• Title/Summary/Keyword: Photosensitive Glass

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Micromachining technology using photosensitive glass (감광성유리를 이용한 마이크로머시닝 기술)

  • Cho, Soo-Je
    • Laser Solutions
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    • v.14 no.1
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    • pp.25-29
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    • 2011
  • Micromachining of photosensitive glass by UV exposure, heat treatment, and etching processes is reported. Like photoresist, the photosensitive glass is also classified into positive and negative types by development characteristics. For the positive type, the exposed area is crystallized and etched away during the etching process in HF solution, whereas the unexposed area is crystallized and etched away for the negative type. The crystallized area of the photosensitive glass has an etch rate approximately 30~100 times faster than that of the amorphous area so that it becomes possible to fabricate microstructures in the glass. Based on the unique properties of glass such as high optical transparency, electrical insulation, and chemical/thermal stability, the glass micromachining technique introduced in this work could be widely applied to various devices in the fields of electronics, bio engineering, nanoelectonics and so on.

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A Photosensitive Glass Chip for DNA Purification of Nucleic Acid Probe Assay

  • Kim, Joon-Ho;Kim, Byung-Gyun;Yoon, Jun-Bo;Euisik Yoon
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.1 no.4
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    • pp.232-238
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    • 2001
  • A new DNA purification chip is proposed and fabricated for the sample preparation of Nucleic Acid (NA) probe assay. The proposed DNA purification chip is fabricated using photosensitive glass substrate and polydimethylsiloxane (PDMS) cover fixture. We have successfully captured and eluted the DNA using the fabricated photosensitive glass chip. The fabricated DNA purification chip showed a binding capacity of $15ng/\textrm{cm}^2$and a minimum extractable input concentration of $100copies/200\muL$. The proposed DNA purification chip can be applied for low-cost, disposable sample preparation of NA probe assays.

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Design and Fabrication of Micro Combustor (III) - Fabrication of Micro Engine by Photosensitive Class - (미세 연소기 개발 (III) - 감광 유리를 이용한 마이크로 엔진의 제작 -)

  • Lee, Dae-Hoon;Park, Dae-Eun;Yoon, Joon-Bo;Yoon, Eui-Sik;Kwon, Se-Jin
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.26 no.12
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    • pp.1639-1645
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    • 2002
  • Micro engine that includes Micro scale combustor is fabricated. Design target was focused on the observation of combustion driven actuation in MEMS scale. Combustor design parameters are somewhat less than the size recommended by feasibility test. The engine structure is fabricated by isotropic etching of the photosensitive glass wafers. Electrode formed by electroplating of the Nickel. Photosensitive glass can be etched isotropically with almost vertical angle. Bonding and assembly of structured photosensitive glass wafer form the engine. Combustor size was determined to be 1 mm scale. Movable piston is engraved inside the wafer. Ignition was done by nickel spark plug which was electroplated with thickness of 40 ${\mu}{\textrm}{m}$. The wafers were bonded by epoxy that resists high temperature. In firing test due to the bonding method and design tolerance pressure buildup by reaction was not confirmed. But ignition, flame propagation and actuation of micro structure from the reaction was observed. From the result basement of design and fabrication technology was obtained.

The Fabrication of Micro-framework Using Photosensitive Glass-ceramics (감광성 결정화유리를 이용한 미세 구조물 제조에 대한 연구)

  • 김형준;이상훈;연석주;최성철
    • Journal of the Korean Ceramic Society
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    • v.37 no.1
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    • pp.82-89
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    • 2000
  • In lithium silicate photosensitive glass-ceramics, the relationship between lithography time and crystallization, and the effect of addition of mineral acid in etching rate and pattern shape were investigated. Irradiation times for micropatterning were less than 5 minutes in which Ce3+ ions in glass were changed rapidly to Ce4+ with ultra violet light. Overexposure to ultra brought about blot of pattern by diffiraction of light. Addition of mineral acid to HF enhanced etching rate as compared with HF solution only. The addition of H2SO4 especially increased the etching rate by 70%. But the mixed solution also increased the etching rate of the noncrystallized portion of the glass and this resulted in heavy etching. Etching with ultrasonic wave showed higher etching rate than that with the static or fluid method.

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Fabrication Technology of Glass Micro-framework by Photolithographic Process (사진식각 공정에 의한 유리 미세구조물 제작 기술)

  • O, Jae-Yeol;Jo, Yeong-Rae;Kim, Hui-Su;Jeong, Hyo-Su
    • Korean Journal of Materials Research
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    • v.8 no.9
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    • pp.871-875
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    • 1998
  • High aspect ratio microstructures were fabricated by photolithography. The material for the microstructure was photosensitive glass which has good mechanical and electrical insulation properties. The photosensitive glass was exposed to ultraviolet light at 312nm through a chromium mask in which the structures are drawn. After heat treatment process over $500^{\circ}C$, the photosensitive glass was etched in a 10% hydrofluoric acid solution with ultrasonic conditions. Final dimension of the micro-framework was greatly dependent on the thickness of photosensitive glass, mask pattern, ultraviolet light exposure and etching conditions. The maximum aspect ratio of the micro-framework obtained from this work was over 30.

