• 제목/요약/키워드: Oxidation-film

검색결과 778건 처리시간 0.026초

전해산화에 의한 배금전극상 전도성 폴리아닐린 피막의 생장거동(I) (Growth Behavior of Condutive Polyaniline Film on a Platinum by Electrochemical Oxidation(I))

  • 신성호;이주성
    • 한국표면공학회지
    • /
    • 제21권2호
    • /
    • pp.68-75
    • /
    • 1988
  • To know the growth behavior of Conductive polyaniline file, the anodic oxidation of anilien on a platiunm in aqueous sulfuric acid solution has been studied. Cyclic votammetry and currenttime transisents method used to investigate the anodic oxidation of aniline to polyaniline films on a platinum. The oxidation of aniline is shown to occur in several steps dependent on the potential. it the phase growth resembles the deposition of a metal film.

  • PDF

Effects of Electrolyte Concentration and Relative Cathode Electrode Area Sizes in Titania Film Formation by Micro-Arc Oxidation

  • Lee, Yong-K.;Lee, Kang-Soo
    • Corrosion Science and Technology
    • /
    • 제9권4호
    • /
    • pp.171-174
    • /
    • 2010
  • MAO (micro-arc oxidation) is an eco-friendly convenient and effective technology to deposit high-quality oxide coatings on the surfaces of Ti, Al, Mg and their alloys. The roles of the electrolyte concentration and relative cathode electrode area sizes in the grown oxide film during titanium MAO were investigated. The higher the concentration of the electrolyte, the lower the $R_{total}A$ value. The oxide film produced by the lower concentration of the electrolyte is thinner and less uniform than the film by the higher concentration, which is thick and porous. The cathode area size must be bigger than the anode area size in order to minimize the voltage drop across the cathode. The ratio of the cathode area size to the anode area size must be bigger than 8. Otherwise, the cathode will be another source for voltage drop, which is detrimental to and slows down the oxide growth.

Stability and Electrochemical Characteristics of Polyaniline Salt Films in 1 N HCl Solution

  • 조정환;오응주;요철현
    • Bulletin of the Korean Chemical Society
    • /
    • 제17권8호
    • /
    • pp.715-719
    • /
    • 1996
  • Thin films of polyaniline (PANI) salts were in situ deposited on a Pt plate during either chemical polymerization or electrochemical polymerization. The oxidation states of the salt films were controlled by the applied DC potential. AC impedance of the Pt/PANI electrode were measured in monomer-free 1 N HCl solution in order to investigate the electrodic properties of the films at the following applied DC potentials: 0, 0.45 and 0.75 V vs. SCE. Very small differences in film conductivity according to its oxidation state were observed by analysis of the impedance spectra, the reasons of which are complicated by enriched water content in the film and possible decrease in the film thickness during the measurements. The electrochemical activity of the film/solution interface varied with its oxidation state. Stability of the film in 1 N HCl solution was also evaluated by impedance and cyclic voltammetry measurements.

이온주입 제어에 의한 재료특성 개선에 관한 연구 (A Study on Improvement of Material Characteristics by Control of Ion Implantation)

  • 양영준;이치우;후지타 카즈히사
    • Journal of Advanced Marine Engineering and Technology
    • /
    • 제32권8호
    • /
    • pp.1178-1184
    • /
    • 2008
  • In this study, techniques of ion implantation were used in order to improve the characteristics of metal materials such as the oxidation and wear resistant. In particular it is necessary to develope their oxidation and wear resistant that could be used in severe environmental conditions. There are mainly two elementary technologies including ion implantation and/or thin film coating. Ion implantation method was performed for surface modification. As a result, it was found that some ion implantations methods such as Nb, high-temperature Nb ion implantation and Nb+C combined implantation are somewhat effective for improving the oxidation resistance of TiAl alloy. Furthermore, the fluorine PBII treatment is more effective for improving the oxidation resistance of the TiAl alloy with three-dimensional shapes. The implantation of boron ion into thin film of TiN was also effective for improving the properties of materials like high temperature wear resistance. TiCrN film was applied to the actual seal ring for steam turbines, and it was observed that its sliding property showed a successfully good performance.

