• 한국전기전자재료학회논문지
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• 제18권2호
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• pp.148-152
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• 2005

Atmospheric low-temperature plasma was produced using dielectric barrier discharge (DBD) plate-type plasma reactor and high frequency of 13.56 Hz. The surfaces of polyimide films for insulating and packaging materials were treated by the atmospheric low-temperature plasma. The contact angle of 67$^{\circ}$ was observed before the plasma treatment. The contact angle was decreased with deceasing the velocity of plasma treatment. In case of oxygen content of 0.2 %, electrode gap of 2 mm, the velocity of plasma treatment of 20 mm/sec, and input power of 400 W, the minimum contact angle of 13$^{\circ}$ was observed. The chemical characteristics of polyimide film after the plama treatment were investigated using X-ray photoelectron spectroscopy (XPS), and new carboxyl group bond was observed. The surfaces of polyimide films were changed into hydrophilic by the atmospheric low-temperature plasma. The polyimide films having hydrophilic surface will be very useful as a packaging and insulating materials in electronic devices.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.458-458
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• 2012

Fuel Cell is used stacking metal or polymer substrate. This hydro property of substrate surface is very important. Usually, surface property is hydrophilic. The surface oxidation of SUS is investigated through plasma treatments with an atmospheric-pressure dielectric barrier discharge (DBD) for increasing hydrophilic property. The plasma process makes an experiment under various operating conditions of the DBD, which operating conditions are treatment time, plasma gas mixture ratio, the plasma source supply frequency. Two kinds of SUS substrate, SUS-304 and SUS 316L, were used. Discharge frequency has a crucial impact on equipment performance and gas treatment. After the plasma treatment of a SUS plate, highly improved wettability was noted. But, when high oxygen supply, the substrate damaged seriously.

• 대한용접접합학회:학술대회논문집
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• 대한용접접합학회 2006년도 춘계 학술대회 개요집
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• pp.13-15
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• 2006

The effects of plasma treatment on the surfaces of the FR-4 (Flame Resistant-4) and copper substrates are investigated in terms of X-ray photoelectron spectroscopy (XPS), contact angle, and atomic force microscopy (AFM). The adhesion strengths of the underfills/FR-4 substrate and underfills/copper substrate are also studied. As experimental results, the plasma treatments of FR-4 and copper substrate surfaces yield several oxygen complexes in hydrophilic surfaces, which can play an important role in increasing the surface polarity, wettability, and adhesion characteristics of the underfills/substrates.

• Fibers and Polymers
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• 제5권3호
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• pp.213-218
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• 2004

Low temperature plasma (LTP) treatment using oxygen gas was applied to a wool fabric. The LTP treated wool fabric was tested with several methods: ASTM D5035-1995, ASTM D1424-1996, AATCC Test Method 99-2000, AATCC Test Method 61-2001 lA, AATCC Test Method 15-2002 and AATCC Test Method 8-2001 and the results were compared with the industrial requirements (ASTM D3780-02 and ASTM D4155-0l). The results revealed that the LTP treated wool fabric could fulfil the industrial requirements. The results of the investigation were discussed thoroughly in this paper.

• 한국방재학회:학술대회논문집
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• 한국방재학회 2008년도 정기총회 및 학술발표대회
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• pp.815-818
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• 2008

Titanium was oxidized with oxygen plasma and calcinated with rapid thermal annealing for degradation of humic acid dissolved in water. Titania photocatalytic plate was produced by titanium surface oxidized with oxygen plasma by Plasma Enhanced Chemical Vapor Deposition(PECVD). RF-power and deposition condition is controlled under 100 W, 150 W, 300 W and 500 W. Treatment time was controlled by 5 min and 10 min. The film properties were evaluated by the X-ray Photoelectron Spectroscopy (XPS) and X-Ray Diffraction (XRD). From the experimental results, we found the optimal condition of titania film which exhibited good performance. Moreover photocatalytic capacity was about twice better than thermal spray titania film, and also as good as titania powder.

• 펄프종이기술
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• 제43권5호
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• pp.55-59
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• 2011

Atmospheric plasma technology was utilized in order to modify surface characteristics of base paper for coating. Argon(Ar) and oxygen(O2) gases were used. It was found that contact angle of a water droplet was decreased with increasing voltage during plasma treatment, meaning that the hydrophilicity of paper surface was increased. On the other hand, the physical properties like roughness and optical properties such as gloss, brightness and opacity were not influenced by the plasma treatment. In conclusion, atmospheric plasma technology can be utilized to control hydrophilicity of paper surface without affecting physical properties of the paper.

