• Title/Summary/Keyword: Piezoresistive Sensor

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A Study on the Development of a Novel Pressure Sensor based on Nano Carbon Piezoresistive Composite by Using 3D Printing (3D 프린팅을 활용한 탄소 나노 튜브 전왜성 복합소재 기반 압력 센서 개발 연구)

  • Kim, Sung Yong;Kang, Inpil
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.41 no.3
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    • pp.187-192
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    • 2017
  • This paper presents an ongoing study to develop a novel pressure sensor by means of a Nano Carbon Piezoresistive Composite (NCPC). The sensor was fabricated using the 3D printing process. We designed a miniaturized cantilever-type sensor electrode to improve the pressure sensing performance and utilized a 3D printer to build a small-sized body. The sensor electrode was made of 2 wt% MWCNT/epoxy piezoresistive nano-composite, and the sensor body was encapsulated with a pipe plug cap for easy installation to any pressure system. The piezoresistivity responses of the sensor were converted into stable voltage outputs by using a signal processing system, which is similar to a conventional foil strain gauge. We evaluated the pressure-sensing performances using a pressure calibrator in the lab environment. The 3D-printed cantilever electrode pressure sensor showed linear voltage outputs of up to 16,500 KPa, which is a 200% improvement in the pressure sensing range when compared with the bulk-type electrode used in our previous work.

Study on Piezoresistive Humidity Sensor using Polycrystalline Silicon with Membrane (박막구조를 가진 폴리실리콘 압저항형 습도센서의 연구)

  • Park, Sung-Il;Park, Se-Kwang
    • Proceedings of the KIEE Conference
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    • 1994.07b
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    • pp.1422-1424
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    • 1994
  • This paper deals with piezoresistive humidity sensor using polycrystalline silicon (Poly-Si ) with membrane in sensors of semiconductor. Poly-Si piezoresistors which have no temperature dependancy are deposited on silicon wafer, membrane is formed with micromachining technology, then polyimide is formed as a hygroscopic layer. Whereas the principle of conventional humidify sensors are based on the change in electrical properties of the material, the humidity induced volume change of a polyimide layer leads to a deformation of a silicon membrane in this case. This deformation is transformed into an output voltage by Poly-Si piezoresistive. Wheatstone bridge. Fabricated piezoresistive humidity sensors showed good linearity, response time, and long term stability.

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Piezoresistive-Structural Coupled-Field Analysis and Optimal Design for a High Impact Microaccelerometer (고충격 미소가속도계의 압저항-구조 연성해석 및 최적설계)

  • Han, Jeong-Sam;Kwon, Soon-Jae;Ko, Jong-Soo;Han, Ki-Ho;Park, Hyo-Hwan;Lee, Jang-Woo
    • Journal of the Korea Institute of Military Science and Technology
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    • v.14 no.1
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    • pp.132-138
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    • 2011
  • A micromachined silicon accelerometer capable of surviving and detecting very high accelerations(up to 200,000 times the gravitational acceleration) is necessary for a high impact accelerometer for earth-penetration weapons applications. We adopted as a reference model a piezoresistive type silicon micromachined high-shock accelerometer with a bonded hinge structure and performed structural analyses such as stress, modal, and transient dynamic responses and sensor sensitivity simulation for the selected device using piezoresistive-structural coupled-field analysis. In addition, structural optimization was introduced to improve the performances of the accelerometer against the initial design of the reference model. The design objective here was to maximize the sensor sensitivity subject to a set of design constraints on the impact endurance of the structure, dynamic characteristics, the fundamental frequency and the transverse sensitivities by changing the dimensions of the width, sensing beams, and hinges which have significant effects on the performances. Through the optimization, we could increase the sensor sensitivity by more than 70% from the initial value of $0.267{\mu}V/G$ satisfying all the imposed design constraints. The suggested simulation and optimization have been proved very successful to design high impact microaccelerometers and therefore can be easily applied to develop and improve other piezoresistive type sensors and actuators.

A Cantilever Type Contact Force Sensor Array for Blood Pressure Measurement (혈압 측정을 위한 외팔보형 접촉힘 센서 어레이)

  • Lee, Byeung-Leul;Jung, Jin-Woo;Chun, Kuk-Jin
    • Journal of Sensor Science and Technology
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    • v.21 no.2
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    • pp.121-126
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    • 2012
  • Piezoresistive type contact force sensor array is fabricated by (111) Silicon bulk micromachining for continuous blood pressure monitoring. Length and width of the unit sensor structure is $200{\mu}m$ and $190{\mu}m$, respectively. The gap between sensing elements is only $10{\mu}m$. To achieve wafer level packaging, the sensor structure is capped by PDMS soft cap using wafer molding and bonding process with $10{\mu}m$ alignment precision. The resistance change over contact force was measured to verify the feasibility of the proposed sensor scheme. The maximum measurement range and resolution is 900 mm Hg and 0.57 mm Hg, respectively.

