• 센서학회지
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• 제31권2호
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• pp.125-130
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• 2022

We describe the importance of zinc oxide nanoparticle (ZnO NP) concentration in the enhancement of electrical properties in a lead sulfide quantum dot (PbS QD)-based shortwave infrared (SWIR) photodetector. ZnO NPs were synthesized using the sol-gel method. The concentration of the ZnO NPs was controlled as 20, 30 and 40 mg/mL in this study. Note that the ZnO NPs layer is commonly used as an electron transport layer in PbS QDs SWIR photodetectors. The photo-to-dark ratio, which is an important parameter of a photodetector, was intensively examined to evaluate the electrical performance. The 20 mg/mL condition of ZnO NPs exhibited the highest photo-to-dark ratio value of 5 at -1 V, compared with 1.8 and 0.4 for 30 mg/mL and 40 mg/mL, respectively. This resulted because the electron mobility decreased when the concentration of ZnO NPs was higher than the optimized value. Based on our results, the concentration of ZnO NPs was observed to play an important role in the electrical performance of the PbS QDs SWIR photodetector.

• Journal of information and communication convergence engineering
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• 제3권4호
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• pp.179-183
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• 2005

A photodiode capable of obtaining a sufficient photo/ dark current ratio at both forward bias state and reverse bias state is proposed. The photodiode includes a glass substrate, an aluminum film formed as a lower electrode over the glass substrate, an alumina film formed as an insulator barrier over the aluminum film, a hydrogenated amorphous silicon film formed as a photo conduction layer over a portion of the alumina film, and a transparent conduction film formed as an upper electrode over the hydro-generated amorphous silicon film. A good quality alumina $(Al_2O_3)$ film is formed by oxidation of aluminum film using electrolyte solution of succinic acid. Alumina is used as a potential barrier between amorphous silicon and aluminum. It controls dark-current restriction. In case of photodiodes made by changing the formation condition of alumina, we can obtain a stable dark current $(\~10^{-12}A)$ in alumina thickness below $1000{\AA}$. At the reverse bias state of the negative voltage in ITO (Indium Tin Oxide), the photo current has substantially constant value of $5{\times}10^{-9}$ A at light scan of 100 1x. On the other hand, the photo/dark current ratios become higher at smaller thicknesses of the alumina film. Therefore, the alumina film is used as a thin insulator barrier, which is distinct from the conventional concept of forming the insulator barrier layer near the transparent conduction film. Also, the structure with the insulator thin barrier layer formed near the lower electrode, opposed to the ITO film, solves the interface problem of the ITO film because it provides an improved photo current/dark current ratio.

• 공업화학
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• 제10권1호
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• pp.98-104
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• 1999

본 연구에서는 ECR플라즈마 화학증착법을 이용하여 반응기내 압력의 변화에 따라 수소화된 무정형 실리콘막을 증착하고 박막내 수소의 함량과 결합구조 및 전기적 특성을 조사하였다. 일반적인 CVD에 의해 제조된 a-Si:H막은 증착속도가 증가할수록 광감도는 감소하지만 ECR플라즈마의 경우 증착속도가 증가할수록 광감도가 향상되었다. 마이크로파 출력과 사일렌/수소 희석비, 반응기내 압력등이 동일한 실험 조건에서 증착시간에 따른 막의 두께는 선형적으로 증가하고 막내에 함유된 수소의 농도는 일정하지만, 반응시간이 짧은 경우 막내에 $SiH_2$결합이 SiH결합보다 많이 형성되어 광전도도를 저하시킬 수 있다. 반응기내 압력이 증가함에 따라 박막내에 SiH결합이 증가하여 광학 에너지 갭을 줄여 광전도도를 향상시킬 수 있었으나 암전도도의 증가로 광감도는 감소하였다. 따라서 양질의 박막을 얻기 위해서는 압력이 낮고 수소기체의 양이 적은 조건에서 성장시켜야 한다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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• pp.65-66
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• 2000

Various fluoride films on a glass substrate were prepared and characterized to provide a seed layer for crystalline Si film growth. The XRD analysis on $CaF_2/glass$ illustrated (220) preferential orientation and showed lattice mismatch less than 5 % with Si. We achieved a fluoride film with breakdown electric field of 1.27 MV/cm, leakage current density about $10^{-6}$ $A/cm^2$, and relative dielectric constant less than 5.6. This paper demonstrates microcrystalline silicon $({\mu}c-Si)$ film growth by using a $CaF_2/glass$ substrate. The ${\mu}c-Si$ films exhibited crystallization in (111) and (220) planes, grain size of $700\;{\AA}$, crystalline volume fraction over 65 %, dark- and photo-conductivity ratio of 124, activation energy of 0.49 eV, and dark conductivity less than $4{\times}10^{-7}$ S/cm.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.207-207
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• 2008

ZnO is one of the widely utilized n-type semiconducting oxide materials in the field of optoelectronic devices. For its application to the fabrication of promising ultraviolet (UV) photodetectors, ZnO with various structures has been extensively studied. However, study on the photodetectors using zero-dimensional (0-D) ZnO nanoparticle is scarce while the 0-D nanoparticle structure has many advantages compared to the other dimensional structures for absorption of light. In this study, the photocurrent characteristics of ZnO nanoparticles were investigated through a simply pasting of the nanoparticles across the pre-patterned electrodes. Then the photoluminescence (PL) characteristic, photocurrent response spectrum, photo- and dark-current and photoresponse spectrum were investigated with a He-Cd laser and an Xe lamp. An dominant PL peak of the ZnO nanoparticles was located at the wavelength of 380 nm under the illumination of 325-nm wavelength light. The ratio of photocurrent to dark current (on/off ratio) is as high as 106 which is considerable value for promising photodetectors. On the other hand, the time constants in photoresponse were relatively slow. The reasons of the high on/off ratio and relatively slow photoresponse characteristic will be discussed.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.416-419
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• 2002

