• Title/Summary/Keyword: Oxidation state

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Oxidation-induced conformational change of Hsp33, monitored by NMR

  • Lee, Yoo-Sup;Kim, Ji-Hoon;Seo, Min-Duk;Ryu, Kyoung-Seok;Kim, Eun-Hee;Won, Hyung-Sik
    • Journal of the Korean Magnetic Resonance Society
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    • v.19 no.3
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    • pp.99-105
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    • 2015
  • Hsp33 is a prokaryotic molecular chaperon that exerts a holdase activity upon response to an oxidative stress at raised temperature. In particular, intramolecular disulfide bond formation between the four conserved cysteines that bind a zinc ion in reduced state is known to be critically associated with the redox sensing. Here we report the backbone NMR assignment results of the half-oxidized Hsp33, where only two of the four cysteines form an intramolecular disulfide bond. Almost all of the resolved peaks could be unambiguously assigned, although the total assignments extent reached just about 50%. Majority of the missing assignments could be attributed to a significant spectral collapse, largely due to the oxidation-induced unfolding of the C-terminal redox-switch domain. These results support two previous suggestions: conformational change in the first oxidation step is localized mainly in the C-terminal zinc-binding domain, and the half-oxidized form would be still inactive. However, some additional regions appeared to be potentially changed from the reduced state, which suggest that the half-oxidized conformation would be an intermediate state that is more labile to heat and/or further oxidation.

Removal of Interface State Density of SiO2/Si Structure by Nitric Acid Oxidation Method (질산산화법을 이용한 SiO2/Si 구조의 계면결함 제거)

  • Choi, Jaeyoung;Kim, Doyeon;Kim, Woo-Byoung
    • Korean Journal of Materials Research
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    • v.28 no.2
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    • pp.118-123
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    • 2018
  • 5 nm-thick $SiO_2$ layers formed by plasma-enhanced chemical vapor deposition (PECVD) are densified to improve the electrical and interface properties by using nitric acid oxidation of Si (NAOS) method at a low temperature of $121^{\circ}C$. The physical and electrical properties are clearly investigated according to NAOS times and post-metallization annealing (PMA) at $250^{\circ}C$ for 10 min in 5 vol% hydrogen atmosphere. The leakage current density is significantly decreased about three orders of magnitude from $3.110{\times}10^{-5}A/cm^2$ after NAOS 5 hours with PMA treatment, although the $SiO_2$ layers are not changed. These dramatically decreases of leakage current density are resulted from improvement of the interface properties. Concentration of suboxide species ($Si^{1+}$, $Si^{2+}$ and $Si^{3+}$) in $SiO_x$ transition layers as well as the interface state density ($D_{it}$) in $SiO_2/Si$ interface region are critically decreased about 1/3 and one order of magnitude, respectively. The decrease in leakage current density is attributed to improvement of interface properties though chemical method of NAOS with PMA treatment which can perform the oxidation and remove the OH species and dangling bond.

Electric-field Assisted Photochemical Metal Organic Deposition for Forming-less Resistive Switching Device (전기장 광화학 증착법에 의한 직접패턴 비정질 FeOx 박막의 제조 및 저항변화 특성)

  • Kim, Su-Min;Lee, Hong-Sub
    • Journal of the Microelectronics and Packaging Society
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    • v.27 no.4
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    • pp.77-81
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    • 2020
  • Resistive RAM (ReRAM) is a strong candidate for the next-generation nonvolatile memories which use the resistive switching characteristic of transition metal oxides. The resistive switching behaviors originate from the redistribution of oxygen vacancies inside of the oxide film by applied programming voltage. Therefore, controlling the oxygen vacancy inside transition metal oxide film is most important to obtain and control the resistive switching characteristic. In this study, we introduced an applying electric field into photochemical metal-organic deposition (PMOD) process to control the oxidation state of metal oxide thin film during the photochemical reaction by UV exposure. As a result, the surface oxidation state of FeOx film could be successfully controlled by the electric field-assisted PMOD (EFAPMOD), and the controlled oxidation states were confirmed by x-ray photoelectron spectroscopy (XPS) I-V characteristic. And the resistive switching characteristics with the oxidation-state of the surface region could be controlled effectively by adjusting an electric field during EFAPMOD process.

Reaction Mechanism and Support Effect for the Gas-Phase Oxidation of o-Xylene (자일렌의 기상 산화반응에서의 반응 메카니즘과 담체영향)

  • Lee, Gun-Dae;Lee, Ho-In
    • Applied Chemistry for Engineering
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    • v.2 no.2
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    • pp.155-164
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    • 1991
  • The reaction mechanism and the effects of the oxidation state of vanadium oxide and of support on catalytic activity for the oxidation of o-xylene were investigated. The oxidation of o-xylene simultaneously proceeded through the consecutive and parallel mechanisms. The high valence of vanadium favored selective oxidation to phthalic anhydride, while the low valence caused complete oxidation of phthalic anhydride to CO and $CO_2$. Crystalline $V_2O_5$ showed better selectivity for partial oxidation rather than amorphous one.

