• Title/Summary/Keyword: OTS SAMs

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Surface Characteristics of Silicon Substrates Coated with Self-assembled Mono-layers (자체조립 단일막으로 코팅된 실리콘 기판의 표면특성)

  • 최성훈;강호종
    • Polymer(Korea)
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    • v.28 no.1
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    • pp.3-9
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    • 2004
  • Silane modified perfluoropolyethers (SPFPE) was synthesized as a self-assembled mono-layers (SAMs) thin film for micro-electro mechanical system (MEMS). SPFPE was compared to the Perfluoropolyethers (PFPE) as well as octadecyltrichlorosilane (OTS) and perfluorooctyltrichlorosilane (FOTS) with respect to the development of hydrophobicity in the SAMs surface. SPFPE shows less hydrophobicity than those of OTS and FOTS. Thermal annealing of SPFPE SAMs resulted in the enhancement of hydrophobicity as much as those of OTS and FOTS. The SAMs formed from SPFPE were found to be similar as OTS and FOTS SAMs with smooth R$\sub$a/ values of 0.3 nm. However, the flexible chain mobility of SPFPE resulted in 50% reduction as much as the fiction force in OTS.

After treated the OTS of the gate insulator, the OTFT electric property of active layer Pentacene growth (게이트 절연막에 OTS를 처리한 후 활성층 Pentacene 성장에 따른 OTFT 전기적 특성)

  • Son, Jae-Gu;Oh, Teresa;Kim, Hong-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.238-239
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    • 2006
  • 본 논문은 게이트 절연막에 OTS(n-octadecy trichlorosilance) 혼합용액을 이용하여 SAMs(Self-Assembled Monolayers)막을 형성하였다. OTS 혼합용액은 OTS를 0.1w%와 0.5w% 각각을 클로로포름 30w%와 헥산 70w%에 혼합하여 만들었다. 이 혼합용액을 게이트 절연막위에 표면처리하였다. 활성층인 Pentacene이 게이트 절연막 위에 증착될 때, OTS 혼합용액의 비에 따라 누설전류특성을 보았다. OTS를 0.1w% 처리한것이 0.5w%보다 누설전류가 더 작게 나타났다. 결과적으로 OTFT의 게이트 절연막의 절열특성은 향상시키는데 OTS 혼합용액의 비가 큰 영향을 준다.

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Surface Characteristics of Silicon Substrates Coated with Octadecyltrichlorosilane (옥타데실트리클로로실란 코팅에 의한 실리콘 표면 특성 변화)

  • 유희재;김수경;김진홍;강호종
    • Polymer(Korea)
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    • v.27 no.6
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    • pp.555-561
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    • 2003
  • The self-assembled monolayer coating of octadecyltrichlorosilane (OTS) on the silicon based MEMS was investigated and surface characteristics were considered as a function of coating conditions and reagent composition. The sulfuric peroxide mixture (SPM) solution was used to form -OH group which caused the hydrophilic characteristic on silicon surftce. Highest hydrophilicity was obtained by SPM solution with 85% acid content at room temperature. OTS was applied on the silicon surface by means of self-assembled monolayers (SAMs) coating. It was found that sol-gel reaction was took place between -OH group on the silicon surface and -Cl group in OTS. As a result, the contact angle increased due to the increase of hydrophobicity by Si-O bonding of SAMs. Sol-gel reaction could be controlled by coating conditions as well as reagent composition in OTS coating solution.

A Study on Tribological Characteristics of Materials for MEMS/NEMS Using Chemically Modified AFM tip (AFM을 이용한 MEMS/NEMS 공정용 재료의 트라이볼로지 특성에 관한 연구)

