• Journal of the Korean Society of Food Science and Nutrition
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• v.27 no.2
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• pp.326-332
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• 1998

The effect of mushroom extracts from Pleurotus ostreatus and Lentinus edodes on carbon tetrachloride(CCl4)-induced hepatotoxicity was investigated. Rats were administered orally each mushroom extract at the dose of 150mg/kg, foolwed by treatment with CCl4. Liver damage was produced in male Sprague-Dawley rats, after 21hrs from dosing with CCl4(0.25ml/kg) which were given intraperitoneally. Liver damage without renal injury was confirmed by measuring plasma enzyme, creatinine and blood analysis and liver analysis. Plasma aminotransferase activity, and levels of cholesterol and triglyceride were analyzed. Plasma alanine aminotransferase and aspartate aminotransferase activities were decreased by 34% and 61.5% in pretreatment group of Lentinus edodes compared with CCl4 treated group, respectively. The adminstration of all mushroom extracts led the plasma cholesterol and triglyceride levels decrease more than the CCl4-treated rats. These results suggest that Lentinus edodes extract protect liver from damage induced by CCl4.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.1323-1324
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• 2008

We developed the Hyper-thermal Neutral Beam (HNB) sputtering process as a plasma damage free process for ITO top anode deposition on inverted Top emission OLED (ITOLED). For examining the effect of the HNB sputtering system, Inverted Bottom emission OLEDs (IBOLED) with ITO top anode electrode were fabricated; the characteristics of IBOLED using HNB sputtering process shows significant suppression of plasma induced damage.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.209.1-209.1
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• 2015

Indium gallium zinc oxide (IGZO), indium zinc oxide (IZO) 그리고 zinc tin oxide (ZTO) 같은 zinc oxide 기반의 산화물 반도체는 높은 이동도, 투과도 그리고 유연성 같은 장점을 갖고 있어, display application의 backplane 소자로 적용되고 있다. 또한 최근에는 산화물 반도체를 이용한 thin-film transistor (TFT) 뿐만아니라 resistive random access memory (RRAM), flash memory 그리고 pH 센서 등 다양한 반도체 소자에 적용을 위한 연구가 활발히 진행 중이다. 그러나 zinc oxide 기반의 산화물 반도체의 전기 화학적 불안정성은 위와 같은 소자에 적용하는데 제약이 있다. 산화물 반도체의 안정성에 영향을 미치는 다양한 요인들 중 한 가지는, sputter 같은 plasma를 이용한 공정 진행 시 active layer가 plasma에 노출되면서 threshold voltage (Vth)가 급격하게 변화하는 plasma damage effect 이다. 급격한 Vth의 변화는 동작 전압의 불안정성을 가져옴과 동시에 누설전류를 증가시키는 결과를 초래 한다. 따라서 본 연구에서는, IGZO 기반의 TFT를 제작 후 plasma 분위기에 노출시켜, power와 노출 시간에 따른 전기적 특성 변화를 확인 하였다. 또한, thermal annealing을 적용하여 열처리 온도와 시간에 따른 Vth의 회복특성을 조사 하였다. 이러한 결과는 추후 산화물 반도체를 이용한 다양한 소자 설계 시 유용할 것으로 기대된다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.4
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• pp.373-378
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• 2006

We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin film transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with Al cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that OLED with Al cathode layer prepared by BCS has much lower leakage current density ($1{\times}10^{-5}\;mA/cm^2$ at -6 V) than that $(1{\times}10^{-2}{\sim}-10^0\;mA/cm^2)$ of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and DC/RF sputtering in fabrication process of organic based optoelectronics.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.53-54
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• 2005

We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin rim transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with top cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that TOLED with ITO or IZO top cathode layer prepared by BCS has much lower leakage current density ($1\times10^{-5}$ mA/cm2 at -6V) than that ($1\times10^{-1}\sim10^{\circ}mA/cm^2$)of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and dc/rf sputtering in fabrication process of organic based optoelectronics.

• Current Photovoltaic Research
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• v.3 no.4
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• pp.112-115
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• 2015

In this study, the surface of ITO films was modified using $N_2-O_2$ molecular plasma, and the effects of oxygen concentration in the plasma on the ITO surface properties were investigated. Upon plasma treatment of ITO films, the surface roughness of ITO films seldom changed up to the oxygen concentration in the range of 0% to 40%, while the roughness of the films slightly changed at or above the oxygen concentration of 60%. The contact angle of water droplet on ITO films dramatically changed with varying oxygen concentration in the plasma, and the minimum value was found to be at the oxygen concentration of 20%. The plasma resistance at this condition exhibited a maximum value, and the change of resistance showed an inverse relationship compared to that of contact angle. From these results, it was conjectured that the chemical reactions in the sheath of the molecular plasma dominated more than the physical actions due to energetic ion bombardment, and also the plasma resistance could be used as an indirect indicator to qualitatively diagnosis the state of plasma during the plasma treatment.

