• Title/Summary/Keyword: PZT Film

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Characteristics of Quasi-MFISFET Device with Various Ferroelectric Thin Films (강유전체 박막의 특성에 따른 Quasi-MFISFET 소자의 특성)

  • Lee, Guk-Pyo;Yun, Yeong-Seop;Gang, Seong-Jun
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.38 no.3
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    • pp.166-173
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    • 2001
  • Hysteresis loops of the ferroelectric thin films such as PLZT(10/30/70), PLT(10) and PZT(30/70) was simulated using the field-dependent polarization model and compared to the measured loops. In case of PZT(30/70) thin film, as the real saturation or polarization at the applied voltage or larger than 5V appears slack and its value is quite different from the simulated one, it is deduced that the ferroelectric polarization of PZT(30/70) is generated not only by the pure dipoles but also by various electric charges. The drain current of quasi-MFISFET is expressed by using the square-law FET and field-dependent polarization models. The modeling results are analogous to the experimental values. The channel of quasi-MFISFET using PZT(30/70) forms more quickly compared to that of quasi-MFISFET using PLZT(10/30/70) or PLT(10) in the state of 'write' gate voltage of -10V. This may be because the decrease rate of the polarization in the PZT(30/70) thin film is 3~4 times more rapid than that of the polarization in the PLZT(10/30/70) or the PLT(10) thin film in the retention characteristics.

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Study of Effect of PZT Thin Film Prepared in Different Post-Annealing Temperature Using SIMS (이차이온질량분석기를 이용한 PZT 박막의 후열처리 온도에 따른 특성에 관한 연구)

  • Shenteng, Shenteng;Lee, Tae-Yong;Lee, Kyung-Chun;Hur, Won-Young;Shin, Hyun-Chang;Kim, Hyun-Duk;Song, Joon-Tae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.5
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    • pp.392-397
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    • 2011
  • The effect of various post-annealing temperature to sputtered Pb(Zr,Ti)$O_3$ (PZT) thin films was investigated. The crystallization process, surface morphology and the electrical characteristics strongly depends on the rapid thermal annealing (RTA). In radio frequency (RF) sputtering methods, there were many papers mostly forcing on the crystal forming and the surface variations with different elements distribution (Pb, Ti, Zr, O) on the surface of the PZT layer. In this experiment, the post-annealing treatment promoted the Pb volatilization in PZT thin film and affected the Ti diffused throughout the Pt layer into the PZT layer. Second ion mass spectroscopy (SIMS) analysis was employed to show that the Pb element in the PZT layer was decreased at the same time the Ti element mass was slight decreased than Pb with increasing RTA temperature. That result prove the content of Pb affect the PZT thin film property.

Densification and Electrical Properties of Screen-printed PZT Thick Films (스크린 프린팅법으로 제작한 PZT 후막의 치밀화와 전기적 특성)

  • Park, Sang-Man;Lee, Sung-Gap
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.7
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    • pp.667-672
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    • 2006
  • Ferroelectric $Pb(Zr_{0.52}Ti_{0.48})O_3$ (PZT(52/48)) thick films were fabricated by the screen-Printing method on the alumina substrates, and $PbTiO_3$ (PT) Precursor solution, which prepared by sol-gel method, was spin-coated on the PZT(52/48) thick films to obtain a densification. Its structural and electrical properties of the PZT(52/48) thick films with the treatment of PT precursor solution coating were investigated. The particle size of the thick films was increased with increasing the number of coatings and the thickness of the PZT-6 (6: number of coatings) films was about $60{\mu}m$. The relative dielectric constant increased and the dielectric loss decreased with increasing the number of PT sol coatings. The relative dielectric constant and dielectric loss of the PZT-6 thick film were 475 and 2 %, respectively. The remanent polarization, coercive field and breakdown strength of the PZT-6 film were $32.6{\mu}C/cm^2$, 15 kV/cm and 60 kV/cm, respectively.

