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Hydrogen Absorption Kinetics on Al/Pd Film in the $\alpha$ Phase  

Cho, Young-Sin (Dept. of Science Education, Kangwon National University)
Publication Information
Transactions of the Korean hydrogen and new energy society / v.18, no.3, 2007 , pp. 334-341 More about this Journal
Abstract
Al film(135.5 nm thick) with Pd film(39.6 nm thick) was made by thermal evaporation method. Electrical resistance change by hydrogen absorption and desorption was measured with four point measurement method. Even though Al film(135.5 nm thick) did not absorb any hydrogen at room temperature, Al/Pd film absorbed hydrogen at upto 640 torr pressure. Hydrogen absorption kinetics was monitored by measuring resistance change of the sample in the temperature range from $25^{\circ}C$ to $40^{\circ}C$. Absorption activation energy of Al/Pd film was about 10.7 and 17.7 kcal/mol H for 1st stage and last stage respectively at 1 torr hydrogen pressure. This activation values are bigger than that of Pd film, but are much less than that of Al film. This result indicates there is possibility that Al can be storage material for hydrogen by using Pd film evaporation on it.
Keywords
electrical resistance; film; hydrogen absorption; desorption; kinetics; activation energy;
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