ETRI Journal

Electronics and Telecommunications Research Institute (한국전자통신연구원)
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Novel Patterning of Gold Using Spin-Coatable Gold Electron-Beam Resist

  • Kim, Ki-Chul (BK21 Physics Research Division, Sungkyunkwan University) ;
  • Lee, Im-Bok (BK21 Physics Research Division, Sungkyunkwan University) ;
  • Kang, Dae-Joon (BK21 Physics Research Division, Sungkyunkwan University) ;
  • Maeng, Sung-Lyul (Cambridge-ETRI Joint R&D Center, ETRI)
  • Received : 2007.08.16
  • Published : 2007.12.31
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Abstract

Conventional lithography methods of gold patterning are based on deposition and lift-off or deposition and etching. In this letter, we demonstrate a novel method of gold patterning using spin-coatable gold electron-beam resist which is functionalized gold nanocrystals with amine ligands. Amine-stabilized gold electron beam resist exhibits good sensitivity, 3.0 mC/$cm^2$, compared to that of thiol-stabilized gold electron beam resists. The proposed method reduces the number of processing steps and provides greater freedom in the patterning of complex nanostructures.

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