• Journal of the Korean Ceramic Society
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• v.47 no.6
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• pp.540-545
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• 2010

In this study, we have investigated new plasma resistant materials with less usage of rare-earth oxides than $Y_2O_3$ which is currently used in the semiconductor industry. We observed the stability ranges of $(Gd{\cdot}Y)_3Al_5O_{12}$ and $(La{\cdot}Y)Al_{11}O_{18}$ ternary systems, and measured their etch rates under typical fluorine plasma. $(Gd{\cdot}Y)_3Al_5O_{12}$ system showed an extensive solid solution up to 80 mol% gadolinium, but $(La{\cdot}Y)Al_{11}O_{18}$ showed a negligible substitution between rare-earth ions, which can be explained by the differences between the ionic radii. The etch rates depended on the total amount of rare-earth oxides but not on the substitution of the rare-earth ions. When the specimen was examined using XPS after the exposure to fluorine plasma, the strong surface fluorination was observed with a shift of the binding energy to higher energy.

• Journal of Environmental Health Sciences
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• v.37 no.3
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• pp.218-225
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• 2011

Objectives: In this paper, a dielectric barrier discharge (DBD) plasma reactor was investigated for degrading the dye Rhodamine B (RhB) in aqueous solutions. Methods: The DBD plasma reactor system in this study consisted of a plasma component [titanium discharge (inner), ground (outer) electrode and quartz dielectric tube], power source, and gas supply. The effects of various parameters such as first voltage (input power), gas flow rate, second voltage (output power), conductivity and pH were investigated. Results: Experimental results showed that a 99% aqueous solution of 20 mg/l Rhodamine B is decolorized following an eleven minute plasma treatment. When comparing the performance of electrolysis and plasma treatment, the RhB degradation of the plasma process was higher that of the electrolysis. The optimum first voltage and air flow rate were 160 V (voltage of trans is 15 kV) and 3 l/min, respectively. With increased second voltage (4 kV to 15 kV), RhB degradation was increased. The higher the pH and the lower conductivity, the more Rhodamine B degradation was observed. Conclusions: OH radical generation of dielectric plasma process was identified by degradation of N, N-dimethyl-4-nitrosoaniline (RNO, indicator of OH radical generation). It was observed that the effect of UV light, which was generated as streamer discharge, on Rhodamine B degradation was not high. Rhodamine B removal was influenced by real second voltage regardless of initial first and second voltage. The effects of pH and conductivity were not high on the Rhodamine B degradation.

• Analytical Science and Technology
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• v.15 no.6
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• pp.496-501
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• 2002

The electrolyte cathode glow discharge (ELCAD) is a new optical system for direct determination of trace heavy metals in flowing water. ELCAD has been successfully developed for on-line monitoring of heavy metals in flowing water. The application of an atmospheric glow discharge between an electrolyte solution cathode and a platinum rod anode led to the development of stable discharge. The fundamental aspects of new plasma source have been investigated. The fundamental study of ELCAD system has been measured plasma temperature using Einstein-Boltzmann equation after searching Fe atomic emission lines. The spectrum of each elements such as Cu, Pb, Fe, Ni and Cr show only major elemental line and no ionic line possibly due to low temperature plasma source. The detection limits of each elements are also investigated. These informations show that this type of plasma may apply for monitoring of heavy metals in waste water which consists of complex matrix.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.29-30
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• 2001

This paper presents some results of plasma nitriding on hard chromium deposit. The substrates were C45 steel and $30~50{\;}\mu\textrm{m}$ of chromium deposit by electroplating was formed. Plasma nitriding was carried out in a plasma nitriding system with $95NH_3{\;}+{\;}SCH_4$ atmosphere at the pressure about 600 Pa and different temperature from $450^{\circ}C{\;}to{\;}720^{\circ}C$ for various time. Optical microscopy and X-ray diffraction were used to evaluate the characteristics of surface nitride layer formed by nitrogen diffusion from plasma atmosphere inward iCr coating and interface carbide layer formed by carbon diffusion from substrate outward Cr coating. The microhardness was measured using microhareness tester at the load of 100 gf. Corrosion resistance was evaluated using the potentiodynamic measurement in 3.5% NaG solution. A saturated calomel electrode (SiCE) was used as the reference electrode. Fig.1 shows the typical microstructures of top surface and cross-section for nitrided and unnitrided samples. Aaer plasma nitriding a sandwich structure was formed consisting of surface nitride layer, center chromium layer and interface carbide layer. The thickness of nitride and carbide layers was increased with the increase of processing temperature and time. Hardness reached about 1000Hv after nitriding while 900Hv for unnitrided hard chromium deposit. X-ray diffraction indicated that surface nitrided layer was a mixture of $Cr_2N$ and CrN at low temperature and erN at high temperature (Fig.2). Anodic polarization curves showed that plasma nitriding can greatly improve the corrosion resistance of chromium e1ectrodeposit. After plasma nitriding, the corrosion potential moved to noble direction and passive current density was lower by 1 to 4 orders of magnitude compared with chromium deposit(Fig.3).

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1564-1567
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• 2005

Zinc oxide thin films were grown at the t emperature of $100^{\circ}C$ and $150^{\circ}C$ by means of plasma enhanced atomic layer deposition (PEALD) and conventional atomic layer deposition for applying to the transparent thin film transistor (TTFT). The growth rate of $1.9{\AA}/cycle$ with oxygen plasma is similar to that of film grown with water. While the sheet resistivity of ZnO grown with water is 1233 ohm/sq, that of film grown with oxygen plasma was too high to measure with 4 point probe and hall measurement system. The resistivity of the films grown with oxygen plasma estimated to be $10^6$ times larger than that of the films grown with water. The difference of electrical property between two films was caused by the O/Zn atomic ratio. We fabricated ZnO-TFT by means of ALD for the first time and the ZnO channel fabricated with water showed saturation mobility of $0.398cm^2/V{\cdot}s$ with bottom gate configuration.