  • Heo, Jung-Chul;Kim, Kwang-Seop;Kim, Kyung-Woong
    • Tribology and Lubricants
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    • v.24 no.2
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    • pp.63-71
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    • 2008
  • Friction and adhesion tests were conducted to investigate tribological characteristics of materials for MEMS/NEMS using atomic force microscope (AFM). AFM Si tips were chemically modified with a self-assembled monolayer (SAM) derived from trichlorosilane like octadecyltrichlorosilane (OTS) and (1H, 1H, 2H, 2H-perfluorooctyl) trichlorosilane (FOTS), and various materials, such as Si, Al, Au, Cu, Ti and PMMA films, were prepared for the tests. SAMs were coated on Si wafer by dipping method prior to AFM tip to determine a proper dipping time. The proper dipping time was determined from the measurements of contact angle, surface energy and thickness of the SAMs. AFM tips were then coated with SAMs by using the same coating condition. Friction and adhesion forces between the AFM Si tip modified with SAM and MEMS/NEMS materials were measured. These forces were compared to those when AFM tip was uncoated. According to the results, after coating OTS and FOTS, the friction and adhesion forces on all materials used in the tests decreased; however, the effect of SAM on the reduction of friction and adhesion forces could be changed according to counterpart materials. OTS was the most effective to reduce the friction and adhesion forces when counterpart material was Cu film. In case of FOTS, friction and adhesion forces decreased the most effectively on Au films.

Amino-Functionalized Alkylsilane SAM-Assisted Patterning of Poly(3-hexylthiophene) Nanofilm Robustly Adhered to SiO2 Substrate

  • Pang, Ilsun;Boo, Jin-Hyo;Sohn, Honglae;Kim, Sung-Soo;Lee, Jae-Gab
    • Bulletin of the Korean Chemical Society
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    • v.29 no.7
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    • pp.1349-1352
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    • 2008
  • We report a novel patterning method for a homo-polymeric poly(3-hexylthiophene) (P3HT) nanofilm particularly capable of strong adhesion to a $SiO_2$ surface. An oxidized silicon wafer substrate was micro-contact printed with n-octadecyltrichlorosilane (OTS) monolayer, and subsequently its negative pattern was selfassembled with three different amino-functionalized alkylsilanes, (3-aminopropyl)trimethoxysilane (APS), N- (2-aminoethyl)-3-aminopropyltrimethoxy silane (EDAS), and (3-trimethoxysilylpropyl) diethylenetriamine (DETAS). Then, P3HT nanofilms were selectively grown on the aminosilane pre-patterned areas via the vapor phase polymerization method. To evaluate the adhesion, patterning, and the film itself, the PEDOT nanofilms and SAMs were investigated with a $Scotch^{(R)}$ tape test, contact angle analyzer, ATR-FT-IR, and optical and atomic force microscopes. The evaluation showed that the newly developed all bottom-up process can offer a simple and inexpensive patterning method for P3HT nanofilms robustly adhered to an oxidized Si wafer surface by the mediation of $FeCl_3$ and amino-functionalized alkylsilane SAMs.

Organic Thin-Film Transistors with Screen Printed Silver Source/Drain Electrodes

  • Kim, Sam-Soo;Kim, Min-Soo;Choi, Gyu-Seok;Kim, Heon-Gon;Kim, Yong-Bae;Lee, Dong-Gu;Roh, Jae-Seong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1305-1307
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    • 2007
  • We show that the electrical properties of organic thinfilm transistors(OTFTs) can be enhanced by controlling the morphology of interface between screen printed electrodes and gate dielectrics. Modified surface of the insulator layer($SiO_2$) affect on the interface energy of electrode on $SiO_2$ layer. Contact angle measurement and FT-IR spectrum shows that the interface is properly modified. OTFTs device with high efficiency has been realized through modification of interface layer.

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The performance of the Co gate electrode formed by using selectively chemical vapor deposition coupled with micro-contact printing

  • Yang, Hee-Jung;Lee, Hyun-Min;Lee, Jae-Gab
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1119-1122
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    • 2005
  • A selective deposition of Co thin films for thin film transistor gate electrode has been carried out by the growth with combination of micro-contact printing and metal organic chemical vapor deposition (MOCVD). This results in the elimination of optical lithography process. MOCVD has been employed to selectively deposit Co films on preformed OTS gate pattern by using micro-contact printing (${\mu}CP$). A hydrogenated amorphous silicon TFT with a Co gate selectively formed on SAMs patterned structure exhibited a subthreshold slope of 0.88V/dec, and mobility of $0.35cm^2/V-s$, on/off current ratio of $10^6$, and a threshold voltage of 2.5V, and thus demonstrating the successful application of the novel bottom-up approach into the fabrication of a-Si:H TFTs.

