• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.6
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• pp.470-475
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• 2009

We deposited $Al_2O_3$ thin films on GaN by remote plasma atomic layer deposition (RPALD) technique, trimethylaluminum(TMA) and oxygen were used as precursors, at fixed process condition, the number of cycle were changed. Growth rate per cycle was $1.2\;{\AA}$/cycle. and Growth rate was in proportion to a number of cycle, the GaN MIS capacitors that $Al_2O_3$ thin film were deposited above 12 nm, have excellent electrical properties, a low electrical leakage current density(${\sim}10^{-10}\;A/cm^2$ at 1.5 MV), but below 12 nm, we can see the degradation of the leakage current density. After post deposition annealing, Dielectric constant was estimated by 1 MHz high-frequency C-V method, it was varied with the anealing temperature from 6.9 at no post anealed to 7.6 at $800^{\circ}C$, and we can see a improvement of the leakage current density and breakdown voltage by post deposition anealing below $700^{\circ}C$, but, after anealed at $800^{\circ}C$, we can see the degradation of the leakage current density and breakdown voltage.

• Korean Journal of Metals and Materials
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• v.48 no.3
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• pp.256-261
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• 2010

In this work, high-k dielectric stacks of $HfO_2$ and $HfO_2$/$Al_2O_3$/$HfO_2$ (HAH) were deposited on $SiO_2/Si$ substrates by atomic layer deposition as charge trapping layers in charge trapping devices. The structural stability and the charge trapping characteristics of such stacks were investigated using Metal-Alumina-Hafnia-Oxide-Silicon (MAHOS) structure. The surface roughness of $HfO_2$ was stable up to 11 nm with the insertion of 0.2 nm thick $Al_2O_3$. The effect of the thickness of the HAH stack and the thickness of intermediate $Al_2O_3$ on charge trapping characteristics were investigated for MAHOS structure under various gate bias pulse with duration of 100 ms. The threshold voltage shift after programming and erase showed that the memory window was increased with increasing bias on gate. However, the programming window was independent of the thickness of HAH charge trapping layers. When the thickness of $Al_2O_3$insertion increased from 0.2 nm to 1 nm, the erase window was decreased without change in the programming window.

• Proceedings of the Korean Society of Crop Science Conference
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• 2022.10a
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• pp.330-330
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• 2022

In recent studies, cold plasma has been used to induce exudation of polyphenols and flavonoids from food materials, leading to enhancement of functional properties. And it is known that polyphenols interact with inflammation related metabolism. The objectives of this study were to investigate the effects of cold plasma treatments on the increase of total phenolic content (TPC), total flavonoid content (TFC), and anti-inflammatory activities of 'Sinpalkwang' peanut (Arachis hypogaea L.) hull. Plasma treatments were carried out using a dielectric barrier discharge gas exchange system at different radicals and temperatures (O₃-25℃, O₃-150℃, NO_x-150℃). Significant differences in TPC, TFC, and inflammatory mediator such as nitric oxide (NO) and tumor necrosis factor a (TNF-α) in lipopolysaccharide stimulated Raw 264.7 macrophages were observed between treated and non-treated peanut hull samples (p < 0.001). Cold plasma treated samples showed higher content (TPC: 2.87-2.93 mg/g sample, TFC: 0.96-0.98 mg/g sample) than non-treated sample (TPC: 2.47 mg/g sample, TFC: 0.78 mg/g sample). Cold plasma treated samples showed lower content of NO (3.3-5.0 uM) and TNF-α (141.4-162.2 ng/mL) than non-treated sample (NO: 11.1 uM, TNF-α: 210.2 ng/mL). This study suggests that cold plasma has potential to improve functionalities of food materials and that cold plasma treated peanut hull can be used as immune enhancing materials.

• Journal of the Korean Chemical Society
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• v.12 no.2
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• pp.65-80
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• 1968

The physico-chemical properties of nine selected thallium borosilicate glasses and other 21 supplementary compositions were investigated. Their composition-property curves are found to be in many respects analogous to those of other borosilicate glasses containing lithia, soda, and lead oxide. It is indicated that certain minima found in the composition-property curves of thallium borosilicate glasses might be caused by a change in boron coordination as has been observed to occur in the $Na_2O-B_2O_3-SiO_2$ glasses. Typical effects of thallium ions on the borosilicate glass are summarized as follows: 1) Addition of thallium ions increased density, refractive index, water solubility, linear coefficient of thermal expansion, and dielectric constant. 2) Increased concentration of thallium decreased the softening point of the glasses, caused fluorescence under ultraviolet radiation and smeared out the absorption edges up to $15{\mu}$ in the infrared region. An extensive liquid immiscibility was found by replication electron microscope technique in the $Tl_2O-B_2O_3-SiO_2$ system. The immiscibility covers a composition range roughly from 55 wt. % Tl2O to the binary system $B_2O_3-SiO_2.$ By acid treatment, it was found that the immiscible glass consists of separate silica-rich and boron-rich phases.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.171.2-171.2
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• 2016

