• Title/Summary/Keyword: Oxide Films

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Applications and Preparation of Nanostructured Polymer Films by Using a Porous Alumina Template (다공성 알루미나 템플레이트를 이용한 고분자 나노 구조 필름의 제조 및 응용)

  • Lee, Joon Ho;Choi, Jin Kyu;Ahn, Myung-Su;Park, Eun Joo;Sung, Sang Do;Lee, Han-sub;Choi, Jinsub
    • Applied Chemistry for Engineering
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    • v.20 no.6
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    • pp.586-592
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    • 2009
  • The preparation of structures with nanosized arrays allows mimicking many different morphologies that exist in nature. In addition, polymer is considered as a material that can be easily applicable to the fabrication of nanostructures and can effectively exhibit nanosize effects since material, synthesis and processing cost is low, and many of polymer structures are well studied. Porous alumina template prepared by anodization of aluminum among nanofabrication methods is the one of promising routes that cost-effectively provides very regularly arrayed nanostructures. In this review, we describe the fabrication of the nanotemplate and template-based polymer nanostructures and their applications.

Effect of Negative Oxygen Ions Accelerated by Self-bias on Amorphous InGaZnO Thin Film Transistors

  • Kim, Du-Hyeon;Yun, Su-Bok;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.466-468
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    • 2012
  • Amorphous InGaZnO (${\alpha}$-IGZO) thin-film transistors (TFTs) are are very promising due to their potential use in thin film electronics and display drivers [1]. However, the stability of AOS-TFTs under the various stresses has been issued for the practical AOSs applications [2]. Up to now, many researchers have studied to understand the sub-gap density of states (DOS) as the root cause of instability [3]. Nomura et al. reported that these deep defects are located in the surface layer of the ${\alpha}$-IGZO channel [4]. Also, Kim et al. reported that the interfacial traps can be affected by different RF-power during RF magnetron sputtering process [5]. It is well known that these trap states can influence on the performances and stabilities of ${\alpha}$-IGZO TFTs. Nevertheless, it has not been reported how these defect states are created during conventional RF magnetron sputtering. In general, during conventional RF magnetron sputtering process, negative oxygen ions (NOI) can be generated by electron attachment in oxygen atom near target surface and accelerated up to few hundreds eV by self-bias of RF magnetron sputter; the high energy bombardment of NOIs generates bulk defects in oxide thin films [6-10] and can change the defect states of ${\alpha}$-IGZO thin film. In this paper, we have confirmed that the NOIs accelerated by the self-bias were one of the dominant causes of instability in ${\alpha}$-IGZO TFTs when the channel layer was deposited by conventional RF magnetron sputtering system. Finally, we will introduce our novel technology named as Magnetic Field Shielded Sputtering (MFSS) process [9-10] to eliminate the NOI bombardment effects and present how much to be improved the instability of ${\alpha}$-IGZO TFTs by this new deposition method.

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Characteristics on Silicon Oxynitride Stack Layer of ALD-Al2O3 Passivation Layer for c-Si Solar Cell (결정질 실리콘 태양전지 적용을 위한 ALD-Al2O3 패시베이션 막의 산화질화막 적층 특성)

  • Cho, Kuk-Hyun;Cho, Young Joon;Chang, Hyo Sik
    • Korean Journal of Materials Research
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    • v.25 no.5
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    • pp.233-237
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    • 2015
  • Silicon oxynitride that can be deposited two times faster than general SiNx:H layer was applied to fabricate the passivation protection layer of atomic layer deposition (ALD) $Al_2O_3$. The protection layer is deposited by plasma-enhanced chemical vapor deposition to protect $Al_2O_3$ passivation layer from a high temperature metallization process for contact firing in screen-printed silicon solar cell. In this study, we studied passivation performance of ALD $Al_2O_3$ film as functions of process temperature and RF plasma effect in plasma-enhanced chemical vapor deposition system. $Al_2O_3$/SiON stacks coated at $400^{\circ}C$ showed higher lifetime values in the as-stacked state. In contrast, a high quality $Al_2O_3$/SiON stack was obtained with a plasma power of 400 W and a capping-deposition temperature of $200^{\circ}C$ after the firing process. The best lifetime was achieved with stack films fired at $850^{\circ}C$. These results demonstrated the potential of the $Al_2O_3/SiON$ passivated layer for crystalline silicon solar cells.