Polarized Raman Scattering Study of Highly(111)-oriented PZT Films in the Rhombohedral-Phase Field

  • 이현정;박정환;장현명
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.174-174
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    • 2003
  • Highly (111)-oriented PZT [Pb(Zrl-xTix)O3] thin films in the Zr-rich rhombohedral phase-field were successfully fabricated on Pt(111)/Ti/SiO2/Si substrates by combining PLD method with sol-gel process. These highly (111)-oriented films can be used as model systems for polarized Raman scattering study of PZT in the rhombohedral-Phase field because the (111)-direction is the principal off-center axis of the rhombohedral ferroelectricity. For this purpose, we have fabricated PZT films employing two distinctive compositions : one with Zr/Ti = 90/10 (abbreviated as PZT90/10) and the other with Zr/Ti= 60/40 (PZT60/40). The PZT90/10 film belongs to the octahedrally distorted FR(LT) phase with a cell-doubled structure, whereas the PZT60/40 is in the high-temperature FR(HT) phase-field at room temperature. To clearly separate E(TO) phonon modes from Al(TO) modes of the (111)-oriented rhombohedral film, we have suitably devised Z(X,Y)Z and Z(X,X)Z backscattering geometries for E(TO) and Al (TO), respectively. The polarized scattering experiment demonstrated that both types of (111)-oriented rhombohedral films closely followed the Raman selection rule.

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Preparation of Ferroelectric PZT Thin Film by Sol-Gel Processing; (III) Effect of Rapid Thermal Annealing on Microstructures and Dielectric Properties (솔-젤법에 의한 강유전성 PZT 박막의 제조;(III) 급속열처리방법이 미세구조 및 유전특성에 미치는 영향)

  • 김병호;박성호;김병호
    • Journal of the Korean Ceramic Society
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    • v.32 no.8
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    • pp.881-892
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    • 1995
  • Sol-Gel derived ferroelectric PZT thin films were fabricated on ITO/Glass substrate. Two kinds of rapid thermal annealing methods, R-I (six times of intermediate and final annealing) and R-II (one final annealing after six times of intermediate annealing) were used for preparation of multi-coated PZT thin films. 2500$\AA$-thick PZT thin films were obtained by the R-I and R-II methods and characterized by microstructure and dielectric properties. In case of using R-II, the microstructure was finer than that of R-I and there was no distinguishable difference in dielectric properties of PZT thin films between the R-I and R-II methods. But dielectric properties were enhanced by increasing perovskite phase fraction with increasing annealing temperature. Measured dielectric constant of PZT thin film annealed at 62$0^{\circ}C$ using the R-I method was 256 at 1kHz. Its remanant polarization (Pr) and coercive field (Ec) were 14.4$\mu$C/$\textrm{cm}^2$ and 64kV/cm, respectively.

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The Study of Characteristics Evaluation for Bimorph PZT Cantilever and its Application (바이몰프 PZT 캔틸레버 특성평가 및 응용연구)

  • 김석삼;채영훈;권현규
    • Tribology and Lubricants
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    • v.19 no.3
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    • pp.133-138
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    • 2003
  • The characteristics for bimorph PZT cantilever of laboratory-fabricated have been evaluated experimentally. The deflections of cantilever with PZT are result from a capillary force between a water drop and a tip of cantilever. The output voltage due to deflect cantilever are depend on the tip shape and thickness of cantilever. We applied a bimorph PZT cantilever to oil thickness measurement. This reasonable concept is that the output voltage be caused by different defected characteristics between oil and surface. Experimental results demonstrated that the high measurement accuracy of the oil film thickness is obtained from the probe.

