• Title/Summary/Keyword: Optical Alignment System

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Automatic Alignment of a Collimating Mirror by Using Phase Image Correlatio (위상 이미지 상관기법을 이용한 시준거울의 자동정렬)

  • Kim, Hyun-Suk;Tserendolgor, D.;Kim, Dae-Suk;Lee, Hyung-Chul;Kim, Soo-Hyun
    • Korean Journal of Optics and Photonics
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    • v.22 no.1
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    • pp.30-34
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    • 2011
  • A novel alignment method that can be used for aligning the collimating mirror employed in a monochromator is described. In most of the spectrometer industry, the alignment of optical components such as a focusing mirror, a grating and a collimating mirror has been performed manually so far. In this paper, we use a matchedfilter based image correlation technique for measuring the accurate image position which is used for aligning the collimating mirror. The experimental results show that with the proposed scheme automatic alignment can be completed within 10 seconds.

Optic-axis Alignment and Performance Test of the Schwarzschild-Chang Off-axis Telescope

  • Park, Woojin;Pak, Soojong;Chang, Seunghyuk;Jeong, Byeongjoon;Lee, Kwang Jo;Kim, Yonghwan;Ji, Tae-Geun
    • The Bulletin of The Korean Astronomical Society
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    • v.42 no.1
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    • pp.56.4-57
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    • 2017
  • The Schwarzschild-Chang off-axis telescope is a "linear astigmatism-free" confocal system. The telescope comprises two pieces of aluminum-alloy freeform mirrors that are fabricated with diamond turning machine (DTM) process. We designed optomechanical structures where optical components in the telescope system can be adjustable on a linear stage. Optomechanical deformation caused by the weight of system itself and its temperature variation is analyzed by the finite element analysis (FEA). The results show that the deformation is estimated in the tolerance range. For the optic-axis alignment of telescope system, three-point alignment (TPA) method is chosen. The TPA method uses three parallel lasers and a plane mirror. Point source images were taken from collimated light and field observation. The performance of optical system was tested by point spread function and aberration measurement of the point sources.

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Measurement of Primary-mirror Vertex Coordinates for a Space Camera by Using a Computer-generated Hologram and a Theodolite (컴퓨터 제작 홀로그램과 데오도라이트를 이용한 인공위성 카메라 주 반사경의 정점 좌표 측정)

  • Kang, Hye-Eun;Song, Jae-Bong;Yang, Ho-soon;Kihm, Hagyong
    • Korean Journal of Optics and Photonics
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    • v.28 no.4
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    • pp.146-152
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    • 2017
  • Alignment of the mirrors composing a space telescope is an important process for obtaining high optical resolution and performance of the camera system. The alignment of mirrors using cube mirrors requires a relative coordinate mapping between the mirror and the cube mirror before optical-system integration. Therefore, to align the spacecraft camera mirrors, the relative coordinates of the vertex of each mirror and the corresponding cube mirror must be accurately measured. This paper proposes a new method for finding the vertex position of a primary mirror, by using an optical fiber and alignment segments of a computer-generated hologram (CGH). The measurement system is composed of an optical testing interferometer and a multimode optical fiber. We used two theodolites to measure the relative coordinates of the optical fiber located at the mirror vertex with respect to the cube mirror, and achieved a measurement precision of better than $25{\mu}m$.

A Wafer Pre-Alignment System Using a High-Order Polynomial Transformation Based Camera Calibration (고차 다항식 변환 기반 카메라 캘리브레이션을 이용한 웨이퍼 Pre-Alignment 시스템)

  • Lee, Nam-Hee;Cho, Tai-Hoon
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.1
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    • pp.11-16
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    • 2010
  • Wafer Pre-Alignment is to find the center and the orientation of a wafer and to move the wafer to the desired position and orientation. In this paper, an area camera based pre-aligning method is presented that captures 8 wafer images regularly during 360 degrees rotation. From the images, wafer edge positions are extracted and used to estimate the wafer's center and orientation using least squares circle fitting. These data are utilized for the proper alignment of the wafer. For accurate alignments, camera calibration methods using high order polynomials are used for converting pixel coordinates into real-world coordinates. A complete pre-alignment system was constructed using mechanical and optical components and tested. Experimental results show that alignment of wafer center and orientation can be done with the standard deviation of 0.002 mm and 0.028 degree, respectively.

Nonhermetic Plastic Packaged Optical Modules of Passive Optical Fiber Alignment Method (수동 광섬유정렬을 이용한 Nohermetic 플라스틱 패키지 광모듈)

  • Lim, Dong-Cheol;Lee, Won-Jong;Kang, Suk-Youb;Park, Hyo-Dal
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.31 no.11A
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    • pp.1053-1058
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    • 2006
  • In this paper, We proposed a efficient OSA(Optical Sub-Assembly) packaging method in use 1.31/1.49um bi-directional hybrid-integrated PLC chip for low-cost OSA in optical access network system applications as GE-PON in FTTH. Fabricated OSA with passive optical fiber alignment and nonhermetic plastic package method and measured optical coupling efficiency and electric-optical characteristics. Its performance is feasible to satisfy the GE-PON ONU specifications with the results as less than 0.5dB coupling losses within 40um alignment of z-axis and less than -24dBm sensitivity. It also has good temperature characteristics to sustain optical output power more than 1.5mW and 10dB extinction ratio, less than 0.3dB tracking error.

Comparison between Two Coordinate Transformation-Based Orientation Alignment Methods (좌표변환 기반의 두 자세 정렬 기법 비교)

  • Lee, Jung-Keun;Jung, Woo-Chang
    • Journal of Sensor Science and Technology
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    • v.28 no.1
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    • pp.30-35
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    • 2019
  • Inertial measurement units (IMUs) are widely used for wearable motion-capturing systems in the fields of biomechanics and robotics. When the IMUs are combined with optical motion sensors (hereafter, OPTs) for their complementary capabilities, it is necessary to align the coordinate system orientations between the IMU and OPT. In this study, we compare the application of two coordinate transformation-based orientation alignment methods between two coordinate systems. The first method (M1) applies angular velocity coordinate transformation, while the other method (M2) applies gyroscopic angle coordinate transformation. In M1 and M2, the angular velocities and angles, respectively, are acquired during random movement for a least-square algorithm to determine the alignment matrix between the two coordinate systems. The performance of each method is evaluated under various conditions according to the type of motion during measurement, number of data points, amount of noise, and the alignment matrix. The results show that M1 is free from drift errors, while drift errors are present in most cases where M2 is applied. Thus, this study indicates that M1 has a far superior performance than M2 for the alignment of IMU and OPT coordinate systems for motion analysis.

Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device

  • Lee, Dong-Hee
    • Journal of the Optical Society of Korea
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    • v.14 no.3
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    • pp.266-276
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    • 2010
  • In the present study, an optical system is proposed for maskless lithography using a digital micromirror device (DMD). The system consists of an illumination optical system, a DMD, and a projection lens system. The illumination optical system, developed for 95% uniformity, is composed of fly's eye lens plates, a 405 nm narrow band pass filter (NBPF), condensing lenses, a field lens and a 250W halogen lamp. The projection lens system, composed of 8 optical elements, is developed for 4 ${\mu}m$ resolution. The proposed system plays a role of an optical engine for PCB and/or FPD maskless lithography. Furthermore, many problems arising from the presence of masks in a conventional lithography system, such as expense and time in fabricating the masks, contamination by masks, disposal of masks, and the alignment of masks, may be solved by the proposed system. The proposed system is verified by lithography experiments which produce a line pattern with the resolution of 4 ${\mu}m$ line width.