• 공업화학
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• 제22권3호
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• pp.261-265
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• 2011

아르곤과 산소 대기압 플라즈마를 이용한 미생물인 E. coli의 살균효과를 분석하였다. 유전체 격막 방전 형태의 플라즈마 반응기는 아르곤과 산소 혼합기체에서 균일한 플라즈마 방전과 오존 생성에 효과적이었다. 직접적인 대기압 플라즈마 조사에 따른 E. coli의 살균처리 공정에서 산소에 대한 혼합비와 인가전력의 증가는 방전기체의 오존 발생농도를 높여 미생물의 살균효과를 증가시켰다. 반응기와 시료와의 거리는 살균효과를 증가하기 위하여 가급적 작게 하는 것이 효율적이었다. 본 연구를 통하여 대기압 플라즈마는 오존과 같은 산화촉진제의 발생으로 저온에서 E. coli와 같은 미생물을 효과적으로 살균할 수 있어 기존의 살균법을 대체 할 수 있는 차세대 살균기술로서의 개발 가능성을 확인 할 수 있었다.

• Biomolecules & Therapeutics
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• 제22권6호
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• pp.477-490
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• 2014

Non-thermal atmospheric-pressure plasma, also named cold plasma, is defined as a partly ionized gas. Therefore, it cannot be equated with plasma from blood; it is not biological in nature. Non-thermal atmospheric-pressure plasma is a new innovative approach in medicine not only for the treatment of wounds, but with a wide-range of other applications, as e.g. topical treatment of other skin diseases with microbial involvement or treatment of cancer diseases. This review emphasizes plasma effects on wound healing. Non-thermal atmospheric-pressure plasma can support wound healing by its antiseptic effects, by stimulation of proliferation and migration of wound relating skin cells, by activation or inhibition of integrin receptors on the cell surface or by its pro-angiogenic effect. We summarize the effects of plasma on eukaryotic cells, especially on keratinocytes in terms of viability, proliferation, DNA, adhesion molecules and angiogenesis together with the role of reactive oxygen species and other components of plasma. The outcome of first clinical trials regarding wound healing is pointed out.

• Korean Chemical Engineering Research
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• 제49권6호
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• pp.835-839
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• 2011

토치형 상압 플라즈마 반응기를 통한 방전 및 플라즈마 flame에 대한 분석과 발생된 플라즈마 현상을 이용하여 E. coli에 대한 살균효과를 측정하였다. 상압 플라즈마 반응기를 통해 나오는 플라즈마 flame의 길이는 입력전압, 반응기의 유량 그리고 아르곤/산소 혼합기체에서의 산소비율에 영향을 크게 받았다. 플라즈마 flame에 의한 가열효과는 10분 조사 후에도 $43^{\circ}C$ 미만으로 저온처리가 가능했다. E. coli에 대한 살균처리에서 입력전압의 증가, 아르곤/산소 혼합기체에서의 산소비율 증가 그리고 플라즈마 flame에 대한 노출시간의 증가에 따라 전체적인 살균효과를 향상되었다. 플라즈마 처리 시에 오존농도가 높은 공정조건에서 플라즈마 flame의 직접적인 접촉시간을 증가시키면 살균효과를 극대화할 수 있다.

• 한국환경과학회지
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• 제22권12호
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• pp.1561-1569
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• 2013

This study carried out a laboratory scale plasma reactor about the characteristics of chemically oxidative species (${\cdot}OH$, $H_2O_2$ and $O_3$) produced in dielectric barrier discharge plasma. It was studied the influence of various parameters such as gas type, $1^{st}$ voltage, oxygen flow rate, electric conductivity and pH of solution for the generation of the oxidant. $H_2O_2$ and $O_3$.) $H_2O_2$ and $O_3$ was measured by direct assay using absorption spectrophotometry. OH radical was measured indirectly by measuring the degradation of the RNO (N-Dimethyl-4-nitrosoaniline, indicator of the generation of OH radical). The experimental results showed that the effect of influent gases on RNO degradation was ranked in the following order: oxygen > air >> argon. The optimum $1^{st}$ voltage for RNO degradation were 90 V. As the increased of $1^{st}$ voltage, generated $H_2O_2$ and $O_3$ concentration were increased. The intensity of the UV light emitted from oxygen-plasma discharge was lower than that of the sun light. The generated hydrogen peroxide concentration and ozone concentration was not high. Therefore it is suggested that the main mechanism of oxidation of the oxygen-plasma process is OH radical. The conductivity of the solution did not affected the generation of oxidative species. The higher pH, the lower $H_2O_2$ and $O_3$ generation were observed. However, RNO degradation was not varied with the change of the solution pH.

