• 대한전기학회:학술대회논문집
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• 대한전기학회 2009년도 제40회 하계학술대회
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• pp.1425_1426
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• 2009

In this study, commercially available polyethylene terephthalate(PET), which is widely used as a substrate of flexible electronic devices, was modified by dielectric barrier discharge(DBD) method in an air condition at atmospheric pressure, and aluminium - doped zinc oxide (ZnO:Al) transparent conducting film was deposited on PET substrate by r. f. magnetron sputtering method. Surface analysis and characterization of the plasma-treated PET substrate was carried out using contact angle measurements, X-ray Photoelectron Spectroscopy(XPS) and Atomic Force Microscopy (AFM). Especially the effect of surface state of PET substrate on some important properties of ZnO:Al transparent conducting film such as electrical and morphological properties and deposition rate of the film, was studied experimentally. The results showed that the contact angle of water on PET film was reduced significantly from $62^{\circ}$ to $43^{\circ}$ by DBD surface treatment at 20 min. of treatment time. The plasma treatment also improved the deposition rate and electrical properties. The deposition rate was increased almost linearly with surface treatment time. The lowest electrical resistivity as low as $4.97{\times}10^{-3}[\Omega-cm]$ and the highest deposition rate of 234[${\AA}m$/min] were obtained in ZnO:Al film with surface treatment time of 5min. and 20min., respectively.

• 한국분말재료학회지
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• 제18권2호
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• pp.112-121
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• 2011

This study investigated the effect of solvent on the fabrication of Ni-free Fe-based alloy nano powders by employing the PWE (pulsed wire evaporation) in liquid and compared the alloy particles fabricated by three different methods (PWE in liquid, PWE in Ar, plasma arc discharge), for high temperature oxidation-resistant metallic porous body for high temperature soot filter system. Three different solvents (ethanol, acetone, distilled water) of liquid were adapted in PWE in liquid process, while X-ray diffraction (XRD), field emission scanning microscope (FE-SEM), and transmission electron microscope (TEM) were used to investigate the characteristics of the Fe-Cr-Al nano powders. The alloy powder synthesized by PWE in ethanol has good particle size and no surface oxidation compared to that of distilled water. Since the Fe-based alloy powders, which were fabricated by PWE in Ar and PAD process, showed surface oxidation by TEM analysis, the PWE in ethanol is the best way to fabricate Fe-based alloy nano powder.

• 전기학회논문지
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• 제57권9호
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• pp.1599-1605
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• 2008

The research was conducted in order to improve the hydrogen generation efficiency of the electrical plasma technology from tap water by using $TiO_2$ photocatalyst, mixed Cu - $TiO_2$ powder, and mixed Ni - $TiO_2$ powder as the catalysts. Experiments were performed with the pulsed power and nitrogen carrier gas. The result has shown that the hydrogen concentration with the presence of $TiO_2$ powder was created higher than that of without using photocatalyst. The hydrogen concentration with using $TiO_2$ was 3012ppm corresponding to the applied voltage of 16kV, while it without using the $TiO_2$ was 1464ppm at the same condition . The effect of $TiO_2$ powder was strongly detected at the applied voltages of 15kV and 16kV. This phenomena might be resulted from the co-effect of the pulsed power discharge and the activated state of $TiO_2$ photocatalyst. The co-effect of the mixed catalysts such as Cu-$TiO_2$ and Ni-$TiO_2$ (the mixed photocatalyst $TiO_2$ and transition metals) were also investigated. The experimental results showed that, Cu and Ni powder dopants were greatly enhancing the activity of the $TiO_2$ photocatalyst. Under these experimental conditions the extremely high hydrogen concentrations at the optimal point were produced as 4089ppm and 6630ppm, respectively.

• Tribology and Lubricants
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• 제32권4호
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• pp.125-131
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• 2016

In recent years, thick ta-C coating has attracted considerable interest owing to its existing and potential commercial importance in applications such as automobile accessories, drills, and gears. The thickness of the ta-C coating is an important parameter in these applications. However, the biggest problems are achieving efficient coating and uniformity over a large area with high-speed deposition. Feasibility is confirmed for the ta-C coating thickness of up to 9.0 µm (coating speed: 3.0 µm/h, fixed substrate) using a single FCVA cathode. The thickness was determined using multiple coating cycles that were controlled using substrate temperature and residual stresses. In the present research, we have designed a coating system using FCVA plasma and produced enhanced thick ta-C coating. The system uses a specialized magnetic field configuration with stabilized DC arc plasma discharge during deposition. To achieve quality that is acceptable for use in automobile accessories, the magnetic field, T-type filters, and 10 pieces of a multi-cathode are used to demonstrate the deposition of the thick ta-C coating. The results of coating performance indicate that uniformity is ±7.6 , deposited area is 400 mm, and the thickness of the ta-C coating is up to 5.0 µm (coating speed: 0.3 µm/h, revolution and rotation). The hardness of the coating ranges from 30 to 59 GPa, and the adhesion strength level (HF1) ranges from 20 to 60 N, depending on the ta-C coating.

