• Title/Summary/Keyword: OLEOs

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The Electrical Properties of Green OLED by Thickness of Al Layer (녹색 발광 OLED의 음극 두께 변화에 따른 전기적 특성)

  • Yang, Myung-Hak;Ki, Hyun-Chul;Kwak, Jae-Young;Min, Yong-Gi;Hong, Kyung-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.04c
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    • pp.42-44
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    • 2008
  • In this study, we report an electrical properties of green OLEO, using the changed thickness of Al Layer. We investigated the electrical properties of OLEOs by IVL and optical properties by EL spectrum. The fundamental structure of green OLEOs was ITO anode/TPD($400{\AA}$)/$Alq_3(600{\AA})$)/LiF($10{\AA}$)/Al($200{\sim}600{\AA}$) cathode. The threshold voltage was low value according to the more thin Al layer. The luminance was increased by decreased cathode layer. The threshold voltage was 12V and wavelength was 530nm at $200{\AA}$ cathode.

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The Effects of Deposition Rate on the Physical Characteristics of OLEDs (유기발광 다이오드의 물성에 미치는 증착속도의 영향)

  • Lee, Young-Hwan;Cha, Ki-Ho;Kim, Weon-Jong;Lee, Jong-Yong;Kim, Gwi-Yeol;Hong, Jin-Woong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.04a
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    • pp.54-55
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    • 2006
  • Organic light-emitting diodes(OLEOs) are attractive because of possible application in display with low operating voltage, low power consumption, self-emission and capability of multicolor emission by the selection of emissive material. We investigated the effects of deposition rate on the electrical characteristics, physical characteristics and optical characteristics of OLEOs in the ITO(indium-tin-oxide)/N.N'-diphenyl-N,N'-bis(3-methyphenyl)-1,1'-biphenyl-4,4'-diamine(TPD)/tris(8-hydroxyquinoline)aluminum($Alq_3$)/Al device. We measured current density, luminous flux and luminance characteristics of devices with varying deposition rates of TPD and $Alq_3$. It has been found that optimal deposition rate of TPD and $Alq_3$ were respectively $1.5{\AA}/s$ from the device structure. An AFM measurement results, surface roughness of the deposited film was the lowest when deposition rate was $1.5{\AA}/s$.

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Photocurrent multiplication process in OLEDs due to light irradiation and crystalline hole transporting layer (유기발광소자의 결정구조에 따른 Photocurrent 발광효율특성 연구)

  • Lim, Eun-Ju;Lee, Kie-Jin;Han, Woo-Mi;E, Jung-Yoon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.1026-1029
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    • 2002
  • We report the electric properties of organic light emitting diodes (OLEDs) by controlling the carrier density according to the crystalline of copper(II) phthalocyanine(CuPc) and the irradiation light intensity. OLEDs were constructed with indium tin oxaide (ITO)/CuPc/triphenyl-diamin (TPD)/tris-(8-hydroxyquinoline)aluminum (Alq3)/Al. The transport properties of OLEDs were changedby the heat-treatments of CuPc. The irradiation of red and blue light exciting CuPc, TPD and Alq3. And then we observed the carrier density of OLEDs.

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Electrical and Optical Properties of Partially Doped Blue Phosphorescent OLEOs (부분 도핑을 이용한 청색 인광 OLEDs의 전기 및 광학적 특성)

  • Seo, Yu-Seok;Moon, Dae-Gyu
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.6
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    • pp.512-515
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    • 2009
  • We have fabricated blue phosphorescent organic light emitting diodes (PHOLEDs) using a 3,5'-N,N'-dicarbazole-benzene (mCP) host and iridium (III) bis[(4,6-difluorophenyl)-pyridinato-N,$C^{2'}$] picolinate (Flrpic) guest materials, The Flrpic was partially doped into the mCP host layer, for investigating recombination zone, current efficiency, and emission characteristics of the blue PHOLEDs. The recombination of electrons and holes takes place inside the mCP layer adjacent to the mCP/hole blocking layer interface. The best current efficiency was obtained in a device with an emission layer structure of mCP (10 nm)/mCP:Flrpic (20 nm, 10%). The high current efficiency in this device was attributed to the confinement of Ffrpic triplet excitons by the undoped mCP layer with high triplet energy, which blocks diffusion of Ffrpic excitons to the adjacent hole transport layer with a lower triplet energy.

Influence of a Stacked-CuPc Layer on the Performance of Organic Light-Emitting Diodes

  • Choe Youngson;Park Si Young;Park Dae Won;Kim Wonho
    • Macromolecular Research
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    • v.14 no.1
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    • pp.38-44
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    • 2006
  • Vacuum deposited copper phthalocyanine (CuPc) was placed as a thin interlayer between indium tin oxide (ITO) electrode and a hole transporting layer (HTL) in a multi-layered, organic, light-emitting diode (OLEOs). The well-stacked CuPc layer increased the stability and efficiency of the devices. Thermal annealing after CuPc deposition and magnetic field treatment during CuPc deposition were performed to obtain a stacked-CuPc layer; the former increased the stacking density of the CuPc molecules and the alignment of the CuPc film. Thermal annealing at about 100$^{circ}C$ increased the current flow through the CuPc layer by over 25$\%$. Surface roughness decreased from 4.12 to 3.65 nm and spikes were lowered at the film surface as well. However, magnetic field treatment during deposition was less effective than thermal treatment. Eventually, a higher luminescence at a given voltage was obtained when a thermally-annealed CuPc layer was placed in the present, multi-layered, ITO/CuPc/NPD/Alq3/LiF/AI devices. Thermal annealing at about 100$^{circ}C$ for 3 h produced the most efficient, multi-layered EL devices in the present study.

A Study on OLED Characteristics according to etching conditions of ITO Pattern (ITO 패턴의 식각 조건에 따른 OLED 특성에 관한 연구)

  • Lee, Eui-Sik;Lee, Byoung-Wook;Lee, Tae-Sung;Lee, Keun-Woo;Lee, Jong-Ha;Moon, Soon-Kwon;Hong, Chin-Soo;Kim, Chang-Kyo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.04a
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    • pp.49-51
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    • 2006
  • OLEOs was fabricated by PLD method. Wet etching process and plasma treatment of ITO on the glass were performed to extend the lifetime of the OLED and increase its brightness. The NPB, $Alq_3$, Li-Benzoate and AI layers on ITO pattern on the glass were deposited by PLO method, sequentially. When the etched ITO was treated by $O_2$ plasma with RF power of 50W, the best result was obtained. The lifetime of the OLED treated by $O_2$ plasma was extended from 3,770sec to 12,586sec compared to that without the plasma treatment.

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