통합 검색 | Korea Science

유형근;이강원
- 한국전기전자재료학회논문지
- /
- 제27권5호
- /
- pp.328-341
- /
- 2014
The object of this paper is to develop optimal optical filter, which can be used to identify the financial account and read the information. The five factors which affect the performance of the optical filter are identified as optical glass type, existence of Fe, Photo pic coating type, and coating form. In this study we seek to determine the optimal combination for the best design of the optical filter. For each combination, the performances of optical filter are investigated using the proper experimental equipments and methods. White-state voltage, black-state voltage, and black-state error rate are used for the performance measures. Through the statistical analysis of the performance data collected, we have determined the optimal design of the optical filter.
https://doi.org/10.4313/JKEM.2014.27.5.328 인용 PDF KSCI

Heo, H.P.;Kong, J.P.;Kim, Y.S.;Park, J.E.;Chang, Y.J.;Lee, S.H.
- 대한원격탐사학회:학술대회논문집
- /
- 대한원격탐사학회 2006년도 Proceedings of ISRS 2006 PORSEC Volume I
- /
- pp.372-375
- /
- 2006
The MSC is a high resolution multi-spectral camera system which is mounted on the KOMPSAT-II satellite. The electro-optic camera system has a refocusing mechanism which can be used in-orbit by ground commands. By adjusting locations of some elements in optics, the system can be focused precisely. The focus mechanism in MSC is implemented with stepper motor and potentiometer. By reading the value of the potentiometer, rough position of the motor can be understood. The exact location of the motor can not be acquired because the information from the potentiometer can not be so accurate. However, before and after certain events of the satellite, like a satellite launch, the direction of the movement or order of the magnitude of the movement can be understood. In this paper, the trend analysis of the focus motor position during the ground test phase is introduced. This result can be used as basic information for the focus calibration after launch. By studying the long term trend, deviation from the best focal point can be understood. The positions of the focus motors after launch are also compared.
PDF

Jang, Hae-Gyu;Choi, Sang-Hyuk;Chae, Hee-Yeop
- 한국진공학회:학술대회논문집
- /
- 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
- /
- pp.182-182
- /
- 2012
Plasma etching is used in various semiconductor processing steps. In plasma etcher, optical- emission spectroscopy (OES) is widely used for in-situ endpoint detection. However, the sensitivity of OES is decreased if polymer is deposited on viewport or the proportion of exposed area on the wafer is too small. Because of these problems, the object is to investigate the suitability of using plasma impedance monitoring (PIM) and self plasma optical emission spectrocopy (SPOES) with statistical approach for in-situ endpoint detection. The endpoint was determined by impedance signal variation from I-V monitor (VI probe) and optical emission signal from SPOES. However, the signal variation at the endpoint is too weak to determine endpoint when $SiO_2$ and SiNx layers are etched by fluorocarbon on inductive coupled plasma (ICP) etcher, if the proportion of $SiO_2$ and SiNx area on Si wafer are small. Therefore, modified principal component analysis (mPCA) is applied to them for increasing sensitivity. For verifying this method, detected endpoint from impedance monitoring is compared with optical emission spectroscopy.
PDF