• Proceedings of the Materials Research Society of Korea Conference
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• 2009.05a
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• pp.58.1-58.1
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• 2009

나노 임프린트 리소그래피 기술은 기존의 노광 장비를 이용하는 기존의 리소그래피 공정에 비해 저렴한 공정으로 대면적 패터닝이 가능한 차세대 리소그래피 기술이다. 나노 임프린트 리소그래피는 기존의 나노 리소그래피 기술과는 다르게 기능성 무기물 물질을 직접 패터닝 할 수 있는 기술이다. 본 연구에서는 $TiO_2$ 나노 패턴을 를 기존의 증착, 리소그래피, 식각 등의 공정을 거치지 않고, sol-gel법과 나노 임프린트 리소그래피를 이용하여 직접 전사하는 기술에 대해 연구 하였다. 본 연구에서는 Tetrabutylorthotitanate를 precusor로 하는 ethanol 기반의 $TiO_2$ sol을 제작하여 이용하였다. PDMS mold를 임프린팅용 몰드로 사용하였으며, 이러한 PDMS mold는 노광 기술과 반응성 이온 식각을 이용하여 제작된 master mold로 부터 복제되었다. 제작된 sol을 Si wafer에 spin coating하여 넓게 도포한 후, wafer위에 PDMS mold를 밀착 시킨다. 이후, 5 bar의 압력과 $200^{\circ}C$의 온도에서 나노 임프린트 리소그래피 공정을 진행하여 $TiO_2$ gel 패턴을 형성한다. gel 상태의 $TiO_2$ 패턴을 anealing 공정을 통해 다결정질 TiO2 나노 패턴으로 제작하였다. 제작된 패턴을 scanning electron microscope(SEM)를 이용하여 확인하고, XRD 및 EDX를 이용하여 분석하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.376-379
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• 2003

In this paper, a novel processing technique for fabrication of high-temperature MEMS based on polymer-derived SiCN microstructures is described. PDMS molds are fabricated on SU-8 photoresist using standard UV-photolithographic processes. Liquid precursors are injected into the PDMS mold. And then, the resulting solid polymer structures are crosslinked under isostatic pressure, and pyrolyzed to form a ceramic capable of withstanding over $1500^{\circ}C$. These fabricated SiCN structures would be applied for high-temperature applications, such as heat exchanger and combustion chamber.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.41 no.6
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• pp.553-560
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• 2017

3D printing technology has been a great interest in human bio-interfaces and human-like robotics since they require arbitrary and adaptive manufacturing. This research mainly concerns the 3D fabrication of a packed biosensor using elastomeric sheets made of PDMS. It is essential to design the PDMS molding with 3D printing since, in the case of biosensors, it should not only produce a conformal shape depending on an arbitrary skin surface but also guarantee a uniform thickness distribution during solidification in the PDMS prepolymer solution. To satisfy the characteristics of the PDMS molding, such as flexibility in the de-molding and stiffness in the solidification processes, multi-materials have been selectively applied to the PDMS molding design, which has been validated with finite element analyses and compared with the 3D printed molding.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.22 no.5
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• pp.831-836
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• 2013

This study demonstrates the process of fabricating patterns using tribonanolithography (TNL),with laboratory-made micro polycrystalline diamond (PCD) tools that are attached to an atomic force microscope (AFM). The various patterns are easily fabricated using mechanical scratching, under various normal loads, using the PCD tool on single crystal silicon, which is the master mold for replication in this study. Then, polydimethylsiloxane (PDMS) replica molds are fabricated using precise pattern transfer processes. The transferred patterns show high dimensional accuracy as compared with those of TNL-processed silicon micro molds. TNL can reduce the need for high cost and complicated apparatuses required for conventional lithography methods. TNL shows great potential in that it allows for the rapid fabrication of duplicated patterns through simple mechanical micromachining on brittle sample surfaces.

• Journal of Sensor Science and Technology
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• v.28 no.4
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• pp.251-255
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• 2019

We propose a two-step lithography process to minimize edge-bead issues caused by thick photoresist (PR) coating. In the conventional PR process, the edge bead can be efficiently removed by applying an edge-bead removal (EBR) process while rotating the silicon wafer at a high speed. However, applying conventional EBR to the production of desired PR mold with unique negative patterns cannot be used because a lower rpm of spin coating and a lower temperature in the soft bake process are required. To overcome this problem, a two-step lithography process was developed in this study and applied to the fabrication of a polydimethylsiloxane (PDMS) film having super-hydrophobic characteristics. Following UV exposure with a first photomask, the exposed part of the silicon wafer was selectively removed by applying a PR developer while rotating at a low rpm. Then, unique PR mold structures were prepared by employing an additional under-exposure process with a second mask, and the mold patterns were transferred to the PDMS. Results showed that the fabricated PDMS film based on the two-step lithography process reduced the height difference from 23% to 5%. In addition, the water contact angle was greatly improved by spraying of hydrophobic nanosilica on the dual-scaled PDMS surface.

