• Title/Summary/Keyword: No buffer layer

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Adaptive Data Transmission Control for Multilane-Based Ethernet

  • Han, Kyeong-Eun;Kim, Kwangjoon;Kim, SunMe;Lee, Jonghyun
    • ETRI Journal
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    • v.35 no.1
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    • pp.146-149
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    • 2013
  • We propose a reconciliation sublayer (RS)-based lane and traffic control protocol for energy-efficient 40-G/100-G Ethernet. The RS performs active/inactive lane control and data rate adaptation depending on active lane information received from the upper layer. This protocol does not result in a processing delay in the media access control layer, nor is an additional buffer required at the physical layer for dynamic lane control. It ensures minimal delay and no overhead for the exchange of control frames and provides a simple adaptive data rate.

Implementation and performance evaluation of SS No.7 in B-ISDN networks (B-ISDN 망에서 공통선 신호 기능의 구현 및 성능 평가)

  • Rhee, Woo-Seop;Kim, Hwa-Suk;An, Yoon-Young;Kwon, Yool
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.23 no.5
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    • pp.1397-1408
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    • 1998
  • Service networks for the future communication networks will be combined by the B-ISDN networks. These service networks also will use SS No.7 as the signaling transport network for the control of user requriement service. Therefore, ITU-T recommended B-ISDN signaling layers for SS No.7 as a substitute for N-ISDN MTP signaling layer. In this paper, we propose the implementation structure and describe the characteristics and functions of each signaling layer of SS No.7, which are adapted to ATM switching system, and evaluate a performance. The structure of SSCOP transmission buffer using a linked list and an unit frame length is proposed for SAAL layer and the implementation structure and internal routing method according to the ATM switching system are also proposed for MTP-3b layer. Additionally, we propose the ISUP/B-ISUP level interworking structure using only associated mode, which are presented in the first stage of B-ISDN as the effective internatworking structure of SS No.7 for the circuit related signaling network between the existing N-ISDN networks and B-ISDN networks.

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GaN Epitaxy with PA-MBE on HF Cleaned Cobalt-silicide Buffer Layer (HF 크리닝 처리한 코발트실리사이드 버퍼층 위에 PA-MBE로 성장시킨 GaN의 에피택시)

  • Ha, Jun-Seok;Chang, Ji-Ho;Song, Oh-Sung
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.11 no.2
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    • pp.409-413
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    • 2010
  • We fabricated 10 nm-thick cobalt silicide($CoSi_2$) as a buffer layer on a p-type Si(100) substrate to investigate the possibility of GaN epitaxial growth on $CoSi_2/Si(100)$ substrates. We deposited 500 nm-GaN on the cobalt silicide buffer layer at low temperature with a PA-MBE (plasma assisted-molecular beam epitaxy) after the $CoSi_2/Si$ substrates were cleaned by HF solution. An optical microscopy, AFM, TEM, and HR-XRD (high resolution X-ray diffractometer) were employed to determine the GaN epitaxy. For the GaN samples without HF cleaning, they showed no GaN epitaxial growth. For the GaN samples with HF cleaning, they showed $4\;{\mu}m$-thick GaN epitaxial growth due to surface etching of the silicide layers. Through XRD $\omega$-scan of GaN <0002> direction, we confirmed the cyrstallinity of GaN epitaxy is $2.7^{\circ}$ which is comparable with that of sapphire substrate. Our result implied that $CoSi_2/Si(100)$ substrate would be a good buffer and substrate for GaN epitaxial growth.

Dephosphorylation of Diphenyl-4-Nitrophenyl Phosphinate(DPNPIN) onto 2-Alkylbenzimidazolide Anion in TTABr Micellar Solution (TTABr 미셀 용액속에서 2-알킬벤즈이미다졸 음이온에 의해 추진되는 디페닐-4-니트로페닐 포스페네이트(DPNPIN)의 탈인산화반응)