The Electric Control Method on the Packaging Technology for Non-Conductive Materials Using the Surface Processing Cavity Pressure Sensor (표면 가공형 캐비티 압력센서를 이용하여 비전도성 물질용 패키지 기술에 전기적 제어방식 연구)

  • Lee, Sun-Jong;Woo, Jong-Chang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.33 no.5
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    • pp.350-354
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    • 2020
  • In this study, a pressure sensor for each displacement was fabricated based on the silicon-based pressure sensor obtained through simulation results. Wires were bonded to the pressure sensor, and a piezoresistive pressure sensor was inserted into the printed circuit board (PCB) base by directly connecting a micro-electro-mechanical system (MEMS) sensor and a readout integrated circuit (ROIC) for signal processing. In addition, to prevent exposure, a non-conductive liquid silicone was injected into the sensor and the entire ROIC using a pipette. The packaging proceeded to block from the outside. Performing such packaging, comparing simple contact with strong contact, and confirming that the measured pulse wavelength appears accurately.

Development of the High Temperature Silicon Pressure Sensor (고온용 실리콘 압력센서 개발)

  • Kim, Mi-Mook;Nam, Tae-Chul;Lee, Young-Tae
    • Journal of Sensor Science and Technology
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    • v.13 no.3
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    • pp.175-181
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    • 2004
  • A pressure sensor for high temperature was fabricated by using a SDB(Silicon-Direct-Bonding) wafer with a Si/$SiO_{2}$/ Si structure. High pressure sensitivity was shown from the sensor using a single crystal silicon of the first layer as a piezoresistive layer. It also was made feasible to use under the high temperature as of over $120^{\circ}C$, which is generally known as the critical temperature for the general silicon sensor, by isolating the piezoresistive layer dielectrically and thermally from the silicon substrate with a silicon dioxide layer of the second layer. The pressure sensor fabricated in this research showed very high sensitivity as of $183.6{\mu}V/V{\cdot}kPa$, and its characteristics also showed an excellent linearity with low hysteresis. This sensor was usable up to the high temperature range of $300^{\circ}C$.

Design and Fabrication of 4-beam Silicon-Micro Piezoresistive Accelerometer for TPMS Application (TPMS용 4빔 실리콘 미세 압저항형 가속도센서의 설계 및 제작)

  • Park, Ki-Woong;Kim, Hyeon-Cheol
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.49 no.2
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    • pp.1-8
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    • 2012
  • This paper presents the accelerometer which is a key component of TPMS(Tire Pressure Monitoring System). Generally a piezoresistive accelerometer has characteristics of lower cost, better linearity and better immunity about the environmnet noise than a capacitive one. Three types of piezoresistive accelerometers are degined and simulated using ANSYS program. The best one is a piezoresistive sensor which is supported by four beams located at the center of the edge of the mass after comparing the characteristics of resonant frequency of the three types. Considering the sensor size and a simulated maximum stress and maximum displacement, the length of beams is set as $200{\mu}m$. The size of a piezoresistive accelerometer is $3.0mm{\times}3.0mm{\times}0.4mm$. The sensor output is characterized by measuring the output characteristic depending on angle. As a result the offset voltage of the accelerometer is 43.2 mV and its sensitivity is $42.5{\mu}V/V/g$. The temperature bias drift is measured. The shock durability of the sensor is 1500g and the measuring range is 0 ~ 60 g.

Fabrication of the piezoresistive pressure sensor using implantation steps

  • Hong, K.K.;Jung, Y.C.;Cho, J.H.;Hong, S.K.;Kim, C.J.
    • Proceedings of the IEEK Conference
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    • 2006.06a
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    • pp.559-560
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    • 2006
  • The paper presents solutions of conventional piezoresistive pressure sensors. Deflection of diaphragm by external stress causes some problems, because the electrode is deposited on the diaphragm formed piezoresistors. To solve these problems, piezoresistors is formed by two implantation steps. To fabricate diaphragm, the backside silicon etching step is done by immersing the wafer into TMAH solution. $30{\mu}m$ thick diaphragm is obtained. Sensitivity of the piezoresistive pressure sensor fabricated is 48.6 mV/V-psi.

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Design and Performance Prediction of μN Level MEMS Thrust Measurement System of Piezoresistance Method (압저항 방식의 μN급 MEMS 추력 측정 시스템 설계 및 성능 예측)

  • Ryu, Youngsuk;Lee, Jongkwang
    • Journal of the Korean Society of Propulsion Engineers
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    • v.22 no.6
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    • pp.111-117
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    • 2018
  • In this study, an MEMS thrust measurement system was designed and a study on the performance prediction of system was performed to evaluate the performance of micro thruster. Thrust measurement system consists of beam, membrane, and piezoresistive sensor. An FEM analysis was carried out to verify the stability of the system, confirm the stress variation at the beam, and position the piezoresistive sensor. The stability of the designed system was verified by comparing the yield strength of the material with the maximum stress. The piezoresistive sensor was designed to be 20% of the length of the beam to obtain a high gauge factor. The size of the membrane and the beam of the reference model were designed to be $15mm{\times}15mm$, and $500{\mu}m{\times}500{\mu}m$, respectively.