Effect of Ion Damage on the Crystallization of PZT thin films (이온주입이 PZT 박막의 결정화에 미치는 영향)

  • 박응철;이장식;박정호;이병일;주승기
    • Journal of the Korean Ceramic Society
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    • v.37 no.5
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    • pp.418-424
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    • 2000
  • Effects of Ar ion damage prior to the phase transformation from pyrochlore to perovskite structure of PZT thin films have been investigated. As the degree of damage increased by increasing the acceleration voltage in the ion mass doping system, the phase transformation temperature decreased such that the temperature could be lowered down to 550$^{\circ}C$ when the film was damaged at 15 kV for 5 minutes. When the film was damaged prior to the heat treatment grain size of the perovskite thin films became less than 300${\AA}$. It turned out that relatively high value of the remanent polarization (about 30${\mu}$C/$\textrm{cm}^2$) as well as improvement of the fatigue characteristics to a large extent is closely related to the fine grain size of thus obtained PZT films.

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Ferroelectric Properties of Hetero-Junction SrBi$_2Ta_2O_9$/Pb(Zr,Ti)O$_3$ (이종접합 SrBi$_2Ta_2O_9$/Pb(Zr,Ti)O$_3$박막 케패시터의 강유전 특성)

  • 이광배;김종탁
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.04a
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    • pp.217-221
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    • 1997
  • We have investigated the ferroelectric properties of multi-layered SrBi$_2$Ta$_2$$O_{9}$Pb(Zr,Ti)O$_3$, SBT/PZT, thin film capacitors. Specimens were prepared onto Pt-coated Si wafer by sol-gel method. Ferroelectric properties of these finns could be obtained only for thin SBT layers below 50nm in thickness. The values of dielectric constant and remnant polarization depend mainly on the thickness of SBT layer, which arises from the paraelectric interface layer between SBT and PZT due to the thermal diffusion of Pb. The value of remnant poarization of PZT/SBT is greater than that of SBT, and the plarization fatigue behaviors of PZT/SBT/Pt capacitors are somewhat improved as compared with those of PZT/Pt.t.

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Fabrication and Characterizations of Thick PZT Films for Micro Piezoelectric Devices (마이크로 압전 소자용 후막 PZT의 제조 및 물성 평가)

  • 박준식;박광범;윤대원;박효덕;강성군;최태훈;이낙규;나경환
    • Transactions of Materials Processing
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    • v.11 no.7
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    • pp.569-574
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    • 2002
  • Recently, thick PZT films are required for the cases of micro piezoelectric devices with high driving force, high breakdown voltage and high sensitivity, and so on. In this work, thick PZT films were fabricated by Sol-Gel multi-coating method. Microstructures, and electrical properties of films were investigated by XRD, FESEM, impedance analyzer, and P-E hysteresis. PZT films with 2.7$mu extrm{m}$ to 4.4${\mu}{\textrm}{m}$ thickness were fabricated. Dielectric constant, loss, remnant polarization and coercive field of them were 880~1650 at 1kHz, 2~3% at 1kHz, 26~32 $\mu$C/$ extrm{cm}^2$, and 33~60kV/cm, respectively. Also a transverse piezoelectric coefficient $(e_{31,f})$ measurement system was fabricated and tested for thick film samples.

Thickness dependence of the piezoelectric characteristic for PZT films using by rf magnetron sputtering (RF 마그네트론 스퍼터링으로 증착한 두께에 따른 PZT 박막의 강유전 특성에 관한 연구)

  • Lee, Tae-Yong;Park, Young;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.313-316
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    • 2003
  • The lead zirconate titanate, $Pb(Zr_{0:52}Ti_{0:48})O_3$, films of $0.5\;{\mu}m,\;1\;{\mu}m$ and $2\;{\mu}m$ thickness were fabricated on $Pt/Ti/SiO_2/Si$ substrate by the rf magnetron sputtering method. The PZT films were annealed using by a rapid thermal annealing (RTA) method. The thickness dependence of the film structure, dielectric properties, Polarization-electric field hysteresis loops and capacitance-voltage characteristics were investigated over the thickness range of $0.5\;{\mu}m,\;1\;{\mu}m$ and $2\;{\mu}m$. According to the XRD patterns of the films, (110) peak intensity increases with film thickness increased. The increase of PZT films thickness leads to the decrease of the remanent polarization and the dielectric constant.

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