• Journal of Sensor Science and Technology
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• v.28 no.2
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• pp.76-80
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• 2019

The characteristics of a titanium oxide layer prepared using a plasma electrolytic oxidation (PEO) process were investigated, using an extended gate ion sensitive field effect transistor (EG-ISFET) to confirm the layer's capability to react with hydrogen ions. The surface morphology and element distribution of the PEO-processed titanium oxide were observed and analyzed using field-emission scanning-electron microscopy (FE-SEM) and energy-distribution spectroscopy (EDS). The titanium oxide prepared by the PEO process was utilized as a hydrogen-ion sensing membrane and an extended gate insulator. A commercially available n-channel enhancement MOS-FET (metal-oxide-semiconductor FET) played a role as a transducer. The responses of the PEO-processed titanium oxide to different pH solutions were analyzed. The output drain current was linearly related to the pH solutions in the range of pH 4 to pH 12. It was confirmed that the titanium-oxide layer prepared by the PEO process could feasibly be used as a hydrogen-ion-sensing membrane for EGFET measurements.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.36D no.5
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• pp.29-35
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• 1999

Inductively coupled plsama etching of platinum thin film was studied using $O_2$ addition to $Cl_2$/Ar gas plasma. In this study, Pt etching mechanism was investigated with Ar/$Cl_2$ /$O_2$ gas plasma by using XPS and QMS. Ion current density was measured with Ar/$Cl_2$ /$O_2$ gas plasma by using single Langmuir probe. It was confirmed by using QMS and single Langmuir probe that Cl and Ar species rapidly decreased and ion current density was also decreased with increasing $O_2$ gas ratios. These results implied that the decrease of Pt etch rate is due to the decrease of reactive species ans ion current density with increasing $O_2$ gas mixing ratios. A maximum etch rate of 150nm/min and the oxide selectivity of 2.5 were obtained at Ar/$Cl_2$ /$O_2$ flow rate of 50 seem, RF power of 600 W, dc bias voltage of 125 V, and the total pressure of 10 mTorr.

• Journal of the Korean Vacuum Society
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• v.18 no.3
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• pp.236-243
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• 2009

Proton Engineering Frontier Project (PEFP) has supplied the metal ions to users by using an installed metal ion implanter of 120 keV. At present a feasibility study is being performed for a cobalt ion implantation. For a cobalt ion extraction we studied to sustain the high temperature($648^{\circ}C$) for metal ions vaporization from a cobalt chloride powder by using an alumina crucible in the ion source. The temperature condition of the crucible was satisfied with the plasma generation at the arc current of 120V and EHC power of 250W. The extracted beam current of $Co^+$ ions was dependent on the arc current in the plasma. The maximum beam current was $100{\mu}A$ at 0.18A of the arc current. The 3 peak currents of the extracted ions such as $Co^+$, $CoCl^+$ and $Cl^+$ were obtained by adjusting a mass analyzing magnet and the $Co^+$ ion beam peak current fraction as around 70% in the sum of the peak currents. The fluence of the implanted cobalt ions at the $10{\mu}A$ of the beam current and 90 minutes of the implantation time into an aluminum sample as measured around $1.74{\times}10^{17}#/cm^2$ by a quantitative analysis method of RBS (Rutherford Backscattering Spectrometry).

• Journal of Astronomy and Space Sciences
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• v.7 no.2
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• pp.113-123
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• 1990

Two dimensional electrostatic model was used to investigate the interactions between beam electron and neutral plasma. It was found that results heavily depend on the beam density. When the beam electron density is lower than the ambient plasma beam density, many beam electrons exhibit vortex structure through beam-plasma interactions and can propagate into the ambient plasma easily from the injection area. On the other hand, when the beam density larget than that of the neutral ambient plasma, it was found that most of the beam electrons constitute return current and ion with much larger mass than that of the electron can be accelerated according to the magnetic field strength. Furthermore, as external field strength varies, it was found that propagation and interaction of the beam can show large dependence on it.

• Proceedings of the Korean Nuclear Society Conference
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• 1997.05b
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• pp.583-588
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• 1997

For the efficient current drive, the structure of ICRF wave propagation and absorption in a tokamak plasma should be first investigated. In this paper, two dimensional study on FWCD as well as ICRF minority ion heating for the KSTAR [Korea Superconducting Tok Amak Research] [1] plasma was performed using the full wave code of TORIC [2]. The ICRF wave propagation and absorption structures, the competitive power absorption between electrons and ions and the coupling of antenna/plasma are investigated.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.3
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• pp.383-388
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• 2011

