A Study on OLED Characteristics according to etching conditions of ITO Pattern

ITO 패턴의 식각 조건에 따른 OLED 특성에 관한 연구

  • Published : 2006.04.28

Abstract

OLEOs was fabricated by PLD method. Wet etching process and plasma treatment of ITO on the glass were performed to extend the lifetime of the OLED and increase its brightness. The NPB, $Alq_3$, Li-Benzoate and AI layers on ITO pattern on the glass were deposited by PLO method, sequentially. When the etched ITO was treated by $O_2$ plasma with RF power of 50W, the best result was obtained. The lifetime of the OLED treated by $O_2$ plasma was extended from 3,770sec to 12,586sec compared to that without the plasma treatment.

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