• ETRI Journal
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• v.45 no.6
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• pp.1056-1064
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• 2023

The optical properties of the materials composing organic light-emitting diodes (OLEDs) are considered when designing the optical structure of OLEDs. Optical design is related to the optical properties, such as the efficiency, emission spectra, and color coordinates of OLED devices because of the microcavity effect in top-emitting OLEDs. In this study, the properties of top-emitting blue OLEDs were optimized by adjusting the thicknesses of the thin metal layer and capping layer (CPL). Deep blue emission was achieved in an OLED structure with a second cavity length, even when the transmittance of the thin metal layer was high. The thin metal film thickness ranges applicable to OLEDs with a second microcavity structure are wide. Instead, the thickness of the thin metal layer determines the optimized thickness of the CPL for high efficiency. A thinner metal layer means that higher efficiency can be obtained in OLED devices with a second microcavity structure. In addition, OLEDs with a thinner metal layer showed less color change as a function of the viewing angle.

• Journal of the Korean Society for Heat Treatment
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• v.28 no.2
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• pp.63-67
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• 2015

$TiO_2/Ag/TiO_2$ trilayer films were deposited with radio frequency (RF) and direct current (DC) magnetron sputtering onto the glass substrate to consider the influence of Ag interlayer on the optical properties of the films. The thickness of $TiO_2$ films was kept at 24 nm, while the thickness of Ag interlayer was varied as 5, 10, 15, and 20 nm. As-deposited $TiO_2$ single layer films show the optical transmittance of 66.7% in the visible wave-length region and the optical reflectance of 16.5%, while the $TiO_2$ films with a 15 nm thick Ag interlayer show the enhanced optical transmittance of 80.2% and optical reflectance of 77.8%. The carrier concentration was also influenced by Ag interlayer. The highest carrier concentration of $1.01{\times}10^{23}cm^{-3}$ was observed for a 15 nm thick Ag interlayer in $TiO_2/Ag/TiO_2$ films. The observed result means that an optimized Ag interlayer in $TiO_2/Ag/TiO_2$ films enhanced the structural and optical properties of the films.

• Journal of the Optical Society of Korea
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• v.17 no.5
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• pp.447-453
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• 2013

A micro zoom system without moving elements by use of two liquid lenses is designed and optimized in this paper. The zoom equations of the system composed of two liquid lenses are deduced. The structure parameters including radius and thickness of a conical double-liquid electrowetting based lens are analyzed and calculated. Because the liquid thickness varies non-linearly with the radius of the interface, it's very difficult to optimize a real liquid lens using commercial optical design software directly. Through the Application Programming Interface (API) of the optical design software CODE V, a zoom system with two real electrowetting based liquid lenses is modeled and optimized. A two-liquid-lens zoom system without moving elements, with a zoom factor of 1.8 and a compact structure of 10 mm is designed for illustration. This can be useful for the camera design of mobile phones, tablets and so on. And this paper presents a convenient way of designing and optimizing a zoom system including liquid lenses by commercial optical design software.

• Current Optics and Photonics
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• v.5 no.5
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• pp.576-582
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• 2021

Dichroic beam-splitter (DBS) with polarization-maintaining took an important role in the free space quantum telecommunication tests on the Micius satellite of China. In this presentation, we designed and prepared a 50 layer polarization-maintaining DBS coating by a dual ion beam sputtering deposition (Dual-IBS) method. In order to solve a stress problem, an 18 layer special anti-reflection (AR) coating with similar physical thickness ratio was deposited on the backside. By stress compensation, the surface flatness RMS value of the DBS sample decreased from 0.341 λ (@632.8 nm) to 0.103 λ while beam splitting and polarization maintaining properties were almost kept unchanged. Further, we discussed the mechanism of film stress and stress compensation by equation deduction and found that total stress had a strong relationship with the total physical thickness and the ratio of layer materials.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2002.10b
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• pp.91-92
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• 2002

