• 제목/요약/키워드: Plasma Sensor

검색결과 177건 처리시간 0.036초

a-Si:H Image Sensor for PC Scanner

  • Hur, Chang-Wu
    • Journal of information and communication convergence engineering
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    • 제5권2호
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    • pp.116-120
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    • 2007
  • In this paper, the image sensor using the a-Si:H TFT is proposed. The optimum amorphous silicon thin film is deposited using plasma enhanced chemical vapor deposition (PECVD). TFT and photodiode both with the thin film are fabricated and form image sensor. The photodiode shows that $I_{dark}\;is\;{\sim}10^{-13}\;A,\;I_{photo}\;is\;{\sim}10^{-9}\;A\;and\;I_{photo}/I_{dark}\;is\;{\sim}10^4$, respectively. In the case of a-Si:H TFT, it indicates that $I_{on}/I_{off}\;is\;10^6$, the drain current is a few ${\mu}A\;and\;V_{th}\;is\;2{\sim}4$ volts. For the analysis on the fabricated image sensor, the reverse bias of -5 volts in ITO of photodiode and $70 {\mu}sec$ pulse in the gate of TFT are applied. The image sensor with good property was conformed through the measured photo/dark current.

고흡수율 비냉각형 적외선 센서의 브릿지 길이에 따른 저항특성 연구 (Study on the Resistance characteristics with the Bridge length of the Uncooled infrared sensor with high absorptance)

  • 강형곤;이해성;임용근;박승범;이홍기
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.464-467
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    • 2004
  • An uncooled infrared sensor has been prepared with sputtering, plasma ash, ICP, and PECVD on a Si wafer In order to analyze the resistance characteristics with the bridge length in the infrared sensor, three samples were prepared with lengths of 0 (no bridge), 15 (short bridge), and 29 urn (long bridge), respectively. I-V curves were measured for their resistance characteristics and EPMA for the dopping concentration of the amorphous Si. The phosphorus concentration was about 4 % and the resistance was increased with the bridge length. The bridge length of cantilever is very important factor for improvement of the efficiency in an infrared sensor.

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진공 플라즈마 용사공정에 의한 MCrAlY코팅재의 음향방출 신호 특성 연구 (A Study on Acoustic Emission Characteristics of MCrAlY Coated Material by Vacuum Plasma Spray Process)

  • 박진효;이구현;예경환;김정석;강명창
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.921-924
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    • 2004
  • This paper is to investigate a crack for plasma sprayed MCrAlY coated material by acoustic emission method in 4-point bending test. The CoNiCrAlY is coated on Inconel-718 by vacuum plasma spray process. Micro-hardness measurement was conducted by means of Micro Vickers-hardness indentor. The porosity of coating layer was measured using a SEM and Image Analyzer. AE monitoring system is composed of PICO type sensor, a wide band preamplifier(40dB), a PC and AE DSP(16/32 PAC) board. The AE count, Hit and energy of coating specimens is measured according to coating thickness.

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Real-time In-situ Plasma Etch Process Monitoring for Sensor Based-Advanced Process Control

  • Ahn, Jong-Hwan;Gu, Ja-Myong;Han, Seung-Soo;Hong, Sang-Jeen
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제11권1호
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    • pp.1-5
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    • 2011
  • To enter next process control, numerous approaches, including run-to-run (R2R) process control and fault detection and classification (FDC) have been suggested in semiconductor manufacturing industry as a facilitation of advanced process control. This paper introduces a novel type of optical plasma process monitoring system, called plasma eyes chromatic system (PECSTM) and presents its potential for the purpose of fault detection. Qualitatively comparison of optically acquired signal levels vs. process parameter modifications are successfully demonstrated, and we expect that PECSTM signal can be a useful indication of onset of process change in real-time for advanced process control (APC).

Highly Sensitive and Transparent Pressure Sensor Using Double Layer Graphene Transferred onto Flexible Substrate

  • Chun, Sungwoo;Kim, Youngjun;Jin, Hyungki;Jung, Hyojin;Park, Wanjun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.229.2-229.2
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    • 2014
  • Graphene, an allotrope of carbon, is a two-dimensional material having a unique electro-mechanical property that shows significant change of the electrical conductance under the applied strain. In addition of the extraordinary mechanical strength [1], graphene becomes a prospective candidate for pressure sensor technology [2]. However, very few investigations have been carried out to demonstrate characteristics of graphene sensor as a device form. In this study, we demonstrate a pressure sensor using graphene double layer as an active channel to generate electrical signal as the response of the applied vertical pressure. For formation of the active channel in the pressure sensor, two single graphene layers which are grown on Cu foil (25 um thickness) by the plasma enhanced chemical vapor deposition (PECVD) are sequentially transformed to the poly-di-methyl-siloxane (PDMS) substrate. Dry and wet transfer methods are individually employed for formation of the double layer graphene. This sensor geometry results a switching characteristic which shows ~900% conductivity change in response to the application of pulsed pressure of 5 kPa whose on and off duration is 3 sec. Additionally, the functional reliability of the sensor confirms consistent behavior with a 200-cycle test.

