• 제목/요약/키워드: Plasma Display

검색결과 1,337건 처리시간 0.03초

Decrease of Global Warming Effect During Dry Etching of Silicon Nitride Layer Using C3F6O/O2 Chemistries

  • Kim, Il-Jin;Moon, Hock-Key;Lee, Jung-Hun;Jung, Jae-Wook;Cho, Sang-Hyun;Lee, Nae-Eung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.459-459
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    • 2012
  • Recently, the discharge of global warming gases in dry etching process of TFT-LCD display industry is a serious issue because perfluorocarbon compound (PFC) gas causes global warming effects. PFCs including CF4, C2F6, C3F8, CHF3, NF3 and SF6 are widely used as etching and cleaning gases. In particular, the SF6 gas is chemically stable compounds. However, these gases have large global warming potential (GWP100 = 24,900) and lifetime (3,200). In this work, we chose C3F6O gas which has a very low GWP (GWP100 = <100) and lifetime (< 1) as a replacement gas. This study investigated the effects of the gas flow ratio of C3F6O/O2 and process pressure in dual-frequency capacitively coupled plasma (CCP) etcher on global warming effects. Also, we compared global warming effects of C3F6O gas with those of SF6 gas during dry etching of a patterned positive type photo-resist/silicon nitride/glass substrate. The etch rate measurements and emission of by-products were analyzed by scanning electron Microscopy (SEM; HITACI, S-3500H) and Fourier transform infrared spectroscopy (FT-IR; MIDAC, I2000), respectively. Calculation of MMTCE (million metric ton carbon equivalents) based on the emitted by-products were performed during etching by controlling various process parameters. The evaluation procedure and results will be discussed in detail.

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Indium Tin Oxide(ITO) Thin Film Deposition on Polyethylene Terephthalate(PET) Using Ion Beam Assisted Deposition(IBAD)

  • Bae, J.W.;Kim, H.J.;Kim, J.S.;Lee, Y.H.;Lee, N.E.;Yeom, G.Y.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.81-83
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    • 2000
  • Tin-doped indium oxide(ITO) thin films were deposited on polyethylene terephthalate(PET) at room temperature by oxygen ion beam assisted evaporator system and the effects of oxygen gas flow rate on the properties of room temperature ITO thin films were investigated. Plasma characteristics of the ion gun such as oxygen ions and atomic oxygen radicals as a function of oxygen flow rate were investigated using optical emission spectroscopy(OES). Faraday cup also used to measure oxygen ion density. The increase of oxygen flow rate to the ion gun generally increase the optical transmittance of the deposited ITO up to 6sccm of $O_2$ and the further increase of oxygen flow rate appears to saturate the optical transmittance. In the case of electrical property, the resistivity showed a minimum at 6 sccm of $O_2$ with the increase of oxygen flow rate. Therefore, the improved ITO properties at 6 sccm of $O_2$ appear to be more related to the incorporation of low energy oxygen radicals to deposited ITO film rather than the irradiation of high energy oxygen ions to the substrate. At an optimal deposition condition, ITO thin films deposited on PET substrates showed the resistivity of $6.6{\times}10^{-4}$ ${\Omega}$ cm and optical transmittance of above 90%.

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ZrO2 첨가에 따른 AC PDP 보호막용 MgO 박막의 광학적 전기적 특성 (Effects of ZrO2 Addition on Optical and Electrical Properties of MgO Films as a Protective Layer for AC PDPs)

  • 김창일;정영훈;이영진;백종후;최은하;정석;김정석
    • 한국재료학회지
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    • 제18권8호
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    • pp.422-426
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    • 2008
  • The effects of an addition of $ZrO_2$ on the microstructure and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. MgO + a 200 ppm $ZrO_2$ protective layer prepared by e-beam evaporation exhibited a secondary electron emission coefficient ($\gamma$) that was improved by 21% compared to that of a pure MgO protective layer. The relative density and Vickers hardness increased with a further addition of $ZrO_2$. These results suggest that the discharge properties and optical properties of MgO protective layers are closely related to the relative density and Vickers hardness. The good optical and electrical properties of $\gamma$, at 0.080, a grain size of $19\;{\mu}m$ and an optical transmittance of 91.93 % were obtained for the MgO + 200 ppm $ZrO_2$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

Hydrogen Passivation for the Enhancement of Poly-Si Performance Crystallized By Double-Frequency YAG Laser

  • Li, Juan;Chong, Luo;Ying, Yao;He, Li;Meng, Zhiguo;Chunya, Wu;Xiong, Shaozhen;Kwok, Hoi-Sing
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1608-1611
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    • 2009
  • Here the hydrogen passivation treatment has been adopted to enhance the performance of poly-Si crystallized by YAG laser annealing (LA poly-Si). We have investigated the effects of passivation time, passivation power and passivation temperature on the hall mobility of the LA poly-Si and analyzed the mechanism of the hydrogen passivation preliminary. It has been found that the quality of the poly-Si annealed by YAG laser could be improved after proper hydrogen plasma treatment.