The cold hollow cathode gas ion source is under development for multi aperture focused ion beam (FIB) system. In this paper, we describe the cold hollow cathode ion source design and the general ion source performance using Ar gas. The glow discharge characteristics and the ion beam current density at various operation conditions are investigated. This ion source can generate maximum ion beam current density of approximately 120 mA/$cm^2$ at ion beam potential of 10 kV. In order to effectively transport the energetic ions generated from the ion source to the multi-aperture focused ion beam(FIB) system, the einzel lens system for ion beam focusing is designed and evaluated. The ions ejected from the ion source can be forced to move near parallel to the beam axis by adjusting the potentials of the einzel lenses.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.58-61
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• 2002

SBT thin films were etched at different content of Cl$_2$in Cl$_2$/Ar plasma. We obtained the maximum etch rate of 883 ${\AA}$/min at Cl$_2$(20%)/Ar(80%). As Cl$_2$ gas increased in Cl$_2$/Ar plasma, the etch rate decreased. The maximum etch rate may be explained by variation of volume density for Cl atoms and by the concurrence of two etching mechanisms such as physical sputtering and chemical reaction with formation of low-volatile products, which can be desorbed only by ion bombardment. The variation of volume density for Cl, F and Ar atoms and ion current density were measured by the optical emission spectroscopy and Langmuir probe. To evaluate the physical damage due to plasma, X-ray diffraction and atomic force microscopy analysis carried out. After etching process, P-E hysteresis loops were measured by ferroelectric workstation.

• Journal of Astronomy and Space Sciences
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• v.3 no.2
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• pp.71-79
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• 1986

According to recent satellite observations, strong ion transverse acceleration to the magnetic field(ion conics) has been known. The ion conics may be a result of electrostatic waves frequently observed on the auroral zone. Both linear and nonlinear theory of electrostatic instability driven by an electron current based on 1-dimensional particle simulation experiment have been considered. From the results of simulation strong ion transverse acceleration has been shown.

• Nuclear Engineering and Technology
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• v.36 no.4
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• pp.357-363
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• 2004

A prototype long pulse ion source was developed, and the beam extraction experiments of the ion source were carried out at the Neutral Beam Test Stand (NBTS) of the Korea Superconducting Tokamak Advanced Research (KSTAR). The ion source consists of a magnetic bucket plasma generator, with multi-pole cusp fields, and a set of tetrode accelerators with circular apertures. Design requirements for the ion source were a 120kV/65A deuterium beam and a 300 s pulse length. Arc discharges of the plasma generator were controlled by using the emission-limited mode, in turn controlled by the applied heating voltage of the cathode filaments. Stable and efficient arc plasmas with a maximum arc power of 100 kW were produced using the constant power mode operation of an arc power supply. A maximum ion density of $8.3{\times}10^{11}\;cm^{-3}$ was obtained by using electrostatic probes, and an optimum arc efficiency of 0.46 A/kW was estimated. The accelerating and decelerating voltages were applied repeatedly, using the re-triggering mode operation of the high voltage switches during a beam pulse, when beam disruptions occurred. The decelerating voltage was always applied prior to the accelerating voltage, to suppress effectively the back-streaming electrons produced at the time of an initial beam formation, by the pre-programmed fast-switch control system. A maximum beam power of 0.9 MW (i.e. $70\;kV{\times}12.5\;A$) with hydrogen was measured for a pulse duration of 0.8 s. Optimum beam perveance, deduced from the ratio of the gradient grid current to the total beam current, was $0.7\;{\mu}perv$. Stable beams for a long pulse duration of $5{\sim}10\;s$ were tested at low accelerating voltages.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.161-166
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• 2005

The plasma ion density in AC-PDP has shown to be increased from $5.6{\times}10^{11}cm^{-3}$ to $9.0{\times}10^{11)cm^{-3}$ as the Xe mixture ratio to neon increase from 1 % to 10 %, respectively, at fixed pressure of 400 Torr, by using the micro-Langmuir probe. It is noted that the plasma ion density is density increases as the gas pressure increases in this experiment. The electron temperature decreases from 2.3 to 1.2 eV as the Xe mole fraction increases from 1 % to 10 % at fixed pressure of 400 Torr, which is measured by the micro Langmuir probe and high-speed ICCD camera in this experiment. It is noted that the electron temperature decreases as the gas pressure increases from 150 to 400 Torr in this experiment. It is also observed that the exited Xe atom density and the plasma ion density are in strong correlation sharp between each other in this experiment. It is noted that $5.2{\times}10^{12}cm^{-3}$ in the $1s_5$ metastable state and $1.2{\times}10^{12}cm^{-3}$ in the $1s_4$ resonance state for the PDP cell with gap of 50 um distances under the fixed gas pressure of 400 Torr and Xe content ratio of 10 %.