Etch Characteristics of NbOx Nanopillar Mask for the Formation of Si Nanodot Arrays (Si Nanodot 배열의 형성을 위한 NbOx 나노기둥 마스크의 식각 특성)

  • Park, Ik Hyun;Lee, Jang Woo;Chung, Chee Won
    • Applied Chemistry for Engineering
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    • v.17 no.3
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    • pp.327-330
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    • 2006
  • We investigated the usefulness of $NbO_{x}$ nanopillars as an etching mask of dry etching for the formation of Si nanodot arrays. The $NbO_{x}$ nanopillar arrays were prepared by the anodic aluminum oxidation process of Al and Nb thin films. The etch rate and etch profile of $NbO_{x}$ nanopillar arrays were examined by varying the experimental conditions such as the concentration of etch gas, coil rf power, and dc bias voltage in the reactive ion etch system using the inductively coupled plasma. As the concentration of $Cl_{2}$ gas increased, the etch rate of $NbO_{x}$nanopillars decreased. With increasing coil rf power and dc bias voltage, the etch rates were found to increase. The etch characteristics and etch mechanism of $NbO_{x}$ nanopillars were investigated by varying the etch time under the selected etch conditions.

Li2O and Li2CO3 Thin Film Growth by LPMOCVD (LPMOCVD에 의한 Li2O 및 Li2CO3 박막의 증착)

  • Jung, Sang-Chul;Ahn, Ho-Geun;Imaishi, Nobuyuki
    • Applied Chemistry for Engineering
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    • v.10 no.2
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    • pp.225-230
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    • 1999
  • Low pressure metal organic chemical vapor deposition (LPMOCVD) of $Li_2O$ solid thin films from Li(DPM) in nitrogen-oxygen or argon-oxygen atmosphere was experimentally investigated by using a small hot wall tubular type reactor. XRD and ESCA analysis revealed that $Li_2CO_3$ film grew in nitrogen-oxygen atmosphere and $Li_2O$ grew in argon-oxygen atmosphere. The grown lithium oxide or carbonate reacted with silicon or silica base materials to produce silicates. The CVD model analysis by means of the well-known micro trench method and Monte Carlo simulation was not fully successful, but a set of data on gas phase reaction rate constant and surface reaction constant was obtained.

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Effect of annealing om p-type Al/SnO2 transparent conductive multilayer films (p-형 Al/SnO2 투명 전도성 다층박막에 미치는 열처리의 영향)

  • Park, Geun-Yeong;Kim, Seong-Jae;Gu, Bon-Heun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2014.11a
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    • pp.27-28
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    • 2014
  • 투명전극이란 전기 전도도를 갖는 동시에 가시광선 영역에서 빛을 투과하는 성질을 가지는 소재이다. 일반적으로 가시광선 영역(380nm~780nm)에서 80%이상의 광 투과도를 가지며, 비저항이 $10^{-3}{\Omega}{\cdot}cm$ 이하, optical band gap 이 3.3 eV 이상인 물질을 TCO(Transparent Conducting oxide)라고 한다. 현재까지 국내의 TCO 관련 연구는 터치패널, 디스플레이, 태양전지 등 광전자분야에서 가장 널리 사용되고 있는 ITO(Sn:In2O3)에 치중되어 있으며, 관련 연구도 거의 디스플레이 맞춤형 연구개발이 주류를 이루어왔다. ITO가 전기전도성이 우수하고 동시에 가시광선 영역에서의 투과율도 80%이상으로 전기적, 광학적 특성이 우수하다는 장점을 가지고 있으나, In의 희소성으로 인한 고가격, 유독성, 접착력 문제 때문에 이를 대체하기 위해 제조원가가 ITO에 비하여 월등히 저렴하고 내화학성과 내마모성이 우수하면서도, 가시광선 영역에서의 광투과율이 80%이상으로 좋다는 $SnO_2$에 관한 연구가 활발히 진행되어 왔다. 적절한 dopant를 첨가하여 $SnO_2$자체의 높은 광학적 투과도를 유지하면서 전기전도성을 더 높일수 있고, 투명전극이 가져야 할 고온 안정성을 가지고 있으며 비독성이고 수소 플라즈마에 대한 내성이 더 클 뿐만 아니라 저온에서 성장이 가능하다. $SnO_2$의 전기 전도도를 높이기 위한 Al, In, Ga, B와 같은 3족 원소가 $SnO_2$의 n형 dopant로 널리 사용되고 있다. 그 중 Al은 반응성이 커서 박막 증착 중에 산화되기 쉬운 반면, 전기적 특성 및 광학적 특성의 향상을 이룰 수 있다. 본 연구에서는 Rf Sputtering법을 사용하여 quartz기판 위에 다층박막 형태의 투명전도막을 제작한 후, 열처리를 수행, 이에 의한 다층박막 내 계면간 상호확산 현상을 이용하여 투명 전도막의 특성변화를 관찰하였다. 박막의 구조적 특성은 XRD장비를 사용하여 분석하였으며, 전기적, 광학적 특성은 각각 표면저항기, 홀 측정 장비, 그리고 UV-VIS-NI를 사용하여 확인하였다.

