• Proceedings of the KIEE Conference
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• 1988.07a
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• pp.315-318
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• 1988

THE STUDY ABOUT CHARACTERISTICS OF PHOTO RESIST ITSELF (MINIMUM RESOLUTION, DEPTH OF FOCUS MARGIN AND CRITICAL DIMENSION CONTROL LATITUDE) WAS DONE AND REPORTED. THREE TYPES OF PHOTO RESISTS WERE TESTED. THE FIRST IS THE LOW MOLECULAR WEIGHT PHOTO-RESIST SHOWING THE NARROW DISTRIBUTION OF MOLECULAR WEIGHT (LOW MOLECULAR WEIGHT CONTROL TYPE), THE SECOND IS A PHOTO-RESIST CONTAINING THE INNER CONTRAST ENCHANCEMENT MATERIAL (INNER CEM TYPE) AND THE THIRD IS A NORMAL PHOTO-RESIST (HIGH MOLECULAR WEIGHT TYPE). THE INNER CEM TYPE AND THE LOW MOLECULAR WEIGHT CONTROL TYPE PHOTO-RESIST ARE MORE IMPROVED PHOTO-RESISTS. IT PROVED THAT THE MINIMUM RESOLUTION WAS IMPROVED BY 0.2 - 0.3 um, THE DEPTH OF FOCUS MARGIN WAS IMPROVED BY 0.8 - 1.2 um AND THE C.D. CONTROL LATITUIDE WAS IMPROVED.

• Proceedings of the KSRS Conference
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• 2003.11a
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• pp.375-377
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• 2003

In this study, we employ the control patches, which have been created in previous photogrammetric projects, serving for the candidates of the control points that are likely to be found in the newly taken photos by utilizing image matching technique. Among others, the successful implementation of the above idea lies in the underlying factors: (1). Predicting the control patches and projecting them onto new photos; (2). Alignment of control patches with respect to the new photos; (3). Generating the equivalent ground elements of control patches versus the new photos for the purpose of correlation; (4). Developing effective matching methods and matching strategy; (5). Refining the exterior orientation parameters. What may show significance in this work comparing to traditional aerial-triangulation chain is that whenever at least three matched control patches succeed in a single photo, it follows that single photo orientation is applicable. The experiments suggest the potential efficiency of automatic control point measurement from control patch database and photo orientation by the proposed workflow.

• Proceedings of the KIEE Conference
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• 2011.07a
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• pp.2110-2111
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• 2011

Optimal Driving of Photo-Sensor for Control of a Mixed Environment was realized. The control system was carried out to investigate into the characteristics of Real time control of temperature and humidity at sprouts cutivators. Especially, for led's control for the cultivation of sprouts we have composed a Combined Automatic Control System possible for the control of temperature and humidity at the same time. The applied Photo-Sensor measurement are blue, green, red, white, yellow leds. And we had also designed the Web Programming for the automatic control about sprouts plants.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.230-230
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• 2013

In amorphous or microcrystalline thin-film silicon solar cells, p-i-n structure is used instead of p/n junction structure as in wafer-based Si solar cells. Hence, these p-i-n structured solar cells inevitably consist of many interfaces and the cell efficiency critically depends on the effective control of these interfaces. In this study, in-situ plasma treatment process of the interfaces was developed to improve the efficiency of a-Si:H solar cell. The p-i-n cell was deposited using a single-chamber VHF-PECVD system, which was driven by a pulsed-RF generator at 80 MHz. In order to solve the cross-contamination problem of p-i layer, high RF power was applied without supplying SiH4 gas after p-layer deposition, which effectively cleaned B contamination inside chamber wall from p-layer deposition. In addition to the p-i interface control, various interface control techniques such as thin layer of TiO2 deposition to prevent H2 plasma reduction of FTO layer, multiple applications of thin i-layer deposition and H2 plasma treatment, H2 plasma treatment of i-layer prior to n-layer deposition, etc. were developed. In order to reduce the reflection at the air-glass interface, anti-reflective SiO2 coating was also adopted. The initial solar cell efficiency over 11% could be achieved for test cell area of 0.2 $cm^2$.

• Journal of the Speleological Society of Korea
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• no.77
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• pp.21-30
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• 2007

Photo-lithography lies in the middle of the wafer fabrication process. It is often considered as the most critical step in the IC process. We use a mask in exposure steps of the photo-lithography. Typically, 20 to 25 different levels of masks are required to complete an IC device. That means, if a photo process can be developed with the use of only one photo mask, we can reduce more process cost. To satisfy this, we plan to develop an alternative photo mask. For this reason, we chose to use a LCD. We expect to develop a LCD panel that can be changed by electrical control. This is the main idea about the adjustive photo mask. The Photo mask made of LCD panel will replace the former one.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.11
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• pp.950-953
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• 2000

Aligning capabilities of nematic liquid crystal(NLC) using an in-situ photo-alignment method with obliquely polarized UV exposure on a polyimide (PI) surface for homeotropic alignment were studied. The high angle for NLC can be measured by obliquely UV exposure of 30°on the PI surface for 10∼20 min. The pretilt angle of NLC generated using the in-situ photo-alignment was higher than that of a conventional photo-alignment method. Finally, we suggest that the control of pretilt angle in NLC with obliquely polarized UV exposure during imidization of the polymer for homeotropic alignment is promising method to generate high pretilt angle.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1583-1585
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• 2007

The purpose of this research is to control proper processing condition of RGB photo resistant in the ink-jet process increasing processing ability by adding additives. The viscosities of modified RGB photo resistant were $10{\sim}14cps$ and the additives could decreased agglomeration and flowing trace of photo resistant effectively. Another way, the adhesion between photo resistant and glass substrate was improved by modifying photo resistant and substrate. The surface tensions of modified photo resistant were same as that of original RGB photo resistant. The additives appeared a better compatibility with photo resistant, and the micelle of photo resistant did not be broken during modified process.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.197-198
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• 2000

A surface-assisted photo-control of the liquid crystal (LC) alignment has been achieved by modifying the topmost surface of the polyimide film with photo-reactive molecules. Recently, photo-alignment technique using a thin film of poly(vinyl cinnamates) have been reported. However their commercial potentiality is limited by their low thermal stability. To enhance thermal stability, we synthesized the chalcone derivatives as the photo-reactive molecules and introduced the materials on the surface-modified polyimide film.. We identified that the photo-chemical reaction of the chalcone derivatives occur in few minutes with irradiation of UV light. The photo-alignment characteristics of the modified polyimide films treated by polarized UV light and their LC cells are investigated as a function of exposure dose.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.533-536
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• 1999

In this study, we investigated pretilt angle generation and liquid crystal alignment by UV light irradiation during imidization of polyimide. Generated pretilt angle of NLC by using in-situ UV photo-alignment method was smaller than that of the conventional UV photo-alignment method. Also, generated pretilt angle of NLC tends to increase by annealing. We found that in-situ UV photo-alignment method has higher thermal stability of LC alignment, but it has a disadvantage to control pretilt angle.

• Spatial Information Research
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• v.19 no.1
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• pp.51-59
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• 2011

We produced true ortho images after interpolating occlusion areas and relief displacement of building as well as producing ortho-images to use backward image of ADS which is a aerial digital camera of line type. Also, I was able to produce high quality ortho-images using a small mount of Ground Control Points(GCP) relatively to compare to frame type camera from the evaluation of horizontal position accuracy using ground check points, photo control points for the verification of ortho-images and true-ortho images. Also, I was able to verify the effectiveness in interpolating occlusion areas cause the length overlap was 100% when producing true-ortho images of line type camera.