• Journal of the Institute of Electronics Engineers of Korea SD
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• v.48 no.3
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• pp.7-11
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• 2011

In this paper, we proposed a simple and high-yield printing process for source and drain electrodes of organic thin film transistor (OTFT). The surface energy of PVP (poly 4-vinylphenol) gate dielectric was decreased from 56 $mJ/m^2$ to 45 $mJ/m^2$ by adding fluoride of 3000ppm into it. Meanwhile the surface energy of source and drain (S/D) electrodes area on the PVP was increased to 87 $mJ/m^2$ by treating the areas, which was patterned by photolithography, with oxygen plasma, maximizing the surface energy difference from the other areas. A conductive polymer, G-PEDOT:PSS, was deposited on the S/D electrode areas by brushing painting process. With such a simple process we could obtain a high yield of above 90 % in $16{\times}16$ arrays of OTFTs. The performance of OTFTs with the fluoride-added PVP was similar to that of OTFTs with the ordinary PVP without fluoride, generating the mobility of 0.1 $cm^2/V.sec$, which was sufficient enough to drive electrophoretic display (EPD) sheet. The EPD panel employing the OTFT-backpane successfully demonstrated to display some patterns on it.

• Journal of the Institute of Electronics and Information Engineers
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• v.52 no.1
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• pp.135-139
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• 2015

The address discharge time lags are investigated in each subfield time in AC plasma display panel and a modified driving waveform is proposed to reduce the address discharge time lag by applying different additional scan voltage under no misfiring discharge production. The weak plasma discharge in AC PDP is generated by applying high positive-going ramp waveform to the scan electrode during the first reset period and that induce the production of the priming particle and wall charge. Because the wall charge becomes the wall voltage in a cell, the wall plus external address voltage produce the address discharge. However, as the wall charge in a cell is gradually disappeared as time passed, the address discharge time in the subfield time for 1 TV frame is lagged. In the first subfield time, the address discharge is faster produced than the other subfield time because the wall charge are much remained by the high positive-going ramp voltage during the reset period in the first subfield time. Meanwhile, from the second to last subfield, the address discharge production time is gradually delayed due to the dissipation of the wall charge in a cell. In this study, the address discharge time lags are measured in each subfield time and the total address discharge time lags are shortened by applying the different additional scan voltage during the address period in each the subfield time.

• Journal of the Institute of Electronics and Information Engineers
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• v.51 no.2
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• pp.168-172
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• 2014

A new sustain driving method is proposed to improve luminous efficiency by the generation of the self-erasing discharge during a sustain period in AC plasma display panel. As one subfield time in the conventional AC PDP is divided into the reset, address, and sustain period. Among them, as the square sustain waveform is alternately applied to the X and Y electrodes on the front plate during the sustain period, the plasma discharge for displaying the image is continuously produced. Meanwhile, in the conventional driving method, the address waveform applied to the A electrode on the rear plate is only driving during an address period and grounded during a sustain period. In this experiment, the negative pulse is applied to the A electrode at the latter part of the sustain pulse for improving the luminous efficiency producing the self-erasing discharge during the sustain period. The negative pulse on the A electrode can change from the space to the wall charge and induce the additional discharge by the accumulated wall charge when the voltages of three electrodes are grounded. As a result, the luminous efficiency will be measured with changes in the voltage level of the A electrode and the new driving method can be improved to the luminous efficiency about 32 % compared with the conventional driving method.

• Journal of the Korean Chemical Society
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• v.45 no.5
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• pp.461-469
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• 2001

The combinatorial approach has been applied to discover and optimize the composition of the novel or enhanced materials. In this study, we screened the optimum composition of the system SrO-Gd$_2$O$_3$-Al$_2$O$_3$ doped with $Tb^{3+}$ by a polymerized-complex combinatorial chemistry method. Mixtures with compositions of Sr, Gd and Al component that is in the range from 0 to 1 in about 0.05 increments could be tested. The sample powders were synthesized by a polymerized complex method. To prepare appropriately polymeric precursors, we used the metallic nitrates, citric acid and ethylene glycol. The luminescence properties of the synthesized powders are investigated using the UV and VUV (Vacuum-UV: 147 nm) photoluminescence spectrometer. In addition, the crystallinity and morphology of powder were monitored by X-ray diffraction spectrometer and scanning electron microscopy. In result of VUV PL works, there are good luminescent samples with the composition of 0.595 < x < 0.733 and 0.016 < y < 0.017 in Gd1-x-yAlxTbyO$\delta$ and 0.049 < x < 0.064 and 0.02 < y < 0.039 in $Sr_xAl_{1-x-y}Tb_yO_$\delta$$, their materials can be applicable to plasma display panels as the green phosphor.

• Journal of the Korean Chemical Society
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• v.43 no.6
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• pp.636-643
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• 1999

Green-emission intensity of a $Zn_{2-x}Mn_xSiO_4$ phosphor, which is a potential candidate as a green component in PDP device, significantly increases provided that the compound is additionally heat treated at 900$^{\circ}C$ after solid state reaction at 1300$^{\circ}C$. In order to verify origin of such an intensity enhancement after the additional heat treatment in association with the electronic and local structural change at around Mn ions, the Mn K-edge X-ray absorption spectra were recorded. From the analyses of the preedge peak corresponding to $1s{\rightarrow}3d$ bound state transition and XANES spectrum, it is known that most Mn ions are in +2 oxidation state and substitute Zn ion site regardless of the thermal treatment. In addition, EXAFS analyses revealed that Mn ions formed $MnO_4$ tetrahedra with the Mn-O bond length shortened by 0.01${\AA}$ and with reduced Debye-Waller factor in the thermally treated sample.

