• 마이크로전자및패키징학회지
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• 제12권4호통권37호
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• pp.339-343
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• 2005

Pt-$SrBi_2Nb_2O_9(SBN)-Pt-Y_2O_3-Si$ 게이트 전계효과 트랜지스터 (MFMISFETs)의 정보저장 특성향상을 위하여 SBN 박막을 산소 플라즈마 내에서 급속열처리 하였다. 그 결과 SBN 박막의 결정크기는 $700^{\circ}C$의 동일한 열처리조건에서 급속열처리한 SBN 결정립의 크기가 전기로 열처리에 의한 SBN 결정립보다 4배 이상 성장하였다. 또한 분극 특성을 비교한 결과 잔류분극은 2배이상 급속열처리 방법으로 제조된 SBN 박막을 이용한 MFMISFET의 메모리윈도우 (memory window)와 on/off상태의 정보저장특성(programming characteristics)은 월등히 향상되었다.

• 약학회지
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• 제52권6호
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• pp.441-445
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• 2008

To investigate effect of caffeic acid on the intracellular reactive oxygen species production, we used DHE for intracellular superoxide anion production, DCF for intracellular ${H_2}{O_2}$ production and DHR for intracellular hydroperoxide production in Raw 264.7 cells. DPPH assay showed that antioxidant activity of caffeic acid with 39.5 ${\mu}M$ of ${IC}_{50}$ values was similar to that of ascorbic acid with 41.3 ${\mu}M$ of ${IC}_{50}$ values. Caffeic acid dose-dependently inhibited silica-induced ${H_2}{O_2}$ and hydroperoxide production but did not affect superoxide anion production in Raw 264.7 cells, which suggest that antioxidant effect of caffeic acid acts on the post-step of superoxide anion. On the other hand, caffeic acid showed a potent antioxidant effect in $lCuSO_4$-induced lipid peroxidation. Furthermore, plasma superoxide dismutase activity (3.43${\pm}$0.23 U/ml) in 10 mg/kg caffeic acid-fed mice was significantly higher than that (2.32${\pm}$0.24 U/ml) of control. From the above results, it is referred that caffeic acid appears to have potent anti-oxidant activity in both cell system and in vivo system.

• Journal of Pharmaceutical Investigation
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• 제25권4호
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• pp.313-322
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• 1995

The covalent conjugation of human recombinant superoxide dismutase (hrSOD) with trichloros-triazine activated polyethylene glycol (PEG) 5000 formed soluble conjugates with molecular weight of 92KD, which retained $90{\sim}98%$ of original activity with a markedly prolonged plasma half-life of enzyme activity. The effect of hrSOD-PEG conjugates on acetaminophen (ACP)-induced hepatotoxicity was tested in male rats which were pretreated with 3-methylcholanthrene. HrSOD-PEG conjugates inhibited the hepatotoxicity produced by ACP, on the other hand, native hrSOD had no protective effect. The above results indicated that oxygen radicals might participate in the mechanism of the ACP-induced hepatotoxicity and that polymer conjugated-protein drugs with prolonged half-lives could be employed as an effective therapeutic agent.

• 센서학회지
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• 제31권4호
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• pp.214-217
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• 2022

The effect of inductively coupled plasma (ICP) treatment with O₂ gas on the surface properties of poly(ether sulfone) (PES) was investigated. X-ray photoelectron spectroscopy (XPS) was used to analyze the chemical characteristics of the O₂ plasma-treated PES films. The surface roughness of the pristine and O₂ plasma-treated PES films for different RF powers of the ICP was determined using an atomic force microscope (AFM). The contact angles of the PES films were also measured, using which the surface free energies were calculated. The O1s XPS spectra of the PES films revealed that the number of polar functional groups increased following the O₂ plasma treatment. The AFM analysis showed the average surface roughness increased from 1.01 to 4.48 nm as the RF power of the ICP was increased. The contact angle measurements revealed that the PES films became more hydrophilic as the RF power of the ICP was increased. The total surface energy increased with the RF power of the ICP, resulting from the increased polar energy component.

• 한국진공학회지
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• 제9권1호
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• pp.36-41
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• 2000

$SnO-2$ thin films for thin film secondary battery anode were deposited n glass substrate with stain-less steel collector and charge/discharge experiments were conducted to investigate feasibility of $SnO-2$ thin film as a new anode material. The as-deposited films were pure $SnO-2$ phase which is not related to deposition condition. The grain size on the surface of as-deposited films increased with increase of oxygen partial pressure. However, the grain size did not show any change above oxygen partial pressure of 80:20. The surface roughness of the as-deposited films increased after decreasing because of resputtering effect of oxygen negative ion in plasma. All films showed typical $SnO-2$ anode characteristics which has a side effect at the first cycle, which is not related to the deposition condition. The charge/discharge experiments of 200cycles indicated that capacity of $SnO-2$ films depended on oxygen contents and surface roughness. The cycle characteristics was determined by initial charge/discharge reaction. The $SnO-2$ film with low initial capacity showed more stable cycle characteristics than film with high initial capacity.