• Macromolecular Research
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• 제17권11호
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• pp.886-893
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• 2009

Surface modifications using a radio frequency Ar-plasma treatment were performed on a polypropylene (PP) blend used for automotive bumper fascia. The surface characterization and morphology were examined. With increasing aging time, there was an increase in wettability, oxygen containing polar functional groups (i.e., C-O, C=O and O-C=O) due to oxidation, the amount of tale, and bearing depth and roughness on the PP surface, while there was a decrease in the number of hydrocarbon groups (i.e., C-C and C-H). AFM indicated that the Ar-plasma-treatment on a PP blend surface transforms the wholly annular surface into a locally dimpled surface, leading to an improvement in wettability. SEM showed that the PP layer observed in the non-plasma-treated sample was removed after the Ar-plasma treatment and the rubber particles were exposed to the surface. The observed surface characterization and morphologies are responsible for the improved wettability and interfacial adhesion between the PP blend substrate and bumper coating layers.

• Composites Research
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• 제16권4호
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• pp.74-79
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• 2003

Micromechanical 시험법과 음향방출을 이용하여 산소 플라즈마 처리된 PBO와 Kevlar 섬유강화 에폭시 복합재료의 계면물성과 미세파괴메카니즘을 고찰하여 상호 비교하였다. 산소 플라즈마 처리된 PBO와 Kevlar 섬유강화 에폭시 복합재료의 계면전단강도와 접착일은 극성 작용기의 도입으로 향상 시킬 수 있었다. 임계표면장력과 총 표면자유에너지 중 극성 표면자유에너지는 플라즈마 처리된 Kevlar 섬유에서 가장 컸으며. 미처리된 PBO의 섬유의 경우에서 가장 작았다. Microfibril 파단 형상은 산소 플라즈마 처리된 Keviar 섬유의 경우에서는 명확하게 관찰 되었으며. 미처리와 비교차여 microfibril 파단이 대각선 방향으로 연속적해서 일어나 가장 많은 섬유 파단 신호가 감지되었다 비파괴 음향방출법을 이용하여 얻은 섬유파단 감지 결과는 microdroplet과 두 섬유강화 복합재료 시험법에서 광학현미경을 이용하여 관찰한 미세파단 형상과 상호 일치하였다.

• 한국재료학회지
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• 제12권9호
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• pp.740-746
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• 2002

In this study, the polycarbonate surface was treated by $O_2$/ Ar gases plasma for the enhancement of adhesion with Cu electrode. From the point of view of hydrophilicity and the functionality, the micro-roughness, new functional groups and oxygen content of the polycarbonate surface were increased by the $O_2$/ Ar gases plasma treatment. The Cu films deposited on the as-received polycarbonate were easily detached while, after the$ O_2$/ Ar gases plasma treatment the adhesive Cu films on polycarbonate could be obtained. These results can be explained that the polycarbonate had a hydrophilic surface with uniform micro-roughness and new functional groups by $O_2$/ Ar gases plasma treatment. Therefore,$O_2$/ Ar gases plasma treatment is a promising method for improvement of adhesion between polycarbonate and Cu electrode.

• 한국세라믹학회지
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• 제41권6호
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• pp.435-438
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• 2004

MOCVD is one of the major deposition techniques for Cu thin films and Ta-Si-N is one of promising barrier metal candidates for Cu with high thermal stability. Effects of hydrogen plasma pretreatment of the underlying Ta-Si-N film surface on the Cu nucleation in Cu MOCVD were investigated using scanning electron microscopy, X-ray photoelectron spectroscopy and Auger electron emission spectrometry analyses. Cu nucleation in MOCVD is enhanced as the rf-power and the plasma exposure time are increased in the hydrogen plasma pretreatment. The optimal plasma treatment process condition is the rf-power of 40 Wand the plasma exposure time of 2 min. The hydrogen gas flow rate in the hydrogen plasma pretreatment process does not affect Cu nucleation much. The mechanism through which Cu nucleation is enhanced by the hydrogen plasma pretreatment of the Ta-Si-N film surface is that the nitrogen and oxygen atoms at the Ta-Si-N film surface are effectively removed by the plasma treatment. Consequently the chemical composition was changed from Ta-Si-N(O) into Ta-Si at the Ta-Si-N film surface, which is favorable for Cu nucleation.