• 한국정밀공학회지
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• 제18권3호
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• pp.47-52
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• 2001

Rapid Prototyping(RP) has been widely applied in designing and developing process of new products. RP can reduce the lead time and expense required to bring a new product form initial concept to production. Among several RP process can dramatically reduce the total build time and be applied for fabrication of large-sized and free form object because it uses in LOM the paper thickness is 0.05∼0.38mm as deposition feature segment. In this study, mechanical properties of pattern with LOM system is studied for optimal design of sand mold casting. The main result is that tensile, compressive strength and pattern size are significantly affected by temperature of hot roll.

• 한국전자통신학회논문지
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• 제8권9호
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• pp.1407-1412
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• 2013

인간의 건강한 생활을 위해서는 자세 및 골격구조가 중요하며, 이것은 평소의 생활습관과 걸음걸이에 의해서 영향을 받아 변형될 수 있다. 인간의 걸음걸이형태로는 크게 바른걸음, 팔자걸음, 안짱걸음으로 구분할 수 있으며, 이러한 걸음걸이형태를 분석하여 바른자세를 유지하는데 도움이 될 수 있다. 본 논문에서는 스트레인 센서를 이용하여 걸음걸이 패턴을 분석하는 신발을 개발하였으며, 제작된 신발로 걸음걸이 패턴을 구분하여 분석할 수 있었다.

• Composites Research
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• 제35권6호
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• pp.463-468
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• 2022

상용 FFF (Fused filament fabrication) 3D 프린터로 제조된 탄소 단섬유강화 나일론 복합재료 구조의 내부 채움 패턴(Infill pattern)의 높은 공극률은 프린팅 된 구조의 기계적 성능을 결정한다. 본 연구는 프린팅 된 구조의 내부 채움 패턴의 공극률을 줄여서 기계적 특성을 개선하기 위해 사각형 내부 채움 구조로 제작된 Onyx 복합 재료 시편의 열압밀 조건에 따른 시편의 기계적 성능을 실험적으로 평가하고, 가장 우수한 기계적 물성을 유도하는 열압밀 공정 조건(145℃, 4 MPa, 12 min)을 찾았다. 현미경 관찰결과 열압밀 후처리를 겪은 복합재료 시편의 내부 채움 공극률이 효과적으로 줄어듦을 확인하였다. 후처리된 시편의 기계적 성능을 확인하기 위해, 후처리를 하지 않은 대조군 시편과, 후처리 후 밀도와 치수를 동일하게 설정하여 출력한 시편과 함께 인장시험 및 3점 굽힘시험을 수행하여 기계적 물성을 비교한 결과 열압밀 후처리를 수행한 경우 기계적 물성이 효과적으로 개선되는 것을 확인하였다.

• 패션비즈니스
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• 제15권5호
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• pp.115-128
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• 2011

Textile fabrication based on traditional culture has grown very attentive as fashion icons in recent so that designers, especially, who want to be the center of attention, may be a public interest and introduce their own culture to the world. In the 21st century by more focusing of our culture, Korean textile designs that is applicable our traditional motifs are required to develop and also its motifs could be comprehensibly got the spirit and the inherent meaning, and should be fuse with modern touch and developed practical design in daily life. Of all many different patterns, this paper placed an emphasis on three of main traditional motifs as a floral arabesque pattern, ivy pattern and butterfly pattern. The traditional motifs were applied through a hand-made technology and the professional design program of TexPro, and then the textile design was simulated by Photoshop to approaching the apparel design. Through these produced artworks, we have conscious that the oriental images have associate traditional meaning and the traditional design tried to express co-existence past and present. Moreover, we believe that the surface pattern design of textile for printing was good chance to relive the traditional meaning, and the tradition is recognized not mere old and expects more advance with applications.

• 통합자연과학논문집
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• 제4권4호
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• pp.311-314
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• 2011

Application of self-assembled monolayers (SAMs) to the fabrication of organic thin film transistor has been recently reported very often since it can help to provide ohmic contact between films as well as to form simple and effective electrode pattern. Accordingly, quality of these ultra-thin films is becoming more imperative. In this study, in order to manufacture a high quality SAM pattern, a hydrophobic alkylsilane monolayer and a hydrophilic aminosilane monolayer were selectively coated on $SiO_2$ surface through the consecutive procedures of a micro-contact printing (${\mu}CP$) and dip-coating methods under extremely dry condition. On a SAM pattern cleaned with SC1 solution immediately after ${\mu}CP$, poly(3,4-ethylenedioxythiophene) (PEDOT) source and drain electrode array were very selectively and nicely vapour phase polymerized. On the other side, on a SC1-untreated SAM pattern, PEDOT array was very poorly polymerized. It strongly suggests that the SC1 cleaning process effectively removes unwanted contaminants on SAM pattern, thereby resulting in very selective growth of PEDOT electrode pattern.

