• 제목/요약/키워드: Particle Contamination

검색결과 215건 처리시간 0.024초

Plasma Corrosion in Oxalic Acid Anodized Coatings Depending on Tartaric Acid Content

  • Shin, Jae-Soo;Song, Je-Boem;Choi, Sin-Ho;Kim, Jin-Tae;Oh, Seong-Geun;Yun, Ju-Young
    • Applied Science and Convergence Technology
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    • 제25권1호
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    • pp.15-18
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    • 2016
  • Study investigated the optimal anodizing conditions for fabricating an oxide film that produces less contamination in a corrosive plasma environment, using oxalic acid and tartaric acid. Oxide films were produced using sulfuric acid, oxalic acid, and tartaric acid electrolyte mixtures with various mole ratios. The oxide film made by adding 0.05M tartaric acid to 0.3M oxalic acid showed higher breakdown voltage and lower leakage current. Additionally, contamination particles were reduced during plasma etching, thus demonstrates that this mixture presented optimal conditions. However, higher tartaric acid content (0.1 M, 0.15 M) led to lower breakdown voltages and higher leakage currents. Also, it resulted in more cracking during thermal shock tests as well as the generation of more contamination particles during plasma processing.

Effect of Brush Treatment and Brush Contact Sequence on Cross Contaminated Defects during CMP in-situ Cleaning

  • Kim, Hong Jin
    • Tribology and Lubricants
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    • 제31권6호
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    • pp.239-244
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    • 2015
  • Chemical mechanical polishing (CMP) is one of the most important processes for enabling sub-14 nm semiconductor manufacturing. Moreover, post-CMP defect control is a key process parameter for the purpose of yield enhancement and device reliability. Due to the complexity of device with sub-14 nm node structure, CMP-induced defects need to be fixed in the CMP in-situ cleaning module instead of during post ex-situ wet cleaning. Therefore, post-CMP in-situ cleaning optimization and cleaning efficiency improvement play a pivotal role in post-CMP defect control. CMP in-situ cleaning module normally consists of megasonic and brush scrubber processes. And there has been an increasing effort for the optimization of cleaning chemistry and brush scrubber cleaning in the CMP cleaning module. Although there have been many studies conducted on improving particle removal efficiency by brush cleaning, these studies do not consider the effects of brush contamination. Depending on the process condition and brush condition, brush cross contamination effects significantly influence post-CMP cleaning defects. This study investigates brush cross contamination effects in the CMP in-situ cleaning module by conducting experiments using 300mm tetraethyl orthosilicate (TEOS) blanket wafers. This study also explores brush pre-treatment in the CMP tool and proposes recipe effects, and critical process parameters for optimized CMP in-situ cleaning process through experimental results.

장비 구동부품 기인 Particle 평가를 위한 마모측정기의 개발에 관한 연구 (A Study of Developing Wear Tester to Measure and Minimize Particle Levels in Cleanroom)

  • 박광희;노권학;장성호;이종환;차영철;전해등
    • 산업경영시스템학회지
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    • 제36권2호
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    • pp.1-7
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    • 2013
  • Cleanroom could be largely classified into industrial cleanroom that can be contaminated by particles and bio-cleanroom that can be contaminated by biological particles. Electrical manufacturing companies producing precision machines and electrical parts essentially have industrial cloom facilities and clean technologies to produce defects free products due to particles. Industrial cleanroom should be controlled in respect of 4M1E to prevent from foreign materials of sub-micro unit and to keep out contamination sources from outside. In this paper, a concept for a quantitative methodology to measure the particles from running components was suggested by combining both newly making clean booth such as wear tester and laser particle counter.

