• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.370-371
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• 2006

본 연구에서는 PZT박막의 강 유전 캐패시터 제작을 위한 연구로, 4-inch크기의 $SiO_2$/Pt/Ti/Si가 증착된 웨이퍼를 습식 식각하여 $SiO_2$ 패턴(0.8um)을 형성하였고, PZT박막의 캐패시터 제작을 위해 패턴 웨이퍼에 $Pb_{1.1}$($Zr_{0.52}Ti_{0.48}$)$O_3$조성을 갖는 PZT를 증착하였다. $600^{\circ}C$에서 열처리 후 페로브스카이트 구조를 가지는 PZT 박막의 CMP(chemical mechanical polishing) 공정에 따른 전기적 특성을 연구하였다. 강유전체 소자 적용을 위한 CMP 공정으로 제조된 PZT 박막 캐패시터의 P-E특성, I-V특성, 피로특성 등의 전기적 특성을 측정하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.321-322
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• 2007

In this thesis, the sintering properties and piezoelectric properties of $Pb[(Co_{0.5}W_{0.5})_{0.03}(Ni_{1/3}Nb_{2/3})_{0.07}(Zr_{0.52}Ti_{0.48})_{0.9}]O_3+0.5[wt%]MnO_2$ ceramics has been systematically investigated as a function of the sintering temperature after manufacturing the specimens with a general method. The lattice constant from the analysis of crystal structure showed that the pychlore structure was decreased with the increase of the sintering temperature. Density was decreased by increasing $B_2O_3$. TCFr was showed its minimum variation rate of 0.35~-0.52[%] in the sintered temperature 950[$^{\circ}C$], $B_2O_3$ 3[wt%]. The electromechanical coupling coefficient (Kp) showed its maximum of 31.116[%] in the sintered temperature 1050[$^{\circ}C$], and its minimum of 20.220[%] in the sintered temperature 1150[$^{\circ}C$].

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.313-316
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• 2003

The lead zirconate titanate, $Pb(Zr_{0:52}Ti_{0:48})O_3$, films of $0.5\;{\mu}m,\;1\;{\mu}m$ and $2\;{\mu}m$ thickness were fabricated on $Pt/Ti/SiO_2/Si$ substrate by the rf magnetron sputtering method. The PZT films were annealed using by a rapid thermal annealing (RTA) method. The thickness dependence of the film structure, dielectric properties, Polarization-electric field hysteresis loops and capacitance-voltage characteristics were investigated over the thickness range of $0.5\;{\mu}m,\;1\;{\mu}m$ and $2\;{\mu}m$. According to the XRD patterns of the films, (110) peak intensity increases with film thickness increased. The increase of PZT films thickness leads to the decrease of the remanent polarization and the dielectric constant.

• Proceedings of the KIEE Conference
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• 2006.07c
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• pp.1368-1369
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• 2006

In this thesis, the minuteness structure, piezoelectric, and dielectric characteristics of Pb[(Co0.5 W0.5) 0.03 (Ni1/3 Nb2/3) 0.07(Zr0.52 Ti0.48)0.9]O3+0.5Wt% MnO2 ceramics has been systematically investigated as a function of the sintering temperature after manufacturing the specimens with a general method. The electromechanical coupling coefficient (Kp) showed its maximum of 31.116[%] in the sintered specimens at $1050[^{\circ}C]$, and its minimum of 20.220[%] in the sintered specimens at $1150[^{\circ}C]$. The mechanical quality coefficient (Qm) marked the maximum of 139.526 at the sintering temperature of $1150[^{\circ}C]$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.570-573
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• 2002

Pb(Zr0.52Ti0.48)O3 (PZT) thin films were deposited on the Pt/Ti bottom electrode by rf magnetron sputtering method from target containing 5%, 25% and 50% Pb excess for applying ferroelectric random access memory (FRAM). PZT films were deposited at $300^{\circ}C$ and then they were crystallized by rapid thermal annealing (RTA) at $700^{\circ}C$. After RTA treatment, our results showed that all PZT films indicated perovskite polycrystalline structure with preferred orientation (110) and no pyrochlore phase was observed by X-ray diffraction (XRD) and by Scanning electron microscopy (SEM). A well-fabricated PZT film of excess Pb 25% capacitor showed a leakage current density in the order of $2.63{\times}10^{-7}A/cm^2$ at 100kV/cm, a remanent polarization of $3.385{\mu}C/cm^2$ and a coercive field of 41.32 kV/cm. The results showed that Pb excess of target affects to electrical properties of PZT thin film.

