• Title/Summary/Keyword: Oxygen plasma

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Efficiency enhancement of the organic light-emitting diodes by oxygen plasma treatment of the ITO substrate

  • Hong, J.W.;Oh, D.H.;Kim, C.H.;Kim, G.Y.;Kim, T.W.
    • Journal of Ceramic Processing Research
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    • v.13 no.spc2
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    • pp.193-197
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    • 2012
  • Oxygen plasma has been treated on the surface of indium-tin-oxide (ITO) to improve the efficiency of the organic light-emitting diodes (OLEDs) device. The plasma treatment was expected to inject the holes effectively due to the control of an ITO work-function and the reduction of surface roughness. To optimize the treatment condition, a surface resistance and morphology of the ITO surface were investigated. The effect on the electrical properties of the OLEDs was evaluated as a function of oxygen plasma powers (0, 200, 250, 300, and 450 W). The electrical properties of the devices were measured in a device structure of ITO/TPD/Alq3/BCP/LiF/Al. It was found the plasma treatment of the ITO surface affects on the efficiency of the device. The efficiency of the device was optimized at the plasma power of 250 W and decreased at higher power than 250 W. The maximum values of luminance, luminous power efficiency, and external quantum efficiency of the plasma treated devices increase by 1.4 times, 1.4 times, and 1.2 times, respectively, compared to those of the non-treated ones.

Structural and optical properties of ZnO epilayers grown on oxygen- and hydrogen-plasma treated sapphire substrates (산소와 수소 플라즈마로 처리한 사파이어 기판 위에 성장된 ZnO 박막의 구조적.광학적 특성)

  • Lee, S.K.;Kim, J.Y.;Kwack, H.S.;Kwon, B.J.;Ko, H.J.;Yao, Takafumi;Cho, Y.H.
    • Journal of the Korean Vacuum Society
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    • v.16 no.6
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    • pp.463-467
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    • 2007
  • Structure and optical properties of ZnO epilayers grown on oxygen- and hydrogen-plasma treated sapphire substrates by plasma-assisted molecular beam epitaxy (denoted as samples A and B, respectively) have been investigated by various techniques. The crystal quality and structural properties of the surface for the ZnO epilayers were investigated by high-resolution X-ray diffraction and atomic force microscope. For investigating the optical properties of excitonic transition of ZnO, we carried out photoluminescence experiments as a function of temperature. The free exciton, bound exciton emission and their phonon replicas were investigated as a function of temperature from 10 to 300 K, and the intensity of excitonic PL peak emission from the sample A is found to be higher than that of sample B. From the results, we found that sample A has better crystal structure quality and optical properties as compared to sample B. The number of oxygen vacancies may be decreased in sample A, resulting in an enhancement of the crystal quality and a higher intensity of excitonic emission band as compared to sample B.

Fabrication and Properties of Diamond Thin-Film from N-Hexane by Using Microwave Plasma Process (Microwave Plasma Process에 의한 N-Hexane으로부터 다이아몬드 박막제작 및 특성)

  • Han, Sang-Bo;Kwon, Tae-Jin;Park, Sang-Hyun;Park, Jae-Youn;Lee, Seung-Ji
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.25 no.4
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    • pp.79-87
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    • 2011
  • In this paper, the best conditions for the deposition of the high quality diamond thin-film from N-hexane as a carbon source in the microwave plasma process was carried out. Major parameters are the deposition time, flow rates of oxygen and hexane. The deposition time for the steady state thin-film was required more than 4[h], and the suitable flow rates of hexane and oxygen for the high-quality thin-film are 0.4[sccm] and 0.1~0.2[sccm], respectively. In addition, amorphous carbons such as DLC and graphite were grown by increasing the flow rate of hexane, and it decreased by increasing the flow rate of oxygen. Specifically, the growth rate is about 1.5[${\mu}mh-1$] under no addition of oxygen and it decreased about 60[%] as ca. 1.0[${\mu}mh-1$] with oxygen.

Phenol Removal Using Oxygen-Plasma Discharge in the Water (산소-플라즈마 방전을 이용한 수중의 페놀 제거)

  • Park, Young-Seek
    • Journal of Environmental Science International
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    • v.22 no.7
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    • pp.915-923
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    • 2013
  • Decomposition of non-biodegradable contaminants such as phenol contained in water was investigated using a dielectric barrier discharge (DBD) plasma reactor in the aqueous solutions with continuous oxygen bubbling. Effects of various parameters on the removal of phenol in aqueous solution with high-voltage streamer discharge plasma are studied. In order to choose plasma gas, gas of three types (argon, air, oxygen) were investigated. After the selection of gas, effects of 1st voltage (80 ~ 220 V), oxygen flow rate (2 ~ 7 L/min), pH (3 ~ 11), and initial phenol concentration (12.5 ~ 100.0 mg/L) on phenol degradation and change of $UV_{254}$ absorbance were investigated. Absorbance of $UV_{254}$ can be used as an indirect indicator of phenol degradation and the generation and disappearance of the non-biodegradable organic compounds. Removal of phenol and COD were found to follow pseudo first-order kinetics. The removal rate constants for phenol and COD of phenol were $5.204{\times}10^{-1}min^{-1}$ and $3.26{\times}10^{-2}min^{-1}$, respectively.

