• 제목/요약/키워드: Plasma shape

검색결과 335건 처리시간 0.023초

ANODE HEATING AND MELTING IN THE ARGON GTA

  • Terasaki, Hidenori;Tanaka, Manabu;Fujii, Hidetoshi;Ushio, Masao
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2002년도 Proceedings of the International Welding/Joining Conference-Korea
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    • pp.746-751
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    • 2002
  • In order to make clear the physical relation among the arc plasma, the anode heat transfer and the weld penetration, the results of experimental measurements of temperatures of arc plasma, the distributions of heat input and current on the anode and the weld penetration were presented The experimental results showed that the electron temperature above the anode and current and heat input density on the anode was dominated by the position of the cathode. Furthermore, it was showed that electron temperature of arc plasma was dominated by the cathode shape. These results were related with the results of the welded penetration measurements. As a result, it was showed that the electron temperature above the anode and current density distribution on the anode decided the heat input density distribution on the anode and that the heat input density on the anode remarkably dominated the size of the weld penetration in argon GTA welding process. Furthermore, it was suggested that the cathode played the important role in the determination of the weld penetration in argon GTA welding process.

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Effect of Improved Surface Wetability and Adhesion of Undulated Diamond-like Carbon Structure with r.f. PE-CVD

  • Jang, Young-Jun;Kim, Seock-Sam
    • KSTLE International Journal
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    • 제9권1_2호
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    • pp.22-25
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    • 2008
  • This paper investigated the wetting and adhesion property of undulated DLC film with surface morphology controlled for a reduced real area of contact. The undulated DLC Films were prepared by 13.56 MHZ radio frequency plasma enhanced chemical vapor deposition (r.f. PECVD) by using nanoscale Cu dots surface on a Si (100) substrate. FE-SEM, AFM analysis showed that the after repeated deposition and plasma induced damage with Ar ions, the surface was nanoscale undulated. This phenomenon changed the surface morphology of DLC surface. Raman spectra of film with changed morphology revealed that the plasma induced damage with Ar ions significantly suppressed the graphitization of DLC structure. Also, it was observed that while the untreated flat DLC surfaces had wetting angle starting ranged from $72^{\circ}$ and adhesion force of 333ni. Had wetting angle the undulated DLC surfaces, which resemble the surface morphology of a cylindrical shape, increased up to $104^{\circ}$ and adhesion force decreased down to 11 nN. The measurements agree with Hertz and JKR models. The surface undulation was affected mainly by several factors: the surface morphology affinity to cylindrical shape, reduction of the real area of contact and air pockets trapped in cylindrical asperities of the surface.

LCD 백라이트용 Xe계 플라즈마 평판 램프의 구동 전압 Pulse의 조건에 따른 방전 특성 연구 (Discharge Characteristics of Xe Plasma Flat Lamp for LCD Backlight According to Operating Voltage Pulse)

  • 권은미;김혁환;이원종
    • 한국재료학회지
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    • 제13권4호
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    • pp.271-278
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    • 2003
  • Conventional backlight for liquid crystal display (LCD) uses mercury which leads to environmental pollution. In this study, characteristics of AC coplanar type mercury-free plasma flat lamp have been studied. Pollution-free Xe-He is adopted as a discharge gas system. Since the Xe gas has a lower efficiency in generating vacuum ultraviolet (VUV) than mercury, the improvement of luminance and luminous efficiency in the Xe gas system is very important. The electrode, dielectric, and phosphor layers constituting lamp are formed on the bottom glass by the screen printing method. The effects of pulse shape, on-time, and pulse frequency on the luminance and luminous efficiency have been examined. For Xe(5%)-He gas, the lamp exhibits higher efficiency with sharper pulse shape, higher peak voltage, and shorter pulse on-time (up to 2 $\mu\textrm{s}$). Higher efficiency and lower consumption of power were obtained at 30 kHz than at 60 kHz. The collision of ion to bottom electrodes is a dominant factor to raise the lamp temperature. Therefore the high voltage and low current discharge system is necessary for reduction of the lamp temperature as well as for enhancement of the luminous efficiency.

플라즈마 아크 용사 공법에 의해 도포된 Zn 및 Zn-15Al 금속 코팅의 해수 환경에서 부식 특성에 관한 실험적 연구 (Experimental Study on the Corrosion Characteristics of Zn and Zn-15Al Coatings Deposited by Plasma Arc Thermal Spray Process in Saline Solution)

  • 정화랑;이한승
    • 한국건축시공학회지
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    • 제21권6호
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    • pp.539-550
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    • 2021
  • 일반 전기 아크에 의한 금속용사공법에 비해 시공속도와 효율성능이 우수한 플라즈마 아크 용사장비를 개발하여 이 플라즈마 용사장비에 의한 코팅의 부식특성 평가가 요구되었다. 본 연구에서는 일반 탄소강에 Zn 및 Zn-15Al을 플라즈마 아크 금속 용사법으로 코팅한 후 해수 환경과 유사한 3.5wt.% NaCl 용액에 침지하여 내식성을 평가하였다. SEM 및 XRD에 의한 표면 형상 분석 시험 결과, Zn 코팅이 다공성이고 침상 형태로 되어 있어 용액의 침투가 용이하여 부식 속도가 빠른 것을 알 수 있었다. 반면, Zn-15Al 코팅은 균일하고 조밀한 형태를 보여 부식을 억제하는 것으로 나타났다.