• 한국정밀공학회지
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• 제18권5호
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• pp.171-176
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• 2001

Plasma Display Panel(PDP) is a type of flat panel display utilizing the light emission produced by gas discharge. Barrier Ribs of PDP separating each sub-pixel prevents optical and electrical crosstalks from adjacent sub-pixels. Mold for forming barrier ribs has been newly researched to overcome the disadvantages of conventional manufacturing process such as screen printing, sand-blasting and photosensitive glass methods. Mold for PDP barrier ribs have stripes of micro grooves transferring glass-material wall. In this paper, Stripes of grooves of which width 48${\mu}{\textrm}{m}$ and 270${\mu}{\textrm}{m}$, depth 124${\mu}{\textrm}{m}$, pitch 274${\mu}{\textrm}{m}$ was acquired by machining hard and brittle materials of WC, Silicon, Alumina with dicing saw blade. Maximum roughness of the bottom and sidewall of the grooves was respectively 120nm, 287nm in grooving WC. Maximum tilt angle caused by difference between upper-most width and lower-most width was 2$^{\circ}$. Maximum Radius of bottom curvatures was 7.75${\mu}{\textrm}{m}$. This results satisfies the specification for barrier ribs of 50 inch XGA PDP if the groove form of mold was fully transferred to the barrier ribs. Barrier ribs were formed with Silicone rubber mold, which is transferred from grooved hard materials. Silicone rubber mold has elasticity accommodating the waveness of lower glass plate of PDP.

• 한국진공학회지
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• 제13권4호
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• pp.175-181
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• 2004

미소인장시험을 통해 304 스테인리스 스틸 판재 위에 증착된 DLC 박막의 안정성을 평가하였다. 모재의 소성 변형과 함께 코팅 층의 손상이 발생하기 시작하는데, 작은 규모의 모재 변형 시에는 인장축의 수직방향으로 박막의 균열이 발생하지만, 모재의 슬립변형이 발생하기 시작하면 인장 축과 $45^{\circ}C$의 각도를 갖는 슬립 면을 따라 필름의 박리가 발생하였다. DLC박막의 박리면적으로부터 필름의 접착력을 평가할 수 있었으며, 필름의 합성 전에 실시하는 Ar 플라즈마 스퍼터링 세척시간이 길수록 그리고 세척시 기판에 인가되는 전압이 높을수록 필름의 접착력은 향상되었다. 이러한 변화는 스테인리스 스틸 모재와 Si 접합 층간의 계면특성이 향상되면, 필름의 전체 접착력을 증진시킬 수 있음을 보여주고 있다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.232-232
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• 2011

DAF는 기존 침전 공정에 비해 뛰어난 정수 품질과 빠른 처리 시간으로 차세대 정수 공정으로 각광 받고 있다. DAF는 기포 생성 방법에 따라 용존 공기 부상법, 분산 공기 부상법, 진공 부상법, 전해 부상법, 미생물학적 부상법 등이 있다. 이 중 가장 많이 쓰이는 방식은 용존 공기 부상법으로, 과포화 상태의 기체와 액체의 혼합액을 압력을 급격히 감소시켜 기포를 발생 시키는 방법이다. 이 방법은 기포의 발생은 많지만 장비의 크기가 거대하고 시설제조 비용이 많이 드는 단점이 있다. 수중에서 발생되는 플라즈마는 그 구조와 메카니즘에 따라 생성되는 버블의 양을 제어할 수 있음을 확인하였다. 모세관 형태의 전극을 이용한 수중 방전은 전원 공급 장치만 있다면 적은 공간으로도 효과적으로 기포를 생성 할 수 있기 때문에, 수중 방전을 이용하여 기포 발생 후 DAF에 적용 가능한지 알아보고자 한다. DAF공정에서 필요한 요인으로는 기포의 크기, 개수, 성분 물질 등이 있는데, 그 중 가장 핵심은 기포의 크기 이다. 그래서 간단한 전원 장치와 리액터 제작 후 방전에 최적화 된 전극으로 기포를 발생시켜 기포의 크기를 측정하였다. 기포의 크기는 전극의 직경과 방전공간의 비율에 따라 제어가 가능함을 확인하였고 평균 기포의 크기는 약 50 ${\mu}m$로서, DAF에 적용 할 수 있는 크기이다. 일반적으로 기포의 사이즈가 작을수록 입자 제거율이 높은데, 실제 DAF공정에서 사용되는 기포의 사이즈는 80 ${\mu}m$정도 이다. 따라서 개발된 기포 발생장치를 DAF 공정에 응용한다면 높은 효율을 가질 것으로 판단된다.

