• 제목/요약/키워드: Pd film

검색결과 209건 처리시간 0.028초

Pd 촉매의 부분 산화 조절을 이용한 SnO$_2$박막 센서의 CH$_4$감도 변화 연구 (The effect of initial Pd catalyst oxidation stale on CH$_4$sensitivity of SnO$_2$thin film sensor)

  • 최원국;조정;조준식;송재훈;정형진;고석근
    • 마이크로전자및패키징학회지
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    • 제6권2호
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    • pp.45-49
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    • 1999
  • 이온빔 보조 증착법을 이용하여 제작한 $SnO_2$박막을 기저 물질로한 가연성 센서에 catalyst로 ultra-thin Pd layer를 이온빔 스퍼터링으로 흡착시켰다. 가연성 기체의 센싱 메카니즘에서 Pd 촉매의 역할을 정확하게 조사하기 위해서 진공 및 공기 상에서 annealing 함으로서 Pd 촉매의 초기 산화 상태를 조절하였다. 촉매가 순수한 금속 Pd 클러스터 상태로 존재하는 $SnO_2$센서의 경우에는 PdO 클러스터가 있는 것에 비해 높은 감응성을 보였다. 이것은 PdO 클러스터가 표면 acceptor로 작용을 하는 것으로 생각되며 $SnO_2$로 부터 Pd sub-channel을 통해 전자를 받아 센서의 감도를 낮추고 응답시간을 늦추는 것으로 생각된다.

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Al/Pd 박막의 수소 흡수 동역학[$\alpha$상] (Hydrogen Absorption Kinetics on Al/Pd Film in the $\alpha$ Phase)

  • 조영신
    • 한국수소및신에너지학회논문집
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    • 제18권3호
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    • pp.334-341
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    • 2007
  • Al film(135.5 nm thick) with Pd film(39.6 nm thick) was made by thermal evaporation method. Electrical resistance change by hydrogen absorption and desorption was measured with four point measurement method. Even though Al film(135.5 nm thick) did not absorb any hydrogen at room temperature, Al/Pd film absorbed hydrogen at upto 640 torr pressure. Hydrogen absorption kinetics was monitored by measuring resistance change of the sample in the temperature range from $25^{\circ}C$ to $40^{\circ}C$. Absorption activation energy of Al/Pd film was about 10.7 and 17.7 kcal/mol H for 1st stage and last stage respectively at 1 torr hydrogen pressure. This activation values are bigger than that of Pd film, but are much less than that of Al film. This result indicates there is possibility that Al can be storage material for hydrogen by using Pd film evaporation on it.

플라즈마 에칭 및 $PdCl_2/SnCl_2$ 촉매조건이 무전해 동도금 피막의 성능에 미치는 영향 (Effect of Plasma Etching and $PdCl_2/SnCl_2$ Catalyzation on the Performance of Electroless Plated Copper Layer)

  • 오경화;김동준;김성훈
    • 한국의류학회지
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    • 제27권7호
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    • pp.843-850
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    • 2003
  • Cu/PET film composites were prepared by electroless copper plating method. In order to improve adhesion between electroless plated Cu layer and polyester (PET) film, the effect of pretreatment conditions such as etching method, mixed catalyst composition were investigated. Chemical etching and plasma treatment increased surface roughness in decreasing order of Ar>HCl>O$_2$>NH$_3$. However, adhesion of Cu layer on PET film increased in the following order: $O_2$<Ar<HCl<NH$_3$. It indicated that appropriate surface roughness and introduction of affinitive functional group with Pd were key factors of improving adhesion of Cu layer. PET film was more finely etched by HCI tolution, resulting in an improvement in adhesion between Cu layer and PET film. Plasma treatment with NH$_3$produced nitrogen atoms on PET film, which enhances chemisorption of Pd$^{2+}$ on PET film, resulting in improved adhesion and shielding effectiveness of Cu layer deposited on the Pd catalyzed surface. Surface morphology of Cu plated PET film revealed that Pd/Sn colloidal particles became more evenly distributed in the smaller size by increasing the molar ratio of PdCl$_2$; SnCl$_2$from 1 : 4 to 1 : 16. With increasing the molar ratio of mixed catalyst, adhesion and shielding effectiveness of Cu plated PET film were increased.d.

