• Title/Summary/Keyword: Plasma surface

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Influence of Deposition Parameters on Film Hardness for Newly Synthesized BON Thin Film by Low Frequency R.F. PEMOCVD

  • G.C. Chen;J.-H. Boo;Kim, Y.J.;J.G. Han
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2001.06a
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    • pp.73-73
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    • 2001
  • Boron-containing materials have several excellent properties, such as superlnardness, insulation and non-Rinear optical property. Recently, oxynitride compounds, such as Si(ON), Ti(ON), became the promising materials applied in diffusion barrier layer and solar cell. With the expectation of obtaining the hybrid property, we have firstly grown the BON thin film by radio frequency (R.F.) plasma enhanced metalorganic chemical vapm deposition (PEMOCVD) with 100 kHz frequency and trimethyl borate precursor. The plasma source gases used in this study were Ar and $H_2$, and two kinds of nhmgen source gases, $N_2$ and <$NH_3$, were also employed. The as-grown films were characterized by XPS, IR, SEM and Knoop microlhardness tester. The relationship between the films hardness and the growth rate indicated that the hardness of the film was dependent on several factors such as nitrogen source gas, substrate temperature and film thickness due to the variation of the composition and the structure of the film. Both nitrogen and carbon content could raise the film hardness, on which nitrogen content did stronger effect than carbon. The smooth morphology and continuous structure was benefit of obtaining high hardness. The maximum hardness of BON film was about 10 GPa.

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Efficacy of plasma treatment for surface cleansing and osseointegration of sandblasted and acid-etched titanium implants

  • Gang-Ho Bae;Won-Tak Cho;Jong-Ho Lee;Jung-Bo Huh
    • The Journal of Advanced Prosthodontics
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    • v.16 no.3
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    • pp.189-199
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    • 2024
  • PURPOSE. This study was conducted to evaluate the effects of plasma treatment of sandblasted and acid-etched (SLA) titanium implants on surface cleansing and osseointegration in a beagle model. MATERIALS AND METHODS. For morphological analysis and XPS analysis, scanning electron microscope and x-ray photoelectron spectroscopy were used to analyze the surface topography and chemical compositions of implant before and after plasma treatment. For this animal experiment, twelve SLA titanium implants were divided into two groups: a control group (untreated implants) and a plasma group (implants treated with plasma). Each group was randomly located in the mandibular bone of the beagle dog (n = 6). After 8 weeks, the beagle dogs were sacrificed, and volumetric analysis and histometric analysis were performed within the region of interest. RESULTS. In morphological analysis, plasma treatment did not alter the implant surface topography or cause any physical damage. In XPS analysis, the atomic percentage of carbon at the inspection point before the plasma treatment was 34.09%. After the plasma treatment, it was reduced to 18.74%, indicating a 45% reduction in carbon. In volumetric analysis and histometric analysis, the plasma group exhibited relatively higher mean values for new bone volume (NBV), bone to implant contact (BIC), and inter-thread bone density (ITBD) compared to the control group. However, there was no significant difference between the two groups (P > .05). CONCLUSION. Within the limits of this study, plasma treatment effectively eliminated hydrocarbons without changing the implant surface.

The Influence of Plasma Surface Modification on Frictional Property of Natural Rubber Vulcanizates

  • Nah, C.;Kim, D.H.;Mathew, G.;Jeon, D.J.;Jurkowski, B.;Jurkowska, B.
    • Elastomers and Composites
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    • v.39 no.1
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    • pp.12-22
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    • 2004
  • The plasma surface modification of natural rubber vulcanizate was carried out using chlorodifluoromethane in a radio-frequency (13.56 MHz) electrodeless bell type plasma reactor. The modification was qualitatively assessed by Fourier transform infrared spectroscopy. The frictional force of the plasma-treated surface was found to decrease with the time of plasma treatment. An increase in the surface polarity, as evidenced by the decrease in contact angle of a sessile drop of water and ethylene glycol on the natural rubber vulcanizate surface, was noted with the plasma modification. In the case of similar plasma treatment of glass surface, only a reduction in the polarity was observed. The use of geometric and harmonic mean methods was found to be useful to evaluate the London dispersive and specific components of surface free energy. Irrespective of the method used for evaluation, an increasing trend in the surface free energy was noted with increasing plasma treatment time. However, the harmonic mean method yielded comparatively higher values of surface free energy than the geometric mean method. The plasma surface modification was found to vary the frictional coefficient by influencing the interfacial, hysteresis and viscous components of friction in opposing dual manners.

Analysis and Reduction of Impurity Contamination Induced by Plasma Etching on Si Surface (플라즈마 식각에 의하여 실리콘 표면에 유기된 불순물 오염의 분석 및 제거)

  • Cho, Sun-Hee;Lee, Won-Jong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.12
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    • pp.1078-1084
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    • 2006
  • Impurity contamination induced by $CF_4\;and\;HBr/Cl_2/O_2$ plasma etching on Si surface was examined by using surface spectroscopes. XPS(x-ray photoelectron spectroscopy) surface analysis showed that F of 0.4 at % exists in the surface layer in the form of Si-F bonding but Br and Cl are below the detection limit $(0.1{\sim}1.0%)$ of the spectroscope. Static-SIMS(secondary ion mass spectrometry) surface analysis showed that the etched Si surface was contaminated with etching gas elements such as H, F, Cl and Br, and they existed to the depth of about $20{\sim}40nm$. The etched Si surface was treated with three different methods that were HF dip, thermal oxidation followed by HF dip and oxygen-plasma oxidation followed by HF dip. They showed an effect in reducing the impurity contamination and the oxygen-plasma oxidation followed by HF dipping method appears to be a little bit more effective.

