• 제목/요약/키워드: Plasma Attenuation

검색결과 48건 처리시간 0.018초

Attenuation Effects of Plasma on Ka-Band Wave Propagation in Various Gas and Pressure Environments

  • Lee, Joo Hwan;Kim, Joonsuk;Kim, Yuna;Kim, Sangin;Kim, Doo-Soo;Lee, Yongshik;Yook, Jong-Gwan
    • Journal of electromagnetic engineering and science
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    • 제18권1호
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    • pp.63-69
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    • 2018
  • This work demonstrates attenuation effects of plasma on waves propagating in the 26.5-40 GHz range. The effect is investigated via experiments measuring the transmission between two Ka-band horn antennas set 30 cm apart. A dielectric-barrier-discharge (DBD) plasma generator with a size of $200mm{\times}100mm{\times}70mm$ and consisting of 20 layers of electrodes is placed between the two antennas. The DBD generator is placed in a $400mm{\times}300mm{\times}400mm$ acrylic chamber so that the experiments can be performed for plasma generated under various conditions of gas and pressure, for instance, in air, Ar, and He environments at 0.001, 0.05, and 1 atm of pressure. Attenuation is calculated by the difference in the transmission level, with and without plasma, which is generated with a bias voltage of 20 kV in the 0.1-1.4 kHz range. Results show that the attenuation varies from 0.05 dB/m to 9.0 dB/m depending on the environment. Noble gas environments show higher levels of attenuation than air, and He is lossier than Ar. In all gas environments, attenuation increases as pressure increases. Finally, electromagnetic models of plasmas generated in various conditions are provided.

Numerical Calculations and Analyses in Diagonal Type Magnetohydrodynamic Generator

  • Le, Chi Kien
    • Journal of Electrical Engineering and Technology
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    • 제8권6호
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    • pp.1365-1370
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    • 2013
  • This paper examines the effects of magnetic induction attenuation on current distribution in the exit regions of the Faraday-type, non-equilibrium plasma Magnetohydrodynamic (MHD) generator by numerical calculation using cesium-seeded helium. Calculations show that reasonable magnetic induction attenuation creates a very uniform current distribution near the exit region of generator channel. Furthermore, it was determined that the current distribution in the middle part of generator is negligible, and the output electrodes can be used without large ballast resistors. In addition, the inside resistance of the exit region and the current concentration at the exit electrode edges, both decrease with the attenuation of magnetic flux density. The author illustrates that the exit electrodes of the diagonal Faraday-type, non-equilibrium plasma MHD generator should be arranged in the attenuation region of the magnetic induction, in order to improve the electrical parameters of the generator.

Attenuation of Background Molecular Ions and Determination of Isotope Ratios by Inductively Coupled Plasma Mass Spectrometry at Cool Plasma Condition

  • 박창준
    • Bulletin of the Korean Chemical Society
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    • 제18권7호
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    • pp.706-710
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    • 1997
  • Isotope ratios of K, Ca, Cr and Fe are measured at cool plasma condition generated using high carrier flow rate and relatively low RF power of 900 W. Background molecular ions are suppressed to below 100 counts which give isobaric interference to the analytes. The background ions show different attenuation characteristics at increased carrier flow rate and hence for each element different carrier flow rate should be used to measure isotope ratios without isobaric interference. Isotope ratios are measured at both scan and peak-hopping modes and compared with certified or accepted ratios. The measured isotope ratios show some mass discrimination against low mass due to low ion energy induced from a copper shield to eliminate capacitive coupling of plasma with load coil.

Double-Side Notched Long-Period Fiber Gratings fabricated by Using an Inductively Coupled Plasma for Force Sensing

  • Fang, Yu-Lin;Huang, Tzu-Hsuan;Chiang, Chia-Chin;Wu, Chao-Wei
    • Journal of the Korean Physical Society
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    • 제73권9호
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    • pp.1399-1404
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    • 2018
  • This study used an inductively coupled plasma (ICP) dry etching process with a metal amplitude mask to fabricate a double-side notched long-period fiber grating (DNLPFG) for loading sensing. The DNLPFG exhibited increasing resonance attenuation loss for a particular wavelength when subjected to loading. When the DNLPFG was subjected to force loading, the transmission spectra were changed, showing a with wavelength shift and resonance attenuation loss. The experimental results showed that the resonant dip of the DNLPFG increased with increasing loading. The maximum resonant dip of the $40-{\mu}m$ DNLPFG sensor was -26.522 dB under 0.049-N loading, and the largest force sensitivity was -436.664 dB/N. The results demonstrate that the proposed DNLPFG has potential for force sensing applications.