• Journal of the Korean Magnetics Society
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• v.15 no.4
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• pp.246-249
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• 2005

The blue-color emitting phosphor powder, $CaMgSi_{2}O_6:Eu^{2+}(CMS:Eu^{2+})$ was synthesized by the solid-state reaction method. The synthesized powder was annealed from room temperature to $1,100^{\circ}C$ in air. Its PL property and valence state of Eu atoms was measured by the photoluminescence (PL) and the electron paramagnetic resonance (EPR) spectrometers, respectively. The PL intensity was stable to $700^{\circ}C$, but drastically decreased to $1,100^{\circ}C$. The behavior of EPR intensity was very similar to the PL intensity. The EPR measurement showed that decreased intensity of the PL was caused to the oxidation from the ion $Eu^{2+}$ to $Eu^{3+}$ ions. The EPR spectrometer was powerful as a tool that could distinguish between the valence states of Eu atom as a dopant in various phosphors.

• Journal of the Korean Ceramic Society
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• v.39 no.8
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• pp.721-727
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• 2002

In order to overcome trade-off among compositions, process and properties of the glasses with high PbO-base composition for PDP Rib, we studied glass crystallization and crystallization kinetics by Differential Thermal Analysis(DTA). Glass powder was obtained through melting/cooling/grinding, with 3 wt%TiO2 addition for the crystal nucleation and growth in $62PbO-19B_2O_3-10SiO_2-9(Al_2O_3-K_2O-BaO-ZnO)$(in wt%) composition glass. This powder was heat-treated for 1 to 10 h at $445^{\circ}C$ for nucleation. DTA measurements were performed to obtain the crystallization peak with $5∼25^{\circ}C/min$ heating rates. DTA crystallization peak temperature increased with increasing the heating rate and decreased with increasing the heating time. Because the Avrami parameter (n) was approximately 1, the surface crystallization occurred. The maximum nucleation time was 2 h.

• Korean Journal of Materials Research
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• v.11 no.4
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• pp.305-311
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• 2001

$PbO-B_2O_3-SiO_2-Al_2O_3$, system was investigated for optical, thermal and electrical properties of transparent dielectric. We also studied the reaction between transparent dielectric and transparent electrode(Indium Tin Oxide, ITO) during firing. For the evaluation of properties, dielectrics were prepared under the conditions fired at 520~58$0^{\circ}C$ with 12$\mu\textrm{m}$ thickness. In the reaction between dielectrics and electrode(ITO), In ions diffused into dielectric layer, while Sn ion diffusion was not observed. The coefficient of thermal expansion, the dielectric constant, the glass transition temperature and the transmittance of the dielectric were greatly dependent on PbO content. The increase of the coefficient of thermal expansion and the dielectric constant were monitored by increasing PbO, while the glass transition temperature and the transmittance were decreased. With the increased $Al_2O_3/B_2O_3$ ratio, the coefficient of thermal expansion and the transmittance were decreased, while the dielectric constant was increased. The glass transition temperature did not change significantly.

• Journal of the Korean Vacuum Society
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• v.15 no.4
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• pp.395-403
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• 2006

It is known that $MgAl_2O_4$ has higher resistance to moisture than MgO, in humid ambient MgO is chemically unstable. It reacts very easily with moisture in the air. In this study, the characteristic of $MgAl_2O_4$ and $MgAl_2O_4/MgO$ layers as dielectric protection layers for AC- PDP (Plasma Display Panel) have been investigated and analysed in comparison for conventional MgO layers. MgO and $MgAl_2O_4$ films both with a thickness of $1000\AA$ and $MgAl_2O_4/MgO$ film with a thickness of $200/800\AA$ were grown on the Cu substrates using the electron beam evaporation. $1000\AA$ thick aluminium layers were deposited on the protective layers in order to avoid the charging effect of $Ga^+$ ion beam while the focused ion beam(FIB) is being used. We obtained sputtering yieds for the MgO, $MgAl_2O_4$ and $MgAl_2O_4/MgO$ films using the FIB system. $MgAl_2O_4/MgO$ protective layers have been found th show $24{\sim}30%$ lower sputtering yield values from 0.244 up to 0.357 than MgO layers with the values from 0.364 up to 0.449 for irradiated $Ga^+$ ion beam with energies ranged from 10 kV to 14 kV. And $MgAl_2O_4$ layers have been found to show lowest sputtering yield values from 0.88 up to 0.109. Secondary electron emission coefficient(g) using the ${\gamma}$- FIB. $MgAl_2O_4/MgO$ and MgO have been found to have similar g values from 0.09 up to 0.12 for indicated $Ne^+$ ion with energies ranged from 50 V to 200 V. Observed images for the surfaces of MgO and $MgAl_2O_4/MgO$ protective layers, after discharge degradation process for 72 hours by SEM and AFM. It is found that $MgAl_2O_4/MgO$ protective layer has superior hardness and degradation resistance properties to MgO protective layer.