• Proceedings of the IEEK Conference
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• 2000.06b
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• pp.302-305
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• 2000

It is important to control the electron energy distribution to have high quality plasma process. A conventional inductively coupled plasma(ICP) source with 13.56MHz power is not adequate for low damage sub-half micron patterning process due to higher electron temperature. Only the pulsed plasma technique seems to provide low electron temperature, and thus low process damage. Recently, a novel method proposed by us, named as ‘Enhanced-ICP’, which uses periodic weak axial magnetic field added to a normal ICP source, has shown great improvement in etch characteristics. changes of plasma characteristics according to the frequency of time-varying axial magnetic field have been observed by probe-time-averaged Langmuir probe.

• Applied Science and Convergence Technology
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• v.23 no.4
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• pp.169-178
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• 2014

Fluid model based numerical analysis is done to simulate a low damage etch back system for 20 nm scale semiconductor fabrication. Etch back should be done conformally with very high material selectivity. One possible mechanism is three steps: reactive radical generation, adsorption and thermal desorption. In this study, plasma generation and transport steps are analyzed by a commercial plasma modeling software package, CFD-ACE+. Ar + $CF_4$ ICP was used as a model and the effect of reactive gas inlet position was investigated in 2D and 3D. At 200~300 mTorr of gas pressure, separated gas inlet scheme is analyzed to work well and generated higher density of F and $F_2$ radicals in the lower chamber region while suppressing ions reach to the wafer by a double layer conducting barrier.

• Journal of Nutrition and Health
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• v.43 no.5
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• pp.443-452
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• 2010

Elevated plasma concentration of total homocysteine (ptHcy) is known as an independent risk factor of cardiovascular disease (CVD) and oxidative stress is also commonly implicated in CVD. An association between ptHcy and oxidative stress has recently been suggested. The study objective is to examine the relationship between ptHcy and oxidative stress markers in 103 healthy college students (62 males and 41 females). Plasma levels of ptHcy, oxidative stress markers (conjugated diene, erythrocyte catalase, TRAP, lymphocyte DNA damage), antioxidant vitamins ($\alpha$-tocopherol, $\gamma$-tocopherol, carotenoids), and lipid parameters (total cholesterol, triglyceride, HDL cholesterol) were determined. The results show that the concentration of ptHcy was significantly higher in male subjects ($22.17\;{\pm}\;2.14\;{\mu}mole/L$) than in female subjects ($12.28\;{\pm}\;0.45\;{\mu}mole/L$). There was a negative association between ptHcy and plasma ${\beta}$-carotene in male subjects (p $lt; 0.05), but no correlation between ptHcy and other plasma antioxidant vitamin levels in either gender. However, there were the negative correlations between ptHcy and plasma ${\alpha}$-carotene or ${\beta}$-carotene, and a positive correlation between ptHcy and lymphocyte DNA damage. A significantly low level of ${\alpha}$-carotene or ${\beta}$-carotene was found in male subjects with elevated ptHcy (${\geq}\;15\;{\mu}mol/L$), as compared to those with lower plasma homocysteine. These study results confirmed the views on the association between plasma homocysteine and oxidative stress markers in humans and support the hypothesis that homocysteine promotes the oxidative environment by counteracting the antioxidant defense mechanism.

• Journal of Nutrition and Health
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• v.36 no.3
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• pp.255-261
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• 2003

Food irradiation has been steadily increasing in many countries in line with increasing international trade and concerns about naturally occurring harmful contaminants in food. Although irradiation provides an excellent safeguard for the consumer by destroying almost 100% of harmful bacteria, it is necessary to ensure the safety of irradiated foods. This study was performed to investigate the effect of an irradiated diet on lipid peroxidation in the plasma, liver, small intestinal mucosa, and lymphocyte DNA damage in mice. Eight-week old ICR mice were assigned to two groups to receive either non-irradiated or irradiated (10 kGy) diets containing 20.38% fish powder and 6.06% sesame seeds for 4 weeks. The resulting changes in the degrees of lipid peroxidation were evaluated based on the level of plasma and liver thiobarbituric acid reactive substance (TBARS), transmission electron micrograph of jejunal mucosa, and free radical-induced oxidative DNA damage in lymphocytes, as measured by alkaline comet assay (single cell gel electrophoresis). The peroxide values of the gamma irradiated diet were measured every week, and the sample for comet assay was taken at the end of the four week experimental period. There was no significant difference in food efficiency ratio between the two groups. The peroxide values of the diet were immediately increased to 35.5% after gamma irradiation and kept on increasing during storage. After 4 weeks, no differences in tissue or plasma TBARS value were observed between the two groups, but epithelial cells of jejumum showed osmiophillic laminated membranous structures, considered as myelin figures,. The oxidative DNA damage expressed as tail moment (TM) increased 30% in the blood lymphocytes of the mice fed the irradiated diet. In conclusion, the comet assay sensitively detected differences in lymphocyte DNA damage after feeding with the irradiated diet for 4 weeks. However, in order to ensure the safety of irradiated foods, it would be more useful to conduct a long-term feeding regimen using an irradiated diet and examine the level of lipid peroxidation and the state of oxidative stress in a greater range of organs.