• 연구논문집
• /
• s.30
• /
• pp.129-135
• /
• 2000

Double boss type composite pressure bottles have been developed widely but single boss type had not because there are some difficulty in technical point. In this paper a research was performed to develop composite pressure vessel in conjunction with design, fabrication, and test. Fiber pattern and angles were decided by CADFIL software and they are [liner/$15^{\circ}$/$15^{\circ}$/$90^{\circ}$/$18^{\circ}$/$90^{\circ}$/$21^{\circ}$/$21^{\circ}$/$90^{\circ}$]. Fabrication of bottles was done by AEA's 5-axis filament winding machine. During fabrication fiber optic sensor were embedded to measure were behavior of structure at the applied internal pressure. Even though satisfied test results were not obtained, the experimental set-up of fiber optics showed the possibility for the application of filament wound vessels. However, the conventional strain and fabrication of single boss composite bottles.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.28 no.12
• /
• pp.771-775
• /
• 2015

In this paper, we designed and fabricated low cost imprinting process for micro patterning on FCCL (flexible copper clad laminate). Compared to conventional imprinting process, developed fabrication method processing imprint and UV photolithography step simultaneously and it does not require resin etch process and it can also reduce the fabrication cost and processing time. Based on proposed method, patterns with $10{\mu}m$ linewidth are fabricated on $180mm{\times}180mm$ FCCL. Compared to conventional methods using LDI (laser direct imaging) equipment that showed minimum line with $10{\sim}20{\mu}m$, proposed method shows comparable pattern resolution with very competitive price and shorter processing time. In terms of mass production, it can be applied to fabrication of large-area low cost applications including FPCB.

• Journal of the Semiconductor & Display Technology
• /
• v.18 no.1
• /
• pp.38-41
• /
• 2019

Proton beam writing is a direct writing lithography technique for semiconductor fabrication process. The advantage of this technique is that the proton beam does not scatter as they travel through the matter and therefore maintain a straight path as they penetrate into the resist. The experiment has been carried out at Accelerator Mass Spectrometry facility. The focused proton beam with the fluence of $100nC/mm^2$ was exposed on the PMMA coated silicon sample to make a pattern on a photo resist. The results show the potential of proton beam writing as an effective way to produce semiconductor fabrication process.

• Journal of the Korean Society of Manufacturing Process Engineers
• /
• v.21 no.4
• /
• pp.77-83
• /
• 2022

Amorphous alloys exhibit excellent mechanical properties; therefore, application technology development is being attempted in various fields. However, industrial use of application technology is limited owing to the limitations in fabrication. In this study, micropattern fabrication of an amorphous alloy was conducted using laser beam machining. Although microhole fabrication is possible without the deformation of the amorphous phase through nanosecond pulsed laser beam machining, there are limitations in the generation of recast layers and spatters. In cover plate laser beam machining (c-LBM), a cover plate is used to reduce the thermal deformation and processing area. Therefore, it is possible to fabricate holes at the level of several micrometers. In this study, it was confirmed that recast layers are hardly generated in c-LBM. Furthermore, square-shaped micropatterns were successfully fabricated using c-LBM.

• Transactions of Materials Processing
• /
• v.23 no.8
• /
• pp.507-512
• /
• 2014

The objective of the current investigation is to establish techniques in micro pattern forming operations of polymeric circular tubes by using hydrostatic pressing. This method was developed and successfully applied to the micro pattern forming on polymeric plates. The key idea of the new technique is to pressurize multiple vacuum-packed substrate-mold stacks above the glass transition temperature of the polymeric substrates. The new process is thought to be a promising micro-pattern fabrication technique for two reasons; first, (hydro-) isostatic pressing ensures a uniform micro-pattern replicating condition regardless of the substrate area and thickness. Second, multiple curved substrates can be patterned at the same time. With the prototype forming machine for the new process, micro prismatic array patterns, 25um in height and 90 degrees in apex angle, were successfully made on the PMMA circular tubes with diameters of 5~40mm. These results show that this process can be also used in the micro pattern forming process on curved plates such as circular tube.