A study on fatigue properties of plasma carburized low carbon Cr-Mo steel (플라즈마 침탄한 저탄소 Cr-Mo강의 피로특성에 관한 연구)

  • Park, Kyeong-Bong;Sin, Dong-Myung;Lee, Chang-Youl;Lee, Ktung-Sub
    • Korean Journal of Materials Research
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    • v.10 no.7
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    • pp.505-514
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    • 2000
  • The carburizing behavior and fatigue properties of the plasma carburized low carbon Cr-Mo steel(0.176C-1.014Cr-0.387Mo) have been investigated. The effective case depth in plasma carburized steel increased up to 50% in comparison with that of gas carburizing, and this case depth increased with the increasing surface carbon content. With increasing time in plasma carburizing, the surface carbon content increased but its increasing rate decreased. Fatigue properties were studied in terms of microstructure, case depth, retained austenite and residual stress near the surface. The fatigue limit of the plasma carburized steel was higher than that of gas carburized one. The initiation of microcracks and initial crack propagation were retarded due to a relatively little surface and internal oxidation layer in plasma carburized steel. Fractography showed the crack initiated at the surface, and transgranular fracture at surface layer was more predominant in plasma carburized steel compared to that of gas carburized steel.

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Effects of $N_2$ addition on chemical etching of silicon nitride layers in $F_2/Ar/N_2$ remote plasma processing

  • Park, S.M.;Kim, H.W.;Kim, S.I.;Yun, Y.B.;Lee, N.E.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.78-79
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    • 2007
  • In this study, chemical dry characteristics of silicon nitride layers were investigated in the $F_2/N_2/Ar$ remote plasma. A toroidal-type remote plasma source was used for the generation of remote plasmas. The effects of additive $N_2$ gas on the etch rates of various silicon nitride layers deposited using different deposition techniques and precursors were investigated by varying the various process parameters, such as the $F_2$ flow rate, the addition $N_2$ flow rate and the substrate temperature. The etch rates of the various silicon nitride layers at the room temperature were initially increased and then decreased with the $N_2$ flow increased, which indicates an existence of the maximum etch rates. The etch rates of the silicon oxide layers were also significantly increased with the substrate temperature increased. In the present experiments the $F_2$ gas flow, addition $N_2$ flow rate and the substrate temperature were found to be the critical parameters in determining the etch rate of the silicon nitride layers

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Influence of Plasma Treatment on The Soil Release Properties of Polyester Fabrics (플라즈마처리가 폴리에스테르 직물의 오염제거성에 미치는 연구)

  • Kwon, Young-Ah
    • Proceedings of the Korean Fiber Society Conference
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    • 2003.04a
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    • pp.434-435
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    • 2003
  • Physicochemical properties of a polymer surface significantly affect adhesion, wetting, and dyeing properties. In recent years, low temperature plasma technology has been widely used for surface modification of polymers. Surface fluorination by low temperature plasma treatment has been employed to improve the water and oily repellency of textile fabrics. However, very few results have been reported on soil release properties of the oxygen plasma treated textile fabrics. (omitted)

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High rate deposition and mechanical properties of SiOx film on PET and PC polymers by PECVD with the dual frequencies UHF and HF at low temperature

  • Jin, Su-B.;Choi, Yoon-S.;Choi, In-S.;Han, Jeon-G.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.180-180
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    • 2010
  • The design and implementation of high rate deposition process and anti-scratch property of silicon oxide film by PECVD with UHF power were investigated according to the effect of UHF input power with HF bias. New regime of high rate deposition of SiOx films by hybrid plasma process was investigated. The dissociation of OMCTS (C8H24Si4O4) precursor was controlled by plasma processes. SiOx films were deposited on polyethylene terephthalate (PET) and polycarbonate substrate by plasma enhanced chemical vapor deposition (PECVD) using OMCTS with oxygen carrier gas. As the input energy increased, the deposition rate of SiOx film increased. The plasma diagnostics were performed by optical emission spectrometry. The deposition rate was characterized by alpha-step. The mechanical properties of the coatings were examined by nano-indenter and pencil hardness, respectively. The deposition rate of the SiOx films could be controlled by the appropriate intensity of excited neutrals, ionized atoms and UHF input power with HF bias at room temperature, as well as the dissociation of OMCTS.

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Microstructures and Properties of Surface Hardened Layer on the Plasma Sulfnitrided SKD61 Steel (플라즈마 침류질화처리된 SKD61강의 표면경화층의 미세조직과 특성)

  • Lee, In-Sup;Park, Chul;Park, Ik-Min
    • Korean Journal of Materials Research
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    • v.12 no.7
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    • pp.568-572
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    • 2002
  • Plasma sulfnitriding technology was employed to harden the surface of SKD61 steel. The plasma sulfnitriding was performed with 3 torr gas pressure at $580^{\circ}C$ for 20 hours. Plasma sulfnitriding resulted in the formation of very thin $2-3\mu\textrm{m}$ FeS sulfide layer on top of $15-20\mu\textrm{m}$ compound layer, which consisted of predominantly $\varepsilon$- $Fe{2-3}$ N and a second phase of $\Upsilon'-Fe_4$N. In comparision with plasma nitriding treatment, plasma sulfnitriding treatment showed better surface roughness and corrosion resistance due to the presence of the thin FeS layer. which coated microvoids and microcracks on top of the nitrided layer. It was also found that plasma sulfnitrided sample showed better wear resistance due to the presence of the thin FeS layer which acted as a solid lubricant.