카르복시메틸화 및 TEMPO 촉매 산화 처리에 의한 셀룰로오스 나노피브릴의 표면 개질 (Surface Modification of Cellulose Nanofibrils by Carboxymethylation and TEMPO-Mediated Oxidation)

  • 심규정;윤혜정;조연희
    • 펄프종이기술
    • /
    • 제47권2호
    • /
    • pp.42-52
    • /
    • 2015
  • In this study, cellulose nanofibrils (CNF) were modified through carboxymethylation or TEMPO-mediated oxidation and their effects on ionicity and characteristics of sheet, film, and foam were investigated. Carboxymethylation was carried out on pulp fibers as a pre-treatment before preparation of CNF. The gel-like and translucent CNF hydrogel was obtained by grinding of carboxymethylated cellulose fibers. Carboxymethylated CNF film and freeze dried sheet showed higher transparency than that of untreated CNF. The CNF sheet with high strength and the CNF foam without large ice crystals were obtained by using the carboxymethylated CNF. TEMPO-mediated oxidation was carried out as a post-treatment of CNF. The zeta potential and charge demand of TEMPO-oxidized CNF were increased with an increase in oxidation time and addition amount of NaClO. The density of sheet made of TEMPO oxidized CNF was increased with the amount of oxidizing agent. The TEMPO oxidized cellulose nanofiber (TOCN) which was obtained from supernatant after centrifugation could be converted to transparent film.

진공증착법에 의한 산화철박막의 제조 및 전기적특성 (Preparation of Iron Oxide Thin Films by Vacuum Evaporation Method and Its Electrical Properties)

  • 조경형;오재희
    • 한국세라믹학회지
    • /
    • 제22권6호
    • /
    • pp.87-93
    • /
    • 1985
  • The hematite the magetite and the maghemite thin film were prepared by oxidation and reductino of the vaccum-evaporated iron thin film. Interre;atoms between film preparation process and the electrical properties were investigated. At room temperature the electrical conductivity of the iron the hematite the magnetite and the maghemite thin film were $1{\times}10^4\Omega^{-1}cm^{-1}$, 2{\times}10^{-5}\Omega^{-1}cm^{-1}$, $3{\times}10^{-5}\Omega^{-1}cm^{-1}$, and $4{\times}10^{-5}\Omega^{-1}cm^{-1}$, resp-ectively. The surface of each thin film was dense and homogeneous. At the temperature that the iron thin film was converted into the hematite thin film the electrical conductivity decreased rapidly and the electrical con-ductivity of the hematite thin film increased as temperature increased. The hematite thin film was reduced to the magnetite thin film in H2 atmosphere. The electrical conductivity decreased rapidly at the temperature that the maghemite thin film is formed by oxidation of the magnetite thin film and the electrical conductivity of the maghemite thin film increased as temperature increased.

  • PDF

플라즈마 표면 처리를 이용한 TiO2 MOS 커패시터의 특성 개선 (Improvement in Capacitor Characteristics of Titanium Dioxide Film with Surface Plasma Treatment)

  • 신동혁;조혜림;박세란;오훈정;고대홍
    • 반도체디스플레이기술학회지
    • /
    • 제18권1호
    • /
    • pp.32-37
    • /
    • 2019
  • Titanium dioxide ($TiO_2$) is a promising dielectric material in the semiconductor industry for its high dielectric constant. However, for utilization on Si substrate, $TiO_2$ film meets with a difficulty due to the large leakage currents caused by its small conduction band energy offset from Si substrate. In this study, we propose an in-situ plasma oxidation process in plasma-enhanced atomic layer deposition (PE-ALD) system to form an oxide barrier layer which can reduce the leakage currents from Si substrate to $TiO_2$ film. $TiO_2$ film depositions were followed by the plasma oxidation process using tetrakis(dimethylamino)titanium (TDMAT) as a Ti precursor. In our result, $SiO_2$ layer was successfully introduced by the plasma oxidation process and was used as a barrier layer between the Si substrate and $TiO_2$ film. Metal-oxide-semiconductor ($TiN/TiO_2/P-type$ Si substrate) capacitor with plasma oxidation barrier layer showed improved C-V and I-V characteristics compared to that without the plasma oxidation barrier layer.