Most studies of elsatohydrodynamic lubrication are oriented only to the measurement of film thickness itself with optical interferometer. In order to exactly investigate the characteristics of a certain lubricant under the condition of additives. especially for traction performance. it is also important to get the information of traction force as well. In this work. we developed the device for measuring friction force of EHL contact condition, which can trace the film thickness over the contact area with optical interferometer. To verify the validity of the measuring system, the friction force and film thickness under EHL condition are measured with the variation of additive ratios of viscosity Index improvers.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.768-770
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• 2003

In AC PDP, since charges generated by gas discharge are accumulated on the dielectric. The dielectric is a major factor to determine cell capacitance and its memory effect is a play an important role in PDP driving. In this experiment, we have investigated the electro-optical characteristics with dielectric thickness and we have analyzed wall charge and wall voltage by Q-V energy diagram. The dielectric thickness was varied from 20 um to 50 um. As results, according to the dielectric thickness increase,cell capacitance and power consumption is reduced.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1556-1559
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• 2005

Indium-tin oxide (ITO) films were deposited by a low-frequency (LF, 100 Hz) magnetron sputtering on glass substrates at the room temperature. The effects of the film thickness on the structural, electrical and optical properties of ITO films were investigated. With the film thickness the films reveal better crystallinity, showing both (222) and (400) pla nes in the XRD pattern. The optical transmittance and the sheet resistance of the films decreased with the increasing thickness. In addition, the electrical properties of ITO films were improved after annealing in a vacuum.

• Journal of the Semiconductor & Display Technology
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• v.2 no.2
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• pp.9-15
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• 2003

This paper proposes a thickness measurement method of silicon-oxide and poly-silicon film deposited on 12" silicon wafer for spin etcher. Halogen lamp is used as a light source for generating a wide-band spectrum, which is guided and focused on the wafer surface through a optical fiber cable. Interference signal from the film is detected by optical sensor to determine the thickness of the film using spectrum analysis and several signal processing techniques including curve-fitting and adaptive filtering. Test wafers with three kinds of priori-known films, polysilicon(300 nm), silicon-oxide(500 nm) and silicon-oxide(600 nm), are measured while the wafer is spinning at 20 Hz and DI water flowing on the wafer surface. From experiment results the algorithm presented in the paper is proved to be effective with accuracy of maximum 0.8% error.rror.

• Transactions on Electrical and Electronic Materials
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• v.17 no.4
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• pp.235-237
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• 2016

Oxide/metal/oxide (OMO) thin films were fabricated using amorphous indium-gallium-zinc-oxide (a-IGZO) and an Ag metal layer on a glass substrate at room temperature. The optical and electrical properties of the a-IGZO/Ag/a-IGZO samples changed systemically depending on the thickness of the Ag layer. The transmittance in the visible range tends to decrease as the Ag thickness increases while the resistivity, carrier concentration, and Hall mobility tend to improve. The a-IGZO/Ag (13 nm)/a-IGZO thin film with the optimum Ag thickness showed an average transmittance (T_av) of 71.7%, resistivity of 6.63 × 10⁻⁵ Ω·cm and Hall mobility of 15.22 cm²V⁻¹s⁻¹.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.28 no.1
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• pp.9-13
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• 2018

In this work, we investigated the variation of optical characteristics with the thickness of bulk GaN grown by hydride vapor phase epitaxy(HVPE) to evaluate applicability as GaN substrates in fabrication of high-brightness optical devices and high-power devices. We fabricated 2-inch GaN substrates by using HVPE method of various thickness (0.4, 0.9, 1.5 mm) and characterized the optical property with the variation of defect density and the residual stress using chemical wet etching, Raman spectroscopy and photoluminescence. As a result, we confirmed the correlation of optical properties with GaN crystal thickness and applicability of high performance optical devices via fabrication of homoepitaxial substrate.