Influence of atmospheric pressure plasma on the melanogenesis in melanoma cells

  • Ali, Anser;Lee, SeungHyun;Attri, Pankaj;Choi, Eun Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.161.2-161.2
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    • 2015
  • Melanin is a black pigment, responsible for hair and skin color. In order to find the melanin stimulatory technique which prove useful for a gray and a white hair-preventive agent or tanning agent, we developed atmospheric pressure plasma jet (APPJ) and tested for tyrosinase activity and melanin production in melanoma (B16F10) cells in vitro. We found plasma dose dependent increase in melanin production. To explore the contributing mechanism in melanin synthesis, intracellular reactive oxygen species (ROS) and MAP kinase signaling pathways were studied. Furthermore, the development of plasma technology for melanin synthesis and planning for in-vivo future studies will be discussed.

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Treatment of surface water using cold plasma for domestic water supply

  • Nguyen, Dung Van;Ho, Phong Quoc;Pham, Toan Van;Nguyen, Tuyen Van;Kim, Lavane
    • Environmental Engineering Research
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    • v.24 no.3
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    • pp.412-417
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    • 2019
  • This paper presents the results of using cold plasma to treat surface water for domestic use purpose. Experimental results showed that cold plasma was an effective method for destroying bacteria in water. After treatment with cold plasma, concentration of coliform and Escherichia coli dramatically reduced. Besides, cold plasma significantly removed water odor, increased dissolved oxygen and decreased the concentration of chemical oxygen demand. However, cold plasma significantly raised the concentration of nitrite and nitrate. Other disadvantages of treating with cold plasma were conductivity increase and pH reduction. Pretreatment steps of coagulation, flocculation, sedimentation and sand filtration followed by disinfection with cold plasma exhibited a high efficiency in surface water treatment. All parameters of surface water after treatment by using the prototype satisfied with the allowance standard of domestic water quality.

Improvement of Interfacial Performances on Insulating and Semi-conducting Silicone Polymer Joint by Plasma-treatment

  • Lee, Ki-Taek;Huh, Chang-Su
    • Transactions on Electrical and Electronic Materials
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    • v.7 no.1
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    • pp.16-20
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    • 2006
  • In this paper, we investigated the effects of short-term oxygen plasma treatment of semiconducting silicone layer to improve interfacial performances in joints prepared with a insulating silicone materials. Surface characterizations were assessed using contact angle measurement and x-ray photoelectron spectroscopy (XPS), and then adhesion level and electrical performance were evaluated through T-peel tests and electrical breakdown voltage tests of treated semi-conductive and insulating joints. Plasma exposure mainly increased the polar component of surface energy from $0.21\;dyne/cm^2$ to $47\;dyne/cm^2$ with increasing plasma treatment time and then leveled off. Based on XPS analysis, the surface modification can be mainly ascribed to the creation of chemically active functional groups such as C-O, C=O and COH on semi-conductive silicone surface. This oxidized rubber layer is inorganic silica-like structure of Si bound with three to four oxygen atoms ($SiO_x,\;x=3{\sim}4$). The oxygen plasma treatment produces an increase in joint strength that is maximum for 10 min treatment. However, due to brittle property of this oxidized layer, the highly oxidized layer from too much extended treatment could be act as a weak point, decreasing the adhesion strength. In addition, electrical breakdown level of joints with adequate plasma treatment was increased by about $10\;\%$ with model samples of joints prepared with a semi-conducting/ insulating silicone polymer after applied to interface.

The Analysis of the Micro-structure of Oxygen Plasma Treated PET Using a Nitrogen Porosimeter (Nitrogen Porosimeter를 이용한 산소 플라즈마 처리 PET의 미세구조 분석)

  • 김병인;김태경;조규민;임용진
    • Textile Coloration and Finishing
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    • v.11 no.6
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    • pp.1-6
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    • 1999
  • The porosities of PET fibers were investigated using a nitrogen porosimeter according to oxygen plasma treatment and dyeing with a disperse dye, and they were discussed in terms of the change of internal micro-structure of the PET fiber. The total pore volume, surface area and average pore size of the plasma treated PET fibers increased expectably compared with the untreated sample. The PET fibers treated with oxygen plasma and then dyed with a disperse dye were increased significantly in the surface area and the total pore volume comparing with those of plasma treated only, but decreased in the average pore size. The increase of the surface area, after dyeing, of the plasma treated PET fibers was due to addition of the surface area of the dye itself to that of the PET fiber. The increase of the total pore volume of the plasma treated PET fibers by dyeing, which is the opposite result to the general idea that the pore volume of fibers would be reduced by occupation of dye molecules in the pores, could be explained by the free-volume model. This is that the amorphous region in the fiber expanded by occupation of dye molecules, and the marginal space surrounding dyes was generated as many smaller pores, and the decrease of the average pore size of the dyed sample also could be explained The decrease of the average pore size was caused by the splitting of a larger pore into smaller pores.