• Molecular & Cellular Toxicology
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• v.1 no.2
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• pp.87-91
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• 2005

Although 2D-PAGE has been widely used as the primary method for protein separation, difficulties in displaying proteins with an extreme values of isoelectric paint (pI), molecular size and hydrophobicity limit the technique. In addition, time consuming steps involving protein transfer and extraction from the gel-pieces can result in sample loss. Here, we describe a novel protein separation technique with capillary size-exclusion chromatography (CSEC) for rapid protein identification from human plasma. The method includes protein fractionation along with molecular size followed by in-solution tryptic digestion and peptide analysis through reversed phase liquid chromatography (RPLC) coupled to nanoflow electrospray-tandem mass spectrometry (ESI-MS/MS). Tryptic peptides are applied an a $100\;{\mu}m\;i.d.{\times}10mm$ length pre-column and then separated on a $75\;{\mu}m{\times}200mm$ analytical column at -100 nL/min flaw rate. Proteins were identified over the wide ranges of pI (3.7-12.3) when this technique was applied to the analysis of $1-2\;{\mu}L$ of human plasma. This gel-free system provides fast fractionation and may be considered a complementary technique to SDS-PAGE in proteomics.

• Korean Journal of Materials Research
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• v.25 no.11
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• pp.622-629
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• 2015

Cu circuits were successfully fabricated on flexible PET(polyethylene terephthalate) substrates using wettability difference and electroless plating without an etching process. The wettability of Cu plating solution on PET was controlled by oxygen plasma treatment and $SiO_x$-DLC(silicon oxide containing diamond like carbon) coating by HMDSO(hexamethyldisiloxane) plasma. With an increase of the height of the nanostructures on the PET surface with the oxygen plasma treatment time, the wettability difference between the hydrophilicity and hydrophobicity increased, which allowed the etchless formation of a Cu pattern with high peel strength by selective Cu plating. When the height of the nanostructure was more than 1400 nm (60 min oxygen plasma treatment), the reduction of the critical impalement pressure with the decreasing density of the nanostructure caused the precipitation of copper in the hydrophobic region.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.05a
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• pp.406-409
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• 1999

Experimental Investigations were carried out to remove NOx, SOx simultaneously from simulated flue gas[NO(0.02%)-SO$_2$(0.08%)-$CO_2$-Air-$N_2$] by using a plasma chemical reaction. Ammonia gas(14.81%) balanced by argon was diluted by all and was Introduced to mall simulated flue gas duct through NH$_3$ Injection system which is in downstream of reactor. The NH$_3$ molecular ratio(MR) was determined based on (NH3) to [NO+S0$_2$]. MR is 1, 1.5, 2.5. The NOx removal rate significantly increased with increasing NaOH bubble quantity. The SO$_2$ removal rate was not significantly effected by applied voltage, however it fairly Increased with increasing NH$_3$ molecule ratio. By-product aerosol particle was observed by XRD(X-ray diffraction) after sampling, The NOx, SOx removal rates, when H2O vapour bubbled by dry all was injected to plasma reactor, were better than those of other cases. When aqueous NaOH solution(20%) bubbled by 2.5( ι /min) of $N_2$ and 0.5 ( ι /min) NH$_3$(MR=1.5) were injected to simulated flue gas, The NOx. SOx removal rate was 95 ~ 100[%]

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.14 no.7
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• pp.699-704
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• 2003

The characteristics of microwave reflectometry as a non-invasive device to examine the density distribution of inhomogeneous media using the technology of FM radar is presented. The microwave reflectometry system requires an optimized system hardware and the understanding of system response from the density distribution in order to provide the system solution to describe the object under test quantitatively. Among the applications, the use of microwave reflectomeoy in the area of applied plasma physics has been newly proposed and the number of usage is found to be increasing gradually. The microwave reflectometry systems that depend on the nature of the object under test are described. The experimental method to characterize the system is explained and the experimental results on the wavenumber dependence and the sensitivity on density perturbation are presented as well as the comparison to the results from the one dimensional numerical simulations.

• Journal of Korean Society of Environmental Engineers
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• v.22 no.2
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• pp.211-216
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• 2000

In this paper, experimental investigations were carried out to remove NOx, SOx simultaneously from a simulated combustion flue gas [$NO(0.02%)-SO_2(0.08%)-CO_2-Air-N_2$] by using a pulse corona induced plasma chemical processing. Discharge domain of wire-cylindrical plasma reactor was separated from a gas flow duct to avoid unstable discharge by aerosol particle deposited on discharge electrode and grounded electrode. The NOx, SOx removal was experimentally investigated by a reaction induced to ammonium nitrate, ammonium sulfate using a low price of aqueous NaOH solution and a small quantity of ammonia. Volume percentage of aqueous NaOH solution used was 20% and $N_2$ flow rate was $2.5{\ell}/min$ for bubbling aqueous NaOH solution. Ammonia gas(l4.82%) balanced by argon was diluted by air and was introduced to a main simulated flue gas duct through $NH_3$ injection system which was in downstream of reactor. The $NH_3$ molecular ratio(MR) was determined based on [$NH_3$] and [$NO+SO_2$]. MR is 1.5. The NOx removal rates increased in the order of DC, AC and pulse, but SOx removal rates was not significantly effected by source of electricity. The NOx removal rate slightly decreased with increasing initial concentration. but SOx removal rate was not significantly affected by initial concentration. The NOx, SOx removal rates decreased with increasing gas flow rate.