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플라즈마 중합막을 이용한 고분자 습도센서에 관한 연구 (A Study on the polymer humidity sensor using plasma polymerized films.)

  • 신백균;이덕출;박구범;박찬복;윤문수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1991년도 하계학술대회 논문집
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    • pp.198-200
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    • 1991
  • In this study we fabricated thin organic polymer films on the comb-electrode by plasma polymerization methode in electrode gas flow type reactor. The dielectric constant of polymer films were increased by increasing relative humidity and we used free volume theory in order to explain the mechanism of water absorption phenomena of polymer films.

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헥사플루오르프로펜 플라즈마박막을 이용한 표면탄성파발진기 습도센서 (surface acoustic wave oscillator hymidity sensor using hexafluoropropene plasma thin film)

  • 박남천;서은덕
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1992년도 춘계학술대회 논문집
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    • pp.144-146
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    • 1992
  • Surface acoustic wave(SAW) oscillator offers many attractive features for application to vapor sensors. The perturbation of SAW velocity by the hexafluoropropence plasma polymer thin film has been studied for relative humidity sensing. adsorption of moisture produces rapid aid changes in the properties of the film, resulting in a change in the velocity of surface acoustic waves and, hence, in the frequency of one SAW oscillator. The device used in our experiments have 55 MHZ SAW oscillator fabricated on a LiNbO substrate.

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BCl3/Ar 유도결합 플라즈마 안에 CH4 가스 첨가에 따른 건식 식각된 TaN 박막 표면의 연구 (A Study on the Surface of the Dry Etched TaN Thin Film by Adding The CH4 Gas in BCl3/Ar Inductively Coupled Plasma)

  • 우종창;최창억;양우석;주영희;강필승;전윤수;김창일
    • 한국전기전자재료학회논문지
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    • 제26권5호
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    • pp.335-340
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    • 2013
  • In this study, the plasma etching of the TaN thin film with $CH_4/BCl_3/Ar$ gas chemistries was investigated. The etch rate of the TaN thin film and the etch selectivity of TaN to $SiO_2$ was studied as a function of the process parameters, including the amount of $CH_4$. X-ray photoelectron spectroscopy (XPS) and Field-emission scanning electron microscopy (FE-SEM) was used to investigate the chemical states of the surface of the TaN thin film.

포토 다이오드를 이용한 6000계열 알루미늄 합금의 레이저 용접에서 키홀 및 플라즈마의 거동 해석 (Analysis on behavior of keyhole and plasma using photodiode in laser welding of aluminum 6000 alloy)

  • 박영환;박현성;이세헌
    • 한국레이저가공학회지
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    • 제7권3호
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    • pp.11-24
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    • 2004
  • In automotive industry, light weight vehicle is one of issues because of the air pollution and the protection of environment. Therefore, automotive manufacturers have tried to apply light materials such as aluminum to car body. Aluminum welding using laser has some advantages high energy density and high productivity. It is very important to understand behavior of plasma and keyhole in order to improve weld quality and monitor the weld state. In this study, spectral analysis was carried out to verify the spectrum for plasma which is generated in laser welding of A 6000 aluminum alloy. Two photodiodes which cover the range of plasma wavelength was used to measure light emission during laser welding according to assist gas flow rate and welding speed. Analysis of relationship between sensor signals of welding variables and formation of keyhole and plasma is performed. To determine the level of significance, analysis of variation (ANOVA) was carried out.

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상압플라즈마 공정을 이용한 Ti 증착 연구 (Ti Deposition using Atmospheric Pressure Plasma Technology)

  • 김경보
    • 융합정보논문지
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    • 제12권2호
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    • pp.149-156
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    • 2022
  • 본 논문에서는 광센서의 주요 구성요소인 도체를 상압플라즈마 공정 기술을 이용하여 티타늄(Ti: Titanium) 박막을 형성하고자 하였다. 이를 위해 기존의 상압플라즈마 장비를 개조하였으며, CF4 가스를 이용하여 sputter용 4인치 크기의 Ti 타겟을 식각하여 그 부산물이 글라스 소재의 샘플에 코팅되는 방법을 이용하였다. 이러한 부산물이 약 2cm까지 형성되었으며, 색깔에 따라 총 15영역으로 구분할 수 있었다. SEM(Scanning Electron Microscopy) 및 EDS(Energy Dispersive Spectrometer), 4-point probe 장비를 이용하여 표면 형상 및 구성 원소를 분석하였으며, 또한, 전기적인 특성을 측정하였다. 증착률 및 Ti 비율을 고려한다면, 타겟에서 약 4.5mm에서 5mm 정도에 샘플을 위치시켜 코팅하면 전체적으로 균일한 박막이 형성되지만, 이 박막에 상당량의 플루오린이 함유되어 있어 박막의 전기적인 특성에 큰 영향을 미치는 것을 알 수 있었다. 따라서 플루오린을 제거하거나 증착시 최소화하는 방안에 대해 추가 실험 및 연구를 진행해야 할 것이다.