• Proceedings of the Korean Society for Technology of Plasticity Conference
• /
• 2005.05a
• /
• pp.51-54
• /
• 2005

Light Guide Plate (LGP) of LCD-BLU(Back Light Unit) is manufactured by forming optical pattern with $5\~100um$ in diameter on the LGP by means of sand blasting or etching method. However, in order to improve the luminance of LCD-LGP, the design of optical pattern has introduced UV inclined-exposure process in this study. This micro-optical pattern, which has asymmetric elliptical column shaped pattern, can change low viewing-angle to high viewing-angle, as well as it contribute to diffusion of light. As a result, this type of micro-optical pattern can introduce the highly luminance. The PR structure obtained in the stage of lithography has asymmetric elliptical column shape and it is processed into a micro-optical pattern. Optical design with this kind of micro-optical pattern, mold fabrication by electroplating and LGP molding with injection molding are under way.

• Journal of the Korean Society for Precision Engineering
• /
• v.24 no.8 s.197
• /
• pp.138-143
• /
• 2007

Microstereolithography technology is similar to the conventional stereolithography process and enables to fabricate a complex 3D microstructure. This is divided into scanning and projection type according to aiming at precision and fabrication speed. The scanning MSL fabricates each layer using position control of laser spot on the resin surface, whereas the projection MSL fabricates one layer with one exposure using a mask. In the projection MSL, DMD used to generate dynamic pattern consists of $1024{\times}768$ micromirrors which have $13.68{\mu}m$ per side. The fabrication range and resolution are determined by the field of view of the DMD and the magnification of the projection lens. If using the projection lens with high power, very fine microstructures can be fabricated. In this paper, the projection MSL system adapted to a large surface for array-type fabrication is presented. This system covers the meso range, which is defined as the intermediate range between micro and macro, with a resolution of a few ${\mu}m$. The fabrication of array-type microstructures has been demonstrated to verify the performance of implemented system.

• Journal of the Korean Society for Precision Engineering
• /
• v.25 no.1
• /
• pp.138-144
• /
• 2008

Micro-machining of a brittle material such as glass, silicon, etc., is important in micro fabrication. Particularly, micro-abrasive jet machining (${\mu}-AJM$) has become a useful technique for micro-machining of such materials. The ${\mu}-AJM$ process is mainly based on the erosion of a mask which protects brittle substrate against high velocity of micro-particle. Therefore, fabrication of an adequate mask is very important. Generally, for the fabrication of a mask in the ${\mu}-AJM$ process, a photomask based on the semi-conductor fabrication process was used. In this research a rapid mask fabrication technology has been developed for the ${\mu}-AJM$. By scanning the focused UV laser beam, a micro-mask pattern was fabricated directly without photolithography process and photomask. Two kinds of mask patterns were fabricated using SU-8 and photopolymer (Watershed 11110). Using fabricated mask patterns, abrasive-jet machining of Si wafer were conducted successfully.

• Proceedings of the Korean Society for Technology of Plasticity Conference
• /
• 2007.05a
• /
• pp.368-370
• /
• 2007

AAO(Anodic Aluminum Oxidation) method has been known that it is practically useful for the fabrication of nano-structures and makes it possible to fabricate the highly ordered nano masters on large surface and even on the 2.5 or 3D surface at low cost comparing to the expensive e-beam lithography or the conventional silicon processing. In this study, by using the multi-step anodizing and etching processes, highly ordered nano patterned master with concave shapes was fabricated. By varying the processing parameters, such as initial matter and chemical conditions; electrical and thermal conditions; time scheduling; and so on, the size and the pitch of the nano pattern can be controlled. Consequently, various alumina/aluminum nano structures can be easily available in any size and shape by optimized anodic oxidation in various aqueous acids. The resulting good filled uniform nano molded structure through hot embossing molding process shows the validity of the fabricated nano pattern masters.

• Transactions of Materials Processing
• /
• v.20 no.1
• /
• pp.23-28
• /
• 2011

For the fabrication of nano patterned products manufacturing a nano patterned mold is needed in advance. The nano patterned stamper was fabricated by electroforming the AAO master with nickel. The surface of nickel-plated stamper had nano-patterned holes with the diameter of 73 nm and the depth of 83 nm. Hot embossing was used for forming P3HT sheet and the process factors of hot embossing were closer as pressure, temperature and time. In the present paper hot embossing experiments were performed to find the main process conditions to affect the replication ratio of nano patterns on surface of P3HT sheet. As a result, main contributing factors for the replication ratio of hot embossed pattern could be sequentially enumerated as pressure, temperature and time.