• 한국물환경학회지
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• 제30권4호
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• pp.394-402
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• 2014

High-voltage dielectric discharges are an emerging technique in environmental pollutant degradation, which are characterized by the production of hydroxyl radicals as the primary degradation species. The initiation and propagation of the electrical discharges depends on several physical, chemical, and electrical parameters such as 1st and 2nd voltage of power, gas supply, conductivity and pH. These parameters also influence the physical and chemical characteristics of the discharges, including the production of reactive species such as OH, $H_2O_2$ and $O_3$. The experimental results showed that the optimum 1st voltage and oxygen flow rate for RNO (N-Dimethyl-4-nitrosoaniline, indicator of the generation of OH radical) degradation were 160 V (2nd voltage of is 15 kV) and 4 L/min, respectively. As the 2nd voltage (4 kV to 15 kV) was increase, RNO degradation was increased and, generated $H_2O_2$ and $O_3$ concentration were increased. The conductivity of the solution was not influencing the RNO degradation, $H_2O_2$ and $O_3$ generation. The pH effect on RNO degradation was not high. However, the lower pH and the conductivity, the higher $H_2O_2$ and $O_3$ generation were observed.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.164-165
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• 2005

The dry etch characteristics of GaAs over both AlGaAs and InGaP in planar inductively coupled $BCl_3$-based plasmas(ICP) with additions of $SF_6$ or $CF_4$ were studied. The additions of flourine gases provided enhanced etch selectivities of GaAs/AlGaAs and GaAs/InGaP. The etch stop reaction involving formation of involatile $AlF_3$ and $InF_3$ (boiling points of etch products: $AlF_3\sim1300^{\circ}C$, $InF_3$ > $1200^{\circ}C$ at atmosphere) were found to be effective under high density inductively coupled plasma condition. Decrease of etch rates of all materials was probably due to strong increase of flourine atoms in the discharge, which blocked the surface of the material against chlorine neutral adsorption. The process parameters were ICP source power (0 - 500 W), RF chuck power (0 - 30 W) and variable gas composition. The process results were characterized in terms of etch rate, selectivities of GaAs over AlGaAs and InGaP, surface morphology, surface roughness and residues after etching.

• 공업화학
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• 제27권1호
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• pp.92-100
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• 2016

플라즈마와 선택적 촉매환원법이 결합된 복합공정을 이용하여 저온에서의 질소산화물($NO_x$) 저감에 대해 조사하였다. 플라즈마와 촉매가 직접 상호작용을 할 수 있도록 촉매 충진층에서 플라즈마가 생성되도록 하였다. 반응온도, 촉매의 형태, 환원제인 n-헵테인의 농도, 산소함량, 수분함량 및 에너지밀도의 변화가 $NO_x$ 전환효율에 미치는 영향에 대해 살펴보았다. 반응온도 $250^{\circ}C$, 에너지밀도 $42J\;L^{-1}$ 조건에서, 복합공정의 $NO_x$ 전환효율은 선형의 Ag 촉매($Ag\;(nanowire)/{\gamma}-Al_2O_3$)와 구형의 Ag 촉매($Ag\;(sphere)/{\gamma}-Al_2O_3$)를 사용한 경우에 각각 83%와 69%로 나타났으며, 플라즈마를 결합하지 않았을 때는 같은 조건에서 선형의 Ag 촉매를 사용해도 약 30%의 낮은 $NO_x$ 전환효율을 보였다. 플라즈마에 의한 촉매의 성능 향상은 플라즈마의 산화작용에 의해 NO가 반응성이 우수한 $NO_2$로 전환되고, n-헵테인이 부분 산화되어 환원력이 우수한 중간생성물을 발생시켜 선택적 환원반응을 촉진시켰기 때문이다. 에너지밀도의 증가에 따라 $NO_x$ 전환효율이 증가하는 경향을 보였으며, n-헵테인의 농도를 증가시킬수록 $NO_x$ 전환효율이 높아졌으나 $C_1/NO_x$ 비가 5 이상이 되면 더 이상 $NO_x$ 전환효율이 증가되지는 않았다. 수분은 $NO_x$와 경쟁흡착 관계에 있으므로 $NO_x$ 전환효율에 큰 영향을 미치며, 수분함량이 높을 경우 $NO_x$ 전환효율이 감소하는 현상을 보였다. 산소농도가 3~15%로 증가할수록 $NO_2$ 및 부분 산화 탄화수소의 생성 촉진으로 $NO_x$ 전환효율이 향상되었으며, 특히 낮은 에너지 밀도에서 $NO_x$ 전환효율 차이가 큰 것으로 나타났다.