• 한국재료학회지
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• 제12권4호
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• pp.254-258
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• 2002

To realize channel cross-connecting in optical communications systems, a high speed optical matrix switch was fabricated using z-cut $LiNbO_3$. For switch fabrication was design bending structure and coupling length and four $2{\times}2$ directional couplers were integrated on one substrate far construction of a $4{\times}4$ switch. Single-mode optical waveguides were formed by Ti-diffusion at a wet $O_2$ atmosphere. Ti-diffusion profile, refractive index variation and waveguide morphology were analyzed by Prism coupler and optical microscopy, respectively.

• Journal of the Optical Society of Korea
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• 제13권3호
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• pp.341-348
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• 2009

We report the development of full-field swept-source optical coherence tomography (SS-OCT) in the wavelength range of 815-870 nm using a unique combination of super-luminescent diode (SLD) as broad-band light source and acousto-optic tunable filter (AOTF) as a frequency-scanning device. Some new applications of full-field SS-OCT in forensic sciences and engineering materials have been demonstrated. Results of simultaneous topography and tomography of latent fingerprints, silicon microelectronic circuits and composite materials are presented. The main advantages of the present system are completely non-mechanical scanning, wide-field, compact and low-cost.

• 대한기계학회논문집B
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• 제34권1호
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• pp.73-76
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• 2010

MEMS 기술이 발전함에 따라 MEMS 공정으로 제작된 미소 구조물들의 검사 및 특성 분석이 매우 중요한 문제로 떠오르고 있다. 그러나 주사 전자현미경(SEM)이나 원자현미경(AFM) 그리고 기계적 표면측정장치 등은 가격적인 측면에서나 방법적인 측면에서 많은 단점을 안고 있다. 본 논문에서는 DVD 광 픽업 장치를 이용하여 미소구조물을 높이를 측정하였다. 미소구조물 시편에서 반사된 빛의 강도를 측정하여 시편의 영상을 만들어냈고 미소구조물의 높이는 포토다이오드에서 측정된 포커스에러신호(FES)을 통해 구할 수 있었다. 제시된 광 픽업 스캐너는 기존 측정 장치와 비교하여 저렴한 비용으로 정밀한 측정이 가능함을 보여주었고, 기존의 기술을 대체할 수 있는 시스템으로 사용될 수 있을 것이다.

• 한국재료학회지
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• 제24권3호
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• pp.145-151
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• 2014

Solution-based Sb-doped $SnO_2$ (ATO) transparent conductive oxides using a low-temperature process were fabricated by an electrospray technique followed by spin coating. We demonstrated their structural, chemical, morphological, electrical, and optical properties by means of X-ray diffraction, X-ray photoelectron spectroscopy, field-emission scanning electron microscopy, atomic force microscopy, Hall effect measurement system, and UV-Vis spectrophotometry. In order to investigate optimum electrical and optical properties at low-temperature annealing, we systemically coated two layer, four layer, and six layers of ATO sol-solution using spin-coating on the electrosprayed ATO thin films. The resistivity and optical transmittance of the ATO thin films decreased as the thickness of ATO sol-layer increased. Then, the ATO thin films with two sol-layers exhibited superb figure of merit compared to the other samples. The performance improvement in a low temperature process ($300^{\circ}C$) can be explained by the effect of enhanced carrier concentration due to the improved densification of the ATO thin films causing the optimum sol-layer coating. Therefore, the solution-based ATO thin films prepared at $300^{\circ}C$C exhibited the superb electrical (${\sim}7.25{\times}10^{-3}{\Omega}{\cdot}cm$) and optical transmittance (~83.1 %) performances.

• 한국재료학회지
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• 제25권3호
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• pp.125-131
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• 2015

Fluorine-doped $SnO_2$ (FTO) thin film/Ag nanowire (NW) double layers were fabricated by means of spin coating and ultrasonic spray pyrolysis. To investigate the optimum thickness of the FTO thin films when used as protection layer for Ag NWs, the deposition time of the ultrasonic spray pyrolysis process was varied at 0, 1, 3, 5, or 10 min. The structural, chemical, morphological, electrical, and optical properties of the double layers were examined using X-ray diffraction, X-ray photoelectron spectroscopy, field-emission scanning electron microscopy, transmission electron microscopy, the Hall effect measurement system, and UV-Vis spectrophotometry. Although pure Ag NWs formed isolated droplet-shaped Ag particles at an annealing temperature of $300^{\circ}C$, Ag NWs covered by FTO thin films maintained their high-aspect-ratio morphology. As the deposition time of the FTO thin films increased, the electrical and optical properties of the double layers degraded gradually. Therefore, the double layer fabricated with FTO thin films deposited for 1 min exhibited superb sheet resistance (${\sim}14.9{\Omega}/{\Box}$), high optical transmittance (~88.6 %), the best FOM (${\sim}19.9{\times}10^{-3}{\Omega}^{-1}$), and excellent thermal stability at an annealing temperature of $300^{\circ}C$ owing to the good morphology maintenance of the Ag NWs covered by FTO thin films.