• Korean Chemical Engineering Research
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• v.59 no.1
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• pp.100-105
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• 2021

This paper proposes the polydimethylsiloxane (PDMS) blade coating method for fabrication of paper-based analytical device (PAD) that is able to monitor the disease diagnosis and progress without special analytical equipment. The mold that has PAD design is easily modified by using laser cutting technique. And the fabricated mold is used for hydrophobic barrier formation by blade coating. We have optimized the stable formation of PDMS hydrophobic barrier as blade coating condition, which is established by analyzing the structure of the PDMS hydrophobic barrier and change of hydrophilic channel size as thickness of the ink and contact time with the chromatography paper. Based on optimal condition, we demonstrate that PAD as biosensor can apply to detect protein, glucose, and metal ion without special analysis equipment.

• Journal of the Korean Society for Precision Engineering
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• v.30 no.2
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• pp.236-240
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• 2013

In this presentation, we propose a fabrication method of PDMS stencil to apply into a localized culture of NIH/3T3 cells. PDMS stencil was fabricated by nitrogen gas blowing and soft lithography from preparing SU-8 master mold by photolithography. PDMS stencil pattern was production of the circle size 20 to $500{\mu}m$. In the culture test of PDMS stencil, a stencil was placed on a glass disk. The NIH/3T3 cells were successfully cultured into micropatterns by using the PDMS stencil. The results showed that cells could be cultured into micropatterns with precisely controlled manner at any shapes and specific size for bioscience study and bioengineering applications.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.411-411
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• 2012

Over the recent years, surface enhanced Raman spectroscopy (SERS) has dramatically grown as a label-free detecting technique with the high level of selectivity and sensitivity. Conventional SERS-active nanostructured layers have been deposited or patterned on rigid substrates such as silicon wafers and glass slides. Such devices fabricated on a flexible platform may offer additional functionalities and potential applications. For example, flexible SERS-active substrates can be integrated into microfluidic diagnostic devices with round-shaped micro-channel, which has large surface area compared to the area of flat SERS-active substrates so that we may anticipate high sensitivity in a conformable device form. We demonstrate fabrication of flexible SERS-active nanostructured substrates based on soft-lithography for simple, low-cost processing. The SERS-active nanostructured substrates are fabricated using conventional Si fabrication process and inkjet printing methods. A Si mold is patterned by photolithography with an average height of 700 nm and an average pitch of 200 nm. Polydimethylsiloxane (PDMS), a mixture of Sylgard 184 elastomer and curing agnet (wt/wt = 10:1), is poured onto the mold that is coated with trichlorosilane for separating the PDMS easily from the mold. Then, the nano-pattern is transferred to the thin PDMS substrates. The soft lithographic methods enable the SERS-active nanostructured substrates to be repeatedly replicated. Silver layer is physically deposited on the PDMS. Then, gold nanoparticle (AuNP) inks are applied on the nanostructured PDMS using inkjet printer (Dimatix DMP 2831) to deposit AuNPs on the substrates. The characteristics of SERS-active substrates are measured; topology is provided by atomic force microscope (AFM, Park Systems XE-100) and Raman spectra are collected by Raman spectroscopy (Horiba LabRAM ARAMIS Spectrometer). We anticipate that the results may open up various possibilities of applying flexible platform to highly sensitive Raman detection.

• Journal of Sensor Science and Technology
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• v.15 no.5
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• pp.357-361
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• 2006

This paper reports a new technology to implement complex PDMS microchannels, which are simply constructed using three-dimensional photoresist structures as mold for PDMS replica process. The process utilizes LOR resist as a sacrificial layer to levitate the structural photoresist and multi-step exposure to control the thicknesses of photoresist structures. Various shapes of photoresist structures were successfully fabricated. Using the PDMS replica method, the three-dimensional photoresist structures are demonstrated to be applicable for implementing complex microchannels in PDMS. In addition, more complex multilevel microchannels are constructed by bonding two PDMS layers with just single PDMS alignment.

• Journal of Powder Materials
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• v.14 no.3 s.62
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• pp.202-207
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• 2007

Novel polymer mold process for fabrication of microcomponents using metal nanopowders was developed and experimentally optimized. Polymer mold for forming green components was produced by using a hard master mold and polydimethylsiloxane (PDMS). In the preparation of metallic powder premix for the green components without any defect, 90 wt.% 17-4PH statinless steel nanopowders and 10 wt.% organic binder were mixed by a ball milling process. The green components with very clear gear shape were formed by filling the powder premix into the PDMS soft mold in surrounding at about $100^{\circ}C$. Cold isostatic pressing (CIP) was very potent process to decrease a porosity in the sintered microcomponent. The microgear fabricated by the improved process showed a good dimension tolerance of about 1.2%.