STS316 용사코팅의 마모거동에 미치는 작용하중 및 미끄럼속도의 영향 (Effect of Applied Load and Sliding Speed on Wear Behavior of Thermally Sprayed STS316 Coating)

  • 이재홍;김영식
    • 동력기계공학회지
    • /
    • 제18권5호
    • /
    • pp.74-79
    • /
    • 2014
  • This article aims at investigating the effect of applied load and sliding speed on wear behavior of thermally spraryed STS316 coating. STS316 coatings were fabricated by flame spray process according to optimal parameters on steel substrates. Dry sliding wear tests were performed on STS316 coating using four different applied load as 10, 15, 20 and 25 N and four different sliding speed as 15, 30, 45 and 60 rpm. Wear behavior on worn surface was investigated using scanning electron microscope(SEM) and energy disperive X-ray spectroscopy(EDS). The dominant wear mechanism of STS316 coating under low applied load and sliding speed was oxidation on worn surface. However, under high applied load and sliding speed the principal wear mechanism was abrasion on oxidation film and damage of oxidation film.

스테인리스강 Spot 용접부의 산화방지에 관한 연구 (A Study on Anti-Oxidation of Stainless Steel Spot Weld)

  • 허동운;이세헌
    • Journal of Welding and Joining
    • /
    • 제29권5호
    • /
    • pp.58-62
    • /
    • 2011
  • Stainless steels are alloy steels with a nominal chromium content of at least 11 percent, with other alloy additions. The stainlessness and corrosion resistance of these alloy steels are attributed to the presence of a passive oxide film on the surface. When exposed to conditions like Resistance Spot Welding (RSW) process that remove the passive oxide film, stainless steels are subject to corrosive attack. And exposure to elevated temperatures causes oxidation (discoloration) of areas around indentation in Spot welding. In this paper, deal with the effect of shielding gas (Ar) preventing the corrosion, oxidation of stainless steel. And find the optimal shielding gas flow rate. In addition, suggest effective purging method for direct/indirect spot welding process.

열산화법을 이용한 산화구리 나노선 수직성장 (Synthesis of Vertically Aligned CuO Nanorods by Thermal Oxidation)

  • 김지민;정혁;김도진
    • 한국재료학회지
    • /
    • 제23권1호
    • /
    • pp.1-6
    • /
    • 2013
  • A simple thermal oxidation of Cu thin films deposited on planar substrates established a growth of vertically aligned copper oxide (CuO) nanorods. DC sputter-deposited Cu thin films with various thicknesses were oxidized in environments of various oxygen partial pressures to control the kinetics of oxidation. This is a method to synthesize vertically aligned CuO nanorods in a relatively shorter time and at a lower cost than those of other methods such as the popular hydrothermal synthesis. Also, this is a method that does not require a catalyst to synthesize CuO nanorods. The grown CuO nanorods had diameters of ~100 nm and lengths of $1{\sim}25{\mu}m$. We examined the morphology of the synthesized CuO nanorods as a function of the thickness of the Cu films, the gas environment, the oxidation time, the oxidation temperature, the oxygen gas flow rate, etc. The parameters all influence the kinetics of the oxidation, and consequently, the volume expansion in the films. Patterned growth was also carried out to confirm the hypothesis of the CuO nanorod protrusion and growth mechanism. It was found that the compressive stress built up in the Cu film while oxygen molecules incorporated into the film drove CuO nanorods out of the film.