• Proceedings of the Korean Vacuum Society Conference
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.78-78
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• 2013

Recently, many platinoid metals like platinum and ruthenium have been used as an electrode of microelectronic devices because of their low resistivity and high work-function. However the material cost of Ru is very expensive and it usually takes long initial nucleation time on SiO2 during chemical deposition. Therefore many researchers have focused on how to enhance the initial growth rate on SiO2 surface. There are two methods to deposit Ru film with atomic layer deposition (ALD); the one is thermal ALD using dilute oxygen gas as a reactant, and the other is plasma enhanced ALD (PEALD) using NH3 plasma as a reactant. Generally, the film roughness of Ru film deposited by PEALD is smoother than that deposited by thermal ALD. However, the plasma is not favorable in the application of high aspect ratio structure. In this study, we used a bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp)2] as a metal organic precursor for both thermal and plasma enhanced ALDs. In order to reduce initial nucleation time, we use several methods such as Ar plasma pre-treatment for PEALD and usage of sacrificial RuO2 under layer for thermal ALD. In case of PEALD, some of surface hydroxyls were removed from SiO2 substrate during the Ar plasma treatment. And relatively high surface nitrogen concentration after first NH3 plasma exposure step in ALD process was observed with in-situ Auger electron spectroscopy (AES). This means that surface amine filled the hydroxyl removed sites by the NH3 plasma. Surface amine played a role as a reduction site but not a nucleation site. Therefore, the precursor reduction was enhanced but the adhesion property was degraded. In case of thermal ALD, a Ru film was deposited from Ru precursors on the surface of RuO2 and the RuO2 film was reduced from RuO2/SiO2 interface to Ru during the deposition. The reduction process was controlled by oxygen partial pressure in ambient. Under high oxygen partial pressure, RuO2 was deposited on RuO2/SiO2, and under medium oxygen partial pressure, RuO2 was partially reduced and oxygen concentration in RuO2 film was decreased. Under low oxygen partial pressure, finally RuO2 was disappeared and about 3% of oxygen was remained. Usually rough surface was observed with longer initial nucleation time. However, the Ru deposited with reduction of RuO2 exhibits smooth surface and was deposited quickly because the sacrificial RuO2 has no initial nucleation time on SiO2 and played a role as a buffer layer between Ru and SiO2.

• Journal of Korean Society of Environmental Engineers
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• 제27권10호
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• pp.1099-1107
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• 2005

The purpose of this study was to find the transformation of organic matter as well as chlorine by product formation potential with ozone dosage. The removal percents of $UV_{254}$ and DOC were $23%{\sim}65%$ and $2%{\sim}15%$ and THMFP and HAAFP were $17%{\sim}52%$ and $9%{\sim}29%$ respectively at $0.5{\sim}3\;mgO_3/mgDOC$ ozone dosage. The hydrophobic and transphobic organic matter were reduced to $37%{\sim}68%$ and $35%{\sim}64%$, on the other hand the hydrophilir organic matter was increased to $40%{\sim}49%$ at $0.5{\sim}3\;mgO_3/mgDOC$ ozone dosage. The produced THMFP and HAAFP from the hydrophobic and transphilic organic matter were decreased greatly with increasing ozone dosage but these by products were increased in the hydrophilic matter. The produced THMFP and HAAFP per unit DOC were decreased and reactivity was reduced greatly with increasing crone dosage. The removal rate of THMFP per unit DOC was much higher than HAAFP by ozone treatment. The Br-THMFP per unit DOC was much more removed than chloroformFP per unit DOC with increasing ozone dosage. and The removal rate of TCAAFP per unit DOC was increased with increasing ozone dosage but TCAAFP was not affected by ozone treatment. Br-HAAFP was decreased at $1\;mgO_3/mgDOC$ ozone dosage but was not more removed above $1\;mgO_3/mgDOC$ ozone dosage. Br-HAAFP had lower removal effect than Br-THMFP by ozone treatment. The optimal ozone dosage can be determined about $1\;mgO_3/mgDOC$ by considering both disinfection by product formation and economical efficiency.

