• Title/Summary/Keyword: Partial mask

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Refilled mask structure for Minimizing Shadowing Effect on EUV Lithography

  • Ahn, Jin-Ho;Shin, Hyun-Duck;Jeong, Chang-Young
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.4
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    • pp.13-18
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    • 2010
  • Extreme ultraviolet (EUV) lithography using 13.5 nm wavelengths is expected to be adopted as a mass production technology for 32 nm half pitch and below. One of the new issues introduced by EUV lithography is the shadowing effect. Mask shadowing is a unique phenomenon caused by using mirror-based mask with an oblique incident angle of light. This results in a horizontal-vertical (H-V) biasing effect and ellipticity in the contact hole pattern. To minimize the shadowing effect, a refilled mask is an available option. The concept of refilled mask structure can be implemented by partial etching into the multilayer and then refilling the trench with an absorber material. The simulations were carried out to confirm the possibility of application of refilled mask in 32 nm line-and-space pattern under the condition of preproduction tool. The effect of sidewall angle in refilled mask is evaluated on image contrast and critical dimension (CD) on the wafer. We also simulated the effect of refilled absorber thickness on aerial image, H-V CD bias, and overlapping process window. Finally, we concluded that the refilled absorber thickness for minimizing shadowing effect should be thinner than etched depth.

Salt and Pepper Noise Removal Algorithm based on Euclidean Distance Weight (유클리드 거리 가중치를 기반한 Salt and Pepper 잡음 제거 알고리즘)

  • Chung, Young-Su;Kim, Nam-Ho
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.26 no.11
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    • pp.1637-1643
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    • 2022
  • In recent years, the demand for image-processing technology in digital marketing has increased due to the expansion and diversification of the digital market, such as video, security, and machine intelligence. Noise-processing is essential for image-correction and reconstruction, especially in the case of sensitive noises, such as in CT, MRI, X-ray, and scanners. The two main salt and pepper noises have been actively studied, but the details and edges are still unsatisfactory and tend to blur when there is a lot of noise. Therefore, this paper proposes an algorithm that applies a weight-based Euclidean distance equation to the partial mask and uses only the non-noisy pixels that are the most similar to the original as effective pixels. The proposed algorithm determines the type of filter based on the state of the internal pixels of the designed partial mask and the degree of mask deterioration, which results in superior noise cancellation even in highly damaged environments.

A Filter Algorithm based on Partial Mask and Lagrange Interpolation for Impulse Noise Removal (임펄스 잡음 제거를 위한 부분 마스크와 라그랑지 보간법에 기반한 필터 알고리즘)

  • Cheon, Bong-Won;Kim, Nam-Ho
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.26 no.5
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    • pp.675-681
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    • 2022
  • Recently, with the development of IoT technology and AI, unmanned and automated in various fields, interest in video processing, which is the basis for automation such as object recognition and object classification, is increasing. Various studies have been conducted on noise removal in the video processing process, which has a significant impact on image quality and system accuracy and reliability, but there is a problem that it is difficult to restore images for areas with high impulse noise density. In this paper proposes a filter algorithm based on partial mask and Lagrange interpolation to restore the damaged area of impulse noise in the image. In the proposed algorithm, the filtering process was switched by comparing the filtering mask with the noise estimate and the purge weight was calculated based on the low frequency component and the high frequency component of the image to restore the image.

A Study on Detection of Influential Observations on A Subset of Regression Parameters in Multiple Regression

  • Park, Sung Hyun;Oh, Jin Ho
    • Communications for Statistical Applications and Methods
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    • v.9 no.2
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    • pp.521-531
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    • 2002
  • Various diagnostic techniques for identifying influential observations are mostly based on the deletion of a single observation. While such techniques can satisfactorily identify influential observations in many cases, they will not always be successful because of some mask effect. It is necessary, therefore, to develop techniques that examine the potentially influential effects of a subset of observations. The partial regression plots can be used to examine an influential observation for a single parameter in multiple linear regression. However, it is often desirable to detect influential observations for a subset of regression parameters when interest centers on a selected subset of independent variables. Thus, we propose a diagnostic measure which deals with detecting influential observations on a subset of regression parameters. In this paper, we propose a measure M, which can be effectively used for the detection of influential observations on a subset of regression parameters in multiple linear regression. An illustrated example is given to show how we can use the new measure M to identify influential observations on a subset of regression parameters.

Surgical Experience of Pulsed Dye Laser Using Laryngeal Mask Airway Under General Anesthesia in Glottal Papillomatosis Patient who Had Previously Failed to Undergo Surgery Under General Anesthesia Due to Impossible Laryngeal Exposure (전신 마취하 후두 노출이 되지 않았던 후두 유두종 환자에 대하여 시도한 후두 마스크 전신 마취하 Pulsed Dye Laser 수술 치험 1예)

  • Chung, Hyun-Pil;Park, Jun-Hee;Kim, Won-Sik;Choi, Hong-Shik
    • Journal of the Korean Society of Laryngology, Phoniatrics and Logopedics
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    • v.19 no.1
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    • pp.54-57
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    • 2008
  • Non-visualization of larynx is one of the reasons for failure of vocal fold surgery. Many otorhinolaryngologists may have a trouble in choice of alternative treatment if they experience this situation. The laryngeal mask airway could be alternative approach for this situation. We report a glottal papillomatous patient who was treated by pulsed dye laser via laryngeal mask airway after failure of vocal fold surgery via endotracheal intubation. The patient was a 73-year-old man. Laryngoscopy revealed a severe diffuse papillomatous lesion on right true vocal cord, anterior commissure, and partial left true vocal cord. The patient was refered for difficult laryngeal exposure during laryngomicrosurgey under general endotracheal anesthesia.