• 접착 및 계면
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• 제23권4호
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• pp.122-129
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• 2022

본 연구에서는 산소 플라즈마 처리시간을 실험 변수로 하여 금속섬유를 처리한 후 섬유표면에 산소함유 기능성 관능기를 도입하여 금속섬유의 친수성을 향상시키기 위한 연구로 플라즈마 처리 전, 후의 표면 특성 변화를 scanning electron microscope (SEM)과 x-ray photoelectron spectroscopy (XPS)를 사용하여 관찰하였다. 또한 플라즈마 처리시간이 금속섬유의 표면에 미치는 영향을 관찰하기 위해 극성 용매와 비극성 용매에 대한 금속섬유의 접촉각 변화를 측정하였다. 측정된 접촉각을 이용해 표면 자유에너지 변화를 계산한 후 산소 플라즈마 처리 전, 후의 금속섬유에 대한 접촉각과 표면 자유에너지를 비교하였으며 접착일과의 상관관계도 고찰하였다. 이런 금속섬유의 표면 변화가 다른 소재와의 복합 시 계면에서의 전단강도 향상에 미치는 영향을 알아보기 위해 microdroplet 시편을 제조하여 계면 전단강도를 측정하였으며 접착일과의 상관관계도 함께 파악하였다. 따라서, 금속섬유의 산소플라즈마 처리는 섬유표면에 물리적인 표면적 증가로 인한 수지와의 접촉면의 증가와 표면의 산소함유 기능성 관능기의 도입에 따른 접촉각, 표면 에너지의 변화에 따른 표면 친수화로 고분자 수지와의 계면 전단강도를 향상시켜주는 결과를 얻었다.

• 한국연소학회:학술대회논문집
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• 한국연소학회 2014년도 제49회 KOSCO SYMPOSIUM 초록집
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• pp.195-198
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• 2014

$Fuel/N_2$ and fuel/air mixtures were treated with non-thermal DBD plasma and the changes in characteristics of laminar diffusion flame have been observed. Flame of $Fuel/N_2$ mixture generated more soot under plasma condition while less amount of soot was formed from fuel/air mixture flame. Luminescence spectrum and gas chromatography results confirmed that plasma energy converts a fraction of fuel molecules into radicals, which then form $C_2$, $C_3$, $C_4$ and higher hydrocarbon under no oxygen condition or turn into CO, $CO_2$ and $H_2O$ when oxygen is present.

• 한국전기전자재료학회논문지
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• 제18권5호
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• pp.450-456
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• 2005

In this paper, the effect of adhesion properties of semiconductive-insulating interface layer of silicone rubber on electrical properties was investigated. The modifications produced on the silicone surface by oxygen plasma were accessed using ATR-FTIR, contact angle and Surface Roughness Tester. Adhesion was obtained from T-peel tests of semiconductive layer haying different treatment durations. In addition, ac breakdown test was carried out for elucidating the change of electrical property with duration of plasma treatment. From the results, the treatment in the oxygen plasma produced a noticeable increase in surface energy, which can be mainly ascribed to the creation of O-H and C=O. It is observed that adhesion performance was determined by surface energy and roughness level of silicone surface. It is found that at dielectric strength was increased with improving the adhesion between the semiconductive and insulating interface.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2013년도 춘계학술대회 논문집
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• pp.170-170
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• 2013

We present a novel etching technique for 2-dimentional (2-D) hexagonal boron nitride (h-BN) by using capacitively coupled plasma (CCP) of oxygen combined with a post-treatment by de-ionized (DI) water. Oxygen CCP etching process for h-BN has been systematically studied. It is found that a passivation layer was generated to obstruct further etching while it can be easily and radically removed by DI water. An essential cleaning effect also has been observed in the etching process, organic residues are successfully removed and the surface roughness has much decreased. Considering h-BN is the most important 2-D dielectric material and its potential application for graphene to silicon-based electronic devices, such an etching method can be widely used to control the 2-D h-BN thickness and improve the surface quality.

• 한국표면공학회지
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• 제29권6호
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• pp.773-780
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• 1996

Silicon oxide films were prepared by using five kinds of organosilicon compound as gas sources without oxygen by rf plasma-enhanced CVD (PECVD). UV light was irradiated on a substrate vertically during deposition to enhance film oxidation and ablation of carbon contamination in a deposited films. Films prepared with UV irradiation contained less carbon than those prepared without UV irradiation. The oxidation of the films was improved by UN irradiation. The effect of UV irradiation was, however, not observed when the films were prepared with tetramethy lsilane (TMS) which contained no oxygen atom. Dissociated oxygen atoms from an organosilicon compound were excited in the plasma with UV irradiation around the substrate surface and affected the enhancement of film oxidation and ablation of carbon in the films.

• 조명전기설비학회논문지
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• 제25권10호
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• pp.116-124
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• 2011

In this work, the effect of the initial concentration of methanol and ethanol, and the addition of oxygen molecules were discussed to improve the hydrogen generation using non-thermal plasma reactor effectively. In addition, the effect of ozone decomposition catalyst of manganese dioxide and its quantity was investigated. First, hydrogen concentration increased until an initial concentration of about 40,000[ppm] of methanol and thereafter it was saturated. Henceforth, hydrogen concentration decreased with increasing the oxygen percent on the carrier gas of nitrogen about both substances. Related with the effect of catalyst, it increased upto 60[g], but it was not changed largely after that. Consequently, it is confirmed that the hybrid process using plasma process and catalytic surface chemical reaction is a very promising way to increase the efficiency of hydrogen generation as investigated in this work.