• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.9
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• pp.571-575
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• 2016

Recently, there has been much focus on the controlled alignment and patterning process of nanowires for nanoelectronic devices. A simple and effective method for patterning of highly aligned nanowires using a microcontact printing technique is demonstrated. In this method, nanowires are first directionally aligned by contact printing, following which line and space micropatterns of nanowire arrays are accomplished by microcontact printing with a micro patterned NOA mold.

• ETRI Journal
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• v.29 no.6
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• pp.814-816
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• 2007

Conventional lithography methods of gold patterning are based on deposition and lift-off or deposition and etching. In this letter, we demonstrate a novel method of gold patterning using spin-coatable gold electron-beam resist which is functionalized gold nanocrystals with amine ligands. Amine-stabilized gold electron beam resist exhibits good sensitivity, 3.0 mC/$cm^2$, compared to that of thiol-stabilized gold electron beam resists. The proposed method reduces the number of processing steps and provides greater freedom in the patterning of complex nanostructures.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.481-484
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• 2008

In order to reduce IR drop through common electrode in AMOLED, we propose a novel method to form electrical contact between highly-conductive bus lines and common electrode by using a plasma-assisted patterning of OLED layers and double deposition of the common electrode. Plasma-assisted patterning effects on OLED performance and degradation have been investigated. This patterning method caused turn-on voltage decrease, current flow increase at the same applied OLED voltages, quantum efficiency decrease, and rapid degradation at early stage during the lifetime test. However, comparable 70% luminance lifetime were obtained for both patterned and non-patterned OLEDs.

• Journal of Information Display
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• v.7 no.2
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• pp.12-15
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• 2006

We propose a patterning method of liquid crystal (LC) alignment layer for producing multi-domain LC structures. By controlling thermal conditions during micro-contact printing procedures and facilitating wetting properties of patterning materials, patterned LC orientation can be easily obtained on a bare ITO surface or other polymer films. The newly proposed patterning method is expected to be a very useful tool for fabricating multi-domain LC structures to enhance or design electro-optic properties of LC-based devices.

• 한국전산유체공학회:학술대회논문집
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• 2008.03b
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• pp.658-659
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• 2008

Numerical simulation is performed for a microdroplet deposition on the pre-patterned micro-structure. The liquid-air interface is tracked by level set method improved by incorporating the ghost fluid approach based on a sharp-interface representation. The method is further extended to treat the contact angle condition at an immersed solid surface. The present computation of a patterning process using microdroplet ejection demonstrates that the multiphase characteristics between the liquid-gas-solid phases can be used to overcome the patterning error.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.33 no.1
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• pp.28-38
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• 2009

Numerical simulation is performed for microdroplet deposition on a pre-patterned micro-structure. The liquid-air interface is tracked by a level-set method, which is improved by incorporating a sharp-interface modeling technique for accurately enforcing the matching conditions at the liquid-gas interface and the no-slip condition at the fluid-solid interface. The method is further extended to treat the contact angle condition at an immersed solid surface. The present computation of a patterning process using microdroplet ejection demonstrates that the multiphase characteristics between the liquid-gas-solid phases can be used to improve the patterning accuracy.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.369-372
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• 2004

Photo-induced surface alignment is charming as a non-contact photo-patternable alignment technology which can be used in the next generation of displays, such as large area, multi-domain. For decades, many polymer film have been investigated and developed to be used in the photo alignment. Among these photoreactive materials, recently developed polyimide, Chloromethylated Polyimide(CMPI) now became the focus of interests in this area because of its high photosensitivity and superior thermal stability. In this report, we present micro patterning method to form the nanoscale structure by Mask-Less laser patterning using this CMPI film and NSOM probe.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.05a
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• pp.106-108
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• 2004

We have investigated the photolithographic patterning method of light emitting polymer film for polymer light emitting diodes (PLED). Blue light emitting polymers based on polyfluorene, which can be cured photochemically to yield an insoluble form, have been synthesized using Ni(0) mediated Yamamoto polymerization. The relationship between patterning property and several variables such as the intensity of the exposed UV light, the concentrations of additives, has been studied by using optical microscope analysis, UV/visible spectroscopy, and photoluminescence. We have successfully fabricated PLEDs composed of the patterned emissive layer and their electroluminescence property has been also investigated. In this presentation, the detailed photolithographic patterning method and its application for polymer light emitting display will be discussed.

• Bulletin of the Korean Chemical Society
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• v.29 no.7
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• pp.1349-1352
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• 2008

We report a novel patterning method for a homo-polymeric poly(3-hexylthiophene) (P3HT) nanofilm particularly capable of strong adhesion to a $SiO_2$ surface. An oxidized silicon wafer substrate was micro-contact printed with n-octadecyltrichlorosilane (OTS) monolayer, and subsequently its negative pattern was selfassembled with three different amino-functionalized alkylsilanes, (3-aminopropyl)trimethoxysilane (APS), N- (2-aminoethyl)-3-aminopropyltrimethoxy silane (EDAS), and (3-trimethoxysilylpropyl) diethylenetriamine (DETAS). Then, P3HT nanofilms were selectively grown on the aminosilane pre-patterned areas via the vapor phase polymerization method. To evaluate the adhesion, patterning, and the film itself, the PEDOT nanofilms and SAMs were investigated with a $Scotch^{(R)}$ tape test, contact angle analyzer, ATR-FT-IR, and optical and atomic force microscopes. The evaluation showed that the newly developed all bottom-up process can offer a simple and inexpensive patterning method for P3HT nanofilms robustly adhered to an oxidized Si wafer surface by the mediation of $FeCl_3$ and amino-functionalized alkylsilane SAMs.

• Laser Solutions
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• v.14 no.3
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• pp.1-6
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• 2011

Globally, the interest of renewable energy has become an upsurge. Especially, the solar industry is the one which is getting rapid growth rate. Many of researchers have been undertaking to improve the efficiency of solar cell to accomplish grid parity. The most of research has been concentrated on two methods, one on the selective emitter and the other is on LBSF (Local Back Surface Field) formation. Laser patterning will be needed to eliminate the thin film to form selective emitter and LBSF of solar cell. This paper reports some experimental results in laser patterning process for high-efficiency crystalline solar cell manufacturing. The experimental results indicate that the patterning quality depends on the average power and repetition rate of laser. The experimental results prove that the laser patterning process is an advantageous method to improve the efficiency of solar cell.