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Formation of parallel nanostructures by Surface-Patterning Technique for the Application to Nano-Device (나노 소자의 응용을 위한 표면 패터닝 기술을 이용한 평형한 나노구조물 형성)

  • Kim, Yu-Duk;Kim, Hyung-Jin;Hong, Byung-You
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.514-514
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    • 2007
  • 1차원 구조를 갖는 나노 와이어들은 나노 소자를 구현하기 위한 building-block으로 많은 과학자들의 주목을 받고 있고 또한 연구되고 있다. 하지만 그것을 정확하게 위치시키고 일정한 간격으로 정렬시키기 위한 기술 개발은 아직도 해결해야 할 큰 과제로 남아 있다. 이 논문에서, 우리는 ahsing 기술과 표면 패터닝 기술을 이용하여 대면적의 실리콘웨이퍼 위에 DNA(deoxyribonucleic acid)를 기반으로 한 금 나노 와이어를 정확하게 위치시키고 일정한 간격으로 정렬시킬 수 있는 새로운 제어 기술을 제안한다. 먼저 우리는 포토 리소그래피 공정과 $O_2$ 플라즈마 ashing 기술을 이용하여 선폭을 100 nm로 감소 시켰다. 그리고 자기조립단분자막 (self-assembled monolayers; SAMs) 방법과 lift-off 공정을 반복함으로서 1-octadecyltrichlorosilane(OTS) 층과 aminopropylethoxysilane(APS) 층을 형성하였다. 마지막으로 DNA 용액을 샘플 표면 위에 도포하고 분자 빗질 방법으로 DNA를 한 방향으로 정렬 시켰고 금 나노입자 용액을 처리하였다. 그 결과 금 나노 와이어는 $10{\mu}m$ 간격으로 일정하게 정열 되었고, APS 층에만 정확하게 정렬되었다. 우리는 금 나노 와이어를 관찰하기 위하여 원자간력 현미경 (Atomic Force Microscope AFM)을 사용하였다.

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Deposition of Poly(3-hexylthiophene)(P3HT) by Vapor Deposition and Patterning Using Self-Assembled Monolayers (Oxide 표면에 Self-Assembly Monolayers를 이용한 전도성 고분자 Poly(3-hexylthiophene)(P3HT) 증착 및 Patterning 연구)

  • Pang, Il-Sun;Kim, Hyun-Ho;Kim, Sung-Soo;Lee, Jae-Gab
    • Korean Journal of Materials Research
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    • v.18 no.12
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    • pp.664-668
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    • 2008
  • Vapor phase polymerization of a conductive polymer on a $SiO_2$ surface can offer an easy and convenient means to depositing pure and conductive polymer thin films. However, the vapor phase deposition is generally associated with very poor adhesion as well as difficulty when patterning the polymer thin film onto an oxide dielectric substrate. For a significant improvement of the patternability and adhesion of Poly(3-hexylthiophene) (P3HT) thin film to a $SiO_2$ surface, the substrate was pre-patterned with n-octadecyltrichlorosilane (OTS) molecules using a ${\mu}$-contact printing method. The negative patterns were then backfilled with each of three amino-functionalized silane self-assembled monolayers (SAMs) of (3-aminopropyl) trimethoxysilane (APS), N-(2-aminoethyl)-aminopropyltrimethoxysilane (EDA), and (3- trimethoxysilylpropyl)diethylenetriamine (DET). The quality and electrical properties of the patterned P3HT thin films were investigated with optical and atomic force microscopy and a four-point probe. The results exhibited excellent selective deposition and significantly improved adhesion of P3HT films to a $SiO_2$ surface. In addition, the conductivity of polymeric thin films was relatively high (${\sim}13.51\;S/cm$).