There are being two prominent studying for Digital Radiography. Direct and Indirect method of Digital Radiography are announced for producing high quality digital image. The one is using amorphous selenium as photoconductor and the other is using phosphor layer as a light conversion. But each two systems have strength and weakness such as high voltage and blurring effect. In this study, we investigated the electrical characteristic of $multi-layer\left(CaWO_{4}+a-Se \right)$ as a photoconductor according to the changing arsenic composition ratio. This is a basic research for developing of Hybrid digital radiography which is a new type X-ray detector. The arsenic composition ratio of a-Se compound is classified into 7 different kinds which have 0.1%, 0.3%, 0.5%, 1%, 1.5%, 5%, 10% and were made test sample throught thermo-evaporation. The phosphor layer of $CaWO_4$ was overlapped on a-Se using EFIRON optical adhesives. We measured the dark and photo current about the test sample and compared the electrical characteristic of the net charge and signal-to-noise ratio. Among other things, test sample of compound material of 0.3% arsenic showed good characteristic of $2.45nA/cm^2$ dark current and $357.19pC/cm^2/mR$ net charge at $3V/{\mu}m$.

• 대한원격탐사학회:학술대회논문집
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• 대한원격탐사학회 2006년도 Proceedings of ISRS 2006 PORSEC Volume II
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• pp.804-807
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• 2006

The SRI(Super Resolution Imager) with 800mm aperture primary mirror is the ground development model of the high resolution satellite camera. The SRI focal plane electronics including detector array generates the data for high-resolution images by converting incoming light into digital stream of pixel data. Since the focal plane including a detector is the basic building block of the camera system, the main system performances is directly determined by its performance. This paper measures the SRI focal plane electronics’ performance such as the dark signal, the dark signal noise, the linearity, the PRNU(Photo Response Non-Uniformity), the SNR(Signal to Noise Ratio) and the sensor saturation capability. In addition, this paper verifies the various functionalities of the SRI focal plane electronics. The electrical test equipment with the specialized software and the optical test equipments such as the integrating sphere, the rotation stage and the target are implemented and used to verify these functionalities and performances.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 하계학술대회 논문집 C
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• pp.1649-1651
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• 2000

Optical properties of $Cd_{1-x}Zn_{x}S$ films deposited by :chemical bath deposition(CBD), which is a very attractive method for low-cost and large-area solar cells, are presented, Especially, in order to control more effectively the zinc component of the films, zinc acetate, which used as the zinc source, mixed in reaction solution after preheating and the pH of the reaction solution decreased with increasing the concentration of zinc acetate. The films prepared after preheating and pH control had larger zinc component and higher optical band gap. As the more zinc substituted for Cd in the films, the optical transmittance improved, while the absorption edge shifts to a shorter wavelength and the optical band gap increased. The photo conductivity of the films was larger than the dark conductivity, while the ratio of those increased with increasing the mole ratio of zinc acetate.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 하계학술대회 논문집 D
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• pp.1514-1516
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• 1999

This paper covers our efforts to improve the low carrier mobility and light instability of hydrogenated amorphous silicon (a-Si:H) films with microcrystalline silicon $({\mu}c-Si)$ films. We successfully prepared ${\mu}c-Si$ films on $CaF_2$/glass substrate by decomposition of $SiH_4$ in RPCVD system. The $CaF_2$ films on glass served as a seed layer for ${\mu}c-Si$ film growth. The XRD analysis on $CaF_2$/glass illustrated a (111) preferred $CaF_2$ grains with the lattice mismatch less than 5 % of Si. We achieved ${\mu}c-Si$ films with a crystalline volume fraction of 61 %, (111) and (220) crystal orientations. grain size of $706\AA$, activation energy of 0.49 eV, and Photo/dark conductivity ratio of 124. By using a $CaF_2$/glass structure. we were able to achieve an improved ${\mu}c-Si$ films at a low substrate temperature of $300^{\circ}C$.

• 한국정보통신학회논문지
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• 제8권7호
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• pp.1448-1452
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• 2004

비정질실리콘은 빛을 받으면 자유전자와 자유정공이 무수히 발생하여 전류 또는 전압의 형태로 나타나는 광전변환 재료이다. 이를 광다이오드로 사용하기 위해서는 금속 박막(Thin film)과 결합하여 쇼트키 다이오드로 만드는 기술이 효과적이다. 본 연구에서는 광다이오드의 신뢰성 및 특성을 개선하기 위하여 크롬실리사이드를 기존의 방식과 달리 하부 전극으로 크롬금속 박막을 증착한 후 그 위에 사일렌(SiH4)가스를 사용해서 PECVD (Plasma Enhanced Chemical Vapor Deposition) 진공 증착장비로 최적의 비정질실리콘 박막을 얇게 (100$\AA$) 만들어 열처리를 통하여 크롬실리사이드 박막을 형성 한 후 광다이오드 소자를 제조한다. 이렇게 형성된 크롬실리사이드 광 다이오드를 사용하여 암전류와 광전류를 측정찬 결과 기존의 방식보다 우수한 성능이 나타났고, 공정도 단순화 할 수 있었으며 그리고 신뢰성도 개선되었다.