• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.418-419
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• 2013

현재, 인듐 주석 산화물(indium tin oxide, ITO) 박막은 가시영역에서 전기적 특성 및 광학적 특성이 우수하기 때문에 평면 디스플레이(flat displays), 박막 트랜지스터(thin film transistors), 태양전지(solar cells) 등을 포함한 광소자에 투명전도성산화물(transparent conducting oxide, TCO) 전극으로 가장 일반적으로 사용되고 있다. 하지만, 이 물질은 밴드갭이 3.4 eV로 다소 작아 다양한 분야의 의료기기, 환경 보호에 응용 가능한 자외선 영역에서 상당히 많은 양의 광흡수가 발생하는 치명적인 문제점을 가지고 있다. 또한, 인듐(Indium)의 급속한 소비는 인듐의 매장량의 한계로 인해 가격을 상승시키는 주요한 원인으로 작용하고 있다. 한편, InGaN 기반의 자외선 발광다이오드 분야에서는 팔라듐(Pd) 기반의 반투명 전극과 은(Ag) 기반의 반사전극을 주로 사용하고 있지만, 낮은 투과도와 낮은 굴절률을 때문에 여전히 자외선 발광다이오드의 광추출 효율(extraction efficiency)에 문제점을 가지고 있다. 따라서 자외선 발광다이오드의 외부양자 효율(external quantum efficiency, EQE)을 높이기 위해 높은 투과도와 GaN와 유사한 굴절률을 가지는 p-형 오믹 전극을 개발해야 한다. 본 연구에서는 초박막의 ITO (16 nm)/Ag (7 nm)/ITO (16 nm) 다층 구조를 갖는 투명전도성 전극을 제작한 후, 열처리 온도에 따른 전기, 광학적 특성에 향상에 대해서 조사하였다. 사용된 산화물/금속/산화물 전극의 구조는 유기발광 다이오드(organic light emitting diode, OLED), 태양전지 등에 많이 사용되는 안정적인 투명 전극을 자외선 LED 소자에 처음 적용하여, ITO의 전체 사용량은 줄이고, ITO 사이에 금속을 삽임함으로써 금속에 의한 전기적 특성 향상과 플라즈몬 효과에 의한 투과도를 높일 수 있는 장점을 가지고 있다. 실험 결과로는, $400^{\circ}C$에서 열처리한 ITO/Ag/ITO 다층 구조는 365 nm에서 84%의 광학적 특성과 9.644 omh/sq의 전기적 특성을 확인하였다. 실험 결과로부터 좀 더 최적화를 수행하면, ITO/Ag/ITO 다층 구조는 자외선 발광다이오드의 투명전도성 전극으로 사용될 수 있을 것이라 기대된다.

• Bulletin of the Korean Chemical Society
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• v.32 no.9
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• pp.3290-3294
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• 2011

The properties of monomeric and dimeric salen-aluminum complexes, [salen(3,5-$^tBu)_2$Al(OR)], R = $OC_6H_4-p-C_6H_6$ (H1) and R = [salen(3,5-$^tBu$)AlOPh]C$(CH_3)_2$ (H2) (salen = N,N'-bis-(salicylidene)-ethylenediamine) as host layer materials in red phosphorescent organic light-emitting diodes (PhOLEDs) were investigated. H1 and H2 exhibit high thermal stability with decomposition temperature of 330 and $370^{\circ}C$. DSC analyses showed that the complexes form amorphous glasses upon cooling of melt samples with glass transition temperatures of 112 and $172^{\circ}C$. The HOMO (ca. -5.2~-5.3 eV) and LUMO (ca. -2.3~-2.4 eV) levels with a triplet energy of ca. 1.92 eV suggest that H1 and H2 are suitable for a host material for red emitters. The PhOLED devices based on H1 and H2 doped with a red emitter, $Ir(btp)_2$(acac) (btp = bis(2-(2'-benzothienyl)-pyridinato-N,$C^3$; acac = acetylacetonate) were fabricated by vacuum-deposition and solution process, respectively. The device based on vacuum-deposited H1 host displays high device performances in terms of brightness, luminous and quantum efficiencies comparable to those of the device based on a CBP (4,4'-bis(Ncarbazolyl) biphenyl) host while the solution-processed device with H2 host shows poor performance.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.37 no.6
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• pp.17-23
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• 2000

