한국정보디스플레이학회:학술대회논문집
- 2008.10a
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- Pages.481-484
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- 2008
A study on plasma-assisted patterning and doubly deposited cathode for improvement of AMOLED common electrode IR drop
- Yang, Ji-Hoon (Dept. of EECS, Seoul Nat'l Univ.) ;
- Kwak, Jeong-Hun (Dept. of EECS, Seoul Nat'l Univ.) ;
- Lee, Chang-Hee (Dept. of EECS, Seoul Nat'l Univ.) ;
- Hong, Yong-Taek (Dept. of EECS, Seoul Nat'l Univ.)
- Published : 2008.10.13
Abstract
In order to reduce IR drop through common electrode in AMOLED, we propose a novel method to form electrical contact between highly-conductive bus lines and common electrode by using a plasma-assisted patterning of OLED layers and double deposition of the common electrode. Plasma-assisted patterning effects on OLED performance and degradation have been investigated. This patterning method caused turn-on voltage decrease, current flow increase at the same applied OLED voltages, quantum efficiency decrease, and rapid degradation at early stage during the lifetime test. However, comparable 70% luminance lifetime were obtained for both patterned and non-patterned OLEDs.