• 대한전기학회:학술대회논문집
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• 대한전기학회 1988년도 전기.전자공학 학술대회 논문집
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• pp.315-318
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• 1988

PHOTO-RESIST 자체문제로인해 감소되는 최소해상력, 촛집심도여유 및 CRITICAL DIMENSION (C.D.) 조정여유도등을 연구하였다. 기존에 사용중인 PHOTO-RESIST(큰 분자량)와 PHOTO-RESIST자체내에 CONTRAST 촉진 물질(CEM)이 첨가된것(INNER CEM TYPE) 및 PHOTO-RESIST구성성분중 작은 분자량/좁은 분자량 산포가 형성된 RESIN 의 PHOTO-RESIST(LOW MOLECULAR WEIGHT CONTROL TYPE)등 세가지 PHOTO-RESIST를 사용 하여 상기의 항목을 분석하였다. INNER CEM TYPE 및 LOW MOLECULAR WEIGHT CONTROL TYPE의 PHOTO-RESIST는 기존에 사용중인 RESIST보다, 최소 RESOLUTION은 약 0.2 - 0.3 um, DEPOCUS MARGIN은 약 0.8 - 1.2 um 및 C.D. CONTROL LATITUDE 향상된 것 등이 우수하였다.

• 대한원격탐사학회:학술대회논문집
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• 대한원격탐사학회 2003년도 Proceedings of ACRS 2003 ISRS
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• pp.375-377
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• 2003

In this study, we employ the control patches, which have been created in previous photogrammetric projects, serving for the candidates of the control points that are likely to be found in the newly taken photos by utilizing image matching technique. Among others, the successful implementation of the above idea lies in the underlying factors: (1). Predicting the control patches and projecting them onto new photos; (2). Alignment of control patches with respect to the new photos; (3). Generating the equivalent ground elements of control patches versus the new photos for the purpose of correlation; (4). Developing effective matching methods and matching strategy; (5). Refining the exterior orientation parameters. What may show significance in this work comparing to traditional aerial-triangulation chain is that whenever at least three matched control patches succeed in a single photo, it follows that single photo orientation is applicable. The experiments suggest the potential efficiency of automatic control point measurement from control patch database and photo orientation by the proposed workflow.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2011년도 제42회 하계학술대회
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• pp.2110-2111
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• 2011

Optimal Driving of Photo-Sensor for Control of a Mixed Environment was realized. The control system was carried out to investigate into the characteristics of Real time control of temperature and humidity at sprouts cutivators. Especially, for led's control for the cultivation of sprouts we have composed a Combined Automatic Control System possible for the control of temperature and humidity at the same time. The applied Photo-Sensor measurement are blue, green, red, white, yellow leds. And we had also designed the Web Programming for the automatic control about sprouts plants.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.230-230
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• 2013

In amorphous or microcrystalline thin-film silicon solar cells, p-i-n structure is used instead of p/n junction structure as in wafer-based Si solar cells. Hence, these p-i-n structured solar cells inevitably consist of many interfaces and the cell efficiency critically depends on the effective control of these interfaces. In this study, in-situ plasma treatment process of the interfaces was developed to improve the efficiency of a-Si:H solar cell. The p-i-n cell was deposited using a single-chamber VHF-PECVD system, which was driven by a pulsed-RF generator at 80 MHz. In order to solve the cross-contamination problem of p-i layer, high RF power was applied without supplying SiH4 gas after p-layer deposition, which effectively cleaned B contamination inside chamber wall from p-layer deposition. In addition to the p-i interface control, various interface control techniques such as thin layer of TiO2 deposition to prevent H2 plasma reduction of FTO layer, multiple applications of thin i-layer deposition and H2 plasma treatment, H2 plasma treatment of i-layer prior to n-layer deposition, etc. were developed. In order to reduce the reflection at the air-glass interface, anti-reflective SiO2 coating was also adopted. The initial solar cell efficiency over 11% could be achieved for test cell area of 0.2 $cm^2$.