• Journal of Korea Technical Association of The Pulp and Paper Industry
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• 제36권4호
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• pp.16-24
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• 2004

The reduction of paper machine water usage is precursor to the water system closure of any mills. This reduction in water consumption reduces the loss of solids; especially fine particulates and their surface adsorbed chemical additives, from mills, which causes an inevitable increase of fine materials in papermaking systems. Also the reduction of paper machine water usage causes substantial increase of organic and inorganic substances in process water. The deterioration of the papermaking process water quality accompanying the reduction of papermaking system closure can be a prime source of the aggravation of paper quality and process efficiency. It is of great importance for paper mills to investigate the influence of the level of papermaking system closure on the paper properties and process runnabililty before implementing process closure. To predict the changes in paper properties at different levels of system closure, highly cotaminated white water was prepared using reverse osmosis technology and used to prepare handsheets from fine paper and newsprint stocks. Results showed that the quality of process water affects the strength. Preparation of highly contaminated process water and handsheet forming with headbox stocks provided important criteria to determine the relationship between the qualities of process water and paper products.

• Applied Chemistry for Engineering
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• 제10권5호
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• pp.666-671
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• 1999

In this work, sulfonated poly(phenylene sulfide) (SPPS) was prepared by demethylation with aqueous NaOH solution after poly[methyl[4-(phenylthio)phenyl]sulfonium trifluoromethanesulfonate](PPST) was sulfonated with fumic sulfonic acid(10% $SO_{3}-H_{2}SO_{4}$). PPST soluble in organic solvents was synthesiszed by self-condensation polymerization of methyl-(phenylthio)phenyl sulfoxide(MPPSO). SPPS showed IR bands of asymmetric O=S=O stretching at $1200cm^{-1}$ and S-O stretching at $621cm^{-1}$ from $-SO_{3}H$ group. From the result, it could be known that sulfonic acid groups were introduced to poly(phenylene sulfide). when PPST was sulfonated for 12hr at $150^{\circ}C$, 1.48 sulfonic acid groups were introduced per repeat unit. The weight average molecular weight(Mw) of PPST and SPPS determined by high temperature GPC were 118323 and 131204, respectively. The SPPS exhibited adsorption capacity of ammonia gas $9.67mmol\;NH_{3}/g$ and it was much higher than that of active carbon or silica gel.

• Journal of the Institute of Electronics Engineers of Korea TE
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• 제39권1호
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• pp.22-30
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• 2002

The nucleation of copper(Cu) with (hfac)iu(VTMS) oganometallic precursor is investigated for Si, $Sio_2$, TiN, $W_2N$ substrates. As the deposition temperature is increased, the dominant growth mechanism is observed to change from the nucleation of Cu particles to the clustering of Cu nuclei around $180^{\ciec}C$, independent of the employed substrates. It is also observed that the cleaning of substrate surfaces with the diluted HF solution improves the selectivity of Cu nucleation between TiN and $Sio_2$ substrates. Dimethyldichlorosilane treatment is found to passivate the surface of TiN substrate, contrary to the generally accepted belief, when the TiN substrate is cleaned by $H_2O_2$ solution before the treatment.

• Journal of the Korean Ceramic Society
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• 제39권11호
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• pp.1113-1118
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• 2002

Nano sized $(Pb_{0.5}Ca_{0.5})(Fe_{0.5}Nb_{0.5})O_3$ (PCFN) powders with the stoichiometric composition and the uniform size distribution were successfully synthesized by the metal-citrate process through the calcination of the polymeric precursor which consisted of the metal ions and the organic network. The crystallization of the initial amorphous powders began at $400{\circ}$ and completed at $700{\circ}$. The pyrochlore phase was detected caused by the dissociation of PbO above $900{\circ}$. Single phase perovskite PCFN powders with 40 nm size and uniform shape were obtained through the calcination at $700{\circ}$.