  • Kim, Jeung-Bea
    • Journal of Environmental Science International
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    • v.24 no.8
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    • pp.981-992
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    • 2015
  • This study is mainly focused on micellar effect of tetradecyltrimethyl ammonium bromide(TTABr) solution including alkylbenzimidazole(R-BI) on dephosphorylation of diphenyl-4-nitrophenylphosphinate(DPNPIN) in carbonate buffer(pH 10.7). Dephosphorylation of DPNPIN is accelerated by $BI^{\Theta}$ ion in $10^2$ M Carbonate buffer(pH 10.7) of $4{\times}10^{-4}$ M TTABr solution up to 80 times as compared with the reaction in Carbonate buffer by no benzimidazole(BI) solution of TTABr. The value of pseudo first order rate constant($k_{\psi}$) of the reaction in TTABr solution reached a maximum rate constant increasing micelle concentration. The reaction mediated by $R-BI^{\Theta}$ in micellar solutions are obviously slower than those by $BI^{\Theta}$, and the reaction rate were decreased with increase of lengths of alkyl groups. It seems due to steric effect of alkyl groups of $R-BI^{\Theta}$ in Stern layer of micellar solution. The surfactant reagent, TTABr, strongly catalyzes the reaction of DPNPIN with R-BI and its anion($R-BI^{\Theta}$) in Carbonate buffer(pH 10.7). For example, $4{\times}10^{-4}$ M TTABr in $1{\times}10^{-4}$ M BI solution increase the rate constant($k_{\psi}=99.7{\times}10^{-4}1/sec$) of the dephosphorylation by a factor ca. 28, when compared with reaction($k_{\psi}=3.5{\times}10^{-4}1/sec$) in BI solution(without TTABr). And no TTABr solution, in BI solution increase the rate constant($k_{\psi}=3.5{\times}10^{-4}1/sec$) of the dephosphorylation by a factor ca. 39, when compared with reaction ($k_{\psi}=1.0{\times}10^{-5}1/sec$) in water solution(without BI).

Planting Design in Green Open Space, Urban Area : Planting Evaluation of Buffer Green Space in Housing Complex (도시지역 녹화공간의 배식기법 : 공동주택단지 완충녹지의 배식)

  • Cho, Woo
    • Korean Journal of Environment and Ecology
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    • v.12 no.1
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    • pp.78-90
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    • 1998
  • An objective of this study was to provide database for the planting disign of buffer green space. Types, planting structure, and effect of vuffer green space were investigated in five housing complexes of newtown of metropolitan area, Korea. Buffer green space in the study sites were constructed as mounding, slope, and plate. The number of species was found 20 tree and sub-tree species(10 evergreen and 20 deciduous species ) and 13 shrub species. These species were planted in one-storyed planting structure and there was no difference with ornamental species in the urban parks. Effect of sound proof by the buffer green space was recognized but sound level in four types among the seven types was observed above standard sound level for housing complex(65dB). Effect of sound proof was especially most effective in the mounding type. It was found that planting density and index of plant crown volume were mot satisfied to the function of buffer green space because of lower density and crown volume than natural vegetation per unit. Based on these results, this study suggested that buffer green space is desirable to be developed in the mounding type over two meters height with multi-layer planting model. In addition, there is needed to consider vegetation structure of natural forest around the developing site.

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Fabrication and Characterization of Cu3SbS4 Solar Cell with Cd-free Buffer

  • Han, Gyuho;Lee, Ji Won;Kim, JunHo
    • Journal of the Korean Physical Society
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    • v.73 no.11
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    • pp.1794-1798
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    • 2018
  • We have grown famatinite $Cu_3SbS_4$ films by using sulfurization of Cu/Sb stack film. Sulfurization at $500^{\circ}C$ produced famatinite $Cu_3SbS_4$ phase, while $400^{\circ}C$ and $450^{\circ}C$ sulfurization exhibited unreacted and mixed phases. The fabricated $Cu_3SbS_4$ film showed S-deficiency, and secondary phase of $Cu_{12}Sb_4S_{13}$. The secondary phase was confirmed by X-ray diffraction, Raman spectroscopy, photoluminescence and external quantum efficiency measurements. We have also fabricated solar cell in substrate type structure, ITO/ZnO/(Zn,Sn)O/$Cu_3SbS_4$/Mo/glass, where $Cu_3SbS_4$ was used as a absorber layer and (Zn,Sn)O was employed as a Cd-free buffer. Our best cell showed power conversion efficiency of 0.198%. Characterization results of $Cu_3SbS_4$ absorber indicates deep defect (due to S-deficiency) and low shunt resistance (due to $Cu_{12}Sb_4S_{13}$ phase). Thus in order to improve the cell efficiency, it is required to grow high quality $Cu_3SbS_4$ film with no S-deficiency and no secondary phase.

