• 제목/요약/키워드: Plating Surface Condition

검색결과 86건 처리시간 0.022초

첨가제에 의한 경질 크롬 도금 층의 열처리 후 기계적 특성 향상에 관한 연구 (Study on Improvement of Mechanical Properties after Heat Treatment of Hard Chromium Electrodeposits with Additives)

  • 강수영;이대원
    • 한국표면공학회지
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    • 제47권3호
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    • pp.116-120
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    • 2014
  • The addition of cyclo propane carbonyl (cpc) to chromium electroplating bath resulted in a chromium deposit which had greatly improved mechanical properties compared to conventional chromium deposits in condition of heat treatment at high temperature. The as-deposited layers had a Vicker's hardness of about 1170, which is comparable to that of conventional chromium plating deposits. With annealing, the hardness goes through a maximum of 1650 at $600^{\circ}C$. Generally speaking, the hardness of conventional plating decreases monotonically with heat treatment. X-ray diffraction show that annealing up to above $400^{\circ}C$ causes formation and growth of chromium crystallites and that chromium carbides form at above $500^{\circ}C$ temperature.

무전해 도금에 의한 수직자기 박막제조시의 착화제의 영향 (Influences of Complexing Agents on the Formation of the Perpendicular Magnetic Film by the Electroless Plating)

  • 김영우;박정일;박광자;김조웅;함용묵;이주성
    • 한국표면공학회지
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    • 제20권4호
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    • pp.135-143
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    • 1987
  • Various complexing agents were investigated to see the effects on the normal orientation of HCP structure of Co-alloy to the film plane in ammoniacal electroless plating bath. To obtain the optimum condition, several complexing agents were investigated to compare the C-axis perpendicular orientation. Results were that succinate - citrate, malonate - succinate, malonate bath were useful for that purpose. Among these complexing agents, succinate - citrate system was obtained as the best one. X-ray diffraction patterns were used to compare the film properties with C-axis perpendicular orientation.

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실링재 및 실링방법이 HVOF 용사된 CrC-NiCr 코팅의 내식성에 미치는 영향 (Effect of Sealing Materials and Parameters on the Corrosion Resistance of HVOF-Sprayed CrC-NiCr Coatings)

  • 정영훈;남욱희;변응선;강태일;강정윤
    • 한국표면공학회지
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    • 제47권6호
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    • pp.323-329
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    • 2014
  • Effects of sealant and sealing procedure on corrosion resistance of high velocity oxy-fuel (HVOF) sprayed coatings were studied. HVOF-sprayed CrC-20NiCr coatings were sealed using three commercial sealants based on phenolics and epoxy. Penetration depth of sealants, measured by fluorescent microscope technique, was between $19{\mu}m$ and $340{\mu}m$ depending on sealant, sealing condition or sealing procedure. It was found that sealing on rotation status was more effective than that on stationary specimen due to the Coriolis effect of fluid in pores of the coating. From the CASS results, corrosion resistance of properly sealed CrC-20NiCr coatings was equal to that of hexa-valent chromium plating.

수산을 사용한 크롬도금의 광택성에 미치는 도금액의 조성과 도금조건의 영향 (Effect of Bath Compositions and Plating Conditions for Decorative Properties of Chromium Deposits using Oxalic Acid)

  • 오이식;박정덕
    • 동력기계공학회지
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    • 제5권3호
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    • pp.80-87
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    • 2001
  • Decorative properties of chromium depositions from oxalic acid bath containing chromium oxide and ammonium sulfate have been examined over a wide range of bath compositions and plating conditions. The obtained results from this experiment are summarized as follow: The followings were determined as a optimum conditions, bath compositions; $CrO_3\;200{\sim}250\;g/{\ell},\;H_2C_2O_4{\cdot}2H_2O\;500{\sim}700\;g/{\ell},\;(NH_4)_2SO_4\;40{\sim}120\;g/{\ell}$, and operation conditions; pH $2.0{\sim}2.5$, current density $15{\sim}250\;A/dm^2$ at bath temperature range of $30{\sim}80^{\circ}C$. Bright chromium deposits were obtained over a wide range of ammonium sulfate concentration and bath temperature. Decorative property for chromium deposition was adopted to apply stoichiometric ratio of $CrO_3$ concentration and $H_2C_2O_4{\cdot}2H_2O$.