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The Effect of Dielectric Thickness and Barrier Rib Height on Addressing Time of Coplanar ac PDP

  • Lee, Sung-Hyun;Kim, Young-Dae;Shin, Joong-Hong;Cho, Jung-Soo;Park, Chung-Hoo
    • Journal of KIEE
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    • 제11권1호
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    • pp.41-45
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    • 2001
  • The addressing time should be reduced by modifying cell structure and/or driving method in order to replace the dual scan system by single scan and increase the luminance in large ac plasma display panel(PDP). In this paper, the effects of the dielectric layer thickness and the barrier rib height on the addressing time of ac PDP are investigated. It is found out that the addressing time was decreased with decreasing thickness of dielectric layer on the front glass and thickness of white dielectric layer on the rear glass. The decreasing rate were 160ns/10${\mu}{\textrm}{m}$ and 270nsd/10${\mu}{\textrm}{m}$, respectively. Also in case of decreasing the height of barrier rib, addressing time was decreased at the rate of 550ns/10${\mu}m$.

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AC PDP에서 CLHS 구동 방법에 의한 ITO Gap에 따른 방전 특성 (The Characteristics of the Discharge According to ITO Gap by the CLHS Driving Method in AC PDP)

  • 신재화;최명규;김근수
    • 전기학회논문지
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    • 제62권1호
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    • pp.83-89
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    • 2013
  • In order to reduce the power consumption in international standard IEC62087, the luminance efficiency should be improved at the low discharge load rather than at the high discharge load. Thus, this paper analysed the characteristics of the discharge at the panels with ITO Gap of $65{\mu}m$, $80{\mu}m$, and $100{\mu}m$ in 50-inch PDP with FHD resolution. It was well known that the long gap panel improves the luminance and the luminous efficiency. However, it is very difficult to drive the panel due to high driving voltage. When the normal driving method was applied at the panel with ITO gap of $100{\mu}m$, the phenomenon of the double peak was generated in the sustain period. We confirmed that main factor of the double peak is the self-erasing discharge. When the CLHS driving method was applied at the panel with ITO gap of $100{\mu}m$, the self-erasing discharge was improved in the sustain period. Also, the $V_S$ and $V_A$ minimum voltage of the CLHS driving method decreased about 9V and 12V compared with those of the normal driving method. Moreover, when the CLHS driving method was applied to the panel with ITO gap of $100{\mu}m$, the luminance and the luminous efficiency increased compared with those of the normal driving method. The luminance and the luminous efficiency greatly increased at the low discharge load. The less discharge load, the higher increase rate of the luminance and the luminous efficiency. Especially, the luminous efficiency at ITO gap of $100{\mu}m$ increased about 26.3% at the discharge load of 4% compared with that at ITO gap of $65{\mu}m$.

PDP 스캔 전극 구동방식에 따른 방전 특성의 변화에 관한 연구 (A Study on the Discharge Characteristics of an Ac PDP with the Variation of Scan Electrode Driver)

  • 김중균
    • 조명전기설비학회논문지
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    • 제19권8호
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    • pp.13-18
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    • 2005
  • 본 연구는 스캔 구동 회로의 변화에 따른 교류형 플라즈마 표시기의 구동 특성에 관한 것이다. 본 연구에서는 교류형 플라즈마 표시기의 용량성 부하 특성을 활용하여 스캔 라인 당 소요되는 스위치의 수를 줄일 수 있는 회로를 제안하고 그 적용 가능성을 고찰하였다. 제안된 방식의 실용화 가능성에 대한 검증을 위하여 방전 유지 전압의 변화에 따라 어드레싱 전압의 변화를 관찰하여 동적 전압 마진을 측정한 결과, 기존 방식에 비하여 9[V] 가량의 전압마진 감소가 관찰되었다. 이는 제안된 방식의 경우 선택된 전극의 스캔 기간에 이웃한 전극에 전위에 영향을 줌으로써 상호 간섭이 유발되는 효과에 의한 것으로 해석되었다. 최소 어드레싱 전압과 어드레싱 방전의 방전 지연 시간에 변화가 없는 점을 감안하면 제안된 방식의 실제 회로 적용은 가능할 것으로 사료된다.