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Fabrication and Performance Test of MEMS Catalytic Combustors Using Photosensitive Glass Wafer (감광유리를 이용한 MEMS 촉매 연소기의 제작 및 성능 평가)

  • Jin, Jung-Kun;Kwon, Se-Jin
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.33 no.3
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    • pp.237-242
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    • 2009
  • MEMS catalytic combustors were fabricated to use in micro-power sources as a heat source. The combustor was fabricated by photolithography and anisotropic wet etching of photosensitive glass wafers. Two different catalyst loading methods were used to complete the fabrication of the combustors. For thin film type, the $Al_2O_3$ was washcoated on the surface of the combustion chamber as a catalyst support, and for packed-bed type, ceramic foam was inserted after Pt was coated. The volume of the combustors was 1.8 $cm^3$ and 16W of heat was generated using the fabricated combustors with hydrogen. The energy density of combustor was about 8.9 W/$cm^3$.

Effect of $Sb_2O_3$ on Solarization of Photosensitive Glasses Containing Ag and $CeO_2$

  • Hyeong Jun Kim;Snag Hoon Lee;Seog Joo Yon;Sung Churl Choi
    • The Korean Journal of Ceramics
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    • v.7 no.2
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    • pp.58-62
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    • 2001
  • The relationship between the addition of Sb$_2$O$_3$ and the color difference by solarization in photosensitive glasses was investigated. Glasses containing CeO$_2$ and Sb$_2$O$_3$ simultaneously and glasses with only CeO$_2$ were changed reddish and yellowish respectively after exposing to ultra violet ray. Color difference between compositions was represented by dominant wavelength and purity. Since, in glasses containing CeO$_2$ and Sb$_2$O$_3$ simultaneously, Sb$_2$O$_3$ as reduction agent affected Ce$^3+$ ions to increase in glass and more Ce$^4+$ ions were induced than in glasses with only CeO$_2$ during UV irradiation, more electrons released by photo-ionization, which were color centers, were trapped by Ce$^4+$. In conclusion, the introduction of Sb$_2$O$_3$ to photosensitive glasses with CeO$_2$ resulted in the change of color center concentration in glasses and prevented the solarization of photosensitive glasses with CeO$_2$.

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The fabrication of high aspect ratio microstructures by negative photosensitive glass process (Negative photosensitive glass process에 의한 high aspect ratio 마이크로 구조물의 제조)

  • Cho, Soo-Je;Ryu, Byung-Gil
    • Proceedings of the KIEE Conference
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    • 1999.11d
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    • pp.1140-1141
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    • 1999
  • 유리 및 세라믹 미세구조물은 열적, 화학적, 기계적특성이 우수하며 이 제조방법으로 대표적인 것이 그라스의 노광, 열처리에 의한 노광부를 선택적으로 에칭시켜 구조물을 형성시키는 감광성그라스 공정이다. 그러나 공정조건을 변화시킴에 따라 기존과는 정반대로 비노광부를 선택적으로 에칭시키는 것이 가능하였으며 본 방식에 의해서 더욱 정밀한 미세구조물을 형성할 수 있음을 확인하였다.

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Crystallization in Li$_2$O-A1$_2$O$_3$-SiO$_2$ Glass induced by 355 nm Nd:YAG Laser Irradiation

  • Lee, Yong-Su;Kang, Won-Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.7 no.2
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    • pp.43-46
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    • 2000
  • Nd:YAG laser of 355 nm wavelength, which amounts to 3.5 eV, produced by a harmonic generator was used to create Ag metallic particles as seeds for nucleation in photosensitive glass containing $Ag^+$ and $Ce^{3+}$ . The pulse widths and frequency of the laser were 8ns and 10 Hz, respectively. For crystalline growth, heat-treatment following laser irradiation was carried out at $570^{\circ}C$ for 1h. Then, the $LiAlSi_3O^8$ crystal phase appeared in the laser irradiated lithium aluminum silicate glass. We present the effect of laser-induced nucleation compared with spontaneous nucleation by heat treatment fur crystallization in the glass.

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Crystallization in Li20-A1203-Si02 Glass induced by 355nm Nd:YAG Laser Irradiation

  • Lee, Yong-Su;Kang, Won-Ho;Song, Sun-Dal
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2000.04a
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    • pp.112-117
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    • 2000
  • Nd:YAG laser of 355nm wavelength, which amounts to 3.5eV, produced by a harmonic generator was used to create Ag metallic particles as seeds for nucleation in photosensitive glass containing Ag+ and Ce3+. The pulse widths and frequency of the laser were 8ns and 10Hz, respectively. For crystalline growth, heat-treatment following laser irradiation was carried out at $570^{\circ}C$ fur 1h. Then, the LiAlSi3O8. crystal phase appeared in the laser irradiated lithium aluminum silicate glass. We present the effect of laser-induced nucleation compared with spontaneous nucleation by heat treatment for crystallization in the glass.

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