• Journal of Animal Science and Technology
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• 제54권3호
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• pp.191-198
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• 2012

The objective of this study was to evaluate the potential use of a dielectric barrier discharge (DBD) plasma system to improve microbial safety of sliced cheese. The atmospheric pressure plasma (APP) effect on visual appearance and a sensory evaluation were also carried out. The number of Escherichia coli inoculated on cheese slices decreased by 0.09, 0.47, 1.16 and 1.47 log cycles with helium (4 liters/min [lpm]) and 0.05, 0.87, 1.89 and 1.98 log cycles with He/$O_2$ mixture (4 lpm/15 standard cubic centimeters per minute), after being treated with plasma for 1, 5, 10, and 15 min, respectively. Significant reductions were also observed in Staphylococcus aureus inoculated onto cheese slices ranging from 0.05 to 0.45 log cycles with He and from 0.08 to 0.91 log cycles with He/$O_2$-treated samples, respectively. Adding oxygen resulted in a significant increase in inactivation of both pathogens. No visible change in the plasma-treated cheese slices was observed even though the instrumental analysis showed a significant decrease in the $L^*$-value and an increase in the $b^*$-value. The cheese slices were damaged after 10 and 15 min of plasma treatment. In addition, significant reductions in sensory quality including flavor, odor, and acceptability of plasma-treated cheese slices were observed. The results indicate that the DBD plasma system has potential for use in sanitizing food products, although the effect was limited. Further development of the APP system is necessary for industrial use.

• Fibers and Polymers
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• 제6권2호
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• pp.169-173
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• 2005

Low temperature plasma (LTP) treatment was applied to wool fabric with the use of a non-polymerizing gas, namely oxygen. After the LTP treatment, the fabric properties including low-stress mechanical properties, air permeability and thermal properties, were evaluated. The low-stress mechanical properties were evaluated by means of Kawabata Evaluation System Fabric (KES-F) revealing that the tensile, shearing, bending, compression and surface properties were altered after the LTP treatment. The changes in these properties are believed to be related closely to the inter-fiber and inter-yam frictional force induced by the LTP. The decrease in the air permeability of the LTP-treated wool fabric was found to be probably due to the plasma action effect on increasing in the fabric thickness and a change in fabric surface morphology. The change in the thermal properties of the LTP-treated wool fabric was in good agreement with the above findings and can be attributed to the amount of air trapped between the yams and fibers. This study suggested that the LTP treatment can influence the final properties of the wool fabric.

• 한국세라믹학회지
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• 제42권2호
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• pp.94-98
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• 2005

[ $RuO_2$ ]는 DRAM과 FRAM소자에서 고유전 capacitors의 저전극물질로서 폭넓게 연구되고 있다. 본 연구에서는 XRD, SEM, AFM 분석 등을 통하여 금속유기 화학 증착법(MOCVD)으로 $RuO_2$ 증착시 핵생성에 영향을 미치는 수소, 산소, 아르곤 ECR플라즈마 전처리 효과를 조사하였으며, 아르곤 ECR플라즈마 전처리의 경우 가장 높은 핵생성 밀도를 나타내었다. ECR 플라즈마 전처리를 통한 $RuO_2$의 핵생성 향상 메카니즘은 아르곤이나 수소 ECR 플라즈마는 TiN막 표면의 질소나 산소원자를 제거하고 따라서 TiN막 표면은 Ti-rich TiN으로 바뀌게 되는 것이다.

• 한국표면공학회지
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• 제36권1호
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• pp.14-21
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• 2003

Thin films of ZrO$_2$ and TiO$_2$ were deposited on Si(100) substrates using RF magnetron sputtering technique. To study an influence of the sputtering parameters, systematic experiments were carried out in this work. XRD data show that the $ZrO_2$ films were mainly grown in the [111] orientation at the annealing temperature between 800 and $1000^{\circ}C$ while the crystal growth direction was changed to be [012] at above $1000^{\circ}C$. FT-IR spectra show that the oxygen stretching peaks become strong due to $SiO_2$ layer formation between film layers and silicon surface after annealing, and proved that a diffusion caused by either oxygen atoms of $ZrO_2$ layers or air into the interface during annealing. Different crystal growth directions were observed with the various deposition parameters such as annealing temperature, RF power magnitude, and added $O_2$ amounts. The growth rate of $TiO_2$ thin films was increased with RF power magnitude up to 150 watt, and was then decreased due to a sputtering effect. The maximum growth rate observed at 150 watt was 1500 nm/hr. Highly oriented, crack-free, stoichiometric polycrystalline $TiO_2$<110> thin film with Rutile phase was obtained after annealing at $1000^{\circ}C$ for 1 hour.

• 한국전기전자재료학회논문지
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• 제19권1호
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• pp.87-90
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• 2006

In case of preparation of ITO thin film for using top electrode of Top-emitting Organic Light Emitting Diodes(TOLEDs), the ITO thin film should be prepared at room temperature and low oxygen gas flow condition in order to reduced the damage of organic layer due to the bombardment of highly energetic particles such as negative oxygen ions which accrued from the plasma. In this study, the ITO thin film with high optical transmittance and low resistivity prepared as a function of oxygen gas (0 ${\~}$ 0.8 sccm) and Ar gas was fixed at 20 sccm by the Facing Targets Sputtering (FTS) method. The electrical and optical properties of ITO thin films were measured by Hall effect measurement, UV/VIS spectrometer, respectively In the results, we obtained the ITO thin film with lowest resistivity($3{\times}10^{-4} {\Omega}{\cdot} cm$) at oxygen gas flow 0.2 sccm and optical transmittance over $80\%$ at oxygen gas flow over 0.2 sccm.