• 한국재료학회지
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• 제27권12호
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• pp.705-709
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• 2017

The electronic and optical characteristics of molybdenum disulphide ($MoS_2$) film significantly vary with its thickness, and thus a rapid and accurate estimation of the number of $MoS_2$ layers is critical in practical applications as well as in basic researches. Various existing methods are currently available for the thickness measurement, but each has drawbacks. Transmission electron microscopy allows actual counting of the $MoS_2$ layers, but is very complicated and requires destructive processing of the sample to the point where it will no longer be useable after characterization. Atomic force microscopy, particularly when operated in the tapping mode, is likewise time-consuming and suffers from certain anomalies caused by an improperly chosen set point, that is, free amplitude in air for the cantilever. Raman spectroscopy is a quick characterization method for identifying one to a few layers, but the laser irradiation causes structural degradation of the $MoS_2$. Optical microscopy works only when $MoS_2$ is on a silicon substrate covered with $SiO_2$ of 100~300 nm thickness. The last two optical methods are commonly limited in resolution to the micrometer range due to the diffraction limits of light. We report here a method of measuring the distribution of the number of $MoS_2$ layers using a low voltage field emission electron microscope with acceleration voltages no greater than 1 kV. We found a linear relationship between the FESEM contrast and the number of $MoS_2$ layers. This method can be used to characterize $MoS_2$ samples at nanometer-level spatial resolution, which is below the limits of other methods.

• 한국재료학회지
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• 제26권4호
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• pp.194-199
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• 2016

We prepared polymethyl methacrylate (PMMA) beads with a particle size of 80 nm to improve the energy conversion efficiency (ECE) by increasing the effective surface area and the dye absorption ability of the working electrodes (WEs) in a dye sensitized solar cell (DSSC). We prepared the $TiO_2$ layer with PMMA beads of 0.0~1.0 wt%; then, finally, a DSSC with $0.45cm^2$ active area was obtained. Optical microscopy, transmission electron microscopy, field emission scanning electron microscopy, and atomic force microscopy were used to characterize the microstructure of the $TiO_2$ layer with PMMA. UV-VIS-NIR was used to determine the optical absorbance of the WEs with PMMA. A solar simulator and a potentiostat were used to determine the photovoltaic properties of the PMMA-added DSSC. Analysis of the microstructure showed that pores of 200 nm were formed by the decomposition of PMMA. Also, root mean square values linearly increased as more PMMA was added. The absorbance in the visible light regime was found to increase as the degree of PMMA dispersion increased. The ECE increased from 4.91% to 5.35% when the amount of PMMA beads added was increased from 0.0 to 0.4 wt%. However, the ECE decreased when more than 0.6 wt% of PMMA was added. Thus, adding a proper amount of PMMA to the $TiO_2$ layer was determined to be an effective method for improving the ECE of a DSSC.

• 한국결정성장학회지
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• 제23권5호
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• pp.235-240
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• 2013

그래핀(Graphene)은 전기 전도성 및 열전도성이 우수하고 1 nm 수준의 초 박막 형 필름 소재를 제조할 수 있다는 장점으로 인하여, 차세대 트랜지스터 소자 및 디스플레이 장치에 적용 가능한 방열 소재로서 많은 연구가 활발히 진행되고 있다. 또한 CVD(chemical vapor deposition)제조법으로 합성된 그래파이트(Graphite)는 구조의 단순성 및 유연성 때문에 안정하고 열에 강한 탄소계 방열소재로 주목 받고 있다. 본 연구는 열전도도가 우수한 폼(foam)형태의 구리를 촉매로 상압과 진공에서의 CVD법을 이용하여 그래핀을 성장시킨 후 구리 폼의 기공 안에 다양한 종류의 그래파이트(Natural graphite, expandable(/expanded) graphite, etc)를 복합 및 안정화시켜 기존보다 높은 열전도도를 가지는 방열소재를 개발하였다. 제조된 금속폼/그래파이트 소재를 OM(optical microscopy)과 SEM(scanning electron microscopy)을 이용하여 표면을 확인하였고 DSC(Differential Scanning Calorimetry), 아르키메데스 법을 활용한 비열, 밀도 결과를 확보하였다. 또한 LFA(Laser Flash Analysis)를 이용하여 열 확산계수 예측을 통한 열전도 특성을 평가하였다.

• Journal of Welding and Joining
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• 제31권1호
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• pp.43-50
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• 2013

The spot welds of Transformation Induced Plasticity (TRIP) steels are prone to interfacial failure and narrow welding current range. Hard microstructures in weld metal and heat affected zone arenormally considered as one of the main reason to accelerate the interfacial failure mode. There fore, detailed observation of weld microstructure for TRIP steels should be made to ensure better weld quality. However, it is difficult to characterize the microstructure, which has similar color, size, and shape using the optical or electron microscopy. The atomic force microscope (AFM) can help to analyze microstructure by using different energy levels for different surface roughness. In this study, the microstructures of resistance spot welds for AHSS are analyzed by using AFM with measuring the differences in average surface roughness. It has been possible to identify the different phases and their topographic characteristics and to study their morphology using atomic force microscopy in resistance spot weld TRIP steels. The systematic topographic study for each region of weldments confirmed the presence of different microstructures with height of 350nm for martensite, 250nm for bainite, and 150nm for ferrite, respectively.

• 센서학회지
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• 제27권1호
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• pp.55-58
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• 2018

Low-cost and large-scale fabrication method of nanohole array, which comprises nanoscale voids separated by a few tens to a few hundreds of nanometers, has opened up new possibilities in biomolecular sensing as well as novel frontier optical devices. One of the key aspects of the nanohole array research is how to control the hole size following each specific needs of the hole structure. Here, we report the extensive study on the fine control of the hole size within the range of 500-2500 nm via surface-catalyzed chemical deposition. The initial hole structures were prepared via conventional photo-lithography, and the hole size was decreased to a designed value through the surface-catalyzed chemical reduction of the gold ion on the predefined hole surfaces, by simple dipping of the hole array device into the aqueous solution of gold chloride and hydroxylamine. The final hole size was controlled by adjusting reaction time, and the optimal experimental condition was obtained by doing a series of characterization experiments. The characterization of size-controlled hole array was systematically examined on the image results of optical microscopy, field emission scanning electron microscopy(FESEM), atomic-force microscopy(AFM), and total internal reflection microscopy.