• 동굴
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• 제77호
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• pp.21-30
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• 2007

Photo-lithography lies in the middle of the wafer fabrication process. It is often considered as the most critical step in the IC process. We use a mask in exposure steps of the photo-lithography. Typically, 20 to 25 different levels of masks are required to complete an IC device. That means, if a photo process can be developed with the use of only one photo mask, we can reduce more process cost. To satisfy this, we plan to develop an alternative photo mask. For this reason, we chose to use a LCD. We expect to develop a LCD panel that can be changed by electrical control. This is the main idea about the adjustive photo mask. The Photo mask made of LCD panel will replace the former one.

• 한국전기전자재료학회논문지
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• 제13권11호
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• pp.950-953
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• 2000

Aligning capabilities of nematic liquid crystal(NLC) using an in-situ photo-alignment method with obliquely polarized UV exposure on a polyimide (PI) surface for homeotropic alignment were studied. The high angle for NLC can be measured by obliquely UV exposure of 30°on the PI surface for 10∼20 min. The pretilt angle of NLC generated using the in-situ photo-alignment was higher than that of a conventional photo-alignment method. Finally, we suggest that the control of pretilt angle in NLC with obliquely polarized UV exposure during imidization of the polymer for homeotropic alignment is promising method to generate high pretilt angle.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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• pp.1583-1585
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• 2007

The purpose of this research is to control proper processing condition of RGB photo resistant in the ink-jet process increasing processing ability by adding additives. The viscosities of modified RGB photo resistant were $10{\sim}14cps$ and the additives could decreased agglomeration and flowing trace of photo resistant effectively. Another way, the adhesion between photo resistant and glass substrate was improved by modifying photo resistant and substrate. The surface tensions of modified photo resistant were same as that of original RGB photo resistant. The additives appeared a better compatibility with photo resistant, and the micelle of photo resistant did not be broken during modified process.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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• pp.197-198
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• 2000

A surface-assisted photo-control of the liquid crystal (LC) alignment has been achieved by modifying the topmost surface of the polyimide film with photo-reactive molecules. Recently, photo-alignment technique using a thin film of poly(vinyl cinnamates) have been reported. However their commercial potentiality is limited by their low thermal stability. To enhance thermal stability, we synthesized the chalcone derivatives as the photo-reactive molecules and introduced the materials on the surface-modified polyimide film.. We identified that the photo-chemical reaction of the chalcone derivatives occur in few minutes with irradiation of UV light. The photo-alignment characteristics of the modified polyimide films treated by polarized UV light and their LC cells are investigated as a function of exposure dose.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.533-536
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• 1999

In this study, we investigated pretilt angle generation and liquid crystal alignment by UV light irradiation during imidization of polyimide. Generated pretilt angle of NLC by using in-situ UV photo-alignment method was smaller than that of the conventional UV photo-alignment method. Also, generated pretilt angle of NLC tends to increase by annealing. We found that in-situ UV photo-alignment method has higher thermal stability of LC alignment, but it has a disadvantage to control pretilt angle.

• Spatial Information Research
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• 제19권1호
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• pp.51-59
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• 2011

라인빙식의 항공디지털 카메라인 ADS 80의 후방(backward)영상으로 정사영성을 제작하고 건물의 기복 변위와 폐색영역을 보정 후, True Ortho Photo을 제작하였다. 또한 제작된 정사영상과 True Ortho-Photo을 검증을 위해 지상검사점, 사진기준점을 이용하여 평면 위치정확도 평가 및 분석한 결과, 프레임방식과 비교하여 상대적으로 소량의 지상기준점을 이용하여 고품질의 정사영상을 제작할 수 있었다. 또한 라인 방식 카메라의 True Ortho Photo 제작 시, 종중복도가 100%이므로 폐색영역 보정시에 효과적임을 검증 할 수 있었다.