The 2-dimensiona electron gas (2DEG) layers have opened tremendous interests in the heterooxide interfaces formed between two insulating materials, especially between LaAlO3 and $SrTiO_3$. The 2DEG layers exhibit extremely high mobility and carrier concentrations along with metallic transport phenomena unlike the constituent oxide materials, i.e., $LaAlO_3$ and $SrTiO_3$. The current work inserted artificially the interfacial layer, $Sr_xCa_{1-x}TiO_3$ between $LaAlO_3$ and $SrTiO_3$, with the aim to controlling the 2-dimensional transports. The insertion of the additional materials affect significantly their corresponding electrical transports. Such features have been probed using DC and AC-based characterizations. In particular, impedance spectroscopy was employed as an AC-based characterization tool. Frequency-dependent impedance spectroscopy have been widely applied to a number of electroceramic materials, such as varistors, MLCCs, solid electrolytes, etc. Impedance spectroscopy provides powerful information on the materials system: i) the simultaneous measurement of conductivity and dielectric constants, ii) systematic identification of electrical origins among bulk-, grain boundary-, and electrode-based responses, and iii) the numerical estimation on the uniformity of the electrical origins. Impedance spectroscopy was applied to the $LaAlO_3/Sr_xCa_{1-x}TiO_3/SrTiO_3$ system, in order to understand the 2-dimensional transports in terms of the interfacial design concepts. The 2-dimensional conduction behavior system is analyzed with special emphasis on the underlying mechanisms. Such approach is discussed towards rational optimization of the 2-dimensional nanoelectronic devices.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.264-264
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• 2016

최근에 charge trap flash (CTF) 기술은 절연막에 전하를 트랩과 디트랩 시킬 때 인접한 셀 간의 간섭현상을 최소화하여 오동작을 줄일 수 있으며 낸드 플래시 메모리 소자에 적용되고 있다. 낸드 플래시 메모리는 고집적화, 대용량화와 비휘발성 등의 장점으로 인해 핸드폰, USB, MP3와 컴퓨터 등에 이용되고 있다. 기존의 실리콘 기반의 플래시 메모리 소자는 좁은 밴드갭으로 인해 투명하지 않고 고온에서의 공정이 요구되는 문제점이 있다. 따라서, 이러한 문제점을 개선하기 위해 실리콘의 대체 물질로 산화물 반도체 기반의 플래시 메모리 소자들이 연구되고 있다. 산화물 반도체 기반의 플래시 메모리 소자는 넓은 밴드갭으로 인한 투명성을 가지고 있으며 저온에서 공정이 가능하여 투명하고 유연한 기판에 적용이 가능하다. 다양한 산화물 반도체 중에서 비정질 In-Ga-Zn-O (a-IGZO)는 비정질임에도 불구하고 우수한 전기적인 특성과 화학적 안정성을 갖기 때문에 많은 관심을 받고 있다. 플래시 메모리의 고집적화가 요구되면서 절연막에 high-k 물질을 atomic layer deposition (ALD) 방법으로 적용하고 있다. ALD 방법을 이용하면 우수한 계면 흡착력과 균일도를 가지는 박막을 정확한 두께로 형성할 수 있는 장점이 있다. 또한, high-k 물질을 절연막에 적용하면 높은 유전율로 인해 equivalent oxide thickness (EOT)를 줄일 수 있다. 특히, HfOx와 AlOx가 각각 trap layer와 blocking layer로 적용되면 program/erase 동작 속도를 증가시킬 수 있으며 넓은 밴드갭으로 인해 전하손실을 크게 줄일 수 있다. 따라서 본 연구에서는 ALD 방법으로 AlOx와 HfOx를 게이트 절연막으로 적용한 a-IGZO 기반의 thin-film transistor (TFT) 플래시 메모리 소자를 제작하여 메모리 특성을 평가하였다. 제작 방법으로는, p-Si 기판 위에 열성장을 통한 100 nm 두께의 SiO2를 형성한 뒤, 채널 형성을 위해 RF sputter를 이용하여 70 nm 두께의 a-IGZO를 증착하였다. 이후에 소스와 드레인 전극에는 150 nm 두께의 In-Sn-O (ITO)를 RF sputter를 이용하여 증착하였고, ALD 방법을 이용하여 tunnel layer에 AlOx 5 nm, trap layer에 HfOx 20 nm, blocking layer에 AlOx 30 nm를 증착하였다. 최종적으로, 상부 게이트 전극을 형성하기 위해 electron beam evaporator를 이용하여 platinum (Pt) 150 nm를 증착하였고, 계면 결함을 최소화하기 위해 퍼니스에서 질소 가스 분위기, $400^{\circ}C$, 30 분의 조건으로 열처리를 했다. 측정 결과, 103 번의 program/erase를 반복한 endurance와 104 초 동안의 retention 측정으로부터 큰 열화 없이 메모리 특성이 유지되는 것을 확인하였다. 결과적으로, high-k 물질과 산화물 반도체는 고성능과 고집적화가 요구되는 향후 플래시 메모리의 핵심적인 물질이 될 것으로 기대된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.188.2-188.2
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• 2015