• Composites Research
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• 제14권3호
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• pp.10-17
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• 2001

복합재료 압력용기를 개발하기 위하여 설계, 제작, 시험을 연계한 연구가 수행되었다. 섬유의 와인딩 패턴 및 각도는 CADFIL 코드를 활용하여 결정하였고, 그 각도는 [$liner/15^{\circ}/15^{\circ}/90^{\circ}/18^{\circ}/90^{\circ}/21^{\circ}/21^{\circ}/90^{\circ}$] 이었다. 압력용기의 제작은 5축 필라멘트 와인딩기를 활용하여 이루어졌다. 제조 공정 중에 광섬유 센서를 매립하여 내부 압력이 가해질 때 각 지점에서 스트레인을 측정하였다. 광섬유가 실험적으로 사용된 반면에 일반적으로 적용하는 스트레인 게이지를 부착하여 안정적인 시험결과를 확보하였다. 가압 시험결과는 유한요소 해석 결과와 비교하였고 그 결과는 유사한 일치를 보여주었다. 이 과정을 통하여 개구부 한개를 지닌 복합재료 압력용기의 설계, 제작 및 시험평가가 성공적으로 이루어져 제조기술의 확보가 가능하였다.

• 한국정밀공학회지
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• 제23권9호
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• pp.164-173
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• 2006

The cooling capacity of a micro-heat pipe is mainly governed by the magnitude of capillary pressure induced in the wick structure. For microchannel wicks, a higher capillary pressure is achievable for narrower and deeper channels. In this study, a metallic micro-heat pipe adopting high-aspect-ratio microchannel wicks is fabricated. Micromachining of high-aspect-ratio microchannels is done using the laser-induced wet etching technique in which a focused laser beam irradiates the workpiece placed in a liquid etchant along a desired channel pattern. Because of the direct writing characteristic of the laser-induced wet etching method, no mask is necessary and the fabrication procedure is relatively simple. Deep microchannels of an aspect ratio close to 10 can be readily fabricated with little heat damage of the workpiece. The laser-induced wet etching process for the fabrication of high-aspect-ratio microchannels in 0.5mm thick stainless steel foil is presented in detail. The shape and size variations of microchannels with respect to the process variables, such as laser power, scanning speed, number of scans, and etchant concentration are closely examined. Also, the fabrication of a flat micro-heat pipe based on the high-aspect-ratio microchannels is demonstrated.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 연구회
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• pp.55-58
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• 2001

In this paper, we present the results of the design and fabrication of the VCO(Voltage controlled Oscillator) using RF circuit simulator GENESYS and electromagnetic field simulator EMpower Frequency range is fabricated VCO is 850 MHz ~ 950 MHz, which is used Colpitts Circuit. the fabricated VCO is consisted of resonator, oscillator and MSL(Microstrip Line) is used in LC tuning circuit.(operated by negative feedback) MSL(Microstrip Line), Varactor(Plastic package), low noise TR(SOT-23), chip inductor(1608), chip capacitor(1005), chip resistance(1005). 1005 type is used for sample fabrication of VCO. In the fabrication process, circuit pattern is screen printed on the alumina substrates of over 99.9% purity. Center frequency of the sample VCO is 850MHz at $V_T=1.5V$, while the simulated value was 1.0GHz at $V_T=1.5V$. Variable frequency range of the sample is 860~950MHz in contrast to the 1068~1100MHz of the simulated values.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 연구회
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• pp.153-156
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• 2001

In this paper, we present the results of the design and fabrication of the VCO(Voltage controlled Oscillator) using RF circuit simulator GENESYS and electromagnetic field simulator EMpower Frequency range is fabricated VCO is 850 MHz ~ 950 MHz, which is used Colpitts Circuit. the fabricated VCO is consisted of resonator, oscillator and MSL(Microstrip Line) is used in LC tuning circuit.(operated by negative feedback) MSL(Microstrip Line), Varactor(Plastic package), low noise TR(SOT-23), chip inductor(1608), chip capacitor(1005), chip resistance(1005). 1005 type is used for sample fabrication of VCO. In the fabrication process, circuit pattern is screen printed on the alumina substrates of over 99.9% purity. Center frequency of the sample VCO is 850MHz at $V_T$=1.5V, while the simulated value was 1.0GHz at $V_T$=1.5V. Variable frequency range of the sample is 860~950MHz in contrast to the 1068~1100MHz of the simulated values.

• 한국정밀공학회지
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• 제25권4호
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• pp.134-139
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• 2008

A spirally arrayed nano-pattern is designed as a model pattern for the next generation optical storage media. The pattern consists off types of embossed rectangular dot, which are 50nm, 100nm, 150nm and 200nm in length and 50nm in width. The height of the dot is designed to be 50nm. The pitch of the spiral track of the pattern is 100nm. A ER(Electron resist) master for this pattern is fabricated by e-beam lithography process. The ER is first spin-coated to be 50nm thick on a Si wafer and then the model pattern is written on the coated ER layer by e-beam. After developing this pattern written wafer in the solution, a ER pattern master is fabricated. The most conventional e-beam machine can write patterns in orthogonal way, so we made our own pattern generator which can write the pattern in circular or spiral way. This program generates the patterns to be compatible with the e-beam machine from Raith(Raith 150). To fabricate 50nm pattern master precisely, a series of experiments were done including the design compensation for the pattern size, optimization of the dose, acceleration voltage, aperture size and developing. Through these experiments, we conclude that the higher accelerating voltages and smaller aperture size are better for mastering the nano pattern which is in order of 50nm. With the optimized e-beam lithography process, a spiral arrayed 50nm pattern master adopting PMMA resist was fabricated to have dimensional accuracy over 95% compared to the designed. Using this pattern master, a metal pattern stamp will be fabricated by Ni electro plating for injection molding of the patterned plastic substrate.