• Transactions on Electrical and Electronic Materials
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• v.15 no.5
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• pp.253-256
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• 2014

$Pb(Zr_{0.52}Ti_{0.48})O_3$ thin films of $1.5{\mu}m$ thickness were grown on $Pt/Ti/Gd_3Ga_5O_{12}$ substrate by RF magnetron sputtering at annealing temperatures ranging from $550^{\circ}C$ to $700^{\circ}C$. We evaluated the residual stress, by using a William-Hall plot, as a function of the annealing temperatures of PZT thin film with a constant thickness. As a result, the residual stresses of PZT thin film of $1.5{\mu}m$ thickness were changed by varying the annealing temperature. Also, we measured the hysteresis characteristic of PZT thin films of $1.5{\mu}m$ thickness to evaluate for application of an optoelectronic device.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.4
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• pp.232-238
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• 2000

PZT thin films(3500 ) have been prepared onto $Pt/Ti/SiO_2/Si$ substrates with a RF magnetron sputtering system using PB1.05(Zr0.52,Ti0.48)O3 ceramic target. We used two-step annealing techniques. As the RTA times and temperatures were increased, crystallization of PZT thin films were enhanced. The ferroelectric characteristics of PZT capacitors fabricated at $700^{\circ}C$ for 60 seconds were like these remanent polarization were $12.1 \muC/cm^2$, coercive field were 110 kV/cm, leakage current density were $4.1\times10-7 A/cm^2,\; \varepsilonr=442,$ and remanent polarization were decreased by 22% after 1010 cycles, respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.325-326
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• 2006

In this study, in order to develop piezoelectric device for multilayer piezoelectric ultrasonic motor, low temperature sintering $Pb(Mn_{1/3}Nb_{2/3})_{0.02}(Ni_{1/3}Nb_{2/3})_{0.12}(Zr_{0.48}Ti_{0.52})_{0.86}O_3$ system ceramics were fabricated according to the variations of forming pressure of casting sheet. At the 300[$kgf/cm^2$] forming pressure, the maximum density of 7.8[$g/cm^3$] was obtained. At the 350[$kgf/cm^2$] forming pressure, the maximum values of effective electromechanical coupling factor $k_{cff}\;=\;0.24$ and mechanical quality factor Qm=628 were obtained.

• Bulletin of the Korean Chemical Society
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• v.18 no.1
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• pp.56-61
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• 1997

Lead zirconate titanate (PZT) thin fills were deposited onto the Pt/Ti/SiO2/Si substrate by the pulsed laser deposition with the second harmonic wavelength (532 nm) of Nd:YAG laser. In order to determine the optimum conditions for the film deposition, the phase of the films were investigated as functions of ambient oxygen pressure, substrate temperature, and laser fluence. Also the chemical composition analysis was conducted for the PZT films deposited under various ambient oxygen pressure. When the distance between substrate and bulk PZT target is set to 20 mm, the optimum conditions have been determined to be 3 torr of oxygen pressure, 1.5 J/cm2 of laser fluence, and 823-848(±10) K range of substrate temperature. At these conditions, perovskite phase PZT films were obtained on platinized silicon. The chemical composition of the films is very similar to that of PZT bulk target. The physical structure of the deposited films analyzed by scanning electron microscopy shows a columnar morphology perpendicular to the substrate surface. Capacitance-Voltage hysteresis loop measurements show also a typical characteristics of ferroelectric thin film. The dielectric constant is found to be 528 for the 0.48 μm thickness of PZT thin film.

• Journal of the Korean Ceramic Society
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• v.42 no.11 s.282
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• pp.743-748
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• 2005

The effect of reaction parameters in the characteristic of $Pb(Zr_{0.52} Ti_{0.48})O_3$ powders by hydrothermal process was investigated in this study. In the preparation of PZT, the types of starting material and concentration of mineralizer on phase fraction and morphology was investigated respectively. Regardless the types of Pb precursor, PZT was able to synthesize ranging from 7 to 20 on KOH concentration and from 13.01 to 13.55 on pH of solution. The particle size of the PZT powders can be controlled by the mineralizer concentration and various types of precursor.