평판디스플레이의 대기중 분진농도에 따른 수명예측 시험방법 개발 (Development of Test Method for Flat Panel Display Life Time Prediction during Atmospheric Particle Exposure)

  • 유동현;이건호;최정욱;안강호
    • 반도체디스플레이기술학회지
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    • 제12권4호
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    • pp.45-48
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    • 2013
  • The electronic device, such as flat panel display (FPD), is very important in our life as a means of communication between humans. Liquid crystal display (LCD), which is categorized as a flat panel display, has been used in many display products, especially in TV industry. An LED TV is composed of several electrical components, such as liquid critical module (LCM), analog to digital convertor (AD), power supplier, and inverter board. These modules are very vulnerable to particulate contamination, and causing malfunction or visibility degradation. In this study, we developed a test method for prediction of LCM's lifetime. The test system consists of carbon particle generation flame, dilution system, test chamber, and particle concentration monitoring instrument. Since the carbon particles are the most abundant in the atmosphere and easily absorb light, soot particles are used as a challenging material for this test. The concentration of generated soot particles is set around 4,000,000 #/cc, which is 400 times higher than that of usual atmospheric particles. Through this experiment, we deduced the relationship between the dust concentration and life time of the test specimen.

Post Ru CMP Cleaning에서 연마입자의 흡착과 제거에 대한 chemical의 첨가제에 따른 영향 (Effect of chemical in post Ru CMP Cleaning solutions on abrasive particle adhesion and removal)

  • 김인권;김태곤;조병권;손일룡;박진구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.529-529
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    • 2007
  • Ruthenium (Ru) is a white metal and belongs to platinum group which is very stable chemically and has a high work function. It has been widely studied to apply Ru as an electrode material in memory devices and a Cu diffusion barrier metal for Cu interconnection due to good electrical conductivity and adhesion property to Cu layer. To planarize deposited Ru layer, chemical mechanical planarization(CMP) was suggested. However, abrasive particle can induce particle contamination on the Ru layer surface during CMP process. In this study, zeta potentials of Ru and interaction force of alumina particles with Ru substrate were measured as a function of pH. The etch rate and oxidation behavior were measured as a function of chemical concentration of several organic acids and other acidic and alkaline chemicals. PRE (particle removal efficiency) was also evaluated in cleaning chemical.

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디젤 엔진오일 내 Soot 함량 증가에 따른 오염도 측정에 관한 실험적 고찰 (An Experimental Study on the Measurement of Soot Contamination in a Diesel Engine Oil)

  • 공호성;조성용;윤의성;한흥구;정동윤
    • Tribology and Lubricants
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    • 제19권5호
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    • pp.251-258
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    • 2003
  • New method and device for the on-line measurement of soot concentration in a diesel engine oil are proposed, where the measurement principle is based mainly on attenuated internal total reflection. The detector were evaluated in various ranges of contaminated oils by carbon black particles. It was found that the proposed detector could be well used to monitor the oil deterioration due to soot contamination. Operational range of the detector was found from 0 to 5 mass percentage of soot content. Test results with water and fuel dilution showed that these effects were not remarkable. However, adsorption of carbon black particles onto the measurement surface was considered to be a critical problem of the detector. Effects of particle deposition on the interface was experimentally evaluated with the oil temperature and flow turbulence and discussed throughout this work.

DOT-3 브레이크액에서 오염에 따른 광학적 특성 연구 (A study of the Optical Characteristics for Contaminated Brake Fluid, DOT-3)

  • 지인근;김여환
    • 한국정보전자통신기술학회논문지
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    • 제8권5호
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    • pp.354-358
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    • 2015
  • DOT-3 규격의 자동차 브레이크액에 대하여 수분 함유량과 시스템 마찰로 인한 오염도를 전기저항과 광학 투과율을 측정하여 비교하였다. 기존의 저항측정법은 수분 함유량을 주로 측정하는 반면에 광학 투과율 방식은 제동장치 내부의 마찰에 의하여 발생된 입자의 오염을 포함하여 측정할 수 있어서 저항변화 측정보다는 광학 투과율 방법이 더 선형적이고 효율적이었다.