스퍼터링법으로 제조된 Pd-doped $SnO_2$ 박막의 수소가스 감도 특성 (The Hydrogen Gas Sensing Characteristics of the Pd-doped $SnO_2$ Thin Films Prepared by Sputtering)

  • 차경현;김영우;박희찬;김광호
    • 한국세라믹학회지
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    • 제30권9호
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    • pp.701-708
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    • 1993
  • Pd-doped SnO2 thin films for hydrogen gas sensing were fabricated by reactive fo magnetron sputtering and were studied on effects of film thickness and Pd doping content. Pd doping caused the optimum sensor operation temperature to reduce down to ~25$0^{\circ}C$ and also enhanced gas sensitivity, compared with undoped SnO2 film. Gas sensitivity depended on the film thickness. The sensitivity increased with decreasing the film thickness, showing maximum sensitivities at the thickness of 730$\AA$ and 300~400$\AA$ for the undoped SnO2 and the Pd-doped SnO2 film, respectively. Further decrease of the film thickness beyond these thickness ranges, however, resulted in the reduction of sensitivity again.

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Al/Pd 박막의 수소 흡수 특성 (Hydrogen Absorption Characteristics of Al/Pd Film)

  • 조영신
    • 한국수소및신에너지학회논문집
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    • 제17권2호
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    • pp.234-240
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    • 2006
  • Al film(135.5 nm thick) with Pd film(39.6 nm thick) on the top of it was made by thermal evaporation method. Hydrogen absorption of Al/Pd film was measured by quartz crystal microbalance(QCM) method at room temperature. The sample was activated by hydrogen absorption and desorption cycling at room temperature. Hydrogen was introduced into the film by increasing hydrogen gas pressure step by step up to 640 torr at room temperature. Hydrogen concentration reached up to 25% at $5{\sim}10$ torr. But at high pressure the concentration decreased. This strange tendency was not understood yet. Further study is needed to find out the mechanism of hydrogen absorption in Al in Al/Pd film.

Pd(111) 박막의 자성: 제일원리계산 (Magnetism of Pd(111) Thin Films: A First-principles Calculation)

  • 홍순철
    • 한국자기학회지
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    • 제26권1호
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    • pp.1-6
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    • 2016
  • Pd은 단일 원소 금속 중에서 자기 감수율이 가장 크고 외부 환경에 따라 강자성 특성을 보이기도 한다. 본 논문은 자성 연구에 가장 적합한 FLAPW 방법을 사용하여 5-ML과 9-ML Pd(111) 박막의 자성을 계산하였다. 전자간 교환-상관 상호작용을 고려하기 위해 LDA와 GGA를 도입하여 두 계산 결과를 비교하였다. LDA 계산은 덩치 Pd이 상자성 상태가 바닥 상태임을 예측하여 실험과 일치하는 반면, GGA 계산은 덩치 Pd이 강자성을 갖는 것으로 잘못 예측하여 Pd 자성에 대해서는 LDA 계산이 더 신뢰할 수 있음을 알았다. 5-ML Pd(111) 박막에 대한 LDA 계산 결과에 의하면 상자성 상태가 바닥인 덩치 Pd과는 다르게 강자성 상태가 더 안정적이었다. 박막의 중앙에 위치한 Pd이 가장 큰 자기모멘트($0.273{\mu}_B$)를 가지며 중앙 Pd 층의 |m| = 1 상태가 덩치의 그것과 큰 차이가 있어 5-ML Pd(111) 박막의 강자성을 유발하는 데 주요 역할을 함을 알 수 있었다. 9-ML Pd(111) 박막은 상자성 상태가 강자성 상태에 비해 안정하였으나 두 상태 사이의 총에너지 차이가 거의 없고 유한한 자기모멘트를 안정적으로 가지는 것으로 계산되어 강자성 상태가 준 안정적임을 보였다.