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전해도금에 의해 제조된 플립칩 솔더 범프의 특성 (Characteristics of Sn-Pb Electroplating and Bump Formation for Flip Chip Fabrication)

  • 황현;홍순민;강춘식;정재필
    • Journal of Welding and Joining
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    • 제19권5호
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    • pp.520-525
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    • 2001
  • The Sn-Pb eutectic solder bump formation ($150\mu\textrm{m}$ diameter, $250\mu\textrm{m}$ pitch) by electroplating was studied for flip chip package fabrication. The effect of current density and plating time on Sn-Pb deposit was investigated. The morphology and composition of plated solder surface was examined by scanning electron microscopy. The plating thickness increased wish increasing time. The plating rate became constant at limiting current density. After the characteristics of Sn-Pb plating were investigated, Sn-Pb solder bumps were fabricated in optimal condition of $7A/dm^$. 4hr. Ball shear test after reflow was performed to measure adhesion strength between solder bump and UBM (Under Bump Metallurgy). The shear strength of Sn-Pb bump after reflow was higher than that of before reflow.

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연속 판재 적용을 위한 고속 동도금의 공정 조건 (The process condition of High-speed copper plating for application of continuous plate)

  • 박상언;허세진;김종현;강용석;최주원
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2007년도 춘계학술발표회 초록집
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    • pp.167-168
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    • 2007
  • 고속 동도금 공정을 확립하기 위하여 선행실험으로 알카리계 동도금 용액을 이용하여 고속 동도금의 가능성을 실험하였다. 전류밀도와 극간거리, 유속의 조절을 통하여 최대 $17.6{\mu}m/min$. 속도의 도금속도를 확보하였으며, Hv 120 내외의 경도를 확보하였다. 고속 동도금을 실현하기 위해서는 높은 전류밀도를 필요로 하고, 낮은 용액 저항을 위해 극간거리는 짧게 유지하되, 빠른 유속을 필요로 하였다.

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Electrochemical Deposition of Copper on Polymer Fibers

  • Lim, Seung-Lin;Kim, Jaecheon;Park, Jongdeok;Kim, Sohee;Lee, Jae-Joon
    • Journal of Electrochemical Science and Technology
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    • 제7권2호
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    • pp.132-138
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    • 2016
  • In this study, we report the fabrication of functional complex fibers, which have been studied widely globally for numerous applications. Here, we fabricated conductive complex fibers with antibacterial properties by coating metal ions on the surface of plastic (polypropylene) fibers using the electroless and electrochemical deposition. First, we polished the polypropylene melt-blown fiber surface and obtained an absorbing Pd seed layer on its surface. Subsequently, we substituted the Pd with Cu. Bis-3-sulfopropyl-disulfide disodium salt (SPS), polyethylene glycol (PEG), and ethylene thiourea (ETU) were used as the brightener, carrier, and leveler, respectively for the electroplating. We focused on most achieving the stable plating condition to remove dendrites, which are normally during electroplating metals so that smooth layer is formed on the fiber surface. The higher the amount of SPS, the higher was the extent of irregular plate-like growth. Many irregularities in the form of round spheres were observed with increase in the amount of PEG and ETU. Hence, when the additives were used separately, a uniform coating could not be obtained. A stable coating was obtained when the three additives were combined and a uniform 5-9 μm thick copper layer with a stable morphology could be obtained around the fiber. We believe that our results can be applied widely to obtain conductive fibers with antibacterial properties and are useful in aiding research on conductive lightweight composite fibers for application in information technology and robotics.

무전해 니켈 도금과 실리콘의 이방성 식각을 이용한 미세 가동 구조물의 제작방법에 관한 연구 (A Study of Micro Freestanding Structure Fabrication using Nickel Electroless Plating And Silicon Anisotropic Etching)

  • 김성혁;김용권;이재호;허진
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권6호
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    • pp.367-374
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    • 2000
  • This paper presents a method to fabricate freestanding structures by (100) silicon anisotropic etching and nickel electroless plating. The electroless plating process is simpler than the electroplating, and provides good coating uniformity and improved mechanical properties. Furthermore, the (100) silicon anisotropic etching in KOH solution with being aligned to <100> direction provides vertical (100) sidewalls on etched (100) surface. In this paper, the effects of the nickel electroless plating condition on the properties of electroless plated metal structures are investigated to apply fabrication of micro structures and then various micro structures are fabricated by nickel electroless plating. And then, the structures are released by silicon anisotropic etching in KOH solution with a large gap between the structure and the substrate. The fabricated cantilever structures are $210\mum$. wide, $5\mum$. thick and $15\mum$. over the silicon substrate, and the comb structure has the comb electrodes which are $4\mum$. wide and $4.3\mum$. thick separated by$1\mum$. It is released by silicon anisotropic etching in KOH solution. The gap between the structure and the substrate is $2.5\mum$.