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Effect of plasma treatment using underwater non-thermal dielectric barrier discharge to remove antibiotics added to fish farm effluent (양식장 배출수에 첨가된 항생제 제거 위한 수중 비열 유전체장벽 방전 플라즈마 처리 효과)

  • Kyu Seok Cho;Han Seung Kang
    • Korean Journal of Environmental Biology
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    • v.40 no.4
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    • pp.641-650
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    • 2022
  • The purpose of this study was to compare the efficiency of air and oxygen injected into the underwater non-thermal dielectric barrier discharge plasma (DBD plasma) device used to remove five types of antibiotics (tetracycline, doxycycline, oxytetracycline, clindamycin, and erythromycin) artificially contained in the fish farm discharge water. The voltage given to generate DBD plasma was 27.8 kV, and the measurement intervals were 0, 0.5, 1, 2, 4, 8, 16 and 32 minutes. Tetracycline antibiotics significantly decreased in 4 minutes when air was injected and were reduced in 30 seconds when oxygen was injected. After the introduction of air and oxygen at 32 minutes, 78.1% and 95.8% of tetracycline were removed, 77.1% and 96.3% of doxycycline were removed, and 77.1% and 95.5% of oxytetracycline were removed, respectively. In air and oxygen, 59.6% and 83.0% of clindamycin and 53.3% and 74.3% of erythromycin were removed, respectively. The two antibiotics showed lower removal efficiency than tetracyclines. In conclusion, fish farm discharge water contains five different types of antibiotics that can be reduced using underwater DBD plasma, and oxygen gas injection outperformed air in terms of removal efficiency.

Characteristic of Ru Thin Film Deposited by ALD

  • Park, Jingyu;Jeon, Heeyoung;Kim, Hyunjung;Kim, Jinho;Jeon, Hyeongtag
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.78-78
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    • 2013
  • Recently, many platinoid metals like platinum and ruthenium have been used as an electrode of microelectronic devices because of their low resistivity and high work-function. However the material cost of Ru is very expensive and it usually takes long initial nucleation time on SiO2 during chemical deposition. Therefore many researchers have focused on how to enhance the initial growth rate on SiO2 surface. There are two methods to deposit Ru film with atomic layer deposition (ALD); the one is thermal ALD using dilute oxygen gas as a reactant, and the other is plasma enhanced ALD (PEALD) using NH3 plasma as a reactant. Generally, the film roughness of Ru film deposited by PEALD is smoother than that deposited by thermal ALD. However, the plasma is not favorable in the application of high aspect ratio structure. In this study, we used a bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp)2] as a metal organic precursor for both thermal and plasma enhanced ALDs. In order to reduce initial nucleation time, we use several methods such as Ar plasma pre-treatment for PEALD and usage of sacrificial RuO2 under layer for thermal ALD. In case of PEALD, some of surface hydroxyls were removed from SiO2 substrate during the Ar plasma treatment. And relatively high surface nitrogen concentration after first NH3 plasma exposure step in ALD process was observed with in-situ Auger electron spectroscopy (AES). This means that surface amine filled the hydroxyl removed sites by the NH3 plasma. Surface amine played a role as a reduction site but not a nucleation site. Therefore, the precursor reduction was enhanced but the adhesion property was degraded. In case of thermal ALD, a Ru film was deposited from Ru precursors on the surface of RuO2 and the RuO2 film was reduced from RuO2/SiO2 interface to Ru during the deposition. The reduction process was controlled by oxygen partial pressure in ambient. Under high oxygen partial pressure, RuO2 was deposited on RuO2/SiO2, and under medium oxygen partial pressure, RuO2 was partially reduced and oxygen concentration in RuO2 film was decreased. Under low oxygen partial pressure, finally RuO2 was disappeared and about 3% of oxygen was remained. Usually rough surface was observed with longer initial nucleation time. However, the Ru deposited with reduction of RuO2 exhibits smooth surface and was deposited quickly because the sacrificial RuO2 has no initial nucleation time on SiO2 and played a role as a buffer layer between Ru and SiO2.

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