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Analysis and Implications of Korean Health Authorities' Fulfillment on World Health Organization's Recommendations for Mask Use: Focused on COVID-19 (세계보건기구의 마스크 사용 지침에 대한 한국 보건당국의 이행 분석과 함의: 코로나 바이러스 감염병을 중심으로)

  • Kim, MyungHee
    • Journal of Convergence for Information Technology
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    • v.10 no.8
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    • pp.77-86
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    • 2020
  • The study aims to analyze the compliance and non-compliance of the Korean health authorities regarding WHO's mask use recommendations following the spread of Covid-19, and to suggest the limitations and implications of the recommendations in the prevention of epidemics by deriving the causes of non-compliance with the results of alternative options. To this end, documents related to masks at home and abroad are reviewed, and WHO's mask recommendations and the Korean health authorities' mask guidelines are targeted for analysis. The analysis results are as follows. First, Korea's health authorities have basically accepted and applied WHO's "limited mask user perspective" in two recommendations. Second, Korea's health authorities have implemented differently from WHO mask recommendations due to the lack of supply and demand of masks. Third, Korea's health authorities were able to succeed in the initial prevention of Corona 19 based on the stabilization of the mask supply. Fourth, in the WHO mask recommendations, mask user restriction resulted in partial errors as a recommendation. The implication derived from the analysis is that even international recommendations based on medical evidence need to be allowed to follow autonomous guidelines according to the country's quarantine situation and competence, rather than strict adherence to international rules, in the infectious disease pandemic situation.

Identification System Based on Partial Face Feature Extraction (부분 얼굴 특징 추출에 기반한 신원 확인 시스템)

  • Choi, Sun-Hyung;Cho, Seong-Won;Chung, Sun-Tae
    • Journal of the Korean Institute of Intelligent Systems
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    • v.22 no.2
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    • pp.168-173
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    • 2012
  • This paper presents a new human identification algorithm using partial features of the uncovered portion of face when a person wears a mask. After the face area is detected, the feature is extracted from the eye area above the mask. The identification process is performed by comparing the acquired one with the registered features. For extracting features SIFT(scale invariant feature transform) algorithm is used. The extracted features are independent of brightness and size- and rotation-invariant for the image. The experiment results show the effectiveness of the suggested algorithm.

Optical encryption of multiple images using amplitude mask and 2D chaos function (진폭 마스크와 2D 카오스 함수를 이용한 다중 이미지 광학 암호화)

  • Kim, Hwal;Jeon, Sungbin;Kim, Do-Hyung;Park, No-Cheol;Park, Young-Pil
    • Transactions of the Society of Information Storage Systems
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    • v.10 no.2
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    • pp.50-54
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    • 2014
  • Object image using DRPE(Double Random Phase Encryption) in 4f system is encrypted by space-division method using amplitude mask. However, this method has the weakness for the case of having partial data of amplitude mask which can access the original image. To improve the security, we propose the method using the 2-dimension logistic chaos function which shuffles the encrypted data. It is shown in simulation results that the proposed method is highly sensitive to chaos function parameters. To properly decrypt from shuffled encryption data, below 1e-5 % errors of each parameter should be required. Thus compared with conventional method the proposed shows the higher security level.

The character classifier using circular mask dilation method (원형 마스크 팽창법에 의한 무자인식)

  • 박영석;최철용
    • Proceedings of the IEEK Conference
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    • 1998.06a
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    • pp.913-916
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    • 1998
  • In this paper, to provide the robustness of character recognition, we propose a recognition method using the dilated boundary curve feature which has the invariance characteristics for the shift, scale, and rotation changes of character pattern. And its some characteristics and effectieness are evaluated through the experiments for both the english alphabets and the numeral digits. The feature vector is represented by the fourier descriptor for a boundary curve of the dilated character pattern which is generated by the circular mask dilation method, and is used for a nearest neighbort classifier(NNC) or a nearest neighbor mean classifier(NNMC). These the processing time and the recognition rate, and take also the robustness of recognition for both some internal noise and partial corruption of an image pattern.

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Overlay And Side-lobe Suppression in AttPSM Lithography Process for An Metal Layer (AttPSM을 사용하는 Metal Layer 리토그라피공정의 Overlay와 Side-lobe현상 방지)

  • 이미영;이흥주
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.18-21
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    • 2002
  • As the mask design rules get smaller, the probability of the process failure becomes higher due to the narrow overlay margin between the contact and metal interconnect layers. To obtain the minimum process margin, a tabbing and cutting method is applied with the rule based optical proximity correction to the metal layer, so that the protection to bridge problems caused by the insufficient space margin between the metal layers can be accomplished. The side-lobe phenomenon from the attenuated phase shift mask with the tight design nile is analyzed through the aerial image simulation for test patterns with variation of the process parameters such as numerical aperture, transmission rate, and partial coherence. The corrected patterns are finally generated by the rules extracted from the side-lobe simulation.

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