In this study, we prepared red organic light-emitting-diode(OLED) with a fluorescent dye(Sq)-doped and inserted between emission and cathode layer 1,3-bis(5-p-t-butylphenyl)-1,3,4-oxadiazol-2-yl)benzene (OXD7) or/and tris(8-hydroxyquinoline) aluminum ($Alq_3$) layers for increasing electroluminescent(EL) efficiency. This inserting effect has been observed and EL mechanism characteristics have been examined. The hole transfer layer is a N,N'-diphenyl-N,N'-bis-(3-methyl phenyl)-1,1'-diphenyl-4,4'-diamine (TPD), and the host and guest materials of emission layer is $Alq_3$ and bis[1-methyl-3,3'-dimethyl-2-indorindiylmethyl] squaraine (Sq), respectively. For the inserting of $Alq_3$, emission efficiency increased. But we can not obtained highly pure red emission owing to the emission of inserting $Alq_3$ layer. The inserting of OXD7 makes hole block and accumulate. Because of increasing recombination probability of electron and hole, highly pure red color can be held. Simultaneously brightness characteristics and emission efficiency could improve.

• Laser Solutions
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• v.14 no.2
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• pp.17-23
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• 2011

Active thin films are ubiquitous in the manufacture of all forms of flat panel display (FPD). One of the most widely employed thin films is indium tin oxide (ITO) and metal films used electrically conductive materials in display industries. ITO is widely used for fabrication of LCD, OLED device, and many kinds of optical applications because of transparency in visible range and its high conductivity and metal films are also widely employed as electrodes in various electric and display industries. It is important that removing specific area of layer, such as ITO or metal film on substrate, to fabricate and repair electrode in display industries. In this work, we demonstrate efficient selective ablation process to ITO and aluminum film on glass using a femtosecond laser (${\lambda}p=1025nm$) respectively. The femtosecond laser with wavelength of 1025nm, pulse duration of 400fs, and the repetition rate of 100kHz was used for selectively removing ITO and Al on glass in the air. We can successfully remove the ITO and Al films with various pulse energies using a femtosecond laser.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.207-207
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• 2011

Amorphous transparent oxide semiconductors (a-TOS) have been widely studied for many optoelectronic devices such as AM-OLED (active-matrix organic light emitting diodes). Recently, Nomura et al. demonstrated high performance amorphous IGZO (In-Ga-Zn-O) TFTs.1 Despite the amorphous structure, due to the conduction band minimum (CBM) that made of spherically extended s-orbitals of the constituent metals, an a-IGZO TFT shows high mobility.2,3 But IGZO films contain high cost rare metals. Therefore, we need to investigate the alternatives. Because Aluminum has a high bond enthalpy with oxygen atom and Alumina has a high lattice energy, we try to replace Gallium with Aluminum that is high reserve low cost material. In this study, we focused on the electrical properties of IZO:Al thin films as a channel layer of TFTs. IZO:Al were deposited on unheated non-alkali glass substrates (5 cm ${\times}$ 5 cm) by magnetron co-sputtering system with two cathodes equipped with IZO target and Al target, respectively. The sintered ceramic IZO disc (3 inch ${\phi}$, 5 mm t) and metal Al target (3 inch ${\phi}$, 5 mm t) are used for deposition. The O2 gas was used as the reactive gas to control carrier concentration and mobility. Deposition was carried out under various sputtering conditions to investigate the effect of sputtering process on the characteristics of IZO:Al thin films. Correlation between sputtering factors and electronic properties of the film will be discussed in detail.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.475-475
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• 2012