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Effect of TiO2 Coating Thickness on Photovoltaic Performance of Dye-sensitized Solar Cells Prepared by Screen-printing Using TiO2 Powders

  • Lee, Deuk Yong;Cho, Hun;Kang, Daejun;Kang, Jong-Ho;Lee, Myung-Hyun;Kim, Bae-Yeon;Cho, Nam-Ihn
    • Journal of the Korean Ceramic Society
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    • v.51 no.4
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    • pp.362-366
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    • 2014
  • Dye-sensitized solar cells (DSSCs) were synthesized using a $0.25cm^2$ area of a $TiO_2$ nanoparticle layer as the electrode and platinum (Pt) as the counter electrode. The $TiO_2$ nanoparticle layers (12 to 22 ${\mu}m$) were screen-printed on fluorine-doped tin oxide glass. Glancing angle X-ray diffraction results indicated that the $TiO_2$ layer is composed of pure anatase with no traces of rutile $TiO_2$. The Pt counter electrode and the ruthenium dye anchored $TiO_2$ electrode were then assembled. The best photovoltaic performance of DSSC, which consists of a $18{\mu}m$ thick $TiO_2$ nanoparticle layer, was observed at a short circuit current density ($J_{sc}$) of $14.68mA{\cdot}cm^{-2}$, an open circuit voltage ($V_{oc}$) of 0.72V, a fill factor (FF) of 63.0%, and an energy conversion efficiency (${\eta}$) of 6.65%. It can be concluded that the electrode thickness is attributed to the energy conversion efficiency of DSSCs.

Fabrication and Thermophysical Properties of Nickel-coated Aluminum Powder by Electroless Plating (비전해 방법을 이용한 니켈 코팅 알루미늄 분말 제조 및 열물성 평가)

  • Lee, Sanghyup;Lim, Jihwan;Noh, Kwanyoung;Yoon, Woongsup
    • Journal of the Korean Society of Propulsion Engineers
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    • v.18 no.4
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    • pp.9-17
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    • 2014
  • In this study, in order to improve the ignitability of high energy aluminum powder, natural oxide films (alumina) were chemically removed, and instead nickel coat was applied. We used an electroless plating for nickel coating and confirmed quantitatively and qualitatively a time-dependent degree of nickel coating through analysis of surface by SEM/EDS. We also conducted element analysis by XRD and thermal properties by TGA/DSC in air oxidizer environment. There results explained the ignition enhancement mechanism of the nickel-coated aluminum powder in air. The difference between coated and un-coated aluminum powder, the effectiveness of coated powder has better ignitability.

Reduced graphene oxide field-effect transistor for biomolecule detection and study of sensing mechanism

  • Kim, D.J.;Sohn, I.Y.;Kim, D.I.;Yoon, O.J.;Yang, C.W.;Lee, N.E.;Park, J.S.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.431-431
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    • 2011
  • Graphene, two dimensional sheet of sp2-hybridized carbon, has attracted an enormous amount of interest due to excellent electrical, chemical and mechanical properties for the application of transparent conducting films, clean energy devices, field-effect transistors, optoelectronic devices and chemical sensors. Especially, graphene is promising candidate to detect the gas molecules and biomolecules due to the large specific surface area and signal-to-noise ratios. Despite of importance to the disease diagnosis, there are a few reports to demonstrate the graphene- and rGO-FET for biological sensors and the sensing mechanism are not fully understood. Here we describe scalable and facile fabrication of rGO-FET with the capability of label-free, ultrasensitive electrical detection of a cancer biomarker, prostate specific antigen/${\alpha}1$-antichymotrypsin (PSA-ACT) complex, in which the ultrathin rGO sensing channel was simply formed by a uniform self-assembly of two-dimensional rGO nanosheets on aminated pattern generated by inkjet printing. Sensing characteristics of rGO-FET immunosensor showed the highly precise, reliable, and linear shift in the Dirac point with the analyte concentration of PSA-ACT complex and extremely low detection limit as low as 1 fg/ml. We further analyzed the charge doping mechanism, which is the change in the charge carrier in the rGO channel varying by the concentration of biomolecules. Amenability of solution-based scalable fabrication and extremely high performance may enable rGO-FET device as a versatile multiplexed diagnostic biosensor for disease biomarkers.

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Photo-Electrochemical Properties of $TiO_2$ Electrodes Prepared by Anodic Oxidation (양극산화에 의해 제조된 $TiO_2$ 전극의 광전기화학적 성질)

  • Yong Kook Choi;Soon Ki Lee;Q Won Choi;Jeong Sub Seong;Ki Hyung Chjo
    • Journal of the Korean Chemical Society
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    • v.37 no.12
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    • pp.1010-1018
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    • 1993
  • The titanium oxide thin films were prepared by anodic oxidation. The Photo-electrochemical properties of the electrodes were studied in 1 M NaOH solution. The flat band potentials of $TiO_2$ electrodes prepared by anodic oxidation showed around -0.8V and the values were shifted 0.2V to the positive potential direction that of single crystal $TiO_2$. Reduction potential of oxygen by cyclic voltammetry showed around -0.95V vs. SCE and these reactions were processed totally irreversible. The photocurrent of electrodes were showed shorter wavelength than that of single crystal $TiO_2$ and its current density decreased.

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