• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.228-229
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• 2006

본 연구에서는 PCB에 적용하기 위한 폴리머 타입 후막저항의 하나로서, 포토공정으로 저항 패턴의 형성이 가능한 페이스트를 제조하였다. 기존의 폴리머 후막저항은 스크린 인쇄를 패터닝의 주요 방법으로 하고 있어 패턴의 정밀성이 떨어지는 단점이 있었다. 이를 개선하여 고정밀 저항 패턴의 형성이 가능하도록 Photoimageable Resin을 저항 페이스트의 개발에 도입하였다. Acrylated oligomer 및 monomer, 그리고 Novolac Epoxy를 주 기지상 재료로서 사용하였으며, acrylate와 epoxy의 함량비에 따른 저항 페이스트의 현상성 및 시트저항을 평가하였다. 전도성 Filler 재료로 카본블랙을 이용하였는데, 그 물리적 특성차와 함량이 저항 페이스트의 현상성과 저항값에 미치는 영향을 평가하였다. 실험결과 Acrylate와 epoxy의 비가 2.5:1일 때 현상성이 가장 양호하였으며, 이 조성에 XC72R 카본블랙을 2g 첨가하였을 때 시트저항의 평균값은 약 $6\;k{\Omega}\{\square}$였다.

• 마이크로전자및패키징학회지
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• 제18권4호
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• pp.63-70
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• 2011

Anorthite forming glass frits in amounts up to 25 vol% of the silver powder were added to improve the adhesion between the conductor pattern formed by thick film photoimageable process and the low temperature co-fired ceramics (LTCC) substrate. The sheet resistance of the conductor pattern was raised from 0.13 ${\Omega}/{\square}$ to 2.25 ${\Omega}/{\square}$ as the volume percentage of glass frit increased up to 25 vol%. The adhesion strength was improved with this glass frit increase, but it decreased when the glass content exceeded 20 vol% which are possibly attributed to the liquid pool effect and the reduced fracture toughness in the interface between conductor and LTCC layer. The shrinkage of the width of the conductor pattern decreased with the addition of glass contents.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.208-208
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• 2008

Micro patterning of conductor line/space on LTCC green sheet in the LTCC module is an important process for miniaturization in 3D integrated circuits. This work presented the effect of inorganic binders on the microstructure, adhesion, electrical resistivity, shrinkage and line/space resolution, which is a part of study in photoimageable conductor paste. The photoimageable conductor paste contains silver powder, polymer binder, monomer, photo-initiator, UV absorber, and solvent. The inorganic binders were furnished with varied weight percentage of anorthite, diopside and MLS-62 glass frits from 0% to 7%. The Line/space sizes thus obtained was under 25 micron.

• Macromolecular Research
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• 제12권4호
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• pp.391-398
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• 2004

Thick-film photolithography is a new technology that combines lithography processes, such as exposure and development, with the conventional thick-film process applied to screen-printing. In this study, we developed a low-temperature cofireable silver paste applicable for thick-film processing to form fine lines using photolitho-graphic technologies. The optimum paste composition for forming fine lines was investigated. The effect of processing parameters, such as the exposing dose, had on the fine-line resolution was also investigated. As the result, we found that the type of polymer and monomer, the silver powder loading, and the amount of photoinitiator were the main factors affecting the resolution of the fine lines. The developed photoimageable silver paste was printed on a low-temperature cofireable green sheet, dried, exposed, developed in an aqueous process, laminated, and then fired. Our results demonstrate that thick-film fine lines having widths < 20 $\mu\textrm{m}$ can be obtained after cofiring.

• 마이크로전자및패키징학회지
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• 제8권3호
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• pp.69-75
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• 2001

후막광식각 기술은 스크린 인쇄 등의 일반적 후막공정에 노광 및 현상등의 리소그라피 공정 을 접목시킨 새로운 기술이다. 그린시트를 적층한 후 감광성 Ag 페이스트를 도포하고, 패턴을 노광, 현상, 동시소성하여 스크린 인쇄법으로는 어려운 25 $\mu\textrm{m}$ 선폭과 25 $\mu\textrm{m}$ 선간공백을 구현하였다. 알루미나 기판을 사용하였을 경우에도 유사한 방법으로 20 $\mu\textrm{m}$에 가까운 선폭이 구현 가능하였으며, 노광량과 현상시간이 미세라인 형성에 있어서 가장 중요한 공정변수임을 확인하였다. 또한, 광식각 기술을 이용하여 정밀도가 높고 고주파 대역에서 전송특성이 우수한 microstrip 전송선로와 series gap 공진기를 제작하여, 이로부터 기판의 유전률 및 유전손실을 계산하였다.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2002년도 추계기술심포지움논문집
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• pp.87-90
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• 2002

무선 통신 시스템의 광대역화에 따라 수십GHz 이상에서의 시스템 구성이 필요하다. 이러한 시스템의 상용화를 위해서는 수십GHz 이상에서의 고주파 특성 만족과 저비용의 공정이 요구된다. 본 연구에서는 후막 리소그라피 공정을 이용하여 미세라인 특성에 민감한 BPF를 설계.제작하였다.

• 한국세라믹학회지
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• 제45권11호
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• pp.739-743
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• 2008

Microfluidic device can be applied in a wide range of chemical and biological technology. In this paper, ceramic-based T-type passive mixers for microfluidic applications were fabricated by LTCC process combined with thick film photolithography. The base ceramic material in thick film was amorphous cordierite $((Mg,Ca)_2Al_4Si_5O_{18})$ and photoimageable polymers were added to give a photosensitivity. Two types of passive mixer, which showed the channel width of 1.0 mm and $200{\mu}m$, respectively, were designed considering mixing efficiency in the channel and their microfluidic properties were discussed in detail.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2001년도 The IMAPS-Korea Workshop 2001 Emerging Technology on packaging
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• pp.151-156
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• 2001

Using the photoimageable thick film conductors, $25\mu\textrm{m}$ line widths and $25\mu\textrm{m}$ spaces can be obtained. Test patterns are made by green tape lamination, paste printing, exposing to UV light, developing in an aqueous process and cofiring. Postfiring method using alumina substrate can be also applied to fine line formation. Series gap resonator formed by photopatterning process showed the improved signal transmission characteristics compared to that obtained by conventional screen printing.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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• pp.689-692
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• 2003

본 논문에서는 개방된 양 끝이 Loading 캐패시턴스로 연결된 새로운 행태의 1/2 파장 공진기를 이용해서 3단 대역통과 여파기를 설계, 제작하였다. 제안한 공진기의 전파지연효과(Slow-Wave Effect)때문에, 넓은 상향저지대역을 갖으며, 사이즈(Size)가 축소된 협대역 여파기 설계가 가능하다. 설계한 대역통과 여파기는 미세라인 구현이 가능한 후막 리소그라피 공정 기술을 이용하여 제작하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.303-303
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• 2007

Photo-imageable thick-film lithography technology was developed for the fabrication of embedded passives such as inductors and capacitors. In this study, photo-imageable dielectric and conductor pastes have apoted a negative type. Sodalime glass wafer, alumina substrate and zero-shrinkage LTCC green tapes were used as substrates. In result, The lithographic patterns were designed as lines and spaces for conductor material, or via-holes for ceramic, LTCC, materials. The scattering and reflection of UV-beam on the substrate had negative effects on fine patterning. The patterning performance was varied with the exposing and developing process conditions, and also varied with the substrate materials. Fine resolution of less then $50/50{\mu}m$ in line and space was obtained, which is difficult in screen printing method.