• Journal of the Korean Electrochemical Society
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• 제3권1호
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• pp.11-14
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• 2000

Transparent conducting ITO thin films have been studied and developed for the solar cell substrate or LCD substrate. ITO thin film has been mostly fabricated by high cost sputtering method. In this research, sol-gel method is applied to fabricate ITO thin film at lower cost. The research is focused on the establishment of process condition and development of precursor. Organic sol was made of indium tri-isopropoxide dissolved in ethylene glycol monoethyl ether. The hydrolysis was controled by addition of acetyl acetone. Tin(IV) chloride was added as dopant. Inorganic sol was made of indium acetate dissolve din normal propanol. Spin coating technique was applied to coat ITO on borosilicate glass. The resistivity of ITO thin film was approximately $0.01\Omega{\cdot}cm$ and the transmittance is higher than $90\%$ in a visible range.

• Journal of Mushroom
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• 제14권4호
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• pp.162-167
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• 2016

Lactic acid bacteria (LAB) producing phenyllactic acid (PLA), which is known as antimicrobial compound, was isolated from button mushroom bed and the isolated LAB was identified to Lactobacillus casei by 16 rRNA gene sequence analysis. Cell-free supernatant (CFS) from L. casei was assessed for both the capability to produce the antimicrobial compound PLA and the antifungal activity against three fungal pathogens (Rhizoctonia solani, Botrytis cinerea, and Collectotricum aculatum). PLA concentration was investigated to be 3.23 mM in CFS when L. casei was grown in MRS broth containing 5 mM phenylpyruvic acid as precursor for 16 h. Antifungal activity demonstrated that all fungal pathogens were sensitive to 5% CFS (v/v) of L. casei with average growth inhibitions ranging from 34.58% to 65.15% (p < 0.005), in which R. solani was the most sensitive to 65.15% and followed by C. aculatum, and B. cinerea. The minimum inhibitory concentration (MIC) for commercial PLA was also investigated to show the same trend in the range of 0.35 mg mL-1 (2.11 mM) to 0.7 mg mL-1 (4.21 mM) at pH 4.0. The inhibition ability of CFS against the pathogens were not affected by the heating or protease treatment. However, pH modification in CFS to 6.5 resulted in an extreme reduction in their antifungal activity. These results may indicate that antifungal activities in CFS was caused by acidic compounds like PLA or organic acids rather than protein or peptide molecules.

• Journal of Korean Society for Atmospheric Environment
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• 제34권5호
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• pp.639-650
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• 2018

Identification of the major sources contributing to PM is of importance in order to understand their quantitative contributions to atmosphere. In the viewpoint of the meat cooking in Korea, only a few analyses of organic molecular markers have been conducted due to analytical difficulties. In this study, ten different parts of meat (i.e., blade shoulder, belly, and arm shoulder of pork; ribeye roll, top blade muscle, and short plate of beef; leg quarter, breast, and wing of chicken; duck; mackerel) were pyrolyzed to generate the cooked PM using an electronic heating plate. Generated PM were collected by the pyrolysis sampling system to identify total carbon (TC) using a carbon analyzer and cholesterol using a Liquid chromatography tandem-mass spectrometry (LC-MSMS) based on fragmentor voltage (FV), precursor ion, collision energy, product ion. In addition, oxydative potential (OP) analysis using dithiothreitol (DTT) method were discussed to investigate the toxicity relates. Highly correlated pairwise scatterplots between the cholesterol and TC indicate that oxydative potential was highly associated with different parts of meat. This study provides insight into the meat cooking components of PM, which could be drivers of the oxidative potential relates.

• Proceedings of the Polymer Society of Korea Conference
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• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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• pp.298-298
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• 2006

There has been much interest in incorporating nanoscale voids into dielectric materials in order to reduce their k value, and thus in producing low-k porous interdielectric materials. One approach to the development of low-k dielectric materials is the templated polycondensation of organosilicate precursors in the presence of a thermally labile, organic polymeric porogen. The other is SiOCH films have low dielectric constant as well as good mechanical strength and high thermal stability through PECVD. In this article we explore the nanopore generation mechanism of organosilicate film using star-shape porogen and SiOCH film using bis-trimethylsilylmethane (BTMSM) precursor.