• Journal of the Semiconductor & Display Technology
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• v.7 no.1
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• pp.1-5
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• 2008

In this paper, we fabricated pressure difference type gas flow sensor using only dry etching technology by ICP-RIE(inductive coupled plasma reactive ion etching). The sensor's structure consists of a common shear stress type piezoresistive pressure sensor with an orifice fabricated in the middle of the sensor diaphragm. Generally, structure like diaphragm is fabricated by wet etching technology using TMAH, but we fabricated diaphragm by only dry etching using ICP-RIE. To equalize the thickness of diaphragm we applied insulator($SiO_2$) layer of SOI(Si/$SiO_2$/Si-sub) wafer as delay layer of dry etching. Size of fabricated diaphragm is $1000{\times}1000{\times}7\;{\mu}m^3$ and overall chip $3000{\times}3000{\times}7\;{\mu}m^3$. We measured the variation of output voltage toward the change of gas pressure to analyze characteristics of the fabricated sensor. Sensitivity of fabricated sensor was relatively high as about 1.5mV/V kPa at 1kPa full-scale. Nonlinearity was below 0.5%F.S. Over-pressure range of the fabricated sensor is 100kPa or more.

• Journal of Sensor Science and Technology
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• v.5 no.5
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• pp.31-37
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• 1996

This paper presents characteristics of pressure sensor using shear-type piezoresistor of LPCVD(low pressure chemical vapour deposition) grown polycrystalline silicon films. The sensor has 3.1mV/V of pressure sensitivity in the pressure range of $1kgf/cm^{2}$, ${\pm}0.012%FS/^{\circ}C$ of TCO, and ${\pm}0.08%FS/^{\circ}C$ of TCS in the temperature range of $-20{\sim}+125^{\circ}C$. It showed ${\pm}0.2%FS$ of hysteresis and ${\pm}1.5%FS$ of non-linearity. Shear-type polycrystalline silicon pressure sensor can eliminate temperature dependence of offset caused by resistors mismatch and be used in relatively wide temperature range, compared to the conventional full-bridge silicon pressure sensors.

• Korean Journal of Metals and Materials
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• v.56 no.11
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• pp.835-843
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• 2018

In this work, we report a delta rosette strain sensor based on highly stretchable silver nanowire (AgNW) percolation piezoresistors. The proposed rosette strain sensors were easily prepared by a facile two-step fabrication route. First, three identical AgNW piezoresistive electrodes were patterned in a simple and precise manner on a donor film using a solution-processed drop-coating of the AgNWs in conjunction with a tape-type shadow mask. The patterned AgNW electrodes were then entirely transferred to an elastomeric substrate while embedding them in the polymer matrix. The fabricated stretchable AgNW piezoresistors could be operated at up to 20% strain without electrical or mechanical failure, showing a maximum gauge factor as high as 5.3, low hysteresis, and high linearity ($r^2{\approx}0.996$). Moreover, the sensor responses were also found to be highly stable and reversible even under repeated strain loading/unloading for up to 1000 cycles at a maximum tensile strain of 20%, mainly due to the mechanical stability of the AgNW/elastomer composites. In addition, both the magnitude and direction of the principal strain could be precisely characterized by configuring three identical AgNW piezoresistors in a delta rosette form, representing the potential for employing the devices as a multidimensional strain sensor in various practical applications.