Ga2O3박막 상에서의 RF 플라즈마 화학기상증착법의 메테인 분율 조절에 의한 탄소층의 다양한 형상 제어 연구 (Various Shape of Carbon Layer on Ga2O3 Thin Film by Controlling Methane Fraction in Radio Frequency Plasma Chemical Vapor Deposition)

  • 서지연;신윤지;정성민;김태규;배시영
    • 열처리공학회지
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    • 제35권2호
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    • pp.51-56
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    • 2022
  • In this study, we controlled the shape of a carbon layer on gallium oxide templates. Gallium oxide layers were deposited on sapphire substrates using mist chemical vapor deposition. Subsequently, carbon layers were formed using radio frequency plasma chemical vapor deposition. Various shapes of carbon structures appeared according to the fraction of methane gas, used as a precursor. As methane gas concentration was adjusted from 1 to 100%, The shapes of carbon structures varied to diamonds, nanowalls, and spheres. The growth of carbon isotope structures on Ga2O3 templates will give rise to improving the electrical and thermal properties in the next-generation electronic applications.

레이저 유도 플라즈마에 대한 자기장 감금의 영향 연구 (Research on the magnetic confinement of laser-induced plasma)

  • 현은주;김용현
    • 전기전자학회논문지
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    • 제28권1호
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    • pp.38-45
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    • 2024
  • 간단한 자기장 감금이 레이저 유도 플라즈마의 전하 입자들에 미치는 영향이 논의 되었다. 자기장 영향에 대한 이전 연구들은 주로 플라즈마 방전 세기의 향상이나 수명시간 연장에 집중되었다. 이와 대조적으로, 본 개발은 과거에 거의 다뤄지지 않았던, 플라즈마 소멸에 대해 연구하였다. 이는 플라즈마를 활용한 기술개발에 혁신적인 도움이 될 것으로 기대한다. Nd:YAG 레이저(1064 nm, 6 ns)가 3가지 타입의 금속 물질(Al, Ti, STS)과 공기 중에 집광되었다. Nd2Fe14B 자석으로 0.4T 크기의 자기장을 만들었고, 이를 레이저 유도 플라즈마에 관통시켰다. 플라즈마 스펙트럼은 레이저 파워와 분광기의 딜레이 타임을 조정해 가면서 자기장 여부에 따른 수치가 측정되었다. O I(777.42 nm), Fe I (520.447 nm), Ti I (503.649 nm), Al I (396.147 nm) 스펙트럼 분석을 통해 자기장에 의한 플라즈마의 소멸이 특정 조건에 상관없이 항상 촉진됨을 독점적으로 발견하였다.

LCD Backlight용 FFL(Flat Fluorescent Lamp)의 발광특성에 미치는 전극 형상 및 전극간 거리의 영향 (Effects of Electrode Shape and Electrode Distance on the Properties of Xe Plasma Flat Fluorescent Lamp)

  • 강종현;이양규;허성택;김상우;이동구;오명훈
    • 한국전기전자재료학회논문지
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    • 제21권12호
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    • pp.1105-1110
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    • 2008
  • In this study, plasma flat fluorescent lamps (FFLs) having two electrode type structures of surface discharge was fabricated by screen printing and were characterized using spectra-radiometer and square pulse power supply. Two types of FFLs (cross-type and line-type electrode structure) were compared with variation of discharge shape and electrode distance.

루트 갭과 단차에 의한 플라즈마 아크 용접성에 관한 연구 (A Study on Plasma Arc Weldability by Root Gap and Misalignment)

  • 김대주;김경주;백호성
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2005년도 추계학술발표대회 개요집
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    • pp.138-140
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    • 2005
  • Plasma arc welding(PAW) technology is a proven process that has already been adopted by other industrial fields and recently has been considered to join the tank structure of LNG carrier. The purpose of this study is to introduce PAW process for the root welding of stainless steel pipes instead of TIG welding. There are distinctive features of the PAW compared to TIG welding; higher energy density that can increase welding speed by more than twofold, and longer arc length that can be controlled to trace seam line easily because of allowable gap between workpiece and torch. However, PAW process is also very sensitive to the root gap and misalignment due to the characteristics of long and narrow arc shape. So, we have done various experiments to establish the allowable fit-up condition by changing welding parameters including arc length, with or without filler metal, groove shape, and obtained satisfactory result.

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3-D Simulation of T-Shaped Electrode and Comparison of Results with Experiments

  • Shin, Yeong-Kyo;Hwang, Tae-Su;Kang, Seok-Dong;Park, Hun-Gun;Ryu, Jae-Hwa;Kim, Hyun-Chul;Shin, Seong-Won;Lee, Jae-Koo
    • Journal of Information Display
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    • 제3권2호
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    • pp.13-18
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    • 2002
  • Numerical simulation is one of the most useful tools to study gas discharge phenomena that occur in alternating current plasma display panel (AC-PDP) cell. Most PDP cell simulations have been performed for two-dimensional cell, is cross-section along the address electrode. We developed a three-dimensional PDP simulator and applied it to a T-shaped electrode cell in order to show the effects of sustain electrode shape that cannot be included in two-dimensional simulation. The dependence of power consumption on electrode shape and area in the simulation showed the same trend as experiment.

냉음극을 이용한 plasma전자 beam의 전기적 입력특성 II

  • 전춘생;김상현;이보호
    • 전기의세계
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    • 제27권6호
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    • pp.49-53
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    • 1978
  • This paper investigates on the electric input characterisitcs of plasma electron beam in H$_{2}$ gas chamber with various pressures, effected by the shape and dimension of hollow screen cathode during electron beam is formed. The result are as follows: (1)Electron beam is formed in the region of positive resistance on the characteristic curve which shows the relation between the voltage and current of electron beam, independent of the shape and dimension of hollow screen cathode. (2)At a given electron beam current, electron beam voltage increases with the decreases of hollow screen cathode length and screen mesh number of it. (3)At a given electron beam current, electron beam voltage increases with the diameters of hollow screen cathode and electron beam hole of it.

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