도핑된 발광층을 갖는 다층 유기발광다이오드 소자의 전기적 특성 해석 (Simulations of Electrical Characteristics of Multi-layer Organic Light Emitting Diode Devices with doped Emitting Layer)

  • 오태식;이영구
    • 한국산학기술학회논문지
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    • 제11권3호
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    • pp.827-834
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    • 2010
  • 발광층에 도펀트가 도핑된 다층 유기발광다이오드 소자 구조에서의 발광 메카니즘을 검증하기 위해 전기적인 특성요인들을 수치해석 하였다. 본 논문에 적용한 유기발광다이오드 소자는 ITO/NPB/$Alq_3$:C545T(%)/$Alq_3$/LiF/Al으로 이루어져 있으며 도펀트인 C545T의 도핑 농도를 변화시킨 4종류의 소자 구조에 대해 특성 변화를 검토하였다. 그 결과 도펀트의 도핑 농도 변화에 따라서 전압-전류 특성이 변화되어짐을 확인하였고, 이는 참고 문헌에 제시되어 있는 전압-전류밀도 실험 데이터와 매우 잘 일치되었다. 또한 도펀트를 도핑시킨 소자 구조들에서 전압-휘도 특성이 대폭 향상되어 발광효율이 3배정도 향상되었다. 이와 같은 guest-host system이 적용된 유기발광다이오드 소자의 동작 메카니즘을 분석하기 위하여 소자 내부에서의 전계분포, 전하분포, 재결합율 등의 전기적인 항목들에 대한 특성의 변화를 관찰하였다.

저온 Roll-to-Roll 스퍼터 시스템을 이용하여 PET 기판위에 성막 시킨 ITO 박막의 전기적, 광학적, 구조적 특성 (Characteristics of amorphous indium tin oxide films on PET substrate grown by Roll-to-Roll sputtering system)

  • 조성우;배정혁;최광혁;문종민;정진아;정순욱;김한기
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.380-381
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    • 2007
  • This paper reports on the deposition conditions and properties of ITO films used as electrode layer in a organic light emitting diodes on a PET substrate. The deposition technique employed was specially designed roll-to-roll sputtering. The oxide was deposited at room temperature in an argon and oxygen plasma on a transparent conducting ITO layer on a PET film. The influence of deposition parameters such as DC power, working pressure and oxygen partial pressure has been investigated, in order to obtain the best compromise between a high deposition rate and adequate electro-optical properties. Electrical and optical properties of ITO films were analyzed by Hall measurement examinations with van der pauw geometry at room temperature and UV/Vis spectrometer analysis, respectively. In addition, the structural properties and surface smoothness were measured by x-ray diffraction and scaning electron microscopy, respectively. From optimized ITO films grown by roll-to-roll sputter system, good electrical$(6.44{\times}10^{-4}\;{\Omega}-cm)$ and optical(above 86 % at 550 nm) properties were obtained. Also, the ITO films exhibited amorphous structure and very flat surface beacause of low deposition temperature.

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플라즈마 디스플레이 패널의 감광성 격벽을 위한 B2O3-Al2O3-SiO2 유리계의 굴절률과 밀도 (Refractive Indices and Densities of B2O3-Al2O3-SiO2 Glass System for Photosensitive Barrier Ribs of Plasma Display Panel)

  • 원주연;황성진;이상호;김형순
    • 한국전기전자재료학회논문지
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    • 제22권6호
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    • pp.506-511
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    • 2009
  • For the application of the photosensitive barrier ribs with optimal properties such as glass transition temperature, refractive index and coefficient thermal expansion, the boro-silicate glasses was studied. The glass transition temperature, coefficient thermal expansion, and refractive index of the glasses based on the $B_2O_3-Al_2O_3-Al_2O_3-SiO_2$ glass system have been investigated with the different ratio of BaO/$Na_2O$ and $B_2O_3/Na_2O$. Increasing the ratio of $B_2O_3/Na_2O$ was led to the increase of coefficient thermal expansion and the decrease of glass transition temperature. The increase of refractive index of boro-silicate glasses increased with the density of glasses. We suggest the empirical equation for the prediction of refractive index with the glass density, $n=0.123{\rho}+1.182$ with 0.042 as the standard deviation in the boro-silicate glass system. The aim of the present paper is to give a basic result of the thermal and optical properties for designing the composition of photosensitive barrier ribs in PDP.