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Research on the Solution and Properties of Ni-P/n-$Al_2O_3$ Electroless Composite Plating

  • Huang, Yan-bin;Liu, Fei-fei;Zhang, Qi-yong;Ba, Guo-zhao;Liang, Zhi-jie
    • Corrosion Science and Technology
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    • 제6권5호
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    • pp.257-260
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    • 2007
  • In order to further improve the corrosion resistance and wear resistance of the Ni-P coatings of electroless plating, electroless Ni-P/n-$Al_2O_3$ composite deposits were prepared by adding some nano $Al_2O_3$ Particles in Ni-P plating bath. The bath composition and proproties were studied in this paper. The orthogonal test was applied in order to get the new composite solution, taking the initial stable potential as evaluation standard and considering the elements correlation at the same time. The processing parameters have been optimized by single factor experiment in which the depositing speed was chosen as the evaluation standard. The results showed that the process is stable and the composite Ni-P/n-$Al_2O_3$ deposits werebright and smooth, whose hardness and corrosion resistance are much better than simple Ni-P coatings. Furthermore the surface appearance and structure of the composite Ni-P/n-$Al_2O_3$ coating were investigated by SEM and XRD method. It was proved that the coating surface is typical cystiform cells and its structure is amorphous. All test results ofcomposite coating showed that all various physical coating properties had been improved by adding nano-particles. The hardness of optimal coating is more than 600HV and increases to 1000HV after heat-treating, and its hardness is 20~50% higher than Ni-P coating. The rust points appeared in 200 hour by immersing the coating into the 10%HCl solution and the corrosive speed is $3{\times}10^{-3}mg/(cm^2{\cdot}h)$which was obtained after 300 hour. In the same condition Ni-P coating is $5.6{\times}10^{-3}mg/(cm^2{\cdot}h)$. The salt spray resistance of the layers can exceed 600h with the thickness $20{\mu}m$.

무전해 니켈 도금된 폴리스티렌 복합 입자 제조 및 도금 조건의 영향 (Preparation of Composite Particles via Electroless Nickel Plating on Polystyrene Microspheres and Effect of Plating Conditions)

  • 김병철;박진홍;이성재
    • 폴리머
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    • 제34권1호
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    • pp.25-31
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    • 2010
  • 무전해 니켈 도금법을 사용하여 단분산 폴리스티렌 입자 표면에 니켈이 도금된 고분자 코어/금속 쉘의 복합 입자를 제조하였다. 단분산 입자는 분산중합으로 제조하였는데 사용한 분산매질의 종류에 따라 다양한 크기의 단분산 폴리스티렌 입자를 제조할 수 있었다. 그 중 직경 $3.4\;{\mu}m$ 크기의 단분산 폴리스티렌 입자를 선택하여 무전해 니켈 도금을 시도하였다. 니켈 도금에 영향을 미치는 도금 조건을 파악하기 위하여 활성화제인 $PdCl_2$의 농도, 착화제인 glycine의 농도와 니켈 도금액의 투여 시간에 따른 니켈 도금된 폴리스티렌 복합 입자의 모폴로지를 관찰하였다. 본 연구조건하에서는 $PdCl_2$의 농도 0.4 g/L, glycine 농도 1 M 이상인 경우 폴리스티렌 입자 위에 균일한 두께의 니켈층을 형성하였고 석출되는 니켈도 적었다. 도금 시간 2 시간 중에서 동일양의 도금액을 투여 속도를 달리하며 도금한 경우 모폴로지 상의 뚜렷한 차이는 없었으나 0.15 mL/min 속도로 1시간 동안 투여한 경우가 상대적으로 균일한 도금 특성을 보여 주었다.