The presence of the conduction interface in epitaxial $LaAlO_3/SrTiO_3$ thin films has opened up challenging applications which can be expanded to next-generation nano-electronics. The metallic conduction path is associated with two adjacent insulating materials. Such device structure is applicable to frequency-dependent impedance spectroscopy. Impedance spectroscopy allows for simultaneous measurement of resistivity and dielectric constants, systematic identification of the underlying electrical origins, and the estimation of the electrical homogeneity in the corresponding electrical origins. Such unique capability is combined with the intentional control on the interface composition composed of $SrTiO_3$ and $CaTiO_3$, which can be denoted by $SrxCa1-_xTiO_3$. The underlying $Sr_xCa1-_xTiO_3$ interface was deposited using pulsed-laser deposition, followed by the epitaxial $LaAlO_3$ thin films. The platinum electrodes were constructed using metal shadow masks, in order to accommodate 2-point electrode configuration. Impedance spectroscopy was performed as the function of the relative ratio of Sr to Ca. The respective impedance spectra were analyzed in terms of the equivalent circuit models. Furthermore, the impedance spectra were monitored as a function of temperature. The ac-based characterization in the 2-dimensional conduction path supplements the dc-based electrical analysis. The artificial manipulation of the interface composition will be discussed towards the electrical application of 2-dimensional materials to the semiconductor devices in replacement for the current Si-based devices.

• Journal of Korean Society of Environmental Engineers
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• v.27 no.3
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• pp.330-336
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• 2005

The ozone injection method was proposed to improve the catalytic process for the removal of nitrogen oxides ($NO_x$). Nitric oxide (NO) in the exhaust gas was first oxidized to nitrogen dioxide ($NO_2$) by ozone produced by dielectric barrier discharge, and then the exhaust gas containing the mixture of NO and $NO_2$ was directed to the catalytic reactor where both NO and $NO_2$ were reduced to $N_2$ in the presence of ammonia as the reducing agent. A commercially available $V_2O_5-WO_3/TiO_2$ catalyst was used as the catalytic reactor. The $NO_2$ content in the mixture of NO and $NO_2$ was changed by the amount of ozone added the exhaust gas. The effect of reaction temperature, initial $NO_x$ concentration, feed gas flow rate, and ammonia concentration on the removal of $NO_x$ at various $NO_2$ contents was examined and discussed. The increase in the content of $NO_2$ by the ozone injection remarkably improved the performance of the catalytic reactor, especially at low temperatures. The present ozone injection method appears to be promising for the improvement of the catalytic reduction of $NO_x$.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.23 no.1
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• pp.14-19
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• 2013

We have successfully synthesized $Bi_{4-x}La_xTi_3O_{12}$ (x~2) having Aurivillius-type layered perovskite structure from exfoliated layered perovskite oxide of $K_2La_2Ti_3O_{10}$ with Ruddlesden-Popper structure. The reaction between the exfoliated lanthanum titanate nanosheets and BiOCl nanocrystal resulted in the formation of polycrystalline $Bi_{4-x}La_xTi_3O_{12}$ (x~2) after heating above $700^{\circ}C$. Colloidal suspension of the nanosheets could be obtained by intercalating ethylamine (EA) into the protonated lanthanum titanate, $H_2La_2Ti_3O_{10}$, derived from $K_2La_2Ti_3O_{10}$. Transmission electron microscopic (TEM) analysis show that the exfoliated lanthanium titanate nanosheets have a thickness of a few nano meters. According to X-ray diffraction (XRD) analysis, the exfoliated lanthanium titanate was found to be transformed into $Bi_{4-x}La_xTi_3O_{12}$ (x~2) after restacking with BiOCl and subsequent thermal treatment at > $700^{\circ}C$.

• Journal of the Institute of Electronics and Information Engineers
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• v.50 no.2
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• pp.98-103
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• 2013

In this work, we investigated the enhanced performance of IZO-based TFTs with $HfSiO_x$ gate insulators. Four types of $HfSiO_x$ gate insulators using different diposition powers were deposited by co-sputtering $HfO_2$ and Si target. To simplify the processing sequences, all of the layers composing of TFTs were deposited by rf-magnetron sputtering method using patterned shadow-masks without any intentional heating of substrate and subsequent thermal annealing. The four different $HfSiO_x$ structural properties were investigated x-ray diffraction(XRD), atomic force microscopy(AFM) and also analyzed the electrical characteristics. There were some noticeable differences depending on the composition of the $HfO_2$ and Si combination. The TFT based on $HfSiO_x$ gate insulator with $HfO_2$(100W)-Si(100W) showed the best results with a field effect mobility of 2.0[$cm^2/V{\cdot}s$], a threshold voltage of -0.5[V], an on/off ratio of 5.89E+05 and RMS of 0.26[nm]. This show that the composition of the $HfO_2$ and Si is an important factor in an $HfSiO_x$ insulator. In addition, the effective bonding of $HfO_2$ and Si reduced the defects in the insulator bulk and also improved the interface quality between the channel and the gate insulator.