듀얼 마그네트론 스퍼터링 법으로 제조된 Pd-Doped Carbon 박막의 물리적 특성에서 Pd 타겟 전력의 영향에 대한 연구 (Study of Pd Target Power Effects on Physical Characteristics of Pd-Doped Carbon Thin Films Using Dual Magnetron Sputtering Method)

  • 최영철;박용섭
    • 한국전기전자재료학회논문지
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    • 제35권5호
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    • pp.488-493
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    • 2022
  • Generally, diamond-like carbon films (a-C:H, DLC) have been shown to have a low coefficient of friction, a high hardness and a low wear rate. Pd-doped C thin film was fabricated using a dual magnetron sputtering with two targets of graphite and palladium. Graphite target RF power was fixed and palladium target RF power was varied. The structural, physical, and surface properties of the deposited thin film were investigated, and the correlation among these properties was examined. The doping ratio of Pd increased as the RF power increased, and the surface roughness of the thin film decreased somewhat as the RF power increased. In addition, the hardness value of the thin film increased, and the adhesive strength was improved. It was confirmed that the value of the contact angle indicating the surface energy increases as the RF power increases. It was concluded that the increase in RF power contributed to the improvement of the physical properties of Pd-doped C thin film.

높은 비저항을 갖는 RF 소자용 CoPdAlO 박막의 자기적 특성 (Magnetic Properties of High Electrical Resistive CoPdAlO Film for RF Device)

  • 김택수;이영우;김종오
    • 한국자기학회지
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    • 제11권3호
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    • pp.109-113
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    • 2001
  • Presently, an inductor adapted at MMIC (Monolithic Microwave Integrated Circuit) which is used for cellular phone or PHS operates at quasi-microwave range over 800 MHz. However, a W-CDMA (Wideband Code Division Multiple Access) will use about 2 GHz range. Therefore magnetic film device should be compatible up to 2 GHz. We have deposited Co-Pd-Al-O system film using rf sputtering method which is expected up to 2 GHz, and investigated the effect of Pd content and magnetic field annealing. When Pd composition is 19%, Hk was 118 Oe, and ${\mu}$′showed flat frequency characteristics up to 1.5 GHz. The Q factor (=${\mu}$′/${\mu}$") was 23.3 at 1 GHz, 6.7 at 1.5 GHz and 1.5 at 2 GHz, respectively. Resonance frequency was 2 GHz. Therefore Co-Pd-Al-O thin film could be used at over 1 GHz, and also expected as an inductor material for wide band CDMA type cellular phone.

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수소흡수시 Pd 박막 시료의 두께 변화에 따른 전기저항의 변화 (Change of Electrical Resistivity of PdH film as a Function of Film Thickness)

  • 조영신
    • 한국수소및신에너지학회논문집
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    • 제10권3호
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    • pp.171-175
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    • 1999
  • 진공 증착 방법으로 제작한 Pd박막(두께 $180{\sim}670{\AA}$)에 상온에서 수소기체를 흡수-방출시킬 때의 전기저항값의 변화를 측정하였다. 저항값 변화의 최대값은 시료의 두께에 따라서 달라졌다. $({\Delta}R_{\infty}/R_0)_{{\beta}min}$ 값은 $\670{\AA}$ 시료는 0.61이었으며, $\180{\AA}$ 시료는 0.34 이었다. 같은 두께의 시료일 경우 시료의 제작 조건에 따라 저항값의 변화는 다른 경향을 보였다.

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수소 흡수-방출에 의한 Pd 박막의 광투과도 특성변화 (Optical Transmittance Change of Pd Thin Film by Hydrogen Absorption and Desorption)

  • 조영신
    • 한국수소및신에너지학회논문집
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    • 제12권4호
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    • pp.287-292
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    • 2001
  • The optical transmittance change of Pd thin film due to hydrogen absorption and desorption was examined at room temperature. Hydrogen absorption and desorption cycling effects on optical transmittance were measured 6 times in the pressure range between 0 and 640 torr. Optical transmittance of Pd film was increasing with increasing hydrogen pressure. Ratio of optical transmittance to the change of pressure at $\beta$ phase is bigger than that of low hydrogen pressure range.

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