Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Study of Pd Target Power Effects on Physical Characteristics of Pd-Doped Carbon Thin Films Using Dual Magnetron Sputtering Method

듀얼 마그네트론 스퍼터링 법으로 제조된 Pd-Doped Carbon 박막의 물리적 특성에서 Pd 타겟 전력의 영향에 대한 연구

  • Choi, Young-Chul (Department of Electrical Engineering, Chosun University) ;
  • Park, Yong Seob (Department of Electronics, Chosun College of Science and Technology)
  • Received : 2022.06.13
  • Accepted : 2022.07.12
  • Published : 2022.09.01
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Abstract

Generally, diamond-like carbon films (a-C:H, DLC) have been shown to have a low coefficient of friction, a high hardness and a low wear rate. Pd-doped C thin film was fabricated using a dual magnetron sputtering with two targets of graphite and palladium. Graphite target RF power was fixed and palladium target RF power was varied. The structural, physical, and surface properties of the deposited thin film were investigated, and the correlation among these properties was examined. The doping ratio of Pd increased as the RF power increased, and the surface roughness of the thin film decreased somewhat as the RF power increased. In addition, the hardness value of the thin film increased, and the adhesive strength was improved. It was confirmed that the value of the contact angle indicating the surface energy increases as the RF power increases. It was concluded that the increase in RF power contributed to the improvement of the physical properties of Pd-doped C thin film.

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