백색 유기발광소자는 매우 얇고, 가볍고, 저전력 구동이 가능하다는 점에서 전색 디스플레이나 조명 시장에서 많은 관심을 끌고 있다. 고효율을 가진 백색 유기발광소자의 제작을 위해서는 일반적으로 쉐도우 마스크를 사용하여 발광 패턴을 만들기 때문에 제작 비용이 비싸다는 단점을 가진다. 본 논문에서는 제작 공정이 간단하고, 저비용의 장점을 가지는 용액 공정을 사용하여 나노 구멍 구조를 가지는 적색 고분자와 청색 저분자의 혼합 발광층으로 백색 유기발광소자를 제작하였다. 이 나노 구멍 구조를 가지는 poly[2-methoxy, 5-(2'-ethyl-hexyloxy)-p-phenylene vinylene] (MEH-PPV)/ 2-methyl-9,10-di(2-naphthyl)anthracene (MADN) 혼합 발광층의 전기적, 광학적 특성을 분석하기 위하여 MEH-PPV/MADN 적층 구조를 가지는 백색 유기발광소자를 제작하여 비교, 분석하였다. 나노 구멍 구조를 가지는 혼합 발광층의 발광 스펙트럼에서 적층 구조보다 청색 파장대의 빛의 비율을 높일 수 있었다. 그 이유는 나노 구멍 구조를 가지는 혼합 발광층에서 정공수송층인 poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) (PEDOT:PSS) 층과 청색 발광층 사이의 일부분 접합부분의 정공 주입 때문이다. 또한, 혼합 발광층을 가진 백색 유기발광소자의 전류 밀도와 휘도는 구멍을 가진 MEH-PPV 층 때문에 상당히 증가하는 것을 알 수 있다. 혼합 발광층을 가진 백색 유기발광소자의 적색과 청색의 균형은 나노 구멍의 크기를 통해서 조절이 가능하고, 색 안정성은 정공 주입층과 청색 발광층 사이의 직접 접촉에 의한 구동 전압의 변화를 따라 증가시킬 수 있었다. 그 결과, 혼합 발광층을 가지는 백색 유기발광소자에서 적색과 청색 발광층의 발광 균형은 스핀 코팅 속도가 3,000 rpm일 때, 최적의 결과를 나타내었다. 이러한 실험 결과들은 저분자/고분자로 이루어진 혼합 발광층을 가진 백색 유기발광소자에서의 전자와 정공의 전달 및 발광 메커니즘을 분석할 수 있었다.

• Korean Journal of Materials Research
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• v.15 no.8
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• pp.543-547
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• 2005

Organic electroluminescence devices were made from 1,4-bis-(9-anthrylvinyl)benzene (AVB) and 1,4-bis-(9-aminoanthryl)benzene (AAB) anthracene derivatives. Device structure was ITO/AVB/PANI(EB)/Al (multi-layer device) and ITO/AAB:DCM/Al(single-layer device). In these devices, AVB, polyaniline(emeraldine base) (PANI(EB)) and AAB were used as the emitting material. 4-(dicyanomethylene)-2-methyl-6-p-(dimethylamino)styryl-4H -pyran(DCM) was used as red fluorescent dopant. We studied change of fluorescence wavelength with concentration of DCM doped in AAB. The ionization potential (IP) and optical band gap (Eg) were measured by cyclic voltammetry and UV-visible spectrum. We compared with difference of emitting wavelength between photoluminescence and electroluminescence spectrum. In case of the multi-layer device, PANI and AVB EL spectra have similar wave pattern to each PL spectrum and when PAM and AVB were used at the same time, and multi-layer device showed that a balanced recombination and radiation kom PANI and AVB. In case of the single-layer device, with the increase of DCM concentration, the blue emission decreases and red emission increases. This indicates that DCM was excited by the energy transfer from AAB to DCM or the direct recombination at the dopant sites due to carrier trapping, or both. The device with $1.0wt\%$ DCM concentration gave white light.

• Journal of the Korean Vacuum Society
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• v.19 no.2
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• pp.148-154
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• 2010

We have fabricated $SiO_2$ oxidation thin films by TCP-CVD (transformer coupled plasma chemical vapor deposition) method for passivation layer of OLED (organic light emitting diode). The purpose of this paper is to control and estimate the deposition rate and refracive index characteristics with process parameters. They are power, gas condition, distance of source and substrate and process temperature. The results show that transmittance of thin films is over 90%, rapid deposition rate and stable reflective index from 1.4 to 1.5 at controled process conditions. They are $SiH_4$ : $O_2$ = 30 : 60 [sccm] gas condition, 70 [mm] distance of source and substrate, no-biased substrate and under 80 [$^{\circ}C$] process temperature.