Unsteady Transitional Boundary Layer due to Rotor Stator Interaction at Design and Off Design Operations (설계점 및 탈설계점에서의 rotor-stator 상호작용에 의한 비정상 천이 경계층의 수치해석적 연구)

  • Kang Dong Jin;Jun Hyun Joo
    • Journal of computational fluids engineering
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    • v.4 no.2
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    • pp.17-30
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    • 1999
  • The unsteady transitional boundary layer due to rotor-stator interaction was studied at two operation points, the design and one off design points. The off design point leads to lower blade loading and lower Reynolds number. A Navier-Stokes code developed in the previous study was parallelized to expedite computations. A low Reynolds number turbulence model was used to close the momentum equations. All computations show good agreement with experimental data. The wake induced transitional strip on the suction side of the stator is clearly captured at design point operation. There is no noticeable change in shape and phase angle of the wake induced strip even in the laminar sublayer. The wake induced transitional strip at off design point shows more complex structure. The wake induced transitional strip is observed only in the turbulent layer, and becomes obscure in the laminar sublayer and buffer layer. This behavior is probably consequent upon that the transition is governed by both wake induced strip and natural transition mechanism by Tollmien-Schlichting wave.

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GaN epitaxy growth by low temperature HYPE on $CoSi_2$ buffer/Si substrates (실리콘 기판과 $CoSi_2$ 버퍼층 위에 HVPE로 저온에서 형성된 GaN의 에피텍셜 성장 연구)

  • Ha, Jun-Seok;Park, Jong-Sung;Song, Oh-Sung;Yao, T.;Jang, Ji-Ho
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.19 no.4
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    • pp.159-164
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    • 2009
  • We fabricated 40 nm-thick cobalt silicide ($CoSi_2$) as a buffer layer, on p-type Si(100) and Si(111) substrates to investigate the possibility of GaN epitaxial growth on $CoSi_2$/Si substrates. We deposited GaN using a HVPE (hydride vapor phase epitaxy) with two processes of process I ($850^{\circ}C$-12 minutes + $1080^{\circ}C$-30 minutes) and process II ($557^{\circ}C$-5 minutes + $900^{\circ}C$-5 minutes) on $CoSi_2$/Si substrates. An optical microscopy, FE-SEM, AFM, and HR-XRD (high resolution X-ray diffractometer) were employed to determine the GaN epitaxy. In case of process I, it showed no GaN epitaxial growth. However, in process II, it showed that GaN epitaxial growth occurred. Especially, in process II, GaN layer showed selfaligned substrate separation from silicon substrate. Through XRD ${\omega}$-scan of GaN <0002> direction, we confirmed that the combination of cobalt silicide and Si(100) as a buffer and HVPE at low temperature (process II) was helpful for GaN epitaxy growth.

Fabrication and Characterization of Ru/Ni Substrates for Superconductor Applications (고온 초전도체를 위한 Ru/Ni 기판의 제조와 특성 분석)

  • Kwangsoo No;Huyong Tian;Inki Hong;Hyunsuk Hwang;Tae-Hyun Sung
    • Proceedings of the Korea Institute of Applied Superconductivity and Cryogenics Conference
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    • 2002.02a
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    • pp.13-16
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    • 2002
  • Ru thin films were deposited on bi-axially textured Ni tape using rf-magnetron sputtering for a conductive buffer layer of high Tc superconductor applications. (002) textured Ni films were fabricated as the deposition temperature was over $600^{\circ}C$. Rocking curves of the films showed similar alignment to those the Ni tapes. The resistivity of the tapes fabricated below $600^{\circ}C$ was around 20$\mu\Omega$-cm which is good for the conductive layer for tape superconductor applications.

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