유체 모델을 이용한 유전체 장벽 방전 플라즈마와 전자기파 간의 시간 의존적 상호 작용 분석 (Time Dependent Interaction between Electromagnetic Wave and Dielectric Barrier Discharge Plasma Using Fluid Model)

  • 김유나;오일영;정인균;홍용준;육종관
    • 한국전자파학회논문지
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    • 제25권8호
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    • pp.857-863
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    • 2014
  • 전자기파와 플라즈마의 상호 작용을 결정하는 주요 변수는 플라즈마 주파수와 충돌 주파수이며, 이 둘은 각각 전자 밀도와 전자 온도로부터 계산할 수 있다. 이 두 값은 플라즈마 발생기 종류에 따라 결정되는 시간 의존적인 변수이다. 기존의 전파 흡수 특성 연구에서는 수치 해석적 모형의 부재로 인하여 플라즈마의 시간적/공간적 변화를 간략화하거나, 상수로 가정하여 수행하였다. 본 연구에서는 플라즈마 유체 모델을 도입하여 얻어진 시간 의존적 변수 값을 전자기파감쇠량 계산에 이용함으로써 해석의 정확도를 높이는 방식을 제안하였다. 해석 대상인 유전체 장벽 방전 플라즈마는 구조적인 단순함으로 인하여 1차원 분석만으로 플라즈마 분포의 시간적 변화를 반영할 수 있다. 본 논문은 한 주기 내에서 전자 밀도와 전자 온도를 추출하여 마이크로파 입사 시 시간적 흡수 특성 변화를 분석하였다. 또한, 전자 밀도와 전자 온도의 변화에 따라 감쇠량을 계산하여 감쇠 경향성을 분석하였다.

조셉슨접합 스트립라인의 마이크로파 감쇠에 대한 실험적인 조사 (Experimental Study on Microwave Attenuation in Josephson Junction Stripline)

  • 홍현권;박세일;김규태
    • Progress in Superconductivity
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    • 제4권1호
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    • pp.64-67
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    • 2002
  • The attenuation of millimeter waves (70-100 ㎓) propagating along Josephson Junction stripline had been measured by pattern recognition near gap voltage and proximity current bump. Test series arrays of 2000, 3000, and 4000 Josephson junctions with the area of $12\mu\textrm{m}$$\times$ $38\mu\textrm{m}$ had two sub-arrays with 50 Junctions at both ends. The arrays were fabricated with and without applying a plasma nitridation process to Nb ground plane. The effects of a nitridationprocess measured by the pattern recognition near gap voltage and proximity current bump were about 1.3-1.7 ㏈ and 1.6-1.8 ㏈, respectively. This means that the last sub-arrays with a nitridation process receive 26-34% more power than those without a nitridation process.

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감쇠파 고주파전압의 선행방전을 이용한 Plasma jet의 전기적 기동특성에 대한 실험적 연구 (The Experimental Research On The Electrical Characteristics For The Ignition Of Plasma Jet Using The Advance Discharge Of High Frequency Voltage With Attenuation)

  • 전춘생
    • 전기의세계
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    • 제21권4호
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    • pp.27-38
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    • 1972
  • This paper discusses the characteristics about the ignition of D.C. main discharge is a plasma jet generator, manufactured for trial as non-transferred type, when the electrical energy appropriate to the ignition is supplied to the gap between the electrodes by using advance discharge of attenuating high frequency voltage generated by a high frequency oscillator with mercury spark gap. These characteristics are under the influences of (a) the length of mercury gap in high frequency oscillator and the quantity of hydrogen flow supplied to it, (b) the condenser capacity of the high frequency oscillator circuit, (c) the length of plasma jet torch in D.C. main discharge circuit and the quantity of argon flow supplied to it, (d) the circuit constants of D.C. main discharge circuit. The results for these characteristics, obtained by this research, are considered to be helpful to the designs for the ignition of a plasma jet as well as the welding arc stabilizer by high frequency discharge and the high frequency arc welder.

