• 제어로봇시스템학회:학술대회논문집
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• 1997.10a
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• pp.32-35
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• 1997

A recent development in the Flat Panel Display(FPD) industry requires an auto-alignment system which is operated in high speed and high precision. In the FPD production process, aligning photo-mask with respect to guide mark printed in the glass should be accomplished in the accuracy of sub-micron order. So the system has high bandwidth and needs a dedicated control system which is fast and robust enough to control linear motors in precise manner. Proposed auto-alignment system structure in this presentation which consists of the master controller board, the DSP position controller board which controls 3 axis precision linear motors, the servo system and the man machine interface software. Designed and tuned under repeated experiments, the proposed system showed a reasonable performance in the aspect of rise time and steady state error.

• Proceedings of the KIPE Conference
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• 2001.10a
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• pp.36-38
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• 2001

A basic structure of 2500V-4500V reverse-conducting GCT (RC-GCT) is given in this paper. The punch-through type (PT) is adopted for narrow N-base with high resistivity so that the fast turn-off and low on-state voltage can be achieved. The photo mask design was made upon the both turn-off performance and solution of separation between GCT and integrated freewheeling diode (FWD) part. The turn-on and turn-off characteristics for reserve-conducting gate commutated thyristors (RC-GCTs) were investigated by ISE simulation. Additionally, the local carrier lifetime control by proton irradiation was adopted so as not only to obtain the reduction of turn-off losses of GCT but also to reach a soft reverse recovering characteristics of FWD

• 제어로봇시스템학회:학술대회논문집
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• 1993.10b
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• pp.545-549
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• 1993

an alignment system in the X-and Y-directions an X-Y-.theta. stage driven by piezoelectric actuators is presented. A pair of quadruple gratings and a quadruple photo-detector are used. The difference between the two 0-th order moire signals in reflection with a relative spatial phase of 180.deg. is used in each direction to control the alignment of the X-Y-.theta. stage. The stage is aligned at the position where the difference is zero. The quadruple gratings are 10 mm * 10 mm, and of a binary square-type with a 1/2 duty cycle. Their pitches are 16 .mu.m. Alignment accuracy of .+-.20nm was obtained in this system.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.12
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• pp.160-166
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• 2004

Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated fer applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecule and bio molecule. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAMs structure formation.

• Korean Journal of Optics and Photonics
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• v.11 no.4
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• pp.261-264
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• 2000

Continuous ND filters are fabricated on the silver halide photoplates. These filters enable us to get intensity modulated laser beam. Two kinds of continuous ND filters are fabricated. Optical density of one filter is increased radically and that of the other is decreased. In order to get a filter having desirable optical density, a mask which has reversed optical density has to be made. made.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.258-260
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• 2008

Developed halftone exposure technique was successfully applied to the fabrication of narrow transistor channels below $4\;{\mu}m$ with conventional photolithography method. Asymmetric slits concept of photo mask was applied to make channel lengths (L) shorter for thin film transistor's (TFT) high performance. These short channel TFTs verified better quality transistor characteristics.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1108-1111
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• 2005

We propose an improved laser crystallization method based on a directional lateral growth technique. To assess the feasibility of this technique, we have developed an experimental prototype using a 351 nm XeF excimer laser and special optics to produce a long and extremely sharp, narrow beam without need for a photo type mask pattern. Using this system, we have demonstrated very uniform directional laterally grown poly-Si films without any grain boundary protrusions. We believe this method can meet the high performance and uniformity requirements needed for future TFTs in System On Panel (SOP) and OLED applications, as well as providing high process throughput for mass production.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.1
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• pp.200-205
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• 1995

The 1st and 2nd-order grating structure for long wavelength DFB(Distributed FeedBack) laser diodes are successfully fabricated on InP substrates by using electron beam lithography and reactive ion etch techniques, and also characterized non-destructively by diffraction analysis without removal of photo-resis layer. A new composite layer made by lifted-off Cr layer on thin SiO2 film is developed and used as an etch mask, because PMMA, the e-beamresist, is unsuitable for reactive ion etch of InP. In addition, it is experimentally confiremed that diffraction analysis makes it possible to predict the grating parameters, and the analysis can be used as a non-destructive on-line test to prevent incomplete gratings from being successively processed.

• ETRI Journal
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• v.29 no.4
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• pp.452-456
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• 2007

Very compact 4-channel 200-GHz-spacing external cavity lasers (ECLs) were fabricated by hybrid integration of reflection gratings and superluminescent laser diodes on a planar lightwave circuit chip. The fifth-order gratings as reflection gratings were formed using a conventional contact-mask photo-lithography process to achieve low-cost fabrication. The lasing wavelength of the fabricated ECLs matched the ITU grid with an accuracy of ${\pm}0.1$ nm, and optical powers were more than 0.4 mW at the injection current of 80 mA for all channels. The ECLs showed single mode operations with more than 30 dB side lobe suppression.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.612-615
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• 2003

Maskless laser patterning process is developed using 3rd harmonic Diode Pumped Solid State Laser with near visible wavelength of 355 nm. Photo-sensitive curable polymer is irradiated by UV laser and developed using polymer solvent to obtain quasi-3D patterns. We performed basic experiments for the various process conditions such as laser power, writing speed, laser focus, and polymer optical property to gain the optimal conditions. Experimentally, the patterns of trapezoidal shape were manufactured into dimension of 8${\mu}{\textrm}{m}$ width and 5.4${\mu}{\textrm}{m}$ height. This process could be applied to fabricate a single mode waveguide without expensive mask projection method.