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Methanol Partial Oxidation over Commercial CuO-ZnO-Al2O3 Catalysts (CuO-ZnO-Al2O3 상업용 촉매에서의 메탄올 부분산화반응)

  • Lim, Mee-Sook;Suh, Soong-Hyuck;Ha, Ki-Ryong;Ahn, Won-Sool
    • Transactions of the Korean hydrogen and new energy society
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    • v.13 no.2
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    • pp.119-126
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    • 2002
  • The methanol partial oxidation using commercial $CuO/ZnO/Al_2O_3$ catalysts in a plug flow reactor was studied in the temperature range of $200{\sim}250^{\circ}C$ at atmospheric pressure, It was achieved the high activities by Cu-based catalysts and the selectivity of $CO_2$/$H_2$ was 100% when $O_2$ was fully convened. The reactivity changes and their hysteresis with increasing/decreasing temperatures were observed due to the chemical state differences between the oxidation and the reduction on the Cu surface, It was suggested as the two-step reaction: the complete oxidation and the following steam reforming for methanol, which was indicated by the distributions of final products vs. the residence time. In addition, the complete oxidation step was shown to be extremely fast and the total reaction rate can be controlled by the steam reforming reaction.

CO Oxidation of Catalytic Filters Consisting of Ni Nanoparticles on Carbon Fiber

  • Seo, Hyun-Ook;Nam, Jong-Won;Kim, Kwang-Dae;Kim, Young-Dok;Lim, Dong-Chan
    • Bulletin of the Korean Chemical Society
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    • v.33 no.4
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    • pp.1199-1203
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    • 2012
  • Catalytic filters consisting of Ni nanoparticle and carbon fiber with different oxidation states of Ni (either metallic or oxidic) were prepared using a chemical vapor deposition process and various post-annealing steps. CO oxidation reactivity of each sample was evaluated using a batch type quartz reactor with a gas mixture of CO (500 mtorr) and $O_2$ (3 torr) at $300^{\circ}C$. Metallic and oxidic Ni showed almost the same CO oxidation reactivity. Moreover, the CO oxidation reactivity of metallic sample remained unchanged in the subsequently performed second reaction experiment. We suggested that metallic Ni transformed into oxidic state at the initial stage of the exposure to the reactant gas mixture, and Ni-oxide was catalytically active species. In addition, we found that CO oxidation reactivity of Ni-oxide surface was enhanced by increase in the $H_2O$ impurity in the reactor.

A Study on the Characteristics of Fenton Oxidation of Bisphenol A and Nitrobenzene (비스페놀A와 니트로벤젠의 펜톤 산화분해 특성)

  • Bae, Su-Jin;Kwon, Hee-won;Kim, Ji-young;Hwang, In-Seong;Kim, Young-Hun
    • Journal of Environmental Science International
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    • v.30 no.12
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    • pp.1005-1014
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    • 2021
  • Organic contaminants can be released into water environments due to chemical accidents and exist as dissolved and non-aqueous phase liquids (NAPL). Fenton oxidation was tested for bisphenol A and nitrobenzene as model organic contaminants in dissolved and NAPL states. Fenton oxidation was successfully applied for both of the dissolved and NAPL states of the two pollutants and the results indicated that a quick treatment was needed to reduce the risk from a chemical accidents instead of carrying out oxidation after the contaminants dissolve in water. A set of Fenton reactions were tested under seawater conditions because chemical accidents often occurs in the ocean. Chloride ions act as radical scavengers and inhibit Fenton oxidation. The reaction rate is inversely proportional to salt contents and the reduced reaction rate can be compensated by increasing the quantity of the oxidizing agents. The current study showes that Fenton oxidation could be applied as a quick treatments for organic contaminant in dissolved and NAPL state organic contaminants released as a result of leaks or chemical accidents.

Effect of Steady-State Oxidation on Tensile Failure of Zircaloy Cladding

  • Kim, Taeho;Choi, Kyoung Joon;Yoo, Seung Chang;Lee, Yunju;Kim, Ji Hyun
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.20 no.2
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    • pp.161-170
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    • 2022
  • The effect of oxidation time on the characteristics and mechanical properties of spent nuclear fuel cladding was investigated using Raman spectroscopy, tube rupture test, and tensile test. As oxidation time increased, the Raman peak associated with the tetragonal zirconium oxide phase diminished and merged with the Raman peak associated with the monoclinic zirconium oxide phase near 333 cm-1. Additionally, the other tetragonal zirconium oxide phase peak at 380 cm-1 decreased after 100 d of oxidation, whereas the zirconium monoclinic oxide peak became the dominant peak. The oxidation time had no effect on the tube rupture pressure of the oxidized zirconium alloy tube. However, the yield and tensile stresses of the oxidized nuclear fuel cladding tube decreased after 100 d of oxidation. The results of the scanning electron microscopy and transmission electron microscopy were represented with the in-situ Raman analysis result for the oxide characteristics generated on the cladding of spent nuclear fuel.