매향리 내륙 사격장 토양의 중금속 오염 분포 (Heavy Metal Distribution in Soils from the Maehyang-ri Inland Shooting Range Area)

  • 이준호;박갑성
    • 한국물환경학회지
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    • 제24권4호
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    • pp.407-414
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    • 2008
  • This study was conducted to evaluate the heavy metal contamination in the soils of Maehyang-ri inland shooting range area. The texture of the Maehyang-ri inland shooting range soil was sandy. Extraction of heavy metals reached quasi-equilibrium within 6 hours using shaking with 0.1 N HCl. 95% and 94% of extraction efficiency was observed for Cu and Pb in the Maehyang-ri shooting range soils, respectively. And Cu and Pb contamination of level of the T-1 region soil was $114.4{\pm}5.7mg/kg$ and $362.3{\pm}20.5mg/kg$. This may be due to the effects of mineralogical factor, soil particle size and un-residual fractions such as exchangeable, carbonate, Fe-Mn oxide and organic+sulfide.

TiO2 제조 실험실에서 나노입자의 배경농도 특징 (Characteristics of Background Nanoparticle Concentration in a TiO2 Manufacturing Laboratory)

  • 박승호;정재희;이승복;배귀남;지현석;조소혜
    • 한국입자에어로졸학회지
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    • 제7권4호
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    • pp.113-121
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    • 2011
  • The aerosol nanoparticles are suspected to be exposed to workers in nanomaterial manufacturing facilities. However, the exposure assessment method has not been established. One of important issues is to characterize background level of nanoparticles in workplaces. In this study, intensive aerosol measurements were made at a $TiO_2$ manufacturing laboratory for five consecutive days in May of 2010. The $TiO_2$ nanoparticles were manufactured by the thermal-condensation process in a heated tube furnace. The particle number size distribution was measured using a scanning mobility particle sizer every 5 min, in order to detect particles ranging from 14.5 to 664 nm in diameter. Total particle number concentration shows a severe diurnal variation irrespective of manufacturing process, which was governed by nanoparticles smaller than 50 nm in diameter. During the background monitoring periods, significant peak concentrations were observed between 2 p.m. and 3 p.m. due to the infiltration of secondary aerosol particles formed by photochemical smog. Although significant increase in nanoparticle concentration was also observed during the manufacturing process twice among three times, these particle peak concentrations were lower than those observed during the background measurement. It is suggested that the investigation of background particle contamination is needed prior to conducting main exposure assessment in nanomaterial manufacturing workplaces or laboratories.

SMPS와 TR-DMPS를 이용한 도로변 초미세 입자 모니터링 결과의 비교 (Comparison of Ultrafine Particles Monitored at a Roadside Using an SMPS and a TR-DMPS)

  • 우대광;이승복;배귀남;김태성
    • 한국대기환경학회지
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    • 제24권4호
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    • pp.404-414
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    • 2008
  • A Transient Differential Mobility Particle Spectrometer (TR-DMPS) with a short response time was recently developed to monitor high concentration of ultrafine particles emitted from vehicles. To investigate the availability of the TR-DMPS for monitoring transient roadside aerosols, the number size distribution of ultrafine particles was monitored at the Cheongnyangni roadside in Seoul on March 23, 2007 together with a Scanning Mobility Particle Sizer (SMPS). The roadside aerosols were monitored every 5 min and 0.1 sec by using the SMPS and the TR-DMPS, respectively. The concentration of ultrafine particles at the roadside was highly fluctuated for a short duration. From the comparison of particle number concentrations and size distributions between two instruments, it was confirmed that the SMPS provided fairly good time-averaged number size distribution although it did not follow rapid change of particle number concentration at the roadside. The TR-DMPS quickly responded to a rapid change of particle number concentration due to abrupt traffic flow. However, the TR-DMPS frequently showed electrical noise events, resulting in underestimated particle contamination. A more stable operation of the TR-DMPS is needed in application of roadside aerosol monitoring.