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정전 탐침법과 유체 시뮬레이션을 이용한 유도결합 Ar 플라즈마의 특성 연구 (Analysis of Inductively Coupled Plasma using Electrostatic Probe and Fluid Simulation)

  • 차주홍;이호준
    • 전기학회논문지
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    • 제65권7호
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    • pp.1211-1217
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    • 2016
  • Discharge characteristics of inductively coupled plasma were investigated by using electrostatic probe and fluid simulation. The Inductively Coupled Plasma source driven by 13.56 Mhz was prepared. The signal attenuation ratios of the electrostatic probe at first and second harmonic frequency was tuned in 13.56Mhz and 27.12Mhz respectively. Electron temperature, electron density, plasma potential, electron energy distribution function and electron energy probability function were investigated by using the electrostatic probe. Experiment results were compared with the fluid simulation results. Ar plasma fluid simulations including Navier-Stokes equations were calculated under the same experiment conditions, and the dependencies of plasma parameters on process parameters were well agreed with simulation results. Because of the reason that the more collision happens in high pressure condition, plasma potential and electron temperature got lower as the pressure was higher and the input power was higher, but Electron density was higher under the same condition. Due to the same reason, the electron energy distribution was widening as the pressure was lower. And the electron density was higher, as close to the gas inlet place. It was found that gas flow field significantly affect to spatial distribution of electron density and temperature.

Effect of Twice Daily Administration of GH-releasing Peptide-2 for 10 Days on Growth Performance, Plasma GH Responses and Insulin-like Growth Factor-1 Concentrations in Swine

  • Nou, V.;Inoue, H.;Lee, H.G.;Matsunaga, N.;Kuwayama, H.;Hidari, H.
    • Asian-Australasian Journal of Animal Sciences
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    • 제16권8호
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    • pp.1193-1198
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    • 2003
  • An increase in frequency of administration of exogenous growth hormone (GH) or GH-releasing hormone was reported to be a model to increase blood circulating insulin-like growth factor-1 (IGF-1) and to improve growth performance in animals. We have investigated the effect of twice daily administration of GH-releasing peptide-2 (GHRP-2) on growth performance, GH responsiveness and plasma insulin-like growth factor IGF-1 in swine. We administered to eight swine, 3 control and 5 treatment, a twice daily s.c. injections of GHRP-2 ($30{\mu}g/kg\;BW$) for a period of 10 days. Every day blood samples immediately taken before injections of GHRP-2 or saline, at 08:00 h and 16:00 h, were measured for IGF-1 concentrations. Blood samples for GH assay were collected every 20 min on days 1, 6 and 10, from 1 hour before and 3 h after GHRP-2 or saline injections at 08:00 h. GH peak concentrations and GH area under curve (GH AUC) on day 1, 6 and 10 in treatment group of swine were higher than those in control swine (p<0.05). Twice daily administration of GHRP-2 caused a significantly attenuation (p<0.05) of GH peak concentrations ($80.25{\pm}13.87$, $39.73{\pm}5.72$ and $27.57{\pm}6.06ng/ml$ for day 1, 6 and 10, respectively) and GH AUCs ($3,536.15{\pm}738.35$, $1,310.31{\pm}203.55$ and $934.37{\pm}208.99ng/ml$ for day 1, 6 and 10, respectively). However, there was no significant difference in GH peak concentration and GH AUC between day 6 and 10. Plasma IGF-1 concentration levels were higher in treatment than control group of swine (p<0.05) after 3 days of the treatment, and the levels reached a plateau from day 3 to 10 of experiment. Growth performance did not alter by GHRP-2 administration, even though a numerical increase of body weight gain and feed efficiency was observed. These results indicate that twice daily administration of GHRP-2 for 10 days in swine did not significantly influence on growth performance, caused an overall attenuation of GH response, and that elevation of plasma GH concentrations caused by GHRP-2 administration increased plasma IGF-1 concentrations, even though an attenuation of GH response was observed.

Characterization of inductively coupled Ar/CH4 plasma using tuned single langmuir probe and fluid simulation

  • 차주홍;한문기;김동현;이해준;이호준
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.143.1-143.1
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    • 2015
  • An inductively coupled plasma source driven by 13.56MHz was prepared for the deposition of a-C:H thin film. Properties of the plasma source are investigated by fluid simulation including Navier-Stokes equations and home-made tuned single Langmuir probe. Signal attenuation ratios of the Langmuir probe at first and second harmonic frequency were 13.56Mhz and 27.12Mhz respectively. Dependencies of plasma parameters on process parameters were agreed with simulation results. Ar/CH4 plasma simulation results shown that hydrocarbon radical densities have their lowest value at the vicinity of gas feeding line due to high flow velocity. For input power density of 0.07W/cm3, CH radical density qualitatively follows electron density distribution. On the other hand, central region of the chamber become deficient in CH3 radical due to high dissociation rate accompanied with high electron density. The result suggest that optimization of discharge power is important for controlling deposition film quality in high density plasma sources.

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